会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • Controlling device for substrate processing apparatus and method therefor
    • 基板处理装置的控制装置及其方法
    • US07844357B2
    • 2010-11-30
    • US11874626
    • 2007-10-18
    • Shinji Sakano
    • Shinji Sakano
    • G06F19/00
    • G05B19/41875G05B2219/32097G05B2219/32182G05B2219/32198G05B2219/37575G05B2219/37576G05B2219/45031H01L21/32135Y02P90/20Y02P90/22
    • A target value that serves as a control value with feed forward control is optimized. A TL performs a feed forward and a feedback control of a PM. A storage unit stores a plurality of recipes indicating different processing sequences, and a target value that serves as a control value when performing an etching process. A communication unit causes an IMM to measure a processing state of the wafer and receives measurement information. A computation unit computes a feedback value for the current wafer processed in the current cycle, based on pre-processing and post-processing measurement information for the wafer. An update unit updates the target value using the feedback value. A recipe adjustment unit changes the recipe to change the process performed in the same PM. When the process is performed after changing, the updated target value is used to perform feed forward control of the wafer in the same PM.
    • 作为具有前馈控制的控制值的目标值被优化。 TL执行PM的前馈和反馈控制。 存储单元存储指示不同处理顺序的多个配方,以及当执行蚀刻处理时用作控制值的目标值。 通信单元使IMM测量晶片的处理状态并接收测量信息。 计算单元基于晶片的预处理和后处理测量信息来计算当前周期中处理的当前晶片的反馈值。 更新单元使用反馈值更新目标值。 配方调整单元更改配方以更改在同一个PM中执行的过程。 当改变之后执行处理时,更新的目标值被用于在相同的PM中执行晶片的前馈控制。
    • 6. 发明申请
    • Method for producing structures or contours on a workpiece, and moulder
    • 用于在工件上制造结构或轮廓的方法,以及模具
    • US20150142167A1
    • 2015-05-21
    • US14386422
    • 2013-03-15
    • Michaek Weinig AG
    • Andreas KonradJürgen Schmidt
    • G05B19/19B27M1/08B27C5/02B23Q17/22
    • G05B19/19B23Q17/2233B27C1/08B27C5/02B27M1/08G05B19/182G05B2219/37304G05B2219/37575G05B2219/37576G05B2219/45229
    • In a moulder, at least one rotatably driven tool (7, 8, 10, 11) is used to produce the structure (27) or contour on the workpiece (1) by workpiece removal. The workpiece positions along the workpiece (1) for producing the structure or contour are set depending on the data of the workpiece (1) and of the tool (7, 8, 10, 11). The data are transmitted to the machine controller which processes the CNC program based on the data during the passage of the workpiece (1) through the moulder and moves the tool (7, 8, 10, 11) into the required positions via CNC drives depending on the workpiece position. The workpiece position is sensed during the passage of the workpiece (1) through the moulder. In order to sense the workpiece position in the moulder, at least one measuring element (18) is provided upstream and downstream of the tool (1), said measuring element (18) being connected to the machine controller and supplying signals that describe the advancing travel of the workpiece (1) to the machine controller. By way of the machine controller, the tool (7, 8, 10, 11) is moved into the respective tool positions in accordance with the signals.
    • 在成型机中,至少一个可旋转驱动的工具(7,8,10,11)用于通过工件移除来在工件(1)上产生结构(27)或轮廓。 根据工件(1)和工具(7,8,10,11)的数据,设置用于生产结构或轮廓的工件(1)的工件位置。 将数据传送到机床控制器,该控制器根据工件(1)通过模具的数据,处理CNC程序,并通过CNC驱动将工具(7,8,10,11)移动到所需的位置 在工件位置。 工件位置在工件(1)通过模子期间被感测到。 为了感测模具中的工件位置,至少一个测量元件(18)设置在工具(1)的上游和下游,所述测量元件(18)连接到机器控制器并提供描述前进的信号 将工件(1)移动到机器控制器。 通过机器控制器,工具(7,8,10,11)根据信号移动到相应的工具位置。