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    • 4. 发明授权
    • Automatic grinding apparatus
    • 自动研磨机
    • US5299389A
    • 1994-04-05
    • US956932
    • 1992-10-02
    • Seishu YonahaMeitoku ChinKenichi Yatsuda
    • Seishu YonahaMeitoku ChinKenichi Yatsuda
    • B25J9/16G05B19/416B24B49/00
    • G05B19/4163B25J11/0065B25J9/1684G05B2219/37285G05B2219/37405G05B2219/45058G05B2219/49362G05B2219/50109G05B2219/50113
    • An automatic grinding apparatus includes a constant rotating grinder (24) having a motor (25) in which a load current increases or decreases due to the metal removal rate per unit hour, a travelling device for moving the grinder three-dimensionally along the grinding surface, a sliding device (20) for adjusting the distance between the grinder and an object (50, 51) to be found and a controller for controlling the sliding device to allow the load current of the grinding motor to be constant. An articulated robot or a cartesian coordinate robot is used for the travelling device. The automatic grinding apparatus starts the grinding motor at first, halting the travelling device at the initiation of grinding, permitting the grinder to approach the object to be ground after a time interval and starting the travelling device simultaneously or a little later after detecting that the grinding disk (26) contacts the object to be ground, due to the variation of the load current of the grinding motor. The apparatus restores respective relative positions of the grinder and the sliding device (20) to a certain position by regulating the operation time of an elevation motor (21) of the sliding device or by directly detecting the location of the slider of the sliding device before and after the grinding process. The automatic grinding apparatus is used for grinding a workpiece (50) such as for finishing welded metal and deburring or chamfering the work piece.
    • 一种自动磨削装置,包括具有电动机(25)的恒定旋转研磨机(24),由于每单位时间的金属去除率,负载电流增加或减少,用于沿研磨面三维地移动研磨机的行进装置 ,用于调整研磨机与要找到的物体(50,51)之间的距离的滑动装置(20)和用于控制所述滑动装置以允许所述研磨电机的负载电流恒定的控制器。 行走装置使用铰接机器人或笛卡尔坐标机器人。 首先,自动研磨装置启动研磨电机,在开始研磨时使行走装置停止,使得研磨机能够在时间间隔后接近被研磨物体,并且在检测到研磨之后同时或稍后起动行进装置 由于磨削电机的负载电流的变化,盘(26)接触被研磨物体。 该装置通过调节滑动装置的升降马达(21)的操作时间或者通过直接检测滑动装置的滑块的位置,将研磨机和滑动装置(20)的各个相对位置恢复到特定位置 并在研磨过程之后。 自动研磨装置用于研磨工件(50),例如用于整理焊接金属和去毛刺或倒角工件。
    • 7. 发明授权
    • Profile working machine
    • 轮廓加工机
    • US4772161A
    • 1988-09-20
    • US20123
    • 1987-02-27
    • Takaaki NagaoYotaro HatamuraKozo Ono
    • Takaaki NagaoYotaro HatamuraKozo Ono
    • B24B49/16B23Q15/013B23Q17/22B24B19/20G05B19/41B23Q15/12
    • B23Q17/2233B24B19/20B24B49/16G05B19/41G05B2219/49362Y10T409/304704Y10T409/306888Y10T409/30728Y10T409/308008
    • A profile working machine includes a support portion, a working portion, and a drive and control system. The machine also includes displacement sensors for detecting the present relative displacements between the support portion and working portion, a load sensor for detecting each working reaction force exerted to the working portion, a memory unit for storing values corresponding to a predetermined suitable working reaction force detected by the load sensor, a deviation computing unit for computing the deviation of each working reaction force from the values stored in the memory unit, and a displacement computing unit for computing, based on the deviation determined by the deviation computing unit and the present relative displacement detected by the displacement sensors, corrective relative displacements of the support portion and working portion required to bring the difference to 0, whereby the spatial orientation of the load sensor is maintained constant relative to the direction of the suitable working reaction force.
    • 轮廓加工机包括支撑部分,工作部分以及驱动和控制系统。 该机器还包括用于检测支撑部分和工作部分之间的当前相对位移的位移传感器,用于检测施加到工作部分上的每个工作反作用力的负载传感器,用于存储与检测到的预定合适的工作反作用力对应的值的存储单元 通过负载传感器,用于计算每个工作反作用力与存储在存储单元中的值的偏差的偏差计算单元;以及位移计算单元,用于基于由偏差计算单元确定的偏差和当前的相对位移 由位移传感器检测到,将差值设定为0所需的支撑部分和工作部分的校正相对位移,由此负载传感器的空间取向相对于合适的工作反作用力的方向保持恒定。
    • 9. 发明授权
    • Sealant dispenser and control method thereof
    • 密封剂分配器及其控制方法
    • US07540924B2
    • 2009-06-02
    • US11125528
    • 2005-05-10
    • Man Ho AhnJoon Young Kim
    • Man Ho AhnJoon Young Kim
    • B05C11/10
    • B05C5/0216B05C11/1018G05B2219/45238G05B2219/49362
    • Disclosed is a sealant dispenser for more precisely dispensing a sealant onto a substrate, and a control method thereof. The sealant dispenser includes a stage on which a substrate is mounted; a nozzle for dispensing a sealant while making a relative motion with the substrate; a syringe coupled to the nozzle, for storing the sealant; and a distance sensor installed on both sides of a lower portion of the syringe, for measuring a vertical distance between a principal plane of the substrate and an outlet of the nozzle. According to the principles of the present invention, because the nozzle and the syringe have substantially the same central axis, the response speed of the sealant to be dispensed is increased and the start point and the end point of paste pattern are more precisely dispensed. Also, by minimizing the distance between the nozzle and a measuring point provided by the distance sensor, it becomes possible to dispense the sealant at higher precision.
    • 公开了一种用于更精确地将密封剂分配到基底上的密封剂分配器及其控制方法。 密封剂分配器包括其上安装有基底的台阶; 用于在与基底进行相对运动的同时分配密封剂的喷嘴; 连接到喷嘴的注射器,用于储存密封剂; 以及安装在所述注射器下部两侧的距离传感器,用于测量所述基底的主平面与所述喷嘴的出口之间的垂直距离。 根据本发明的原理,由于喷嘴和注射器具有基本上相同的中心轴,所以要分配的密封剂的响应速度增加,并且更精确地分配糊状图案的起始点和终点。 此外,通过使喷嘴与由距离传感器提供的测量点之间的距离最小化,可以以更高的精度分配密封剂。