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    • 9. 发明申请
    • Low water uptake silicas
    • 低吸水二氧化硅
    • US20050074386A1
    • 2005-04-07
    • US10500107
    • 2002-12-24
    • Remi ValeroYvonick Chevallier
    • Remi ValeroYvonick Chevallier
    • A61K47/04A23L29/294C01B33/193C08K3/36C01B33/12
    • C01B33/193C01P2006/12C01P2006/80C01P2006/82C08K3/36C08L83/04
    • The invention concerns a method for preparing low water uptake precipitated silicas, comprising successive steps which consist in: (a) producing an initial starter including a silicate, the silicate concentration in said starter, expressed in SiO2 equivalent, being less than 15 g/L; (b) bringing the medium pH to a value ranging between 7 and 8 by adding an acidifying agent, (c) in the resulting medium, simultaneously adding a silicate and an acidifying agent the respective amounts of silicate and acidifying agent added in time being specifically such that, during the entire addition (1) the reaction medium pH stays between 7 and 8, and (ii) the silicon concentration in the medium, expressed in SiO2 equivalent, stays below 35 g/L; (d) adding an acidifying agent in the medium resulting from step (c), so as to bring the medium to a pH ranging between 3 and 6.5; and (e) filtering the resulting aqueous silica dispersion, then drying the filter cake obtained at the end of the filtering step. The invention also concerns low water uptake silicas obtained by said method and their use, in particular for reinforcing silicones or polymer or elastomer matrices.
    • 本发明涉及一种制备低吸水沉淀二氧化硅的方法,包括连续步骤,其包括:(a)产生包含硅酸盐的初始起始物,所述起始物中的硅酸盐浓度以SiO 2当量表示,小于15g / L ; (b)通过添加酸化剂使介质pH值达到7〜8,(c)在得到的培养基中,同时加入硅酸盐和酸化剂,分别加入相应量的硅酸盐和酸化剂 使得在整个添加(1)期间,反应介质pH保持在7和8之间,和(ii)以SiO 2当量表示的介质中的硅浓度保持在35g / L以下; (d)在由步骤(c)得到的培养基中加入酸化剂,以使培养基达到3至6.5的pH; 和(e)过滤所得的二氧化硅水溶液,然后干燥在过滤步骤结束时获得的滤饼。 本发明还涉及通过所述方法获得的低吸水二氧化硅及其用途,特别是用于增强硅氧烷或聚合物或弹性体基质。