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1. 发明申请

US20030172959A1 Radioactive decontamination and translocation method 失效
公开(公告)号：US20030172959A1
公开(公告)日：2003-09-18
申请号：US10418787
申请日：2003-04-18
申请人： Bobolink, Inc.
发明人： Robert T. Martin
IPC分类号： C23G001/36
CPC分类号： G21F9/28 , C11D7/08 , C11D7/261 , C11D7/265 , C11D7/3236 , C11D11/0023 , C11D11/0064 , G21F9/30
摘要： A method for removing a wide variety of radioactive contaminants from a contaminated surface sufficient for the surface to be classified as a low-level waste or as free release. Contaminated surfaces may be classified as Class C, Class B, Class A, or high-level radioactive wastes prior to treatment. An aqueous solution having a wetting agent and a complex substituted keto-amine is provided. The aqueous solution is left on the surface for a time sufficient to remove the radioactive contaminants into the aqueous solution which is then removed. Depending on the type and condition of the surface, an acid may be added to the aqueous solution to aid in the contaminant removal process. However, typical metals surfaces may often be treated effectively without the use of concentrated acids or with dilute concentrations of such acids. The method of the present invention has the effect of removing substantially all of the radioactive contaminants from a variety of previously contaminated surfaces.

2. 发明授权

US09657435B2 Metal free bleaching composition 有权
公开(公告)号：US09657435B2
公开(公告)日：2017-05-23
申请号：US13703385
申请日：2011-06-21
申请人： Markus Frey , Hauke Rohwer , Frederique Wendeborn , Menno Hazenkamp
发明人： Markus Frey , Hauke Rohwer , Frederique Wendeborn , Menno Hazenkamp
IPC分类号： C11D3/39 , C11D3/395 , C11D7/54 , D06L3/02 , C07C225/06 , C07C225/22 , C07C317/32 , C07C323/32 , C07C381/12 , C11D3/30 , C11D3/34 , C11D7/32 , C11D7/34
CPC分类号： D06L4/15 , C07C225/06 , C07C225/22 , C07C317/32 , C07C323/32 , C07C381/12 , C07C2601/14 , C11D3/30 , C11D3/349 , C11D3/3902 , C11D3/3905 , C11D3/3915 , C11D3/3917 , C11D7/3236 , C11D7/3281 , C11D7/34 , D06L4/12
摘要： The present invention relates to the use of a composition comprising specific a-amino-ketones, H2O2, a H2O2 precursor or a peracid and optionally an activator as a bleaching mixture for textile materials or dishes either manually or in an automatic washing machine or dish washer. Further aspects of the invention are the composition comprising specific a-aminoketones and H2O2, a H2O2 precursor or a peracid and a process for bleaching of stains or of soiling on textile materials or dishes in the context of a washing process either manually or in an automatic washing machine or dish washer. Also aspects of the invention are detergent formulations comprising such a composition and novel compounds.

3. 发明授权

US6153575A Storage stabilized 1,2-dichloroethylene compositions 有权
标题翻译：储存稳定的1,2-二氯乙烯组合物
公开(公告)号：US6153575A
公开(公告)日：2000-11-28
申请号：US519291
申请日：2000-03-06
申请人： Earl M. Gorton , Ronald D. Olinger
发明人： Earl M. Gorton , Ronald D. Olinger
IPC分类号： C11D7/32 , C11D7/50 , C23G5/028 , C11D3/26 , C23G5/02
CPC分类号： C23G5/02806 , C11D7/32 , C11D7/3236 , C11D7/5018 , C23G5/02883
摘要： Describes a stabilized trans-1,2-dichloroethylene composition having a low concentration of aliphatic aldehyde hydrazone, optionally in combination with an epoxide. The aliphatic aldehyde hydrazone was found to be more efficient than commercially used hydroquinone monomethylether (HQMME) in preventing the isomeric transformation of trans-1,2-dichloroethylene to cis-1,2-dichloroethylene during storage. Also described is a process for cleaning the surface of an article with the stabilized 1,2-dichloroethylene composition.
摘要翻译：描述了具有低浓度脂族醛腙的稳定的反式1,2-二氯乙烯组合物，任选与环氧化物组合。发现脂族醛腙比商业使用的氢醌单甲醚（HQMME）在防止反式-1,2-二氯乙烯向顺式-1,2-二氯乙烯的储存过程中异构转化时更有效。还描述了用稳定的1,2-二氯乙烯组合物清洁制品的表面的方法。

4. 发明公开

US20240117280A1 METAL RESIDUE REMOVING LIQUID, METAL RESIDUE REMOVING METHOD, AND METAL WIRING MANUFACTURING METHOD 审中-公开
公开(公告)号：US20240117280A1
公开(公告)日：2024-04-11
申请号：US18460451
申请日：2023-09-01
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Ivan Ryzhii , Mai Sugawara , Yugeng Wu
IPC分类号： C11D11/00 , C11D7/10 , C11D7/32 , C11D7/50 , H05K3/02 , H05K3/26
CPC分类号： C11D11/0047 , C11D7/10 , C11D7/3209 , C11D7/3236 , C11D7/5013 , H05K3/02 , H05K3/26 , H05K2203/0766
摘要： A metal residue removing liquid including a mixed solvent containing a first organic solvent and a second organic solvent, a salt of a base containing no metal ions and hydrofluoric acid, and water, in which the first organic solvent is diethylformamide, and the mixed solvent has a value of 0.6 or more, which is obtained by subtracting a hydrogen bond term of a Hansen solubility parameter from a polar term of the Hansen solubility parameter.

5. 发明授权

US06605158B1 Radioactive decontamination and translocation method 失效
标题翻译：放射性去污和易位法
公开(公告)号：US06605158B1
公开(公告)日：2003-08-12
申请号：US10283039
申请日：2002-10-24
申请人： Robert T. Martin
发明人： Robert T. Martin
IPC分类号： B08B304
CPC分类号： C11D7/08 , C11D7/261 , C11D7/265 , C11D7/3236 , C11D11/0023 , C11D11/0064 , G21F9/28
摘要： A method for removing radioactive contaminants from a given surface. An aqueous solution having a wetting agent and a complex substituted keto-amine is provided. The solution is left on the surface for a time sufficient to remove the radioactive contaminants into the aqueous solution which is then removed. Depending on the type and condition of the surface, a concentrated acid may be added to the aqueous solution to aid in the contaminant removal process. In such a case, a pH of less than 3.0, and preferably less than 1.5 is maintained. If a concentrated acid is used, the acidic solution containing radioactive contaminants is preferably neutralized by an alkaline material to a pH of between 5.5 and 9.0. Removal of thorium contamination from railcars is one useful application of the invention. The method of the present invention has the effect of removing substantially all of the radioactive contaminants from a previously contaminated surface.
摘要翻译：从给定表面去除放射性污染物的方法。提供了具有润湿剂和络合物取代的酮 - 胺的水溶液。将溶液留在表面上足以将放射性污染物除去到水溶液中的时间，然后将其去除。根据表面的类型和状况，可以向水溶液中加入浓酸以帮助污染物去除过程。在这种情况下，保持小于3.0，优选小于1.5的pH。如果使用浓酸，则含有放射性污染物的酸性溶液优选被碱性物质中和至pH5.5至9.0。从轨道车辆去除钍污染物是本发明的一个有用的应用。本发明的方法具有从先前被污染的表面去除基本上所有的放射性污染物的作用。

6. 发明授权

US06497769B1 Radioactive decontamination and translocation method 失效
标题翻译：放射性去污和易位法
公开(公告)号：US06497769B1
公开(公告)日：2002-12-24
申请号：US09976467
申请日：2001-10-12
申请人： Robert T. Martin
发明人： Robert T. Martin
IPC分类号： B08B304
CPC分类号： C11D11/0064 , C11D7/08 , C11D7/261 , C11D7/265 , C11D7/3236 , C11D11/0023 , G21F9/28
摘要： A method for removing radioactive contaminants from a given surface. An acidic solution having a pH of less than 3.0, and preferably less than 1.5, of a complex substituted keto-amine, and a mixture of a saturated and unsaturated lower alcohol (e.g. isopropyl alcohol and propargyl alcohol), and concentrated acid is applied to a contaminated surface. The solution is left on said surface for a time sufficient to remove the radioactive contaminants into the acidic solution and then removed. The acidic solution containing the radioactive contaminants is preferably neuralized by an alkaline material to a pH of between 5.5 and 9.0. Removal of thorium contamination from railcars is one useful application of the invention. The method of the present invention has the effect of removing substantially all of the radioactive contaminants from a previously contaminated surface.
摘要翻译：从给定表面去除放射性污染物的方法。将配合物取代的酮胺的pH值小于3.0，优选小于1.5的酸性溶液和饱和和不饱和低级醇（例如异丙醇和炔丙醇）和浓缩酸的混合物施加到受污染的表面。将溶液留在所述表面上足以将放射性污染物除去到酸性溶液中然后除去的时间。含有放射性污染物的酸性溶液优选通过碱性材料进行神经化，pH为5.5至9.0。从轨道车辆去除钍污染物是本发明的一个有用的应用。本发明的方法具有从先前被污染的表面去除基本上所有的放射性污染物的作用。

7. 发明申请

US20020092543A1 Processing compositions and methods of using same 有权
标题翻译：加工组合物及其使用方法
公开(公告)号：US20020092543A1
公开(公告)日：2002-07-18
申请号：US10051269
申请日：2002-01-18
申请人： Micron Technology, Inc.
发明人： Brian A. Vaartstra
IPC分类号： C23G001/00
CPC分类号： H01L21/02052 , C11D7/264 , C11D7/3209 , C11D7/3236 , C11D11/0047 , H01L21/30625 , H01L21/31053
摘要： Compositions and methods for processing (e.g., cleaning) substrates, such as semiconductor-based substrates, as well as processing equipment, include one or more compounds of Formula (I): 1 wherein each R1, R2, R3, and R4 is independently H or an organic group.
摘要翻译：用于处理（例如，清洁）基底（例如基于半导体的基底）以及加工设备的组合物和方法包括一种或多种式（I）的化合物：其中每个R 1，R 2，R 3和R 4独立地为H或一个有机组织。

8. 发明授权

US06375754B1 Processing compositions and methods of using same 失效
标题翻译：加工组合物及其使用方法
公开(公告)号：US06375754B1
公开(公告)日：2002-04-23
申请号：US09490660
申请日：2000-01-25
申请人： Brian A. Vaartstra
发明人： Brian A. Vaartstra
IPC分类号： C03C2300
CPC分类号： H01L21/02052 , C11D7/264 , C11D7/3209 , C11D7/3236 , C11D11/0047 , H01L21/30625 , H01L21/31053
摘要： Compositions and methods for processing (e.g., cleaning) substrates, such as semiconductor-based substrates, as well as processing equipment, include one or more compounds of Formula (I): wherein each R1, R2, R3, and R4 is independently H or an organic group.
摘要翻译：用于处理（例如，清洁）基底（例如基于半导体的基底）以及加工设备的组合物和方法包括一种或多种式（I）的化合物：其中每个R 1，R 2，R 3和R 4独立地为H或一个有机组织。

9. 发明授权

US06207630B1 Processing compositions and methods of using same 有权
标题翻译：加工组合物及其使用方法
公开(公告)号：US06207630B1
公开(公告)日：2001-03-27
申请号：US09478385
申请日：2000-01-06
申请人： Brian A. Vaartstra
发明人： Brian A. Vaartstra
IPC分类号： H01L21302
CPC分类号： H01L21/02052 , C11D7/264 , C11D7/3209 , C11D7/3236 , C11D11/0047 , H01L21/30625 , H01L21/31053
摘要： Compositions and methods for processing (e.g., cleaning) substrates, such as semiconductor-based substrates, as well as processing equipment, include one or more compounds of Formula (I): wherein each R1, R2, R3, and R4 is independently H or an organic group.
摘要翻译：用于处理（例如，清洁）基底（例如基于半导体的基底）以及加工设备的组合物和方法包括一种或多种式（I）的化合物：其中每个R 1，R 2，R 3和R 4独立地为H或一个有机组织。

10. 发明授权

US06030491A Processing compositions and methods of using same 失效
公开(公告)号：US06030491A
公开(公告)日：2000-02-29
申请号：US914509
申请日：1997-08-19
申请人： Brian A. Vaartstra
发明人： Brian A. Vaartstra
IPC分类号： C11D7/26 , C11D7/32 , C11D11/00 , H01L21/306 , H01L21/3105 , B44C1/22 , C11D9/00 , C11D9/04
CPC分类号： H01L21/02052 , C11D11/0047 , C11D7/264 , C11D7/3209 , C11D7/3236 , H01L21/30625 , H01L21/31053
摘要： Compositions and methods for processing (e.g., cleaning) substrates, such as semiconductor-based substrates, as well as processing equipment, include one or more compounds of Formula (I): ##STR1## wherein each R.sup.1, R.sup.2, R.sup.3, and R.sup.4 is independently H or an organic group.

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