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1. 发明授权

US06791680B1 System and method for inspecting semiconductor wafers 失效
标题翻译：用于检查半导体晶片的系统和方法
公开(公告)号：US06791680B1
公开(公告)日：2004-09-14
申请号：US09474941
申请日：1999-12-30
申请人： Eliezer Rosengaus , Steven R. Lange
发明人： Eliezer Rosengaus , Steven R. Lange
IPC分类号： G01N2188
CPC分类号： G01N21/95623 , G01N21/9501 , G01N2021/8822 , H01L21/67155
摘要： A method for inspecting semiconductor wafers is provided in which a plurality of independent, low-cost, optical-inspection subsystems are packaged and integrated to simultaneously perform parallel inspections of portions of the wafer, the wafer location relative to the inspection being controlled so that the entire wafer is imaged by the system of optical subsystems in a raster-scan mode. A monochromatic coherent-light source illuminates the wafer surface. A darkfield-optical system collects scattered light and filters patterns produced by valid periodic wafer structures using Fourier filtered. The filtered light is processed by general purpose digital-signal processors. Image subtraction methods are used to detect wafer defects, which are reported to a main computer to aid in statistical process control, particularly for manufacturing equipment.
摘要翻译：提供了一种用于检查半导体晶片的方法，其中多个独立的，低成本的光学检查子系统被封装和集成，以同时对晶片的部分进行并行检查，相对于被检查的晶片位置被控制，使得整个晶片由光学子系统的系统以光栅扫描模式成像。单色相干光源照亮晶片表面。暗场光学系统使用傅立叶滤波来收集散射光并滤除由有效周期性晶片结构产生的图案。滤波后的光由通用数字信号处理器处理。图像减法方法用于检测晶片缺陷，报告给主计算机，以帮助进行统计过程控制，特别是制造设备。

2. 发明授权

US6020957A System and method for inspecting semiconductor wafers 失效
标题翻译：用于检查半导体晶片的系统和方法
公开(公告)号：US6020957A
公开(公告)日：2000-02-01
申请号：US70437
申请日：1998-04-30
申请人： Eliezer Rosengaus , Steven R. Lange
发明人： Eliezer Rosengaus , Steven R. Lange
IPC分类号： G01B11/30 , G01N21/95 , G01N21/956 , G06T1/00 , H01L21/66 , H01L21/677 , G01N21/89
CPC分类号： G01N21/95623 , G01N21/9501 , G01N2021/8822 , H01L21/67155
摘要： A method for inspecting semiconductor wafers is provided in which a plurality of independent, low-cost, optical-inspection subsystems are packaged and integrated to simultaneously perform parallel inspections of portions of the wafer, the wafer location relative to the inspection being controlled so that the entire wafer is imaged by the system of optical subsystems in a raster-scan mode. A monochromatic coherent-light source illuminates the wafer surface. A darkfield-optical system collects scattered light and filters patterns produced by valid periodic wafer structures using Fourier filtering. The filtered light is processed by general purpose digital-signal processors. Image subtraction methods are used to detect wafer defects, which are reported to a main computer to aid in statistical process control, particularly for manufacturing equipment.
摘要翻译：提供了一种用于检查半导体晶片的方法，其中多个独立的，低成本的光学检查子系统被封装和集成，以同时对晶片的部分进行并行检查，相对于被检查的晶片位置被控制，使得整个晶片由光学子系统的系统以光栅扫描模式成像。单色相干光源照亮晶片表面。暗场光学系统收集散射光，并使用傅立叶滤波对由有效的周期性晶片结构产生的滤波图案进行滤波。滤波后的光由通用数字信号处理器处理。图像减法方法用于检测晶片缺陷，报告给主计算机，以帮助进行统计过程控制，特别是制造设备。

3. 发明申请

US20080212089A1 Multi-spectral techniques for defocus detection 有权
标题翻译：用于散焦检测的多光谱技术
公开(公告)号：US20080212089A1
公开(公告)日：2008-09-04
申请号：US12069997
申请日：2008-02-14
申请人： Eliezer Rosengaus
发明人： Eliezer Rosengaus
IPC分类号： G01J3/00 , G01B9/02
CPC分类号： G01J3/453 , G01J3/02 , G01J3/0224 , G01J3/2823 , G01N21/211 , G01N21/9501 , G01N2021/213
摘要： A method and apparatus for improved defocus detection on wafers. The use of hyperspectral imaging provides increased sensitivity for local defocus defects, and the use of Fourier Space analysis provides increased sensitivity for extended defocus defects. A combination of the two provides improved overall sensitivity to local and extended defocus defects.
摘要翻译：一种用于改善晶片上散焦检测的方法和装置。使用高光谱成像可以提高局部散焦缺陷的灵敏度，并且使用傅立叶空间分析可以提供延长散焦缺陷的灵敏度。两者的组合提供了对局部和扩展的散焦缺陷的总体灵敏度的改善。

4. 发明授权

US07181368B1 Status polling 有权
标题翻译：状态轮询
公开(公告)号：US07181368B1
公开(公告)日：2007-02-20
申请号：US10967419
申请日：2004-10-18
申请人： Krishnamurthy Bhaskar , Mark J. Roulo , John S. Taylor , Lawrence R. Miller , Paul T. Russell , Jason Z. Lin , Eliezer Rosengaus , Richard M. Wallingford , Kishore Bubna
发明人： Krishnamurthy Bhaskar , Mark J. Roulo , John S. Taylor , Lawrence R. Miller , Paul T. Russell , Jason Z. Lin , Eliezer Rosengaus , Richard M. Wallingford , Kishore Bubna
IPC分类号： G06F11/30
CPC分类号： G05B19/41855 , G05B2219/37224
摘要： An inspection system for detecting anomalies on a substrate. The inspection system has a sensor array for generating image data. A first high speed network is coupled to the sensor array and receives and communicates the image data. An array of process nodes is coupled to the first high speed network, and receives and processes the image data to produce anomaly reports. Each process node has an interface card coupled to the first high speed network, that receives the image data from the first high speed network and formats the image data according to a high speed interface bus protocol. The interface card sets a register indicating whether a predetermined amount of image data has been stored in a memory, and the process node reads the register to determine whether the predetermined amount of image data has been stored in the memory, and initiates image processing when the register indicates that the predetermined amount of image data has been stored in the memory.
摘要翻译：用于检测基板上的异常的检查系统。检查系统具有用于生成图像数据的传感器阵列。第一高速网络耦合到传感器阵列并接收并传送图像数据。一系列过程节点耦合到第一高速网络，并接收和处理图像数据以产生异常报告。每个处理节点具有耦合到第一高速网络的接口卡，其接收来自第一高速网络的图像数据，并且根据高速接口总线协议格式化图像数据。接口卡设置表示预定量的图像数据是否已经存储在存储器中的寄存器，并且处理节点读取寄存器以确定预定量的图像数据是否已被存储在存储器中，并且当寄存器指示预定量的图像数据已被存储在存储器中。

5. 发明授权

US5653539A Method and apparatus for remotely measuring the temperature of a surface 失效
标题翻译：用于远程测量表面温度的方法和装置
公开(公告)号：US5653539A
公开(公告)日：1997-08-05
申请号：US236404
申请日：1994-05-02
申请人： Eliezer Rosengaus
发明人： Eliezer Rosengaus
IPC分类号： G01K11/20 , G01K3/04 , G01K3/06
CPC分类号： G01K11/20 , Y10S252/962
摘要： A method and apparatus for measuring the temperature profile of a surface exhibiting spatial and/or temporal variations in temperature, e.g., the surface of a machine or a biological system, is disclosed. The inventive method involves forming a layer of chemiluminescent material in thermal contact with the surface. The chemiluminescent activity is selected to be a function of temperature by suitable dye choices. The resulting luminescence is detected.
摘要翻译：公开了一种用于测量表现出空间和/或时间温度变化的表面的温度分布的方法和装置，例如机器或生物系统的表面。本发明的方法包括形成与表面热接触的化学发光材料层。通过合适的染料选择将化学发光活性选择为温度的函数。检测出所得到的发光。

6. 发明授权

US09068917B1 Systems and methods for inspection of a specimen 有权
标题翻译：检测样品的系统和方法
公开(公告)号：US09068917B1
公开(公告)日：2015-06-30
申请号：US11374711
申请日：2006-03-14
申请人： Mehdi Vaez-Iravani , Eliezer Rosengaus
发明人： Mehdi Vaez-Iravani , Eliezer Rosengaus
IPC分类号： G01N21/00 , G01N21/88
CPC分类号： G01N21/00 , G01N21/88 , G01N21/9501 , G01N21/956 , G01N2021/8825
摘要： Systems and methods for inspection of a specimen are provided. One system includes an illumination subsystem configured to illuminate the specimen by scanning a spot across the specimen. The system also includes a non-imaging detection subsystem configured to generate output signals responsive to light specularly reflected from the spot scanned across the specimen. In addition, the system includes a processor configured to generate images of the specimen using the output signals and to detect defects on the specimen using the images. In one embodiment, the non-imaging detection subsystem includes an objective and a detector. An NA of the objective does not match a pixel size of the detector. In another embodiment, the non-imaging detection subsystem includes an objective having an NA of greater than about 0.05. The system may be configured for multi-spot illumination and multi-channel detection. Alternatively, the system may be configured for single spot illumination and multi-channel detection.
摘要翻译：提供了用于检查样本的系统和方法。一个系统包括照明子系统，该照明子系统被配置为通过扫描样品上的斑点照射样本。该系统还包括非成像检测子系统，其被配置为响应于从穿过样本扫描的点镜面反射的光产生输出信号。另外，该系统包括处理器，该处理器被配置为使用输出信号产生样本的图像，并使用该图像来检测样本上的缺陷。在一个实施例中，非成像检测子系统包括物镜和检测器。目标的NA与检测器的像素尺寸不匹配。在另一个实施例中，非成像检测子系统包括具有大于约0.05的NA的物镜。该系统可以被配置用于多点照明和多通道检测。或者，该系统可以被配置用于单点照明和多通道检测。

7. 发明授权

US07379838B2 Programmable image computer 有权
标题翻译：可编程图像计算机
公开(公告)号：US07379838B2
公开(公告)日：2008-05-27
申请号：US11530153
申请日：2006-09-08
申请人： Krishnamurthy Bhaskar , Mark J. Roulo , John S. Taylor , Lawrence R. Miller , Paul T. Russell , Jason Z. Lin , Eliezer Rosengaus , Richard M. Wallingford , Kishore Bubna
发明人： Krishnamurthy Bhaskar , Mark J. Roulo , John S. Taylor , Lawrence R. Miller , Paul T. Russell , Jason Z. Lin , Eliezer Rosengaus , Richard M. Wallingford , Kishore Bubna
IPC分类号： G06F15/00
CPC分类号： G06T1/0007 , G01N21/9501 , G01N21/956 , G01N2021/8825 , G01R31/311
摘要： An inspection system for detecting anomalies on a substrate. A first network is coupled to a sensor array and communicates data. Process nodes are coupled to the first network, and process the data to produce reports. Each process node has an interface card that formats the data for a high speed interface bus that is coupled to the interface card. A computer receives and processes the data to produce the report. A second network receives the reports. A job manager is coupled to the second network, receives the reports, and sends information to the process nodes to coordinate processing of the data.
摘要翻译：用于检测基板上的异常的检查系统。第一网络耦合到传感器阵列并传送数据。过程节点耦合到第一个网络，并处理数据以生成报告。每个进程节点都有一个接口卡，格式化耦合到接口卡的高速接口总线的数据。计算机接收并处理数据以生成报告。第二个网络接收报告。作业管理器耦合到第二网络，接收报告，并将信息发送到处理节点以协调数据的处理。

8. 发明授权

US07251586B2 Full swath analysis 有权
标题翻译：全幅分析
公开(公告)号：US07251586B2
公开(公告)日：2007-07-31
申请号：US11314627
申请日：2005-12-21
申请人： Krishnamurthy Bhaskar , Mark J. Roulo , John S. Taylor , Lawrence R. Miller , Paul T. Russell , Jason Z. Lin , Eliezer Rosengaus , Richard M. Wallingford , Kishore Bubna
发明人： Krishnamurthy Bhaskar , Mark J. Roulo , John S. Taylor , Lawrence R. Miller , Paul T. Russell , Jason Z. Lin , Eliezer Rosengaus , Richard M. Wallingford , Kishore Bubna
IPC分类号： G21C17/00 , G06F11/30 , G06F15/00
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： An inspection system for detecting anomalies on a substrate. A first network is coupled to the sensor array and communicates image data. Process nodes are couple to the first network, and process the data to produce reports. Each process node has an interface card that formats the data for a high speed interface bus that is coupled to the interface card. A computer receives and processes the data to produce the report. A second network receives the reports from the process nodes. A job manager is coupled to the second network, and receives the reports from the process nodes and sends information to the process nodes to coordinate the processing of the data in the process nodes.
摘要翻译：用于检测基板上的异常的检查系统。第一网络耦合到传感器阵列并传送图像数据。过程节点耦合到第一个网络，并处理数据以生成报告。每个进程节点都有一个接口卡，格式化耦合到接口卡的高速接口总线的数据。计算机接收并处理数据以生成报告。第二个网络从进程节点接收报告。作业管理器耦合到第二个网络，并从进程节点接收报告，并向进程节点发送信息以协调进程节点中数据的处理。

9. 发明授权

US07076390B1 Memory load balancing 有权
标题翻译：内存负载平衡
公开(公告)号：US07076390B1
公开(公告)日：2006-07-11
申请号：US10967397
申请日：2004-10-18
申请人： Krishnamurthy Bhaskar , Mark J. Roulo , John S. Taylor , Lawrence R. Miller , Paul T. Russell , Jason Z. Lin , Eliezer Rosengaus , Richard M. Wallingford , Kishore Bubna
发明人： Krishnamurthy Bhaskar , Mark J. Roulo , John S. Taylor , Lawrence R. Miller , Paul T. Russell , Jason Z. Lin , Eliezer Rosengaus , Richard M. Wallingford , Kishore Bubna
IPC分类号： G06F15/00
CPC分类号： G01N21/95607 , G06T7/0004
摘要： An inspection system for detecting anomalies on a substrate. A first network is coupled to a sensor array and communicates data. Process nodes are coupled to the first network, and process the data to produce reports. Each process node includes memory sufficient to buffer the data until it can process the data. Each process node has an interface card that formats the data for a high speed interface bus that is coupled to the interface card. A computer receives and processes the data to produce the report. A second network receives the reports. A job manager is coupled to the second network, receives the reports, and sends information to the process nodes to coordinate processing of the data.
摘要翻译：用于检测基板上的异常的检查系统。第一网络耦合到传感器阵列并传送数据。过程节点耦合到第一个网络，并处理数据以生成报告。每个进程节点包括足以缓冲数据的内存，直到它能够处理数据。每个进程节点都有一个接口卡，格式化耦合到接口卡的高速接口总线的数据。计算机接收并处理数据以生成报告。第二个网络接收报告。作业管理器耦合到第二网络，接收报告，并将信息发送到处理节点以协调数据的处理。

10. 发明授权

US07719677B2 Multi-spectral techniques for defocus detection 有权
标题翻译：用于散焦检测的多光谱技术
公开(公告)号：US07719677B2
公开(公告)日：2010-05-18
申请号：US12069997
申请日：2008-02-14
申请人： Eliezer Rosengaus
发明人： Eliezer Rosengaus
IPC分类号： G01J3/00
CPC分类号： G01J3/453 , G01J3/02 , G01J3/0224 , G01J3/2823 , G01N21/211 , G01N21/9501 , G01N2021/213
摘要： A method and apparatus for improved defocus detection on wafers. The use of hyperspectral imaging provides increased sensitivity for local defocus defects, and the use of Fourier Space analysis provides increased sensitivity for extended defocus defects. A combination of the two provides improved overall sensitivity to local and extended defocus defects.
摘要翻译：一种用于改善晶片上散焦检测的方法和装置。使用高光谱成像可以提高局部散焦缺陷的灵敏度，并且使用傅立叶空间分析可以提供延长散焦缺陷的灵敏度。两者的组合提供了对局部和扩展的散焦缺陷的总体灵敏度的改善。

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