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1. 发明授权

US06660994B1 Optical apparatus and method for high speed measurement of temporally-resolved transient pressures 失效
标题翻译：用于高速测量时间分辨瞬态压力的光学装置和方法
公开(公告)号：US06660994B1
公开(公告)日：2003-12-09
申请号：US09963948
申请日：2001-09-26
申请人： Gerardo I. Pangilinan , Thomas P. Russell
发明人： Gerardo I. Pangilinan , Thomas P. Russell
IPC分类号： G01B1116
CPC分类号： G01L23/16 , G01L11/02
摘要： An apparatus for measuring pressure in a medium includes a laser for emitting linearly polarized light; a polarizing beam splitter that reflects the linearly polarized light from the laser; a first lens that receives and focuses the linearly polarized light from the polarizing beam splitter; an optical fiber having first and second ends, the first end for receiving the linearly polarized light from the first lens, the second end comprising a tip disposed in the medium, the tip receiving reflected light from the medium, the reflected light being transmitted back through the optical fiber and the first lens to the polarizing beam splitter; the polarizing beam splitter transmitting the reflected light that has polarization orthogonal to the linearly polarized light emitted by the laser but not transmitting the reflected light that has polarization substantially parallel to the linearly polarized light emitted by the laser; a second lens for receiving the reflected light that has polarization orthogonal to the linearly polarized light emitted by the laser; a photodiode for receiving the orthogonal reflected light from the second lens; an oscilloscope connected to the photodiode; and a delay generator connected to the photodiode, the oscilloscope and the laser.
摘要翻译：用于测量介质中的压力的装置包括用于发射线性偏振光的激光器; 反射来自激光器的线偏振光的偏振分束器; 接收并聚焦来自偏振分束器的线偏振光的第一透镜; 具有第一和第二端的光纤，所述第一端用于接收来自所述第一透镜的线偏振光，所述第二端包括设置在所述介质中的尖端，所述尖端接收来自所述介质的反射光，所述反射光被透射回光纤和第一透镜到偏振分束器; 偏振光束分光器透射具有与由激光器发射的线性偏振光正交的偏振的反射光，但不透射具有基本上平行于由激光器发射的线偏振光的偏振光的反射光; 用于接收具有与由激光器发射的线偏振光正交的偏振的反射光的第二透镜; 用于接收来自第二透镜的正交反射光的光电二极管; 连接到光电二极管的示波器; 以及连接到光电二极管，示波器和激光器的延迟发生器。

2. 发明授权

US06538725B2 Method for determination of structural defects of coatings 有权
公开(公告)号：US06538725B2
公开(公告)日：2003-03-25
申请号：US09765757
申请日：2001-01-22
申请人： Radislav Alexandrovich Potyrailo , Daniel Robert Olson , Michael Jarlath Brennan , James Norman Cawse , Bret Ja Chisholm
发明人： Radislav Alexandrovich Potyrailo , Daniel Robert Olson , Michael Jarlath Brennan , James Norman Cawse , Bret Ja Chisholm
IPC分类号： G01B1116
CPC分类号： G01N21/6452 , C09K11/06 , G01N21/25 , G01N21/31 , G01N21/8422 , G01N21/88 , G01N2021/6417 , G01N2021/646
摘要： The present invention provides a method for quantifying structural defects of a coating composition on a given substrate, where certain structural defect-inducing tests are performed. In this method, a coating formulation is doped with a colorimetric or luminescent material. Concentration of the material depends on the quantum efficiency, excitation and emission wavelengths, and employed detection techniques, and can range from about 1 fM to about 1 mM. Before, during and/or after such tests, the coating is illuminated with a wavelength of radiation at which the reflected or transmitted color or emitted luminescence of the material in the coating is detectable with an optical detector or by visual inspection. In this fashion, the percentage of failure of the coating can be quantified as well as the level of interdiffusion of coating into substrate or substrate into coating. The method of the invention is thus particularly well-suited for the combinatorial analysis of an array of coating samples. Additionally, when the structural defect-inducing material test is being performed, the removed coating material can be analyzed in like fashion.

3. 发明授权

US06337737B1 Fiber-Bragg-grating-based strain measuring apparatus, system and method 有权
标题翻译：基于光纤布拉格光栅的应变测量装置，系统和方法
公开(公告)号：US06337737B1
公开(公告)日：2002-01-08
申请号：US09803711
申请日：2001-03-09
申请人： Chia-Chen Chang , Erin Sahinci , Waqar Mahmood
发明人： Chia-Chen Chang , Erin Sahinci , Waqar Mahmood
IPC分类号： G01B1116
CPC分类号： G01L1/246 , G01D5/35316
摘要： The invention was originally developed to determine the strain-relief capability of a fusion splice protector as well as the compressive stress imparted to a fusion splice by the splice protector. The invention also permits performance and comparative analyses of splice protectors as well as any package in which the optical fiber is at least partially disposed. To those ends a fiber Bragg grating (FBG) is axially arranged relative to the package such that a free or reference section of the FBG protrudes from the package while a shielded section lies within the package. Broadband light is supplied to the FBG which reflects certain wavelengths that are measured by an optical spectrum analyzer. The FBG reflected spectra will be split into two peaks as the reference and shielded sections experience different amounts or types of stress thereby providing a powerful analysis tool. A wavelength shift in the reflected spectra reveals the amount of stress experienced by the reference and free sections and permits a qualitative and quantitative analysis of the stress applied by the package and the package's ability to protect fiber from stress (e.g. such as that imposed by a tension pull test). Measurements may be made after a variety of conditions are changed such as splice protector curing, axial tension application, axial tension release, time, and age accelerating environments. Comparative studies and various other calculations may also be performed to evaluate different packages.
摘要翻译：本发明最初被开发用于确定熔接保护器的应变消除能力以及由熔接保护器施加到熔接的压缩应力。本发明还允许对接头保护器的性能和比较分析以及光纤至少部分地布置在其中的任何封装。为此，光纤布拉格光栅（FBG）相对于封装件轴向地布置，使得FBG的自由或参考部分从封装突出，而屏蔽部分位于封装内。宽带光被提供给反射由光谱分析仪测量的某些波长的FBG。 FBG反射光谱将被分为两个峰，因为参考和屏蔽部分经历不同的应力量或类型，从而提供了强大的分析工具。反射光谱中的波长偏移显示了参考和自由部分所经历的应力量，并允许对包装施加的应力的定性和定量分析以及包装保护纤维免受应力的能力（例如，由拉力试验）。可以在各种条件改变之后进行测量，例如接头保护器固化，轴向张力施加，轴向张力释放，时间和年龄加速环境。还可以进行比较研究和各种其他计算来评估不同的包装。

4. 发明授权

US06771356B1 Scatterometry of grating structures to monitor wafer stress 失效
标题翻译：光栅结构的散射法监测晶片应力
公开(公告)号：US06771356B1
公开(公告)日：2004-08-03
申请号：US10050626
申请日：2002-01-16
申请人： Christopher F. Lyons , Bhanwar Singh , Steven C. Avanzino , Khoi A. Phan , Bharath Rangarajan , Ramkumar Subramanian , Cyrus E. Tabery
发明人： Christopher F. Lyons , Bhanwar Singh , Steven C. Avanzino , Khoi A. Phan , Bharath Rangarajan , Ramkumar Subramanian , Cyrus E. Tabery
IPC分类号： G01B1116
CPC分类号： G01B11/165
摘要： A system for monitoring a fabrication process is provided. The system includes one or more light sources, each light source directing light to one or more gratings on a wafer. Light reflected from the gratings is collected by a measuring system that processes the collected light. The collected light is indicative of distortion due to stress at respective portions of the wafer. The measuring system provides distortion/stress related data to a processor that determines the acceptability of the distortion of the respective portions of the wafer. The collected light may be analyzed by scatterometry systems to produce scatterometry signatures associated with distortion and to produce feed-forward control information that can be employed to control semiconductor fabrication processes.
摘要翻译：提供了一种用于监视制造工艺的系统。该系统包括一个或多个光源，每个光源将光引导到晶片上的一个或多个光栅。从光栅反射的光被处理收集的光的测量系统收集。所收集的光指示由于晶片的各个部分处的应力引起的变形。测量系统向处理器提供失真/应力相关数据，该处理器确定晶片各部分的失真的可接受性。收集的光可以通过散射测量系统进行分析，以产生与失真相关联的散射仪签名并产生可用于控制半导体制造过程的前馈控制信息。

5. 发明授权

US06665059B2 Method of measuring an inner stress state of disk substrate 失效
标题翻译：测量盘基片内应力状态的方法
公开(公告)号：US06665059B2
公开(公告)日：2003-12-16
申请号：US09781557
申请日：2001-02-13
申请人： Toshiyuki Kanno , Eiji Ishibashi , Toru Yoshizawa , Yukitoshi Otani
发明人： Toshiyuki Kanno , Eiji Ishibashi , Toru Yoshizawa , Yukitoshi Otani
IPC分类号： G01B1116
CPC分类号： G01B11/16 , G01B11/18
摘要： A measuring method capable of automatically analyzing quantitatively the inner state of a disk is provided. Linearly polarized light from a light source enters a retarder to produce a desired elliptically polarized state. The elliptically polarized light is then passed through a half-wave plate to rotate the direction of a principal axis of the ellipse. The light is expanded into two dimensions by lens systems and to obtain planar information, and is further transmitted through a disk substrate so that the birefringence of a specimen, which depends on an inner stress state and a polymer orientation state, changes the phase of the light. The light wave with its phase changed is passed through a polarizer arranged perpendicular to the principal axis of the retarder. The CCD detects the light wave as a light intensity.
摘要翻译：提供能够定量地自动分析盘内部状态的测量方法。来自光源的线偏振光进入延迟器以产生期望的椭圆极化状态。然后将椭圆偏振光通过半波片以旋转椭圆的主轴的方向。光被透镜系统扩展成二维并获得平面信息，并且进一步透过盘基片，使得取决于内应力状态和聚合物取向状态的试样的双折射率改变了光。其相位改变的光波通过垂直于延迟器主轴布置的偏振片。 CCD将光波检测为光强度。

6. 发明授权

US06587188B2 Method and sensor arrangement for measuring temperature and strain using an optical fiber embedded in a cover layer on a substrate 失效
标题翻译：用于使用嵌入在衬底上的覆盖层中的光纤来测量温度和应变的方法和传感器装置
公开(公告)号：US06587188B2
公开(公告)日：2003-07-01
申请号：US09775866
申请日：2001-02-02
申请人： Wolfgang Gleine , Michael Trutzel
发明人： Wolfgang Gleine , Michael Trutzel
IPC分类号： G01B1116
CPC分类号： G01M11/086 , G01K11/3206 , G01L5/0047
摘要： In a sensor arrangement for sensing temperature and strain, an optical fiber with a Bragg grating therein is arranged on a substrate and embedded in a cover layer. The fiber is initially adhered onto an adhesive carrier, which then positions and applies the fiber onto the substrate. The fiber is point-wise fixed onto the substrate by a binder applied through holes in the adhesive carrier. Next, the carrier is stripped off to leave the fiber on the substrate. A cover layer is applied over the fiber and the substrate. Temperature and strain variations are transmitted from the cover layer into the fiber as non-circularly-symmetrical strains. The strain and temperature can be independently determined using this single sensor, by feeding quasi-depolarized light into the fiber and measuring the overlapping birefringent reflections from the Bragg grating. The full width at half maximum value indicates the temperature, while the Bragg wavelengths indicate the strain and the temperature.
摘要翻译：在用于感测温度和应变的传感器装置中，其中具有布拉格光栅的光纤被布置在基板上并且嵌入在覆盖层中。纤维最初粘附到粘合剂载体上，然后将纤维定位并施加到基材上。纤维通过粘合剂载体上的孔施加的粘结剂点状地固定在基底上。接下来，剥离载体以将纤维留在基材上。将覆盖层施加在纤维和基底上。温度和应变变化从覆盖层传递到纤维中作为非圆形对称应变。可以使用该单个传感器，通过将准去偏振光馈送到光纤中并测量来自布拉格光栅的重叠双折射反射来独立地确定应变和温度。半峰值的全宽表示温度，而布拉格波长表示应变和温度。

7. 发明授权

US06525308B1 Apparatus and method for wavelength detection with fiber bragg grating sensors 失效
标题翻译：用光纤布拉格光栅传感器进行波长检测的装置和方法
公开(公告)号：US06525308B1
公开(公告)日：2003-02-25
申请号：US09208385
申请日：1998-12-09
申请人： Cornelia Schmidt-Hattenberger
发明人： Cornelia Schmidt-Hattenberger
IPC分类号： G01B1116
CPC分类号： G01J9/02
摘要： A wavelength detector configuration for detecting the Bragg wavelength of at least one Bragg grating in at least one FBG sensor, in which light reflected by each Bragg grating is conducted by fiber couplers into two detector channels, each containing a detector, whereby an evaluator device is provided to detect the signals of the detectors and to determine the Bragg wavelength from a quotient of the detector signals, the detectors of each pair of detector channels having narrowband spectral sensitivities that overlap with one another and who central wavelengths of maximum sensitivity span a wavelength range containing the Bragg wavelength of the corresponding Bragg grating.
摘要翻译：一种波长检测器配置，用于检测至少一个FBG传感器中的至少一个布拉格光栅的布拉格波长，其中由每个布拉格光栅反射的光由光纤耦合器传送到两个检测器通道中，每个检测器通道包含检测器，由此评估器装置提供用于检测检测器的信号并根据检测器信号的商确定布拉格波长，每对检测器通道的检测器具有彼此重叠的窄带光谱灵敏度，以及最大灵敏度的中心波长跨越波长范围包含相应布拉格光栅的布拉格波长。

8. 发明授权

US06668661B2 Pressure distribution image analysis process 失效
公开(公告)号：US06668661B2
公开(公告)日：2003-12-30
申请号：US09805892
申请日：2001-03-15
申请人： Cristin Rider
发明人： Cristin Rider
IPC分类号： G01B1116
CPC分类号： G01L1/247 , G01B11/16
摘要： A method of analyzing force on a surface is described including providing a pressure-sensitive medium, applying the force to the medium, determining any change in the medium as a result of the applied force, correlating the change in the medium with a pressure value, and analyzing the force value. The pressure-sensitive film may be scanned, each shade or color on the film assigned a pixel value corresponding with pressure values, and the total pixel area values measured to determine pressure characteristics, such as average pressure or total pressure area.

9. 发明授权

US06499355B1 Elongation and cracking testing and optical characterization of small-size coatings and materials 失效
标题翻译：小尺寸涂料和材料的伸长和裂纹测试和光学表征
公开(公告)号：US06499355B1
公开(公告)日：2002-12-31
申请号：US09682359
申请日：2001-08-24
申请人： Radislav Alexandrovich Potyrailo
发明人： Radislav Alexandrovich Potyrailo
IPC分类号： G01B1116
CPC分类号： G01B11/20
摘要： This invention relates to methods for testing elongation and cracking of coating arrays. The method includes simultaneously applying an elongating force to each of a plurality of coatings, and monitoring the cracks and thickness decrease in each coating. A relative performance characteristic of each coating is then determined based on a correlation between a detected crack and/or thickness decrease in the coating, and the corresponding elongating force.
摘要翻译：本发明涉及测试涂层阵列的伸长率和裂纹的方法。该方法包括同时向多个涂层中的每一个施加伸长力，并且监测每个涂层中的裂纹和厚度减小。然后基于检测到的裂纹和/或涂层的厚度减少与相应的拉伸力之间的相关性来确定每个涂层的相对性能特性。

10. 发明授权

US06308576B1 Method for determining stress effect on a film during scrubber clean 有权
标题翻译：洗涤器清洁期间确定膜上应力作用的方法
公开(公告)号：US06308576B1
公开(公告)日：2001-10-30
申请号：US09281339
申请日：1999-03-30
申请人： Renn-Shyan Yeh , Der-Fang Huang , Tzu-Yu Lin , Chao-Hsin Chang
发明人： Renn-Shyan Yeh , Der-Fang Huang , Tzu-Yu Lin , Chao-Hsin Chang
IPC分类号： G01B1116
CPC分类号： G01M9/00 , G01N3/567
摘要： A method for determining stress effects, or stress endurance of a film layer coated on a wafer during a scrubber clean process is disclosed. In the method, a wafer having a film layer coated on top is held in a stationary position while a high pressure water jet having a pressure larger than 60 kg/cm2 is scanned across a top surface of the film layer and through a center of the wafer. The total number of stress defects is then counted in the scanning path on top of the film layer as an indication of the stress endurance of the specific coating layer. The invention also discloses a method for scrubber cleaning a wafer surface which is coated with a film layer without causing stress defects in the film by rotating a silicon wafer, which has a film layer coated on top at a suitable rotational speed, and then scanning a water jet across a top surface of the film layer without passing through a center of the wafer. The water pressure utilized for the water jet may be suitably between 50 kg/cm2 and 75 kg/cm2. It is preferred that the water jet does not pass any regions on the top surface of the film layer that is less than 2 mm from the center of the wafer.
摘要翻译：公开了一种在洗涤器清洁过程中确定在晶片上施加的薄膜层的应力作用或应力耐力的方法。在该方法中，将具有涂覆在顶部上的膜层的晶片保持在静止位置，同时将具有大于60kg / cm 2的压力的高压水射流扫过膜层的顶表面并穿过该膜层的中心晶圆。然后在膜层顶部的扫描路径中计数应力缺陷的总数，作为特定涂层的应力耐久性的指示。本发明还公开了一种用于洗涤器清洁晶片表面的方法，该晶片表面涂覆有薄膜层，而不会通过旋转硅晶片而导致薄膜中的应力缺陷，该硅晶片具有以合适的转速顶部涂覆的薄膜层，然后扫描水射流穿过薄膜层的顶表面而不穿过晶片的中心。用于水射流的水压可适当地在50kg / cm2至75kg / cm2之间。优选的是，水射流不通过距离晶片中心小于2mm的膜层顶表面上的任何区域。

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