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1. 发明申请

US20180326596A1 METHODS AND SYSTEMS FOR ELECTROADHESION-BASED MANIPULATION IN MANUFACTURING 审中-公开
公开(公告)号：US20180326596A1
公开(公告)日：2018-11-15
申请号：US16030340
申请日：2018-07-09
申请人： GRABIT, INC.
发明人： Harsha PRAHLAD , Richard J. CASLER , Susan KIM , Matthew LEETTOLA , Jon SMITH , Kenneth TAN , Patrick WANG , John Mathew FARREN , Patrick Conall REGAN , Po Cheng CHEN , Howard FU , Dragan JURKOVIC , Aishwarya VARADHAN , Chang-Chu LIAO , Chih-Chi CHANG , Kuo-Hung LEE , Ming-Feng JEAN
IPC分类号： B25J15/00 , B25J15/06 , B25J9/00 , B25J9/04 , B25J19/02
CPC分类号： B25J15/0666 , B25J9/0093 , B25J9/0096 , B25J9/044 , B25J15/0085 , B25J19/023 , H02N13/00
摘要： Systems, apparatus, and methods of manufacturing an article using electroadhesion technology for the pick-up and release of materials, respectively.

2. 发明申请

US20170291308A1 SUCTION NOZZLE 有权
公开(公告)号：US20170291308A1
公开(公告)日：2017-10-12
申请号：US15511724
申请日：2014-10-10
申请人： FUJI MACHINE MFG. CO., LTD.
发明人： Junichi YAMAMURO
IPC分类号： B25J15/06
CPC分类号： B25J15/0691 , B25J15/06 , B25J15/0666 , H05K13/0409
摘要： In a suction nozzle 66 which sucks and holds a component 150 on a suction surface by using negative pressure air and detaches the sucked and held component from the suction surface by using positive pressure air, the positive pressure air and the negative pressure air used when the component is held and detached selectively flow through through-holes 90, 94 and 96, air flow path 116, or the like. In addition, a rod 110 is held to be capable of being advanced and retracted toward the suction surface in an inside section of the suction nozzle. The rod protrudes from the suction surface by the positive pressure air flowing through the air flow path and is retracted to the inside section of the suction nozzle when the negative pressure flows through the air flow path. In other words, the through-hole, the air flow path, or the like is shared as a mechanism for moving the rod and a mechanism for sucking and holding the component by the suction nozzle. Accordingly, it is possible to make the device compact, simple or the like and to improve practicality of the suction nozzle.

3. 发明申请

US20170069523A1 WORKPIECE HOLDING APPARATUS 有权
标题翻译：工作控制装置
公开(公告)号：US20170069523A1
公开(公告)日：2017-03-09
申请号：US15122524
申请日：2015-02-17
申请人： SHIN-ETSU HANDOTAI CO., LTD.
发明人： Taichi YASUDA , Tatsuo ENOMOTO
IPC分类号： H01L21/683 , B25J15/06
CPC分类号： H01L21/6838 , B24B37/345 , B24B41/06 , B25J15/0658 , B25J15/0666 , B25J15/0683 , H01L21/304
摘要： A workpiece holding apparatus, including: a rigid body having a vent; a suction pad adhered onto the lower end face of rigid body and having an opening communicating with vent, being configured to suck and hold a workpiece; an air controlling mechanism communicating with the vent, being configured to aspirate or discharge air through vent to aspirate or discharge air from opening; and a swelling portion being configured to be supplied with air by air controlling mechanism through the vent to swell out at least part of an area of suction pad to be in contact with the workpiece toward the workpiece in detaching workpiece from suction pad; wherein suction pad is configured to suck and hold workpiece by bringing the opening into contact with workpiece while aspirating air by air controlling mechanism through opening, and is configured to detach the workpiece from suction pad by discharging air from opening.
摘要翻译：一种工件保持装置，包括：具有通风口的刚体; 吸附垫粘附到刚体的下端面上，并且具有与排气口连通的开口，被构造成吸附和保持工件; 与排气口连通的空气控制机构，其构造成通过排气口吸入或排出空气，以从开口抽吸或排出空气; 以及膨胀部，其通过所述排气口由空气控制机构供给空气，以使从所述工件脱离吸附垫而将与所述工件接触的吸附区域的至少一部分区域向所述工件膨胀; 其特征在于，所述吸盘构成为通过使所述开口与工件接触而吸引和保持工件，同时通过打开通过空气控制机构吸入空气，并且通过从开口排出空气来将工件从吸盘上分离。

4. 发明授权

US09272424B2 Gripper for a contact lens and process for transporting a contact lens 有权
标题翻译：用于隐形眼镜的夹具和用于输送隐形眼镜的工艺
公开(公告)号：US09272424B2
公开(公告)日：2016-03-01
申请号：US14482534
申请日：2014-09-10
申请人： Novartis AG
发明人： Roger Biel
IPC分类号： B25J15/06 , B25J11/00 , B29D11/00
CPC分类号： B25J15/0666 , B25J11/005 , B29D11/0024
摘要： A gripper (1) for a contact lens comprises a gripper head (2) having a bearing surface (21) for the contact lens (L) to adhere thereto. The gripper (1) further comprises an ejector (23) for mechanically displacing the contact lens, at least partially, away from the bearing surface (21). Also a process for transporting a contact lens (L) from a start location to a destination location, comprising the steps of providing the gripper (1) and positioning the gripper head (2) of the gripper at the start location with its bearing surface (21) adjacent to the contact lens (L) at a distance sufficiently close to the contact lens (L) to cause the contact lens to adhere to the bearing surface (21), moving the gripper (1) together with the contact lens (L) adhered to the bearing surface (21) to the destination location, and actuating the ejector (23, 24) in order to mechanically displace the contact lens (L) at least partially from the bearing surface (21) until the contact lens comes into sufficient contact with a receiving liquid at the destination location in order to release the contact lens (L) from the gripper (1).
摘要翻译：用于隐形眼镜的夹持器（1）包括具有用于使隐形眼镜（L）粘附于其上的支承表面（21）的夹持头（2）。夹具（1）还包括用于至少部分地远离支承表面（21）机械地移动隐形眼镜的喷射器（23）。还有一种用于将接触镜（L）从起始位置传送到目的地位置的过程，包括以下步骤：提供夹持器（1）并将夹具的夹持器头部（2）定位在起始位置处，其夹持表面（ 21），使得隐形眼镜粘附到支承面（21）上，使夹持器（1）与隐形眼镜（L ）粘附到所述目标位置的所述支承表面（21）并且致动所述喷射器（23,24），以便至少部分地将所述隐形眼镜（L）从所述支承表面（21）机械地移位，直到所述隐形眼镜进入在目的地位置与接收液体充分接触，以便从夹具（1）释放隐形眼镜（L）。

5. 发明申请

US20180207809A1 APPARATUS, SYSTEM AND METHOD FOR PROVIDING A VACUUM EJECTOR FOR AN END EFFECTOR 审中-公开
公开(公告)号：US20180207809A1
公开(公告)日：2018-07-26
申请号：US15414208
申请日：2017-01-24
申请人： Jeroen BOSBOOM , Daniel BATEMAN , Michael CALLAHAN
发明人： Jeroen BOSBOOM , Daniel BATEMAN , Michael CALLAHAN
IPC分类号： B25J15/06 , B25J15/00
CPC分类号： B25J15/0666 , B25J15/0616
摘要： An apparatus, system and method for providing a vacuum ejector for an end effector. Embodiments may include at least an end effector and a vacuum chamber for gripping an element during semiconductor processing. The end effector may include at least two clamp arms for placing a gripped element; a vacuum cup having a mouth capable of sealing to the gripped element to provide a vacuum chamber to the gripped element; a vacuum ejector pin extending into the vacuum chamber and including a plurality of ports substantially at a tip thereof proximate to the gripped element, wherein the vacuum is applied by the plurality of ports; and an ejector pin actuator that is capable of moving the vacuum ejector pin toward the gripped element through the vacuum chamber in the y-axis until the sealing of the mouth is broken and the gripped element is ejected.

6. 发明授权

US09728442B2 Workpiece holding apparatus 有权
公开(公告)号：US09728442B2
公开(公告)日：2017-08-08
申请号：US15122524
申请日：2015-02-17
申请人： SHIN-ETSU HANDOTAI CO., LTD.
发明人： Taichi Yasuda , Tatsuo Enomoto
IPC分类号： B25J15/06 , H01L21/683 , B24B41/06 , H01L21/304
CPC分类号： H01L21/6838 , B24B37/345 , B24B41/06 , B25J15/0658 , B25J15/0666 , B25J15/0683 , H01L21/304
摘要： A workpiece holding apparatus, including: a rigid body having a vent; a suction pad adhered onto the lower end face of rigid body and having an opening communicating with vent, being configured to suck and hold a workpiece; an air controlling mechanism communicating with the vent, being configured to aspirate or discharge air through vent to aspirate or discharge air from opening; and a swelling portion being configured to be supplied with air by air controlling mechanism through the vent to swell out at least part of an area of suction pad to be in contact with the workpiece toward the workpiece in detaching workpiece from suction pad; wherein suction pad is configured to suck and hold workpiece by bringing the opening into contact with workpiece while aspirating air by air controlling mechanism through opening, and is configured to detach the workpiece from suction pad by discharging air from opening.

7. 发明申请

US20150228522A1 SYSTEM AND METHOD FOR AUTOMATICALLY CORRECTING FOR ROTATIONAL MISALIGNMENT OF WAFERS ON FILM FRAMES 审中-公开
标题翻译：用于自动校正电影框架上波形旋转偏差的系统和方法
公开(公告)号：US20150228522A1
公开(公告)日：2015-08-13
申请号：US14424427
申请日：2013-09-02
申请人： SEMICONDUCTOR TECHNOLOGIES & INSTRUMENTS PTE LTD
发明人： Jing Lin
IPC分类号： H01L21/68 , G01N21/95 , G01B11/27
CPC分类号： H01L21/681 , B25J11/0095 , B25J15/0616 , B25J15/0658 , B25J15/0666 , G01B11/27 , G01N21/9501 , G01N2201/025 , H01L21/67144 , H01L21/67706 , H01L21/6838 , H01L21/68757 , Y10T29/49826
摘要： Automatically correcting for rotational misalignment of a wafer improperly mounted on a film frame includes capturing an image of portions of the wafer using an image capture device, prior to initiation of a wafer inspection procedure by an inspection system; digitally determining a rotational misalignment angle and a rotational misalignment direction of the wafer relative to the film frame and/or a set of reference axes of a field of view of the image capture device; and correcting for the rotational misalignment of the wafer by way of a film frame handling apparatus separate from the inspection system, which is configured for rotating the film frame across the rotational misalignment angle in a direction opposite to the rotational misalignment direction. Such film frame rotation can occur prior to placement of the film frame on the wafer table, without decreasing film frame handling throughput or inspection process throughput.
摘要翻译：自动校正不正确地安装在胶片框架上的晶片的旋转未对准包括在通过检查系统启动晶片检查过程之前使用图像捕获装置捕获晶片的部分图像; 数字地确定晶片相对于胶片框架的旋转未对准角度和旋转未对准方向和/或图像捕获装置的视场的一组参考轴; 以及通过与检查系统分离的胶片框架处理装置校正晶片的旋转未对准，所述检查系统被配置为沿与旋转未对准方向相反的方向旋转胶片框架跨过旋转未对准角度。在胶片框架放置在晶片台上之前，胶片框架旋转可能发生，而不会降低胶片框架处理量或检查处理量。

8. 发明申请

US20150214085A1 MULTIFUNCTION WAFER AND FILM FRAME HANDLING SYSTEM 审中-公开
标题翻译：多功能波形和薄膜框架处理系统
公开(公告)号：US20150214085A1
公开(公告)日：2015-07-30
申请号：US14424415
申请日：2013-09-02
申请人： SEMICONDUCTOR TECHNOLOGIES & INSTRUMENTS PTE LTD
发明人： Jian Ping Jin , Leng Kheam Lee
IPC分类号： H01L21/677 , B25J11/00 , B25J15/06
CPC分类号： H01L21/681 , B25J11/0095 , B25J15/0616 , B25J15/0658 , B25J15/0666 , G01B11/27 , G01N21/9501 , G01N2201/025 , H01L21/67144 , H01L21/67706 , H01L21/6838 , H01L21/68757 , Y10T29/49826
摘要： A multifunction wafer and film frame handling system includes a wafer table assembly having a wafer table providing an ultra-planar wafer table surface configured for carrying a wafer or a film frame, and at least one of: a flattening apparatus configured for automatically applying a downward force to portions of a warped or non-planar wafer in a direction normal to the wafer table surface; a displacement limitation apparatus configured for automatically constraining or preventing uncontrolled lateral motion of a wafer relative to the wafer table surface after cessation of an applied negative pressure and application of a positive pressure to the underside of the wafer via the wafer table; and a rotational misalignment compensation apparatus configured for automatically compensating for a rotational misalignment of a wafer mounted on a film frame.
摘要翻译：一种多功能晶片和薄膜框架处理系统，包括晶片台组件，该晶片台组件具有提供用于承载晶片或薄膜框架的超平面晶片台表面的晶片台，以及至少一个：平坦化装置，其被配置为自动施加向下在垂直于晶片台表面的方向上对翘曲或非平面晶片的部分施力; 位移限制装置，被配置为在停止施加的负压之后自动约束或防止晶片相对于晶片台表面的不受控横向运动，并且通过晶片台向晶片的下侧施加正压力; 以及旋转对准补偿装置，被配置为自动补偿安装在胶片框架上的晶片的旋转未对准。

9. 发明授权

US12038451B2 Plate transport device and plate changer 有权
公开(公告)号：US12038451B2
公开(公告)日：2024-07-16
申请号：US17266139
申请日：2018-08-23
申请人： SHIMADZU CORPORATION
发明人： Koki Miyazaki , Tadanobu Shibabuki
IPC分类号： G01N35/04 , B25J15/08 , G01N35/00 , B25J15/00 , B25J15/06
CPC分类号： G01N35/04 , B25J15/08 , G01N35/0099 , B25J15/00 , B25J15/0666 , G01N2035/0418 , G01N2035/042 , G01N2035/0425
摘要： A plate transport device includes a main body, first and second moving members and first and second elastic members. The main body has an intermediate supporter. The first and second moving members have first and second supporters, respectively. The first and second moving members are supported to be movable in a first direction with respect to the main body. The first elastic member is provided between the intermediate supporter and the first supporter, and supplies a first biasing force directed toward the intermediate supporter in the first direction to the first moving member. The second elastic member is provided between the intermediate supporter and the second supporter, and supplies a second biasing force, which is directed toward the intermediate supporter in the first direction and opposite to the direction in which the first biasing force is directed, to the second moving member.

10. 发明公开

US20240091958A1 HAND MECHANISM 审中-公开
公开(公告)号：US20240091958A1
公开(公告)日：2024-03-21
申请号：US18275307
申请日：2022-01-21
申请人： THK CO., LTD.
发明人： Yoshimasa Endo , Toshiya Watanabe , Min Bao
IPC分类号： B25J15/00 , B25J15/06
CPC分类号： B25J15/0009 , B25J15/0625 , B25J15/0666 , B25J15/0683 , B25J5/007
摘要： A hand mechanism (2) comprises a plurality of finger units. Each of the plurality finger units is equipped with a first finger link unit (211) including a fingertip, a first joint unit (22) provided at an end portion on a finger base side of the first finger link unit (211), a second finger link unit (212) connected to the first finger link unit (211) via the first joint unit (22), and a second joint unit (23) provided at an end portion on a finger base side of the second finger link unit (212). A suction mechanism (600) is provided on at least one predetermined finger unit of the plurality of finger units (21). The suction mechanism (600) is provided on a dorsal surface (216) of the first finger link unit (211) in a predetermined finger, and suctions and retains a target object by generating negative pressure.

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