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1. 发明申请

US20090207399A1 Lithographic method 审中-公开
标题翻译：平版印刷法
公开(公告)号：US20090207399A1
公开(公告)日：2009-08-20
申请号：US12318035
申请日：2008-12-19
申请人： Alex F. Fong , Henricus Wilhelmus Maria Van Buel , Joseph J. Consolini , Michael Josephus Evert Van De Moosdijk , Michael Charles Robles
发明人： Alex F. Fong , Henricus Wilhelmus Maria Van Buel , Joseph J. Consolini , Michael Josephus Evert Van De Moosdijk , Michael Charles Robles
IPC分类号： G03B27/58 , G01B11/00
CPC分类号： G03F9/7011 , B01J21/04 , G03F9/7019 , G03F9/7084 , G03F9/7088
摘要： A method of calibrating a front to backside alignment capable lithographic apparatus. The method includes attaching a substrate having a plurality of alignment marks to a carrier, the substrate being arranged such that the alignment marks face towards the carrier; reducing the thickness of the substrate; using an alignment system of the apparatus to measure the positions of images of alignment marks formed by optics in a substrate table of the apparatus; projecting a pattern onto the substrate, the position of the pattern being determined according to the measured positions of the alignment marks; measuring the positions of the projected pattern and the alignment marks provided on the opposite side of the substrate, the position of the alignment marks provided on the opposite side of the substrate being measured by the alignment system directing radiation through the substrate; and comparing the measured positions in order to determine an overlay error.
摘要翻译：校准从前到后对准的光刻设备的方法。所述方法包括将具有多个对准标记的基板附接到载体上，所述基板布置成使得所述对准标记朝向所述载体; 减小基板的厚度; 使用所述装置的对准系统来测量由所述装置的衬底台中的光学元件形成的对准标记的图像的位置; 将图案投影到基板上，根据对准标记的测量位置确定图案的位置; 测量投影图案的位置和设置在基板的相对侧上的对准标记，设置在基板的相对侧上的对准标记的位置由通过基板引导辐射的对准系统测量; 并比较测量位置以确定重叠误差。

2. 发明申请

US20090190106A1 IMMERSION LITHOGRAPHY APPARATUS 审中-公开
标题翻译：倾斜平面设备
公开(公告)号：US20090190106A1
公开(公告)日：2009-07-30
申请号：US12358931
申请日：2009-01-23
申请人： Harry SEWELL , Louis John Markoya
发明人： Harry SEWELL , Louis John Markoya
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed having a projection system, a liquid supply system, and a recycling system. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, wherein a substrate table is configured to support the substrate. The liquid supply system is configured to provide an immersion liquid to a space between the projection system and the substrate or the substrate table. The recycling system is configured to collect the immersion liquid from the liquid supply system and to supply the immersion liquid to the liquid supply system. The recycling system includes a fiber configured to remove organic contaminants from the immersion liquid.
摘要翻译：公开了一种具有投影系统，液体供应系统和再循环系统的浸没式光刻设备。投影系统被配置为将图案化的辐射束投影到基板的目标部分上，其中衬底台被配置为支撑衬底。液体供应系统被配置为向投影系统和衬底或衬底台之间的空间提供浸没液体。回收系统被配置为从液体供应系统收集浸没液体并将浸没液体供应到液体供应系统。回收系统包括被配置为从浸没液中除去有机污染物的纤维。

3. 发明申请

US20080273180A1 Lithographic apparatus 有权
标题翻译：平版印刷设备
公开(公告)号：US20080273180A1
公开(公告)日：2008-11-06
申请号：US11797649
申请日：2007-05-04
申请人： Stephen Roux
发明人： Stephen Roux
IPC分类号： G03B27/42
CPC分类号： G03F7/70891 , G03F7/70308
摘要： A projection system suitable for use in a lithographic apparatus, the projection system including a transmissive optical element and a thermal profile corrector configured to change a thermal profile of the transmissive optical element, the thermal profile corrector including a transfer member and a thermal profile conditioner, the transfer member being moveable into and out of proximity with the transmissive optical element to transfer a desired thermal profile from the thermal profile conditioner into the transmissive optical element.
摘要翻译：一种适用于光刻设备的投影系统，所述投影系统包括透射光学元件和配置为改变所述透射光学元件的热分布的热分布校正器，所述热分布校正器包括转印部件和热分布调节器，所述传送构件可移动到与所述透射光学元件接近和离开的位置，以将期望的热剖面从所述热剖面调节器转移到所述透射光学元件中。

4. 发明申请

US20060126036A1 Uniformity correction for lithographic apparatus 失效
标题翻译：光刻设备的均匀性校正
公开(公告)号：US20060126036A1
公开(公告)日：2006-06-15
申请号：US11007580
申请日：2004-12-09
申请人： Alexander Kremer , Marcel Mathijs Marie Dierichs , Erik Loopstra
发明人： Alexander Kremer , Marcel Mathijs Marie Dierichs , Erik Loopstra
IPC分类号： G03B27/52
CPC分类号： G03F7/70083 , G03F7/70066 , G03F7/70558
摘要： A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, including a plurality of movable blades arranged along each long side of the illumination slit and a chamber containing a fluid wherein said movable blades are at least partly immersed in said fluid, and wherein the difference between the refractive index of each blade and the refractive index of said fluid is sufficiently small to prevent significant reflection and refraction at the surface of each blade.
摘要翻译：一种用于改善具有两个长边和两个短边的矩形照明狭缝中的辐射分布的均匀性的均匀性校正模块，包括沿着照明狭缝的每个长边布置的多个可动刀片和包含流体的腔室，其中所述可移动叶片至少部分地浸没在所述流体中，并且其中每个叶片的折射率与所述流体的折射率之间的差异足够小以防止在每个叶片的表面处的显着的反射和折射。

5. 发明授权

US08629970B2 Immersion lithographic apparatus with immersion fluid re-circulating system 失效
标题翻译：浸没式光刻设备带浸液再循环系统
公开(公告)号：US08629970B2
公开(公告)日：2014-01-14
申请号：US12355039
申请日：2009-01-16
申请人： Harry Sewell , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Louis John Markoya , Diane McCafferty
发明人： Harry Sewell , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Louis John Markoya , Diane McCafferty
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G03F7/70341
摘要： A lithographic apparatus includes a projection system, a fluid handling structure, a metrology device, and a recycling control device. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, the substrate being supported on a substrate table. The fluid handling structure is configured to provide an immersion fluid to a space between the projection system and the substrate and/or substrate table. The metrology device is configured to monitor a parameter of the immersion fluid. The recycling control device regulates a routing of the immersion fluid either to be reused by the fluid handling structure or to be reconditioned based on the quality of immersion fluid indicated by the metrology device.
摘要翻译：光刻设备包括投影系统，流体处理结构，计量装置和再循环控制装置。投影系统被配置为将图案化的辐射束投影到基板的目标部分上，该基板被支撑在基板台上。流体处理结构被配置为向投影系统和衬底和/或衬底台之间的空间提供浸没流体。测量装置被配置为监测浸没流体的参数。回收控制装置调节浸没流体的路线，以便由流体处理结构重新使用，或者基于由计量装置指示的浸入流体的质量进行再修复。

6. 发明授权

US08451422B2 Re-flow and buffer system for immersion lithography 有权
标题翻译：用于浸没光刻的再流和缓冲系统
公开(公告)号：US08451422B2
公开(公告)日：2013-05-28
申请号：US12388900
申请日：2009-02-19
申请人： Harry Sewell , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Louis John Markoya , Diane McCafferty , Ralph Joseph Meijers
发明人： Harry Sewell , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Louis John Markoya , Diane McCafferty , Ralph Joseph Meijers
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G01F1/662 , G01F1/667 , G01N1/2226 , G03F7/70341 , G03F7/70858
摘要： A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further, there is disclosed a system for measuring flow rate and/or vapor concentration of a gas using a transducer to send and/or receive an acoustic signal.
摘要翻译：公开了一种从外部环境中分离浸入式光刻设备的环境室的系统，其中包含液体的浸没流体。此外，公开了一种用于使用换能器测量气体的流速和/或蒸汽浓度以发送和/或接收声信号的系统。

7. 发明申请

US20110310367A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
公开(公告)号：US20110310367A1
公开(公告)日：2011-12-22
申请号：US13223952
申请日：2011-09-01
申请人： Nicolaas Rudolf KEMPER , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
发明人： Nicolaas Rudolf KEMPER , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

8. 发明授权

US07869003B2 Lithographic apparatus and device manufacturing method with reticle gripper 有权
标题翻译：平版印刷设备及装置制造方法
公开(公告)号：US07869003B2
公开(公告)日：2011-01-11
申请号：US11484855
申请日：2006-07-12
申请人： Matthew J. Van Doren , Jonathan H. Feroce
发明人： Matthew J. Van Doren , Jonathan H. Feroce
IPC分类号： G03B27/62
CPC分类号： G03F7/70741 , G03F7/70783
摘要： A reticle gripper to hold a reticle of a lithographic apparatus is presented. The reticle gripper includes three gripper structures to contact the surface of the reticle. Each of the three gripper structures determines a position with respect to the reticle gripper of one of the points on the surface of the reticle.
摘要翻译：提出了一种用于保持光刻设备的掩模版的掩模版夹具。光罩夹持器包括三个夹具结构，以接触掩模版的表面。三个夹具结构中的每一个确定相对于掩模版的表面上的一个点的光罩夹持器的位置。

9. 发明申请

US20080192214A1 Lithographic apparatus, a dryer and a method of removing liquid from a surface 有权
标题翻译：平版印刷设备，干燥器和从表面除去液体的方法
公开(公告)号：US20080192214A1
公开(公告)日：2008-08-14
申请号：US11984825
申请日：2007-11-21
申请人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Harry Sewell , Louis John Markoya , Marcus Martinus Petrus Adrianus Vermeulen , Diane Czop McCafferty
发明人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Harry Sewell , Louis John Markoya , Marcus Martinus Petrus Adrianus Vermeulen , Diane Czop McCafferty
IPC分类号： G03B27/52 , F26B3/00
CPC分类号： G03F7/70341
摘要： Lithographic Apparatus, a Dryer and a Method of Removing Liquid from a Surface A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.
摘要翻译：平版印刷设备，干燥器和从表面去除液体的方法公开了一种干燥和/或润湿表面（例如基底的顶表面）的新方法，其可用于浸没式光刻。将表面放置在单相萃取器下方，并将启动液体在单相萃取器和表面之间输送。单相萃取器只有在单相萃取器和表面之间提供了引发液体后才被激活。在整个干燥和/或润湿过程中，引发液体被输送到单相萃取器。

10. 发明申请

US20110194094A1 LITHOGRAPHIC APPARATUS WITH SUPPORT FOR AN OBJECT AND METHOD FOR POSITIONING SAME 有权
标题翻译：支持对象的定位装置和定位方法
公开(公告)号：US20110194094A1
公开(公告)日：2011-08-11
申请号：US13022247
申请日：2011-02-07
申请人： Enrico ZORDAN
发明人： Enrico ZORDAN
IPC分类号： G03B27/58
CPC分类号： G03B27/58 , G03F7/707
摘要： A support structure for positioning an exchangeable object in a lithographic apparatus. The support structure has a chuck to support and clamp the object and an actuating structure. The actuating structure may have a first actuating structure (e.g., spring) and a second actuating structure (e.g., linear actuator). The first actuating structure is moveable relative to the chuck and is configured to move the second actuating structure between a first position in contact with a side of the object and a second position out of contact with the side of the object. The second actuating structure is configured to move at least a portion thereof relative to the first actuating structure between a first position in contact with the side of the object and a second position out of contact with the side of the object and to apply a pushing force to the side of the object.
摘要翻译：用于将可更换物体定位在光刻设备中的支撑结构。支撑结构具有卡盘以支撑和夹持物体和致动结构。致动结构可以具有第一致动结构（例如，弹簧）和第二致动结构（例如，线性致动器）。第一致动结构可相对于卡盘移动，并且构造成使第二致动结构在与物体的一侧接触的第一位置和与物体的侧面不接触的第二位置之间移动。第二致动结构构造成在与物体的侧面接触的第一位置和与物体的侧面不接触的第二位置之间相对于第一致动结构移动其至少一部分，并施加推力到对象的一边。

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