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    • 1. 再颁专利
    • Process for silver plating in printed circuit board manufacture
    • 印刷电路板制造中的镀银工艺
    • USRE45279E1
    • 2014-12-09
    • US13471203
    • 2012-05-14
    • Andrew McIntosh SoutarPeter Thomas McGrath
    • Andrew McIntosh SoutarPeter Thomas McGrath
    • C25D3/46C25D5/02
    • H05K3/244C23C18/42
    • In PCB manufacture, the pads and/or through-holes of a bare board are protected prior to mounting of other components by a silver plating process. The silver plate is applied from a plating composition by a replacement process in which silver ions oxidized copper and deposit a layer of silver at the surface. In the aqueous plating composition the silver ions are maintained in solution by the incorporation of a multidentate complexing agent. The compositions may contain a silver tarnish inhibitor and are free of reducing agent capable of reducing silver ions to silver metal, halide ions and substantially free of non-aqueous solvent. Surface mounted components can be soldered direct to the silver coated contact using any commercially available solder. Silver does not deposit onto solder mask, but only onto metal which is less electropositive than silver.REEXAMINATION RESULTSThe questions raised in reexamination proceedings Nos. 90/012,336 and 90/009,934, filed Jun. 4, 2012 and Aug. 3, 2011 respectively, have been considered, and the results thereof are reflected in this reissue patent which constitutes the reexamination certificate required by 35 U.S.C. 307 as provided in 37 CFR 1.570(e) for ex parte reexaminations, and/or the reexamination certificate required by 35 U.S.C. 316 as provided in 37 CFR 1.997(e) for inter partes reexaminations.
    • 在PCB制造中,裸板的焊盘和/或通孔在通过镀银工艺安装其它部件之前得到保护。 通过银离子氧化铜并在表面沉积一层银的替换过程,由镀覆组合物施加银板。 在水性电镀组合物中,通过掺入多齿络合剂将银离子保持在溶液中。 组合物可以含有银晦暗抑制剂,并且不含能够将银离子还原成银金属,卤离子并基本上不含非水溶剂的还原剂。 表面安装的部件可以使用任何市售的焊料直接焊接到镀银触点。 银不会沉积在焊料掩模上,而只能沉积在比银正电的金属上。 重审结果2012年6月4日和2011年8月3日提交的复审程序第90 / 012,336号和第90 / 009,934号提出的问题已经被考虑,其结果反映在构成复审的重新发行专利中 35USC要求的证书 根据37 CFR 1.570(e)规定,单方面复审,和/或35 U.S.C.所要求的复审证书。 按照第37 CFR 1.997(e)条的规定进行跨部门重新审查。
    • 7. 发明授权
    • Solder alloy
    • 焊锡合金
    • US08641964B2
    • 2014-02-04
    • US12036497
    • 2008-02-25
    • Brian G. LewisBawa SinghJohn LaughlinRanjit Pandher
    • Brian G. LewisBawa SinghJohn LaughlinRanjit Pandher
    • C22C13/00C22C13/02
    • C22C13/00
    • An alloy suitable for use in a ball grid array or chip scale package comprising from 0.05-1.5 wt. % copper, from 0.1-2 wt. % silver, from 0.005-0.3 wt % nickel, from 0.003-0.3 wt % chromium, from 0-0.1 wt. % phosphorus, from 0-0.1 wt. % germanium, from 0-0.1 wt. % gallium, from 0-0.3 wt. % of one or more rare earth elements, from 0-0.3 wt. % indium, from 0-0.3 wt. % magnesium, from 0-0.3 wt. % calcium, from 0-0.3 wt. % silicon, from 0-0.3 wt. % aluminum, from 0-0.3 wt. % zinc, from 0-2 wt. % bismuth, from 0-1 wt. % antimony, from 0-0.2 wt % manganese, from 0-0.3 wt % cobalt, from 0-0.3 wt % iron, and from 0-0.1 wt % zirconium, and the balance tin, together with unavoidable impurities.
    • 适用于球栅阵列或芯片级封装的合金,其包含0.05-1.5wt。 %铜,0.1-2重量% %银,0.005-0.3重量%镍,0.003-0.3重量%铬,0-0.1重量% %磷,0-0.1重量% %锗,0-0.1重量% %镓,0-0.3重量% %的一种或多种稀土元素,0-0.3wt。 %铟,0-0.3重量% %镁,0-0.3重量% %钙,0-0.3重量% %硅,0-0.3重量% %铝,0-0.3重量% %锌,0-2重量% %铋,0-1重量% %的锑,0-0.2重量%的锰,0-0.3重量%的钴,0-0.3重量%的铁和0-0.1重量%的锆,余量为的锡以及不可避免的杂质。