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1. 发明申请

US20180164784A1 High Speed Smooth Tool Path 审中-公开
公开(公告)号：US20180164784A1
公开(公告)日：2018-06-14
申请号：US15890928
申请日：2018-02-07
申请人： Samarinder Singh
发明人： Samarinder Singh
IPC分类号： G05B19/4093 , G05B19/4103 , G05B19/19
CPC分类号： G05B19/40937 , G05B19/19 , G05B19/4103 , G05B2219/30 , G05B2219/34105 , Y02P90/265
摘要： Improvements in a high speed smooth tool path is presented where the high speed smooth tool path to be used for primarily finishing for finishing any type of walls (negative/positive drafted) for any given bounded region be it 3, 4, 5, . . . n sided shape. The tool path incorporates a combined strategy for finishing the walls while removing any excess material leftover from a previous larger diameter cutter. This tool-motion can be utilized for roughing the regions by approximating the walls by offsetting the regions inwards. The finished boundaries are offset inwards and then cut using these methods. This is optimized as opposed to moving the cutter at a consistent speed in the cutting path. This is performed to eliminate the wasted tool-motion to the maximum extent. This technique is implemented for roughing any closed or open bounded areas regardless of the walls being straight, drafted (negative/positive or both).

2. 发明授权

US07769482B2 Methods and systems for controlling a semiconductor fabrication process 有权
标题翻译：用于控制半导体制造工艺的方法和系统
公开(公告)号：US07769482B2
公开(公告)日：2010-08-03
申请号：US11877228
申请日：2007-10-23
申请人： Patrick D. Pannese , Vinaya Kavathekar , Peter van der Meulen
发明人： Patrick D. Pannese , Vinaya Kavathekar , Peter van der Meulen
IPC分类号： G06F19/00 , G05B7/00
CPC分类号： G05B99/00 , G05B15/02 , G05B19/41865 , G05B19/41885 , G05B23/0267 , G05B2219/30 , G05B2219/31 , G05B2219/31467 , G05B2219/31472 , G05B2219/32128 , G05B2219/32267 , G05B2219/32329 , G05B2219/32335 , G05B2219/32342 , G05B2219/32351 , G05B2219/35494 , G05B2219/40411 , G05B2219/40412 , G05B2219/40413 , G05B2219/40419 , G05B2219/40424 , G05B2219/45031 , G06T7/0004 , H01L21/67161 , H01L21/67184 , H01L21/6719 , H01L21/67196 , H01L21/67201 , H01L21/67207 , H01L21/67742 , H01L21/67745 , Y02P90/18 , Y02P90/20 , Y02P90/26 , Y02P90/86
摘要： Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in combination to offer improved usability and computational efficiency for real time control and monitoring of a semiconductor manufacturing process. More generally, these techniques may be usefully employed in a variety of real time control systems, particularly systems requiring complex scheduling decisions or heterogeneous systems constructed of hardware from numerous independent vendors.
摘要翻译：用于控制异构半导体制造环境中的处理的软件可以包括以晶圆为中心的数据库，使用神经网络的实时调度器和显示系统的模拟操作的图形用户界面。这些特征可以单独使用或组合使用以提供用于半导体制造过程的实时控制和监视的改进的可用性和计算效率。更一般来说，这些技术可以有用地用于各种实时控制系统中，特别是需要复杂调度决策的系统或由许多独立供应商的硬件构成的异构系统。

3. 发明申请

US20080167890A1 METHODS AND SYSTEMS FOR CONTROLLING A SEMICONDUCTOR FABRICATION PROCESS 审中-公开
公开(公告)号：US20080167890A1
公开(公告)日：2008-07-10
申请号：US11877279
申请日：2007-10-23
申请人： Patrick D. Pannese , Vinaya Kavathekar , Peter van der Meulen
发明人： Patrick D. Pannese , Vinaya Kavathekar , Peter van der Meulen
IPC分类号： G06Q10/00
CPC分类号： G05B99/00 , G05B15/02 , G05B19/41865 , G05B19/41885 , G05B23/0267 , G05B2219/30 , G05B2219/31 , G05B2219/31467 , G05B2219/31472 , G05B2219/32128 , G05B2219/32267 , G05B2219/32329 , G05B2219/32335 , G05B2219/32342 , G05B2219/32351 , G05B2219/35494 , G05B2219/40411 , G05B2219/40412 , G05B2219/40413 , G05B2219/40419 , G05B2219/40424 , G05B2219/45031 , G06F15/00 , G06T7/0004 , H01L21/67161 , H01L21/67184 , H01L21/6719 , H01L21/67196 , H01L21/67201 , H01L21/67207 , H01L21/67742 , H01L21/67745 , Y02P90/18 , Y02P90/20 , Y02P90/26 , Y02P90/86
摘要： Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in combination to offer improved usability and computational efficiency for real time control and monitoring of a semiconductor manufacturing process. More generally, these techniques may be usefully employed in a variety of real time control systems, particularly systems requiring complex scheduling decisions or heterogeneous systems constructed of hardware from numerous independent vendors.

4. 发明申请

US20080134075A1 METHODS AND SYSTEMS FOR CONTROLLING A SEMICONDUCTOR FABRICATION PROCESS 审中-公开
公开(公告)号：US20080134075A1
公开(公告)日：2008-06-05
申请号：US11877153
申请日：2007-10-23
申请人： Patrick D. Pannese , Vinaya Kavathekar , Peter van der Meulen
发明人： Patrick D. Pannese , Vinaya Kavathekar , Peter van der Meulen
IPC分类号： G06F3/048
CPC分类号： G05B99/00 , G05B15/02 , G05B19/41865 , G05B19/41885 , G05B23/0267 , G05B2219/30 , G05B2219/31 , G05B2219/31467 , G05B2219/31472 , G05B2219/32128 , G05B2219/32267 , G05B2219/32329 , G05B2219/32335 , G05B2219/32342 , G05B2219/32351 , G05B2219/35494 , G05B2219/40411 , G05B2219/40412 , G05B2219/40413 , G05B2219/40419 , G05B2219/40424 , G05B2219/45031 , G06F15/00 , G06T7/0004 , H01L21/67161 , H01L21/67184 , H01L21/6719 , H01L21/67196 , H01L21/67201 , H01L21/67207 , H01L21/67742 , H01L21/67745 , Y02P90/18 , Y02P90/20 , Y02P90/26 , Y02P90/86
摘要： Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in combination to offer improved usability and computational efficiency for real time control and monitoring of a semiconductor manufacturing process. More generally, these techniques may be usefully employed in a variety of real time control systems, particularly systems requiring complex scheduling decisions or heterogeneous systems constructed of hardware from numerous independent vendors.

5. 发明授权

US08442667B2 Applications of neural networks 有权
标题翻译：神经网络的应用
公开(公告)号：US08442667B2
公开(公告)日：2013-05-14
申请号：US12032733
申请日：2008-02-18
申请人： Patrick D. Pannese
发明人： Patrick D. Pannese
IPC分类号： G06F19/00 , G06F17/00 , G06E1/00 , G06N5/00 , G05B13/02
CPC分类号： G05B99/00 , G05B15/02 , G05B19/41865 , G05B19/41885 , G05B23/0267 , G05B2219/30 , G05B2219/31 , G05B2219/31467 , G05B2219/31472 , G05B2219/32128 , G05B2219/32267 , G05B2219/32329 , G05B2219/32335 , G05B2219/32342 , G05B2219/32351 , G05B2219/35494 , G05B2219/40411 , G05B2219/40412 , G05B2219/40413 , G05B2219/40419 , G05B2219/40424 , G05B2219/45031 , G06T7/0004 , H01L21/67161 , H01L21/67184 , H01L21/6719 , H01L21/67196 , H01L21/67201 , H01L21/67207 , H01L21/67742 , H01L21/67745 , Y02P90/18 , Y02P90/20 , Y02P90/26 , Y02P90/86
摘要： Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in combination to offer improved usability and computational efficiency for real time control and monitoring of a semiconductor manufacturing process. More generally, these techniques may be usefully employed in a variety of real time control systems, particularly systems requiring complex scheduling decisions or heterogeneous systems constructed of hardware from numerous independent vendors.
摘要翻译：用于控制异构半导体制造环境中的处理的软件可以包括以晶圆为中心的数据库，使用神经网络的实时调度器和显示系统的模拟操作的图形用户界面。这些特征可以单独使用或组合使用以提供用于半导体制造过程的实时控制和监视的改进的可用性和计算效率。更一般来说，这些技术可以有用地用于各种实时控制系统中，特别是需要复杂调度决策的系统或由许多独立供应商的硬件构成的异构系统。

6. 发明申请

US20080163095A1 METHODS AND SYSTEMS FOR CONTROLLING A SEMICONDUCTOR FABRICATION PROCESS 有权
公开(公告)号：US20080163095A1
公开(公告)日：2008-07-03
申请号：US11877180
申请日：2007-10-23
申请人： Patrick D. Pannese , Vinaya Kavathekar , Peter van der Meulen
发明人： Patrick D. Pannese , Vinaya Kavathekar , Peter van der Meulen
IPC分类号： G06F3/048
CPC分类号： G05B99/00 , G05B15/02 , G05B19/41865 , G05B19/41885 , G05B23/0267 , G05B2219/30 , G05B2219/31 , G05B2219/31467 , G05B2219/31472 , G05B2219/32128 , G05B2219/32267 , G05B2219/32329 , G05B2219/32335 , G05B2219/32342 , G05B2219/32351 , G05B2219/35494 , G05B2219/40411 , G05B2219/40412 , G05B2219/40413 , G05B2219/40419 , G05B2219/40424 , G05B2219/45031 , G06T7/0004 , H01L21/67161 , H01L21/67184 , H01L21/6719 , H01L21/67196 , H01L21/67201 , H01L21/67207 , H01L21/67742 , H01L21/67745 , Y02P90/18 , Y02P90/20 , Y02P90/26 , Y02P90/86
摘要： Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in combination to offer improved usability and computational efficiency for real time control and monitoring of a semiconductor manufacturing process. More generally, these techniques may be usefully employed in a variety of real time control systems, particularly systems requiring complex scheduling decisions or heterogeneous systems constructed of hardware from numerous independent vendors.

7. 发明申请

US20080155445A1 METHODS AND SYSTEMS FOR CONTROLLING A SEMICONDUCTOR FABRICATION PROCESS 有权
公开(公告)号：US20080155445A1
公开(公告)日：2008-06-26
申请号：US11877191
申请日：2007-10-23
申请人： Patrick D. Pannese , Vinaya Kavathekar , Peter van der Meulen
发明人： Patrick D. Pannese , Vinaya Kavathekar , Peter van der Meulen
IPC分类号： G06F3/048
CPC分类号： G05B99/00 , G05B15/02 , G05B19/41865 , G05B19/41885 , G05B23/0267 , G05B2219/30 , G05B2219/31 , G05B2219/31467 , G05B2219/31472 , G05B2219/32128 , G05B2219/32267 , G05B2219/32329 , G05B2219/32335 , G05B2219/32342 , G05B2219/32351 , G05B2219/35494 , G05B2219/40411 , G05B2219/40412 , G05B2219/40413 , G05B2219/40419 , G05B2219/40424 , G05B2219/45031 , G06T7/0004 , H01L21/67161 , H01L21/67184 , H01L21/6719 , H01L21/67196 , H01L21/67201 , H01L21/67207 , H01L21/67742 , H01L21/67745 , Y02P90/18 , Y02P90/20 , Y02P90/26 , Y02P90/86
摘要： Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in combination to offer improved usability and computational efficiency for real time control and monitoring of a semiconductor manufacturing process. More generally, these techniques may be usefully employed in a variety of real time control systems, particularly systems requiring complex scheduling decisions or heterogeneous systems constructed of hardware from numerous independent vendors.

8. 发明申请

US20080155443A1 METHODS AND SYSTEMS FOR CONTROLLING A SEMICONDUCTOR FABRICATION PROCESS 审中-公开
公开(公告)号：US20080155443A1
公开(公告)日：2008-06-26
申请号：US11877058
申请日：2007-10-23
申请人： Patrick D. Pannese , Vinaya Kavathekar , Peter van der Meulen
发明人： Patrick D. Pannese , Vinaya Kavathekar , Peter van der Meulen
IPC分类号： G06F3/048
CPC分类号： G05B99/00 , G05B15/02 , G05B19/41865 , G05B19/41885 , G05B23/0267 , G05B2219/30 , G05B2219/31 , G05B2219/31467 , G05B2219/31472 , G05B2219/32128 , G05B2219/32267 , G05B2219/32329 , G05B2219/32335 , G05B2219/32342 , G05B2219/32351 , G05B2219/35494 , G05B2219/40411 , G05B2219/40412 , G05B2219/40413 , G05B2219/40419 , G05B2219/40424 , G05B2219/45031 , G06F15/00 , G06T7/0004 , H01L21/67161 , H01L21/67184 , H01L21/6719 , H01L21/67196 , H01L21/67201 , H01L21/67207 , H01L21/67742 , H01L21/67745 , Y02P90/18 , Y02P90/20 , Y02P90/26 , Y02P90/86
摘要： Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in combination to offer improved usability and computational efficiency for real time control and monitoring of a semiconductor manufacturing process. More generally, these techniques may be usefully employed in a variety of real time control systems, particularly systems requiring complex scheduling decisions or heterogeneous systems constructed of hardware from numerous independent vendors.

9. 发明申请

US20170343997A1 METHOD AND APPARATUS FOR GENERATING MACHINING CODES OF WORKPIECES FROM A PAPER ENGINEERING DRAWING 审中-公开
公开(公告)号：US20170343997A1
公开(公告)日：2017-11-30
申请号：US15527048
申请日：2014-12-01
申请人： Siemens Aktiengesellschaft
发明人： Shun Jie FAN , Ming JIE , Qian WANG
IPC分类号： G05B19/42 , G05B19/4097 , G06F17/50
CPC分类号： G05B19/4202 , G05B19/4093 , G05B19/4097 , G05B2219/30 , G05B2219/35216 , G05B2219/37572 , G06F17/50 , Y02P90/265
摘要： A method and apparatus for generating machining code of workpieces from a paper engineering drawing are provided. The method includes processing the paper engineering drawing to be a binary image; extracting dimension features and shape features of the workpieces from the binary image; and generating the machining codes of the workpieces based on the extracted dimension features and shape features of the workpieces. The machining codes indicate the dimension and shape of the workpieces, Machining codes of workpieces are generated from a paper engineering drawing directly without manual involvement.

10. 发明授权

US09535426B2 Positioning control device 有权
标题翻译：定位控制装置
公开(公告)号：US09535426B2
公开(公告)日：2017-01-03
申请号：US14781348
申请日：2014-06-26
申请人： Mitsubishi Electric Corporation
发明人： Koichiro Ueda , Yoshihiro Marushita
IPC分类号： H02P3/14 , G05D13/66 , G05D3/20 , G05B11/01
CPC分类号： G05D13/66 , G05B11/01 , G05B19/19 , G05B2219/30 , G05B2219/34314 , G05D3/20
摘要： A positioning control device according to an embodiment includes an amplifier that includes a converter that rectifies and outputs an AC power supply to bus-bars; a smoothing capacitor that smoothes an output of the converter and generates a bus voltage; a regenerative resistance and a regenerative transistor; an inverter that supplies a drive current; and a command generation unit that generates a position command value for positioning control of a mechanical load in accordance with a command pattern. The inverter is connected between the bus-bars and supplies the drive current. The command generation unit acquires a regenerative-power-amount estimated value and an energy value storable in the smoothing capacitor; and on the basis of a result of a comparison between these values, it decides whether to use the position command value on the basis of the command pattern.
摘要翻译：根据实施例的定位控制装置包括放大器，该放大器包括整流并输出到母线的AC电源的转换器; 平滑电容器，其平滑转换器的输出并产生总线电压; 再生电阻和再生晶体管; 提供驱动电流的逆变器; 以及命令生成单元，其根据命令模式生成用于定位机械负载的控制的位置指令值。变频器连接在母线之间，并提供驱动电流。命令生成单元获取能够存储在平滑电容器中的再生功率量估计值和能量值; 并且基于这些值之间的比较的结果，它决定是否基于命令模式使用位置命令值。

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