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1. 发明申请

US20030013789A1 Process for producing oligo (meth) acrylate-containing resin composition, catalyst for use therein and oligo (meth acrylate-containing resin composition obtained thereby 审中-公开
标题翻译：含有（甲基）丙烯酸酯的树脂组合物的制造方法，使用的催化剂和由此得到的含（含甲基丙烯酸酯的树脂组合物）
公开(公告)号：US20030013789A1
公开(公告)日：2003-01-16
申请号：US10175509
申请日：2002-06-20
申请人： DJK LABORATORIES INC.
发明人： Eiichiro Takiyama , Susumu Yoshimura , Shinichi Otsuka
IPC分类号： C08K005/10 , C08K005/09 , C08J003/00 , C08L001/00 , C08F004/04
CPC分类号： C08G63/58 , C08G63/866
摘要： A process for production of an oligo(meth)acrylate-containing resin, whereby a composition containing (meth)acrylic acid, an alkylene monoepoxide and a polybasic acid anhydride, a composition prepared by adding a polybasic acid anhydride to a composition containing an unsaturated monoalcohol obtained by reaction of (meth)acrylic acid and an alkylene monoepoxide, or a composition containing an unsaturated oligomer with an unsaturated group and a hydroxyl group, obtained by reaction of (meth)acrylic acid, an alkylene monoepoxide and a polybasic acid anhydride, is reacted at a temperature from 140null C. to 210null C. using a catalyst containing an organic and/or inorganic antimony compound.
摘要翻译：一种含有（甲基）丙烯酸酯的树脂的制造方法，其中含有（甲基）丙烯酸，亚烷基单环氧化物和多元酸酐的组合物，通过在含有不饱和一元醇的组合物中添加多元酸酐而制备的组合物通过（甲基）丙烯酸和亚烷基单环氧化物的反应获得的组合物，或通过（甲基）丙烯酸，亚烷基单环氧化物和多元酸酐反应获得的含有不饱和基团和羟基的不饱和低聚物的组合物是使用含有有机和/或无机锑化合物的催化剂在140℃至210℃的温度下反应。

2. 发明申请

US20020107340A1 Polymerization process for ionic monomers 有权
标题翻译：离子单体的聚合方法
公开(公告)号：US20020107340A1
公开(公告)日：2002-08-08
申请号：US09972260
申请日：2001-10-05
发明人： Krzysztof Matyjaszewski , Nicolay Tsarevsky
IPC分类号： C08F004/04
CPC分类号： C08F4/40 , C08F2/10 , C08F4/00 , C08F112/08 , C08F293/005 , C08F2438/01
摘要： The present invention describes preparation of nanocomposite particles and structures by polymerizing monomers onto a functional inorganic colloid comprising a polymerization initiation site. The polymerization process is preferably a controlled/living polymerization process, including but not limited to, atom transfer radical polymerization and stable free radical polymerization. The nanocomposite particles can self-organize in solution, on surfaces or in films forming nanocomposite structures. Tethered AB block nanocomposite particles bring size control, solubility control and control over micro- and macro-functionality to the particles. The process may be catalyzed by a transition metal complex which participates in a reversible redox cycle with at least one of the group and a compound having a radically transferable atom or group, to form a nanocomposite particle with a tethered polymer chain. The process may be continued to form tethered copolymer chain. The particle may be silicon based including, for example, silica, silicates and polysilsesquioxane. A nanocomposite structure may be formed by casting, depositing or forming the material including nanocomposite particles.
摘要翻译：本发明描述了通过将单体聚合到包含聚合引发位点的官能无机胶体上来制备纳米复合材料颗粒和结构。聚合方法优选是受控/活性聚合方法，包括但不限于原子转移自由基聚合和稳定的自由基聚合。纳米复合颗粒可以在溶液，表面或形成纳米复合结构的膜中自组织。连接的AB嵌段纳米复合颗粒使微粒和微观功能的尺寸控制，溶解度控制和控制。该方法可以由过渡金属络合物催化，该过渡金属络合物与基团中的至少一个和具有可自由基转移的原子或基团的化合物一起参与可逆的氧化还原循环，以形成具有束缚的聚合物链的纳米复合颗粒。该方法可以继续形成系链共聚物链。颗粒可以是硅基，包括例如二氧化硅，硅酸盐和聚倍半硅氧烷。可以通过铸造，沉积或形成包括纳米复合材料颗粒的材料来形成纳米复合结构。

3. 发明申请

US20020091213A1 Olefin-carbon monoxide copolymers derived from synthesis gas (KWP-0003) 失效
标题翻译：衍生自合成气的烯烃 - 一氧化碳共聚物（KWP-0003）
公开(公告)号：US20020091213A1
公开(公告)日：2002-07-11
申请号：US10090873
申请日：2002-03-05
发明人： Abhimanyu O. Patil , Manika Varma-Nair
IPC分类号： C08F004/04
CPC分类号： C08G67/02
摘要： The invention is related to non-linear olefin-carbon monoxide copolymer composition which is derived from an olefin feedstream and a synthesis gas feedstream. The invention is also related to a method for preparing olefin-carbon monoxide copolymers by heating an olefin feed and a synthesis gas feed in the presence of a free radical polymerization initiator. More particularly, the synthesis gas feed comprises predominantly carbon monoxide and hydrogen. The copolymers of the invention are useful as polyvinyl chloride plasticizers.
摘要翻译：本发明涉及一种衍生自烯烃原料流和合成气进料流的非线性烯烃 - 一氧化碳共聚物组合物。本发明还涉及通过在自由基聚合引发剂存在下加热烯烃进料和合成气进料来制备烯烃 - 一氧化碳共聚物的方法。更具体地说，合成气进料主要包括一氧化碳和氢气。本发明的共聚物可用作聚氯乙烯增塑剂。

4. 发明申请

US20020058771A1 Compounds useful for control agents for living-type free radical polymerization 失效
公开(公告)号：US20020058771A1
公开(公告)日：2002-05-16
申请号：US09963174
申请日：2001-09-25
发明人： Han Ting Chang , Dominique Charmot , Yunxiao Li
IPC分类号： C08F004/04
CPC分类号： C08F2/38
摘要： Control agents that have a nitrogen-nitrogen bond covalently bonded to a thiocarbonyl moiety are provided for living-type free radical polymerization of a wide variety of monomers. These control agents provide superior properties for control of the polymerization and/or the properties of the polymers obtained and/or the monomers that may be polymerized. In some embodiments, a bulky group is pendant off the activated thiocarbonyl portion of the control agents. Multifunctional control agents provide the opportunity for a variety of structurally unique polymers, including block copolymers, stars and hyper-branched polymers.

5. 发明申请

US20040106727A1 Method for obtaining polybutadiene based aqueous dispersions 失效
标题翻译：获得聚丁二烯基水性分散体的方法
公开(公告)号：US20040106727A1
公开(公告)日：2004-06-03
申请号：US10471110
申请日：2004-01-13
发明人： Damien Colombie , Frederic Lemahieu , Denis Temboun N' Zudie
IPC分类号： C08F004/04
CPC分类号： C08F236/06 , C08F2/22 , C08F4/04
摘要： The invention relates to a method for preparing butadiene-based aqueous dispersions in the presence of at least one azocarboxylic acid ester.
摘要翻译：本发明涉及一种在至少一种偶氮羧酸酯存在下制备基于丁二烯的水分散体的方法。

6. 发明申请

US20030118736A1 Organic polymer for anti-reflective coating layer and preparation thereof 失效
标题翻译：用于抗反射涂层的有机聚合物及其制备方法
公开(公告)号：US20030118736A1
公开(公告)日：2003-06-26
申请号：US10293022
申请日：2002-11-12
申请人： Hyundai Electronics Industries Co., Ltd.
发明人： Min-Ho Jung , Sung-Eun Hong , Ki-Ho Baik
IPC分类号： C08F004/04 , C07C069/52 , B05D003/02
CPC分类号： C07C69/54 , C07C2603/24 , C08F220/14 , C08F220/18 , C08F220/28
摘要： The present invention provides a polymer that can be used as an anti-refelctive coating (ARC) polymer, an ARC composition comprising the same, methods for producing the same, and methods for using the same. The polymer of the present invention is particularly useful in a submicrolithographic process, for example, using KrF (248 nm) or ArF (193 nm) lasers as a light source. The polymer of the present invention comprises a chromophore that is capable of absorbing light at the wavelengths used in a submicrolithographic process. Thus, the ARC of the present invention significantly reduces or prevents back reflection of light and the problem of the CD alteration caused by the diffracted and/or reflected light. The ARC of the present invention also significantly reduces or eliminates the standing wave effect and reflective notching. Therefore, the polymer of the present invention can be used to produce a stable ultrafine pattern that is suitable in manufacturing of 64M, 256M, 1G, 4G and 16G DRAM semiconductor devices. Moreover, the ARC of the present invention significantly improves the production yield of such semiconductor devices.
摘要翻译：本发明提供可用作抗反射涂层（ARC）聚合物的聚合物，包含其的ARC组合物，其制备方法及其使用方法。本发明的聚合物在例如使用KrF（248nm）或ArF（193nm）激光器作为光源的亚微光刻工艺中特别有用。本发明的聚合物包括能够吸收在亚微光刻工艺中使用的波长的光的发色团。因此，本发明的ARC显着地减少或防止了光的反射和由衍射光和/或反射光引起的CD改变的问题。本发明的ARC还显着地减少或消除驻波效应和反射性切口。因此，本发明的聚合物可以用于制造适合于制造64M，256M，1G，4G和16G DRAM半导体器件的稳定超细晶格。此外，本发明的ARC显着提高了这种半导体器件的生产成本。

7. 发明申请

US20030092859A1 Acrylic PSAs with narrow molecular weight distribution 失效
标题翻译：丙烯酸PSA分子量分布窄
公开(公告)号：US20030092859A1
公开(公告)日：2003-05-15
申请号：US10197684
申请日：2002-07-16
发明人： Marc Husemann , Stephan Zollner
IPC分类号： C08F004/04
CPC分类号： C08F20/12 , C08G2170/40 , C09D133/08 , Y10T428/28
摘要： A process for preparing acrylic pressure sensitive adhesives by means of radical polymerization of a monomer mixture to give a polyacrylate, wherein said polymerization is carried out with an initiator system comprising at least one triazolinyl compound of the general formula 1
摘要翻译：一种通过单体混合物的自由基聚合制备丙烯酸压敏粘合剂以产生聚丙烯酸酯的方法，其中所述聚合是用包含至少一种通式为三唑啉化合物的引发剂体系进行的

8. 发明申请

US20010053834A1 Semiconductor device using polymer-containing photoresist, and process for manufacturing the same 有权
公开(公告)号：US20010053834A1
公开(公告)日：2001-12-20
申请号：US09934369
申请日：2001-08-21
发明人： Min Ho Jung , Jae Chang Jung , Cheol Kyu Bok , Ki Ho Baik
IPC分类号： C08F010/00 , G03F007/004 , C08F004/04
CPC分类号： C08F232/08 , C07C67/347 , C07C69/753 , C08F222/06
摘要： The present invention relates to a semiconductor device using a copolymer-containing photoresist, and a process for manufacturing the same. As a norbornene derivative (monomer) having a hydrophilic group is synthesized and introduced to the backbone chain of a polymer, the polymer according to the present invention has excellent etching resistance and heat resistance, which are the characteristic points of alicyclic olefin structure, and provide excellent resolution due to prominent enhancement of adhesiveness resulted from introducing a hydrophilic group (nullOH).

9. 发明申请

US20040236041A1 Polyethylene type resin and method for producing the same, and inflation film using the same as base material 审中-公开
标题翻译：聚乙烯型树脂及其制造方法以及使用该树脂作为基材的吹塑薄膜
公开(公告)号：US20040236041A1
公开(公告)日：2004-11-25
申请号：US10482157
申请日：2004-01-05
发明人： Hiroyuki Higuchi , Katsutoshi Ohta , Masayuki Shinohara
IPC分类号： C08F004/04 , C08F004/40 , C08F110/02
CPC分类号： C08J5/18 , C08F8/50 , C08F10/02 , C08F110/02 , C08F210/16 , C08F2810/10 , C08J2323/04 , C08F2500/12 , C08F2500/07 , C08F210/08 , C08F2500/26
摘要： The present invention is directed to a polyethylene resin having a density of 940-970 kg/m3 and a long-term relaxation component index of 1.5-10. The polyethylene resin exhibits, among other properties, excellent extrudability and bubble stability during blow film extrusion, and well-balanced physical properties of a film; e.g., impact resistance, and in particular, low unevenness in thickness. The polyethylene resin can provide a blown film having few gels.
摘要翻译：本发明涉及密度为940-970kg / m 3，长期松弛成分指数为1.5-10的聚乙烯树脂。除了其它特性之外，聚乙烯树脂表现出在吹塑薄膜挤出期间优异的挤出性和气泡稳定性以及薄膜的良好平衡的物理性能; 例如抗冲击性，特别是厚度不均匀性低。聚乙烯树脂可以提供几乎没有凝胶的吹塑薄膜。

10. 发明申请

US20040059077A1 Polymers for use in optical devices 失效
标题翻译：聚合物用于光学器件
公开(公告)号：US20040059077A1
公开(公告)日：2004-03-25
申请号：US10642097
申请日：2003-08-15
申请人： Cambridge Display Technology Ltd.
发明人： Andrew Bruce Holmes , Xiao-Chang Li , Stephen Carl Moratti , Kenneth Andrew Murray , Richard Henry Friend
IPC分类号： C08F004/04
CPC分类号： H05B33/14 , C08F128/06 , C08F220/18 , C08F220/30 , C08F220/36 , C08F228/06 , C08G61/00 , C08G61/02 , C08G61/12 , C08G61/126 , C09K11/06 , H01L51/0003 , H01L51/0035 , H01L51/0036 , H01L51/0038 , H01L51/004 , H01L51/0043 , H01L51/007 , H01L51/5012 , H01L51/5048 , H05B33/10
摘要： Optical devices fabricated from solvent processible polymers suffer from susceptibility to solvents and morphological changes. A semiconductive polymer capable of luminescence in an optical device is provided. The polymer comprises a luminescent film-forming solvent processible polymer which contains cross-linking so as to increase its molar mass and to resist solvent dissolution, the cross-linking being such that the polymer retains semiconductive and luminescent properties.
摘要翻译：由溶剂可加工聚合物制成的光学器件易受溶剂和形态的影响。提供了能够在光学装置中发光的半导体聚合物。该聚合物包含含有交联以增加其摩尔质量和抵抗溶剂溶解的发光成膜溶剂可加工聚合物，交联使得聚合物保持半导体和发光性质。

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