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    • 1. 发明申请
    • Calibration of reconfigurable inspection machine
    • 校准可重构检测机
    • US20040263840A1
    • 2004-12-30
    • US10852716
    • 2004-05-24
    • Stephen B. SegallJuris Upatnieks
    • G01J001/10G01B011/02
    • G01B11/02
    • A method for calibrating an inspection machine including a plurality of displacement detectors for inspecting a production part and a linear motion stage for relative motion between the displacement detectors and the production part. The method includes determining relative positional errors of the displacement detectors relative to each other, determining the effect of motion stage errors on a first detector from the plurality of displacement detectors as a function of position of the motion stage, and determining the effect of motion stage errors on the remaining displacement detectors as a function of position of the motion stage.
    • 一种用于校准包括用于检查生产部件的多个位移检测器和用于位移检测器和生产部件之间的相对运动的线性运动平台的检查机器的方法。 该方法包括确定位移检测器相对于彼此的相对位置误差,从多个位移检测器确定运动级误差对第一检测器的影响作为运动级的位置的函数,以及确定运动级的影响 作为运动平台位置的函数的剩余位移检测器的误差。
    • 4. 发明申请
    • Method and apparatus for measuring motion
    • 测量运动的方法和装置
    • US20040150832A1
    • 2004-08-05
    • US10355509
    • 2003-01-31
    • Michael Mermelstein
    • G01B011/02
    • G01H9/00G01B9/02014G01B9/02057G01B9/02069G01B9/02077G01B9/02083G01B9/02084G01B9/0209G01S17/50
    • A method and apparatus for measuring motion of an object substantially orthogonal to an optical axis of an interferometer. The method includes the steps of obtaining a first interferogram and a second interferogram, wherein each of the first and second interferograms includes intensity information of each of at least two pixels, and determining the motion of the object from the first and the second interferograms in response to the difference of the intensity gradients of the pixels in the first and second interferograms in the orthogonal direction. The system includes a first interferogram including intensity information of each of at least two pixels and a second interferogram including intensity information of each of at least two pixels. The system also includes a gradient processor calculating the intensity gradients of the first and second interferograms in the orthogonal direction and a motion processor calculating the motion of the object from the first and the second interferograms in response to the difference of the intensity gradients of the first and second interferograms in the orthogonal direction.
    • 用于测量基本上与干涉仪的光轴正交的物体的运动的方法和装置。 该方法包括获得第一干涉图和第二干涉图的步骤,其中第一和第二干涉图中的每一个包括至少两个像素中的每一个的强度信息,以及响应于从第一和第二干涉图中确定物体的运动 对于正交方向上的第一和第二干涉图中的像素的强度梯度的差异。 该系统包括包括至少两个像素中的每一个的强度信息的第一干涉图和包括至少两个像素中的每一个的强度信息的第二干涉图。 该系统还包括梯度处理器,其计算正交方向上的第一和第二干涉图的强度梯度;以及运动处理器,响应于第一和第二干涉图的强度梯度的差异,从第一和第二干涉图计算物体的运动 和正交方向上的第二干涉图。
    • 5. 发明申请
    • Weighted least-square interferometric measurement of multiple surfaces
    • 多个表面的加权最小二乘干涉测量
    • US20040105097A1
    • 2004-06-03
    • US10308484
    • 2002-12-03
    • Phase Shift Technology
    • Shouhong Tang
    • G01B011/02
    • G01B11/2441
    • A system and method are provided for obtaining mapping profiles of transparent objects having a plurality of reflective surfaces. The object, the surfaces of which are to be mapped, is placed in an unequal path interferometer including a reference surface located a predetermined distance from the object. Coherent light is supplied in the interferometer from a tunable source; and multiple optical interferograms for each of the plurality of reflective surfaces are simultaneously recorded. These interferograms are simultaneously extracted through the use of a dynamically generated weighted least-square fitting technique, which separates interferograms from a set of superimposed interferograms to obtain a given interferogram for any one of the surfaces, free from errors resulting from the existence of the other interferograms.
    • 提供了一种用于获得具有多个反射表面的透明对象的映射简档的系统和方法。 其表面将要映射的对象被放置在不等距干涉仪中,该干涉仪包括距物体预定距离的参考表面。 干涉仪中的相干光从可调光源提供; 并且同时记录多个反射表面中的每一个的多个光学干涉图。 通过使用动态生成的加权最小二乘拟合技术来同时提取这些干涉图,该技术将干涉图与一组叠加的干涉图分离,以获得任何一个表面的给定干涉图,而不存在由于其他 干涉图。
    • 6. 发明申请
    • Displacement pickup
    • 位移拾取
    • US20040080755A1
    • 2004-04-29
    • US10692376
    • 2003-10-22
    • Sony Precision Technology
    • Hideaki TamiyaKayoko TaniguchiAkihiro Kuroda
    • G01B011/02
    • G01D5/34707
    • A displacement pickup is provided which includes a displaceable scale (12) having defined therein a first area (12a) where positional information is recorded with a predetermined pitch and a second area (12b) where positional information is recorded with a predetermined pitch different from that in the first area (12a), a first reading system (10) to read the positional information recorded in the first area (12a), a first phase detector (14) to detect a first phase on the basis of the positional information read by the first reading system (10), a second reading system (11) to read the positional information recorded in the second area (12b), a second phase detector (15) to detect a second phase on the basis of the positional information read by the second reading system (11), a phase comparator (16) to make a comparison between the first and second phases, and an origin signal generator (17) to generate an origin signal according to the result of comparison from the phase comparator (16).
    • 提供了一种位移拾取器,其包括可移位标尺(12),其中限定了第一区域(12a),其中以预定间距记录位置信息;以及第二区域(12b),其中以与 在第一区域(12a)中,读取记录在第一区域(12a)中的位置信息的第一读取系统(10),基于由第一区域(12a)读取的位置信息来检测第一阶段的第一相位检测器 第一读取系统(10),读取记录在第二区域(12b)中的位置信息的第二读取系统(11),基于由第二读取系统读取的位置信息来检测第二阶段的第二相位检测器(15) 第二读取系统(11),用于进行第一和第二相位之间的比较的相位比较器(16)以及根据比较结果从相位比较器产生原点信号的原点信号发生器(17) (16)。
    • 7. 发明申请
    • Process endpoint detection method using broadband reflectometry
    • 使用宽带反射测量法处理端点检测方法
    • US20040032593A1
    • 2004-02-19
    • US10401118
    • 2003-03-27
    • LAM RESEARCH CORPORATION
    • Vijayakumar C. Venugopal
    • G01B011/02
    • G01N21/8422G01B11/0625G01B11/0683
    • A method of determining a parameter of interest during processing of a patterned substrate includes obtaining a measured net reflectance spectrum resulting from illuminating at least a portion of the patterned substrate with a light beam having a broadband spectrum, calculating a modeled net reflectance spectrum as a weighted incoherent sum of reflectances from different regions constituting the portion of the patterned substrate, and determining a set of parameters that provides a close match between the measured net reflectance spectrum and the modeled net reflectance spectrum. For wavelengths below a selected transition wavelength, a first optical model is used to calculate the reflectance from each region as a weighted coherent sum of reflected fields from thin film stacks corresponding to laterally distinct areas constituting the region. For wavelengths above the transition wavelength, a second optical model based on effective medium approximation is used to calculate the reflectance from each region.
    • 在图案化衬底的处理期间确定感兴趣的参数的方法包括获得由具有宽带光谱的光束照射图案化衬底的至少一部分而得到的测量的净反射光谱,将模拟的净反射光谱计算为加权 构成图案化衬底部分的不同区域的反射率不相干和,并且确定提供测量的净反射光谱和建模的净反射光谱之间的紧密匹配的一组参数。 对于低于所选择的跃迁波长的波长,使用第一光学模型来计算来自每个区域的反射率,作为对应于构成区域的横向不同区域的薄膜叠层的反射场的加权相干和。 对于高于过渡波长的波长,使用基于有效介质近似的第二光学模型来计算每个区域的反射率。
    • 8. 发明申请
    • Position measuring device
    • 位置测量装置
    • US20040030529A1
    • 2004-02-12
    • US10380864
    • 2003-03-17
    • Johann Mitterreiter
    • G01B003/02G01B005/02G01B005/14G01B007/02G01B007/14G01B011/02G01B011/14G01B013/02G06F015/00G01B021/02
    • G01D5/34738
    • A position measuring system that includes a scale graduation, a scanning unit for scanning the scale graduation. An adjustment device that includes a displacement element for setting a position of the scanning unit with respect to the scale graduation and a gear-down mechanism arranged between the displacement element and the scanning unit, the gear-down mechanism converts a displacement movement of the displacement element into a shorter displacement movement of the scanning unit. The gear-down mechanism includes a lever arrangement with joints, which converts the displacement movement of the displacement element into a linear displacement movement of the scanning unit in relation to the scale graduation.
    • 包括刻度刻度的位置测量系统,用于扫描刻度刻度的扫描单元。 一种调节装置,其包括用于设定扫描单元相对于刻度的位置的位移元件和布置在位移​​元件和扫描单元之间的减速机构,所述减速机构将位移的位移运动 元件变成扫描单元的较短位移运动。 齿轮减速机构包括具有接头的杠杆装置,其将位移元件的位移运动转换成扫描单元相对于刻度刻度的线性位移运动。