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1. 发明授权

US06260565B1 Double dishwasher 有权
标题翻译：双洗碗机
公开(公告)号：US06260565B1
公开(公告)日：2001-07-17
申请号：US09157461
申请日：1998-09-21
申请人： Rodney M. Welch , Stephen L. Birkenholtz , Douglas M. Ringger , Juda J. Cordle
发明人： Rodney M. Welch , Stephen L. Birkenholtz , Douglas M. Ringger , Juda J. Cordle
IPC分类号： B08B1300
CPC分类号： A47L15/0084
摘要： A dishwasher cabinet has a front wall, a rear wall, and opposite sidewalls. The cabinet has an intermediate wall for forming the cabinet into a first compartment and a second compartment. The front wall has a first opening and a second opening providing access into the first and second compartments respectively. First and second doors are in covering relation over the first and second openings and are movable between open and closed positions.
摘要翻译：洗碗机柜具有前壁，后壁和相对的侧壁。机柜具有用于将机壳形成第一隔间和第二隔间的中间壁。前壁具有第一开口和第二开口，分别进入第一和第二隔间。第一和第二门处于第一和第二开口的覆盖关系中，并且可在打开和关闭位置之间移动。

2. 发明授权

US06178975B2 Waste water classifying recovery apparatus in wafer cleaning system 失效
标题翻译：晶圆清洗系统废水分级回收装置
公开(公告)号：US06178975B2
公开(公告)日：2001-01-30
申请号：US09305199
申请日：1999-05-05
申请人： Shoji Aoki
发明人： Shoji Aoki
IPC分类号： B08B1300
CPC分类号： C02F1/008 , Y10S134/902
摘要： In a single wafer cleaning system of a single tank type in which wafers are one by one sprayed with chemical liquid and rinse water used in a successive order, not only can waste water is recovered while being classified into chemical liquid waste water and rinse waste water, but also the rinse waste water is recovered while being classified into cloudy rinse waste water and clean rinse waste water. A waste water classifying recovery apparatus comprises: chemical liquid waste water lines 15, 16 and a rinse waste water line 17 connected to a treatment tank 1; chemical liquid/rinse selective distributor automatic valves 10, 11, 12 respectively provided on the lines; a concentration meter sensor 18 for detecting a concentration of the rinse waste water on the rinse waste water line 17 downstream from the distributor automatic valve 12; a cloudy rinse waste water line 17a and a clean rinse waste water line 17b branched from the rinse waste water line 17 downstream from the concentration meter sensor 18; and cloudy/clean rinse distributor valves 13, 14 respectively provided on the waste water lines 17a, 17b; wherein the distributor automatic valve 13 on the cloudy rinse waste water line 17a or the distributor automatic valve 14 on the clean rinse waste water line 17b is opened according to a detection signal of the concentration meter sensor 18, so that the cloudy rinse waste water or the clean rinse waste water is separately drained.
摘要翻译：在单个槽式单晶片清洗系统中，其中晶片依次喷洒有化学液体和冲洗水，不仅可以将废水分类为化学液体废水和冲洗废水，而且冲洗后的废水也被分类为浑浊的冲洗废水和干净的漂洗废水。废水分级回收装置包括：化学废液管线15,16和连接到处理槽1的冲洗废水管线17; 分别设置在线路上的化学液体/冲洗选择性分配器自动阀10,11,12; 用于检测分配器自动阀12下游的冲洗废水管线17上的冲洗废水浓度的浓度计传感器18; 从浓度计传感器18下游的冲洗废水管线17分支的多云冲洗废水管线17a和清洁的漂洗废水管线17b; 分别设置在废水管线17a，17b上的多雾/清洁冲洗分配阀13,14; 其中根据浓度计传感器18的检测信号打开清洁冲洗废水管线17b上的浑浊冲洗废水管线17a或分配器自动阀14上的分配器自动阀13，使得混浊的漂洗废水或干净的冲洗废水分开排干。

3. 发明授权

US06171407B2 Ventilation fixture and method of using same 失效
标题翻译：通风夹具及其使用方法
公开(公告)号：US06171407B2
公开(公告)日：2001-01-09
申请号：US09415075
申请日：1999-10-12
申请人： David J. Rackoski , Anthony M. Jones
发明人： David J. Rackoski , Anthony M. Jones
IPC分类号： B08B1300
CPC分类号： B08B15/007
摘要： An apparatus and method are provided for removing gases produced during off-service cleaning of a processing chamber which operates under vacuum in a wafer fabrication tool. The apparatus includes a ventilation fixture providing a manifold having an internal cavity in fluid communication with a source of vacuum and at least one intake aperture, and a quick disconnect fitting connected to the source of vacuum and in fluid communication with the internal cavity. The manifold is portable and located adjacent to the processing chamber during cleaning.
摘要翻译：提供了一种用于去除在晶片制造工具中在真空下操作的处理室的非工作状态清洁期间产生的气体的装置和方法。该设备包括通风夹具，其提供具有与真空源和至少一个进气孔流体连通的内腔的歧管，以及连接到真空源并与内腔流体连通的快速断开配件。歧管是便携式的，并且在清洁期间位于处理室附近。

4. 发明授权

US06318386B1 Treatment apparatus 有权
标题翻译：治疗仪器
公开(公告)号：US06318386B1
公开(公告)日：2001-11-20
申请号：US09546291
申请日：2000-04-10
申请人： Yuji Kamikawa , Naoki Shindo , Shigenori Kitahara
发明人： Yuji Kamikawa , Naoki Shindo , Shigenori Kitahara
IPC分类号： B08B1300
CPC分类号： H01L21/67028 , B08B3/10 , F04B43/04 , F04B43/0736 , F04B2205/063 , Y10S134/902
摘要： A cleaning tank 30 stores a cleaning liquid to clean the surfaces of semiconductor wafers W immersed in the cleaning liquid. A cleaning liquid supply pipe 33 connects the cleaning tank 30 to a pure water supply source 31. A chemical liquid container 34 stores a chemical liquid, and a chemical liquid supply pipe 36 connects the cleaning liquid supply pipe 33 to the chemical liquid container 34 via an infusion open/close switching valve 35, and a chemical liquid feed means is interposed in the chemical liquid supply pipe 36. The chemical liquid feed means is a reciprocal pump, such as diaphragm pump 37. Thus, a predetermined quantity of the chemical liquid can be infused into pure water or to a drying gas generator to ensure that the chemical liquid of a predetermined concentration be available for washing or drying treatment, regardless of fluctuations in flow amount or pressure of pure water or a drying gas carrier gas.
摘要翻译：清洗槽30储存清洗液体以清洁浸在清洗液中的半导体晶片W的表面。清洗液供给管33将清洗槽30连接到纯水供给源31.化学液容器34储存药液，药液供给管36将清洗液供给管33与药液容器34连接，经由输液开闭切换阀35以及化学液体供给装置插入化学液体供给管36中。药液供给装置是隔膜泵37等往复泵。因此，预定量的药液可以输入纯水或干燥气体发生器，以确保预定浓度的化学液体可用于洗涤或干燥处理，而与纯水或干燥气体载体气体的流量或压力的波动无关。

5. 发明授权

US06172376B2 Method and system for measuring particles in a liquid sample 失效
标题翻译：用于测量液体样品中颗粒的方法和系统
公开(公告)号：US06172376B2
公开(公告)日：2001-01-09
申请号：US09152520
申请日：1998-09-14
申请人： Mindi Xu , Weiching Li
发明人： Mindi Xu , Weiching Li
IPC分类号： B08B1300
CPC分类号： G01N15/02 , G01N2021/054
摘要： Provided are a method and apparatus for measuring particles in a liquid sample. The method involves introducing a liquid sample into a heat exchanger, thereby cooling the sample to a predetermined temperature. A particle measurement is performed on the cooled sample by introducing the cooled sample into a particle detector. The method and apparatus in accordance with the invention effectively suppress bubbles present in a liquid chemical sample being measured, thereby allowing for accurate particle measurements. The invention has particular applicability in the semiconductor and pharmaceutical manufacturing industries.
摘要翻译：提供了一种用于测量液体样品中的颗粒的方法和装置。该方法包括将液体样品引入热交换器，从而将样品冷却至预定温度。通过将冷却的样品引入颗粒检测器中对冷却的样品进行颗粒测量。根据本发明的方法和装置有效地抑制了被测量的液体化学样品中存在的气泡，从而允许精确的颗粒测量。本发明在半导体和药物制造业中具有特别的适用性。

6. 发明授权

US06334453B1 Seal configuration for use with a motor drive assembly in a microelectronic workpiece processing system 有权
标题翻译：用于微电子工件处理系统中的电机驱动组件的密封配置
公开(公告)号：US06334453B1
公开(公告)日：2002-01-01
申请号：US09503784
申请日：2000-02-14
申请人： Raymon F. Thompson , Scott Bruner
发明人： Raymon F. Thompson , Scott Bruner
IPC分类号： B08B1300
CPC分类号： H01L21/67126 , Y10S134/902
摘要： An apparatus for processing a microelectronic workpiece, such as a semiconductor wafer, is set forth. The apparatus comprises a processing bowl that defines a processing chamber. A seal is provided to assist in removing fluids, such as processing fluids, from the processing chamber that are in the proximity of the seal. Further, the seal is provided to assist in preventing the fluids from entering the motor. To this end, flow generating threads and expulsion threads are provided at an end of a shaft assembly that is connected to be driven by the motor. A member substantially surrounds at least a portion of the flow generating threads and at least a portion of the expulsion threads. Together, the member defines a chamber with the shaft assembly. Rotation of the shaft assembly results in corresponding rotation of the flow generating threads and expulsion threads to drive fluids proximate the shaft assembly to an exhaust while concurrently assisting in preventing such fluids from entering the motor.
摘要翻译：阐述了一种用于处理诸如半导体晶片的微电子工件的装置。该装置包括限定处理室的处理碗。提供密封件以帮助从位于密封件附近的处理室中除去诸如处理流体的流体。此外，设置密封件以帮助防止流体进入马达。为此，在轴组件的端部设置有流动产生螺纹和排出螺纹，该组件的连接部由马达驱动。构件基本上围绕流动产生螺纹的至少一部分和排出螺纹的至少一部分。构件一起定义了具有轴组件的腔室。轴组件的旋转导致流动产生螺纹和排出螺纹的相应旋转，以将靠近轴组件的流体驱动到排气，同时辅助防止这种流体进入马达。

7. 发明授权

US06189549B1 Waste material skimming device 有权
标题翻译：废料清理装置
公开(公告)号：US06189549B1
公开(公告)日：2001-02-20
申请号：US09312804
申请日：1999-05-17
申请人： Louis B. Fontana , Gerald B. Davis
发明人： Louis B. Fontana , Gerald B. Davis
IPC分类号： B08B1300
CPC分类号： B01D21/0003 , B01D17/0202 , B01D17/0208 , B01D17/0211 , B01D17/0214 , B01D21/00 , B01D21/0012 , B01D21/0018 , B01D21/0039 , B01D21/0042 , B01D21/2433 , B01D21/2438 , B01D21/2488 , B08B3/02
摘要： A compact, self-contained skimming system for removing waste material from aqueous cleaning solutions used in parts washers. A single tank contains a sloped floor, two compartments separated by a baffle, and an opening between a bottom edge of the baffle and the floor. Waste liquid collects in the first stage compartment, where gravity initially separates water and coarse debris from the waste material containing oil and grease, some water, and fine debris. A partially immersed rotating skimmer further adsorbs the waste material. A waste collection system transfers the waste material to the second stage compartment, where gravity further separates the fine debris and additional water from the oil and grease. The oil and grease flow through a waste drainage system out of the second stage compartment. The fine debris and water flow along the downwardly sloping floor, through the opening at the bottom of the baffle back into the first stage compartment. A single tank may incorporate multiple baffles, skimmer systems, and waste collection systems to perform the separation process in stages.
摘要翻译：一种紧凑，独立的撇取系统，用于从零件清洗机中使用的水性清洁溶液中除去废物。单个箱体包含倾斜的地板，由挡板隔开的两个隔间以及挡板的底部边缘与地板之间的开口。废液收集在第一级隔间中，其中重力首先从含有油和油脂，一些水和细碎的废物分离出水和粗碎屑。部分浸没的旋转分离器进一步吸附废料。废物收集系统将废料转移到第二级隔室，其中重力进一步将细碎屑和额外的水从油和油脂中分离出来。油和油脂通过废水排放系统流出第二级隔室。细碎的碎屑和水沿着向下倾斜的地板流过，通过挡板底部的开口回到第一级隔间。单个罐可以并入多个挡板，分离器系统和废物收集系统，以分阶段进行分离。

8. 发明授权

US06170293B2 Lehr roll cleaning apparatus 失效
标题翻译： Lehr卷筒清洗设备
公开(公告)号：US06170293B2
公开(公告)日：2001-01-09
申请号：US09237080
申请日：1999-01-25
申请人： Bryan Cody
发明人： Bryan Cody
IPC分类号： B08B1300
CPC分类号： C03B35/168 , B08B1/008
摘要： In situ lehr-roll cleaning apparatus includes a carriage supported within the space between first and second adjacent rolls, the carriage having a first set of elements contacting the surface of the first roll and a second set of elements contacting the surface of the second roll, whereby the carriage is movable back and forth along a path parallel to the rolls. A mechanism such as a rotating wire wheel disposed on the carriage is used to clean at least one of the first and second rolls as the carriage moves along the path and in between the adjacent rolls. The invention further including means for forcing the carriage away from an adjacent roll toward the one being cleaned so that the elements contacting the surface of the roll being cleaned are forced thereagainst to precisely position the cleaning mechanism relative to the surface. Means are preferably further provided for fine-adjusting the distance of the cleaning mechanism relative to the surface of the roll being cleaned. The preferred apparatus further includes a dust cover disposed over the carriage, and air-inlet and air-output ports formed through the cover to provide a recirculating air path to remove particulates and cool the apparatus.
摘要翻译：原位光滑清洁装置包括支撑在第一和第二相邻辊之间的空间内的滑架，滑架具有接触第一辊的表面的第一组元件和与第二辊的表面接触的第二组元件，由此托架可以沿着平行于辊的路径来回移动。当托架沿着路径移动并且在相邻的辊之间时，诸如设置在托架上的旋转线轮的机构用于清洁第一和第二辊中的至少一个。本发明还包括用于迫使托架离开相邻的辊朝向被清洁的辊的装置，使得接触待清洁的辊的表面的元件被迫在其上以相对于表面精确地定位清洁机构。进一步提供了用于精细调整清洁机构相对于被清洁辊的表面的距离的装置。优选的装置还包括设置在滑架上的防尘盖，以及通过盖形成的空气入口和空气输出端口，以提供循环空气路径以去除微粒并冷却设备。

9. 发明授权

US06823877B2 Cleaning control method for recording head, cleaning controller performing the method, and recorder incorporating the cleaning controller 有权
公开(公告)号：US06823877B2
公开(公告)日：2004-11-30
申请号：US10678260
申请日：2003-10-06
申请人： Masahiro Kimura
发明人： Masahiro Kimura
IPC分类号： B08B1300
CPC分类号： B41J2/16517
摘要： In a cleaning controller for a recording head of a recorder connected to an external device, a timer acquires a first time value indicating a current time from the external device, and performs cyclic clocking in which a first predetermined time period is repetitively clocked from a predetermined time point. A nonvolatile storage medium stores a second time value indicating a time at which a cleaning operation is lastly performed. A determinant compares the first and the second time values to obtain a third time value, and determines whether a cleaning operation is necessary to be performed based on the third time value. A cleaner performs a cleaning operation of the recording head based on the result determined by the determinant.

10. 发明授权

US06766810B1 Methods and apparatus to control pressure in a supercritical fluid reactor 有权
标题翻译：控制超临界流体反应器压力的方法和装置
公开(公告)号：US06766810B1
公开(公告)日：2004-07-27
申请号：US10078213
申请日：2002-02-15
申请人： Patrick A. Van Cleemput
发明人： Patrick A. Van Cleemput
IPC分类号： B08B1300
CPC分类号： B08B7/0021 , B01D11/0203 , B01D11/0403 , Y10T137/0379 , Y10T137/8326
摘要： The present invention pertains to methods and apparatus for controlling the pressure in a supercritical processing system. Active methods for controlling the pressure include anticipating a pressure deviation due to a solute addition to a system, and changing the pressure within the system to compensate for the deviation. In this way, a desired pressure is achieved when the solute is added, without phase separation of the solute from the solvent. Pressure is adjusted by changing the volume of the supercritical processing system. Passive methods include adjusting the pressure of a supercritical system by changing the volume in response to a pressure deviation from a desired pressure. Apparatus for controlling the pressure in a supercritical processing system are described.
摘要翻译：本发明涉及用于控制超临界处理系统中的压力的方法和装置。用于控制压力的主动方法包括预测由于系统中的溶质添加引起的压力偏差，以及改变系统内的压力以补偿偏差。以这种方式，当添加溶质而不使溶质从溶剂中分离时，获得所需的压力。通过改变超临界处理系统的体积来调节压力。被动方法包括通过响应于与期望压力的压力偏差来改变体积来调节超临界系统的压力。描述了用于控制超临界处理系统中的压力的装置。

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