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1. 发明公开

US20240199898A1 COATINGS, COATED SEPARATORS, BATTERIES, AND RELATED METHODS 审中-公开
公开(公告)号：US20240199898A1
公开(公告)日：2024-06-20
申请号：US18413284
申请日：2024-01-16
申请人： CELGARD, LLC
发明人： Michael B. Lane , Insik Jeon , Edward Kruger , Xiang Yu , Ronnie E. Smith , Stefan Reinartz , Junqing Ma
IPC分类号： C09D7/65 , C09D5/18 , C09D7/20 , C09D129/04 , C09D133/04 , C09D139/04 , H01M10/0525 , H01M50/411 , H01M50/414 , H01M50/417 , H01M50/42 , H01M50/426 , H01M50/429 , H01M50/449 , H01M50/451 , H01M50/457 , H01M50/489
CPC分类号： C09D7/65 , C09D5/18 , C09D7/20 , C09D129/04 , C09D133/04 , C09D139/04 , H01M10/0525 , H01M50/411 , H01M50/414 , H01M50/417 , H01M50/42 , H01M50/426 , H01M50/429 , H01M50/449 , H01M50/451 , H01M50/457 , H01M50/489 , H01M2220/20
摘要： New and/or improved coatings for porous substrates, including battery separators or separator membranes, and/or coated porous substrates, including coated battery separators, and/or batteries or cells including such coatings or coated separators, and/or related methods including methods of manufacture and/or of use thereof are disclosed. Also, new or improved coatings for porous substrates, including battery separators, which comprise at least a polymeric binder and heat-resistant particles with or without additional additives, materials or components, and/or to new or improved coated porous substrates, including battery separators, where the coating comprises at least a polymeric binder and heat-resistant particles with or without additional additives, materials or components are disclosed. Further, new or improved coatings for porous substrates, including battery separators, and new and/or improved coated porous substrates, including battery separators, new or improved coatings for porous substrates, including battery separators, which comprise at least (i) a polymeric binder, (ii) heat-resistant particles, and (iii) at least one component selected from the group consisting of a cross-linker, a low-temperature shutdown agent, an adhesion agent, and a thickener, and new and/or improved coated porous substrates, including battery separators, where the coating comprises at least (i) a polymeric binder, (ii) heat-resistant particles, and (iii) at least one component selected from the group consisting of a cross-linker, a low-temperature shutdown agent, an adhesion agent, a thickener, a friction-reducing agent, a high-temperature shutdown agent are disclosed.

2. 发明授权

US11884836B2 Polymer, coating composition comprising same, and organic light emitting element using same 有权
公开(公告)号：US11884836B2
公开(公告)日：2024-01-30
申请号：US16651082
申请日：2019-02-28
申请人： LG Chem, Ltd.
发明人： Esder Kang , Jinseck Kim , Jaesoon Bae , Jaechol Lee , Hwakyung Kim , Daeho Kim
IPC分类号： H01L51/00 , C09D139/04 , C08F126/12 , C08F112/14 , C09D125/18 , C08F112/32 , C08F12/32 , H10K85/10 , H10K50/11 , H10K50/15 , H10K50/17 , H10K71/00 , H10K71/15 , H10K71/40
CPC分类号： C09D139/04 , C08F12/32 , C08F112/26 , C08F112/32 , C08F126/12 , C09D125/18 , H10K85/111 , H10K50/11 , H10K50/15 , H10K50/17 , H10K71/00 , H10K71/15 , H10K71/441
摘要： The present specification relates to a polymer including a unit represented by Formula 1, a coating composition including the same, and an organic light emitting device formed by using the same.

3. 发明公开

US20230295457A1 SURFACE TREATMENT LIQUID AND SURFACE TREATMENT METHOD 审中-公开
公开(公告)号：US20230295457A1
公开(公告)日：2023-09-21
申请号：US18042828
申请日：2021-07-28
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Takahiro SENZAKI , Hisato SHIMIZU
IPC分类号： C09D139/04 , C09D147/00
CPC分类号： C09D139/04 , C09D147/00
摘要： A surface treatment liquid which adhesiveness of a component that achieves a surface treatment effect is good, and a desired surface treatment effect is easily obtained, and a surface treatment method using the surface treatment liquid are provided.
A surface treatment liquid including a resin (A) and a solvent (S), in which the resin (A) includes a constituent unit (a1) derived form a compound having a hydrophilic group and an ethylenic double bond and a constituent unit (a2) derived from a compound a nitrogen-containing heterocyclic group, an ethylenic double bond, and a specific type of polar group is used.

4. 发明授权

US11720023B2 Material for forming organic film, method for forming organic film, patterning process, and compound 有权
公开(公告)号：US11720023B2
公开(公告)日：2023-08-08
申请号：US17089259
申请日：2020-11-04
申请人： SHIN-ETSU CHEMICAL CO., LTD.
发明人： Daisuke Kori , Takayoshi Nakahara , Yusuke Biyajima
IPC分类号： G03F7/11 , C07D209/48 , C07D403/14 , C07D487/04 , C08F26/06 , C09D139/04 , G03F7/09 , H01L21/027 , H01L21/033 , H01L21/768
CPC分类号： G03F7/11 , C07D209/48 , C07D403/14 , C07D487/04 , C08F26/06 , C09D139/04 , G03F7/094 , H01L21/0273 , H01L21/0337 , H01L21/76819
摘要： The present invention provides a material for forming an organic film, containing a compound shown by the following general formula (1), and an organic solvent, where X represents an organic group having a valency of n1 and 2 to 50 carbon atoms, n1 represents an integer of 1 to 10, and R1 represents at least one or more of the following general formulae (2) to (4). This aims to provide an organic film material for forming an organic film that has all of high filling property, high planarizing property, and excellent adhesive force to a substrate.

5. 发明授权

US10876015B2 Coating compositions for forming toner coatings 有权
公开(公告)号：US10876015B2
公开(公告)日：2020-12-29
申请号：US15775972
申请日：2016-11-14
申请人： ISP INVESTMENTS LLC
发明人： Osama M. Musa , Drupesh Patel , Michael A. Tallon , David K. Hood
IPC分类号： C09D139/04 , C09D4/00 , C09D7/20 , C09J139/04 , C09D7/63 , B41M5/52
CPC分类号： C09D139/04 , B41M5/5254 , C09D4/00 , C09D7/20 , C09D7/63 , C09J139/04 , C09D4/00 , C08F220/385
摘要： The present invention provides coating compositions for forming a toner coating and inkjet receptive coatings on a substrate containing a film forming polymer comprising (a) a monomer (monomer A) comprising at least one functionalized or unfunctionalized acryloyl moiety and at least one lactam moiety. (b) a N-vinyl amide monomer (monomer Bx1), (c) an optional cross-linker (monomer Bx2) and (d) a solvent. The coating compositions may further comprise an additional hydrophobic monomer moiety. The present invention further provides toner substrates and inkjet receptive substrates coated with the coating compositions.

6. 发明申请

US20180329301A1 COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING METHOD USING SAME 审中-公开
公开(公告)号：US20180329301A1
公开(公告)日：2018-11-15
申请号：US15775661
申请日：2016-11-02
申请人： AZ Electronic Materrials (Luxembourg) S.a.r.l.
发明人： Xiaowei WANG
IPC分类号： G03F7/11 , G03F7/16 , G03F7/40 , G03F7/038 , C09D139/08
CPC分类号： G03F7/11 , C08L2201/56 , C09D139/04 , C09D139/08 , G03F7/038 , G03F7/16 , G03F7/168 , G03F7/405
摘要： The present invention relates to a shrink material composition for fattening a resist pattern prepared from a negative-tone lithography process, comprising at least one polymer and at least one organic solvent, wherein the at least one polymer comprises at least one structural unit of a nitrogen heteroaromatic ring system.

7. 发明授权

US09982080B2 Photocurable composition and hard coating agent 有权
公开(公告)号：US09982080B2
公开(公告)日：2018-05-29
申请号：US14374233
申请日：2013-03-05
申请人： ADEKA CORPORATION
发明人： Tetsuo Kamimoto , Satoshi Masuda , Fumihiko Sato , Yosuke Ishima
IPC分类号： C08F2/46 , B32B27/18 , C08F290/00 , C09D4/02 , C09D7/12 , C09D201/00 , C08F226/06 , C08F2/50 , C09D5/32 , C09D139/04 , C07D251/24 , C08K5/3492 , C08F265/04 , C08F290/06 , C09D201/02 , C08F222/10 , C08F222/22
CPC分类号： C08F226/06 , C07D251/24 , C08F2/50 , C08F222/1006 , C08F265/04 , C08F290/067 , C08F2222/225 , C08K5/3492 , C09D5/32 , C09D7/48 , C09D139/04 , C09D201/02 , C08F222/22
摘要： A photocurable composition contains at least one ultraviolet absorber represented by Formula (1), and a hard coating agent including the photocurable composition. wherein R1, R2 and R3 may be the same as or different from each other and represent a branched or linear alkyl group with 1-20 carbon atoms and is substituted with a (meth)acryloyloxy group; the alkyl group may be substituted with a hydroxyl group, an alkoxy group having 1-8 carbon atoms, or an acyloxy group having 1-8 carbon atoms; the alkyl group may be interrupted by an oxygen atom, a sulfur atom, a carbonyl group, an ester group, an amide group, or an imide group; and R4, R5 and R6 may be the same as or different from each other and represent a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group having 1-12 carbon atoms, or an alkoxy group having 1-12 carbon atoms.

8. 发明授权

US09821589B2 Coating compositions for forming toner receptive coatings 有权
公开(公告)号：US09821589B2
公开(公告)日：2017-11-21
申请号：US14779419
申请日：2014-03-25
申请人： ISP INVESTMENTS INC.
发明人： David K. Hood , Charles J. Wasserman , Karyn B. Visscher , Sounak Sarkar
IPC分类号： C09D139/04 , B41M5/52 , C08F226/08 , C08F218/08 , C08F226/06 , C08F226/10 , C09D139/06 , C08F220/28
CPC分类号： B41M5/5254 , C08F218/08 , C08F226/06 , C08F226/08 , C08F226/10 , C08F2220/283 , C09D139/04 , C09D139/06
摘要： The present invention provides coating composition for forming a toner receptive coating on a substrate containing a polymer comprising: (a) a N-vinyl amide monomer, (b) a vinyl acetate monomer, (c) a substituted or unsubstituted monomer comprising a cyclic ether, and (d) a solvent. The coating compositions may further comprise a (e) non-reactive hydrophobic monomer. The invention also provides substrates coated with the toner receptive coatings.

9. 发明授权

US09720324B2 Resist composition and pattern forming process 有权
公开(公告)号：US09720324B2
公开(公告)日：2017-08-01
申请号：US15210025
申请日：2016-07-14
申请人： SHIN-ETSU CHEMICAL CO., LTD.
发明人： Jun Hatakeyama , Koji Hasegawa
IPC分类号： G03F7/004 , G03F7/30 , C08F18/20 , C08F220/28 , C08F220/60 , C08F224/00 , C08F226/02 , C08F228/02 , C08F228/06 , G03F7/039 , C08F222/40 , C08F222/20 , C08F216/14 , G03F7/16 , G03F7/20 , G03F7/32
CPC分类号： G03F7/0392 , C08F18/20 , C08F216/1416 , C08F220/18 , C08F220/28 , C08F220/60 , C08F222/20 , C08F222/40 , C08F224/00 , C08F226/02 , C08F226/06 , C08F228/02 , C08F228/06 , C08F2222/404 , C08F2222/408 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/085 , G03F7/162 , G03F7/168 , G03F7/2041 , G03F7/2053 , G03F7/30 , G03F7/325 , C08F2220/283 , C08F2220/1891 , C08F2220/1866 , C08F220/20 , C08F2220/1841 , C08F220/24 , C09D133/10 , C08L33/16 , C09D139/04 , C09D143/02
摘要： A resist composition is provided comprising a polymer comprising recurring units (a) having an oxazolidinedione, thioxooxazolidinone, thiazolidinedione or thioxothiazolidinone structure and recurring unit (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group. The resist composition suppresses acid diffusion, exhibits a high resolution, and forms a pattern of satisfactory profile with low edge roughness.

10. 发明授权

US09663603B2 Curable composition and polymer 有权
公开(公告)号：US09663603B2
公开(公告)日：2017-05-30
申请号：US14123147
申请日：2012-05-31
申请人： Tetsuya Noda , Fuminori Nakaya , Hajime Okutsu
发明人： Tetsuya Noda , Fuminori Nakaya , Hajime Okutsu
IPC分类号： C08F226/06 , C08F26/06 , C09D133/16 , C09D139/04 , C08F220/14 , C08F220/36 , C08F2/38 , C08F2/54 , C08F2/48 , C08F2/50 , C08F2/46
CPC分类号： C08F220/14 , C08F2/38 , C08F2/46 , C08F2/48 , C08F2/50 , C08F2/54 , C08F26/06 , C08F220/36 , C08F226/06 , C08J5/18 , C08J2333/12 , C08L2312/00 , C09D133/12 , C09D133/16 , C09D139/04 , C08F222/1006 , C08F220/60
摘要： An object of the invention is to provide a curable composition having a HALS skeleton and capable of producing polymers having excellent weather resistance and outer appearance. The present invention provides a curable composition including at least a monomer component that contains a monomer (A) represented by a certain formula and a monomer (B) polymerizable with the monomer (A). In the curable composition, the content of the monomer (A) is 0.01 to 35 mol % in the monomer component, and the content of the monomer (B) is 65 to 99.99 mol % in the monomer component.

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