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1. 发明授权

US08817226B2 Systems and methods for insitu lens cleaning using ozone in immersion lithography 有权
标题翻译：在浸没式光刻中使用臭氧进行透镜清洁的系统和方法
公开(公告)号：US08817226B2
公开(公告)日：2014-08-26
申请号：US12128035
申请日：2008-05-28
申请人： Harry Sewell , Louis John Markoya
发明人： Harry Sewell , Louis John Markoya
IPC分类号： G03B27/52 , G03B27/54 , G03B27/32 , G03B27/58 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/70925 , G03F7/70983
摘要： An immersion lithography apparatus is provided that includes an energy source, a projection optical system, a stage, a showerhead including an immersion liquid supply device and an immersion liquid discharge device that produces a flow of liquid within an exposure zone, and a cleaning device that cleans a portion of the projection optical system having been contacted with the immersion liquid by means of a cleaning gas. In an embodiment, the cleaning device includes an ozone generation unit produces a flow of ozone into the exposure zone. In embodiments, the apparatus includes a stage that includes a dose sensor and/or an ultra-violet light source. A method for insitu cleaning of a final lens element within an immersion lithography system having an immersion fluid showerhead that provides immersion fluid to an exposure zone of the immersion lithography system is also provided.
摘要翻译：提供了一种浸没式光刻设备，其包括能量源，投影光学系统，平台，包括浸没液体供应装置的喷头和在曝光区域内产生液体流的浸没液体排出装置，以及清洁装置，通过清洁气体清洁已经与浸没液接触的投影光学系统的一部分。在一个实施例中，清洁装置包括臭氧产生单元产生臭氧流入曝光区域。在实施例中，该装置包括包括剂量传感器和/或紫外光源的平台。还提供了一种用于在浸没式光刻系统内对最终透镜元件进行真空清洁的方法，其具有向浸没式光刻系统的曝光区域提供浸没流体的浸没式液体喷头。

2. 发明授权

US07995185B2 Systems and methods for thermally-induced aberration correction in immersion lithography 有权
标题翻译：浸没光刻中热致像差校正的系统和方法
公开(公告)号：US07995185B2
公开(公告)日：2011-08-09
申请号：US11634924
申请日：2006-12-07
申请人： Harry Sewell , Louis John Markoya , Diane Czop McCafferty
发明人： Harry Sewell , Louis John Markoya , Diane Czop McCafferty
IPC分类号： G03B27/52
CPC分类号： G03B27/72 , G03F7/70258 , G03F7/70341 , G03F7/7085 , G03F7/70858
摘要： Immersion lithography aberration control systems and methods that compensate for a heating effect of exposure energy in an immersion fluid across an exposure zone are provided. An aberration control system includes actuators that adjust optical elements within the immersion lithography system and a fluid heating compensation module coupled to the actuators. The fluid heating adjustment module determines actuator commands to make aberration adjustments to optical elements within the immersion lithography system based on changes in one or more of a flow rate of the immersion liquid, an exposure dose and a reticle pattern image. In an embodiment, the aberration control system includes an interferometric sensor that pre-calibrates aberrations based on changes in operating characteristics related to the immersion fluid. Methods are provided that calibrate aberrations, determine actuator adjustments and implement actuator adjustments upon changes in operating characteristics to control aberration effects.
摘要翻译：提供了浸没光刻像差控制系统和补偿曝光区域中浸没流体中曝光能量的加热效应的方法。像差控制系统包括调节浸没式光刻系统内的光学元件的致动器和耦合到致动器的流体加热补偿模块。流体加热调节模块基于浸入液体的流速，曝光剂量和掩模版图案图像中的一个或多个的变化来确定致动器命令以对浸没式光刻系统内的光学元件进行像差调整。在一个实施例中，像差控制系统包括干涉测量传感器，其基于与浸没流体相关的操作特性的变化来预校准像差。提供校准像差的方法，确定致动器调节并且在操作特性的变化中实施致动器调节以控制像差效应。

3. 发明申请

US20090109411A1 Systems and Methods for Insitu Lens Cleaning Using Ozone in Immersion Lithography 有权
标题翻译：在沉浸光刻中使用臭氧进行透镜清洁的系统和方法
公开(公告)号：US20090109411A1
公开(公告)日：2009-04-30
申请号：US12128035
申请日：2008-05-28
申请人： Harry Sewell , Louis John Markoya
发明人： Harry Sewell , Louis John Markoya
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/70925 , G03F7/70983
摘要： An immersion lithography apparatus is provided that includes an energy source, a projection optical system, a stage, a showerhead including an immersion liquid supply device and an immersion liquid discharge device that produces a flow of liquid within an exposure zone, and a cleaning device that cleans a portion of the projection optical system having been contacted with the immersion liquid by means of a cleaning gas. In an embodiment, the cleaning device includes an ozone generation unit produces a flow of ozone into the exposure zone. In embodiments, the apparatus includes a stage that includes a dose sensor and/or an ultra-violet light source. A method for insitu cleaning of a final lens element within an immersion lithography system having an immersion fluid showerhead that provides immersion fluid to an exposure zone of the immersion lithography system is also provided.
摘要翻译：提供了一种浸没式光刻设备，其包括能量源，投影光学系统，平台，包括浸没液体供应装置的喷头和在曝光区域内产生液体流的浸没液体排出装置，以及清洁装置，通过清洁气体清洁已经与浸没液接触的投影光学系统的一部分。在一个实施例中，清洁装置包括臭氧产生单元产生臭氧流入曝光区域。在实施例中，该装置包括包括剂量传感器和/或紫外光源的平台。还提供了一种用于在浸没式光刻系统内对最终透镜元件进行真空清洁的方法，其具有向浸没式光刻系统的曝光区域提供浸没流体的浸没式液体喷头。

4. 发明授权

US08629970B2 Immersion lithographic apparatus with immersion fluid re-circulating system 失效
标题翻译：浸没式光刻设备带浸液再循环系统
公开(公告)号：US08629970B2
公开(公告)日：2014-01-14
申请号：US12355039
申请日：2009-01-16
申请人： Harry Sewell , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Louis John Markoya , Diane McCafferty
发明人： Harry Sewell , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Louis John Markoya , Diane McCafferty
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G03F7/70341
摘要： A lithographic apparatus includes a projection system, a fluid handling structure, a metrology device, and a recycling control device. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, the substrate being supported on a substrate table. The fluid handling structure is configured to provide an immersion fluid to a space between the projection system and the substrate and/or substrate table. The metrology device is configured to monitor a parameter of the immersion fluid. The recycling control device regulates a routing of the immersion fluid either to be reused by the fluid handling structure or to be reconditioned based on the quality of immersion fluid indicated by the metrology device.
摘要翻译：光刻设备包括投影系统，流体处理结构，计量装置和再循环控制装置。投影系统被配置为将图案化的辐射束投影到基板的目标部分上，该基板被支撑在基板台上。流体处理结构被配置为向投影系统和衬底和/或衬底台之间的空间提供浸没流体。测量装置被配置为监测浸没流体的参数。回收控制装置调节浸没流体的路线，以便由流体处理结构重新使用，或者基于由计量装置指示的浸入流体的质量进行再修复。

5. 发明授权

US08451422B2 Re-flow and buffer system for immersion lithography 有权
标题翻译：用于浸没光刻的再流和缓冲系统
公开(公告)号：US08451422B2
公开(公告)日：2013-05-28
申请号：US12388900
申请日：2009-02-19
申请人： Harry Sewell , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Louis John Markoya , Diane McCafferty , Ralph Joseph Meijers
发明人： Harry Sewell , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Louis John Markoya , Diane McCafferty , Ralph Joseph Meijers
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G01F1/662 , G01F1/667 , G01N1/2226 , G03F7/70341 , G03F7/70858
摘要： A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further, there is disclosed a system for measuring flow rate and/or vapor concentration of a gas using a transducer to send and/or receive an acoustic signal.
摘要翻译：公开了一种从外部环境中分离浸入式光刻设备的环境室的系统，其中包含液体的浸没流体。此外，公开了一种用于使用换能器测量气体的流速和/或蒸汽浓度以发送和/或接收声信号的系统。

6. 发明申请

US20080192214A1 Lithographic apparatus, a dryer and a method of removing liquid from a surface 有权
标题翻译：平版印刷设备，干燥器和从表面除去液体的方法
公开(公告)号：US20080192214A1
公开(公告)日：2008-08-14
申请号：US11984825
申请日：2007-11-21
申请人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Harry Sewell , Louis John Markoya , Marcus Martinus Petrus Adrianus Vermeulen , Diane Czop McCafferty
发明人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Harry Sewell , Louis John Markoya , Marcus Martinus Petrus Adrianus Vermeulen , Diane Czop McCafferty
IPC分类号： G03B27/52 , F26B3/00
CPC分类号： G03F7/70341
摘要： Lithographic Apparatus, a Dryer and a Method of Removing Liquid from a Surface A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.
摘要翻译：平版印刷设备，干燥器和从表面去除液体的方法公开了一种干燥和/或润湿表面（例如基底的顶表面）的新方法，其可用于浸没式光刻。将表面放置在单相萃取器下方，并将启动液体在单相萃取器和表面之间输送。单相萃取器只有在单相萃取器和表面之间提供了引发液体后才被激活。在整个干燥和/或润湿过程中，引发液体被输送到单相萃取器。

7. 发明申请

US20080129973A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20080129973A1
公开(公告)日：2008-06-05
申请号：US11607100
申请日：2006-12-01
申请人： Diane McCafferty , Harry Sewell , Louis John Markoya
发明人： Diane McCafferty , Harry Sewell , Louis John Markoya
IPC分类号： G03B27/52
CPC分类号： G03F7/70408
摘要： A lithographic apparatus is presented. The lithographic apparatus includes a beam splitter configured to split a radiation beam into a plurality of radiation beams; a substrate stage configured to support a substrate; a beam combiner adapted to redirect and combine at least a portion of the plurality of radiation beams to form an interference pattern on the substrate; and a control unit in communication with the substrate stage and a radiation source configured to output the beam of radiation, the control unit configured to synchronize a motion of the substrate stage with a repetition rate at which the beam of radiation is output by the radiation source.
摘要翻译：介绍了一种光刻设备。光刻设备包括分束器，其配置成将辐射束分裂成多个辐射束; 衬底台，被配置为支撑衬底; 光束组合器，其适于重定向和组合所述多个辐射束的至少一部分以在所述衬底上形成干涉图案; 以及与所述衬底台连通的控制单元和被配置为输出所述辐射束的辐射源，所述控制单元被配置为使所述衬底台的运动与所述辐射源输出的所述辐射束的重复频率同步。

8. 发明申请

US20100214544A1 FLUID HANDLING DEVICE, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：流体处理装置，静态平铺装置和装置制造方法
公开(公告)号：US20100214544A1
公开(公告)日：2010-08-26
申请号：US12711825
申请日：2010-02-24
申请人： Harry Sewell , Sjoerd Nicolaas lambertus Donders , Louis John Markoya , Diane McCafferty , Ralph Joseph Meijers
发明人： Harry Sewell , Sjoerd Nicolaas lambertus Donders , Louis John Markoya , Diane McCafferty , Ralph Joseph Meijers
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70341
摘要： A fluid handling device for an immersion lithographic apparatus, the fluid handling device comprising: at least one body with a surface facing a space for fluid; a plurality of openings for the flow of fluid therethrough defined in the surface; at least one barrier moveable relative to the plurality of openings for selectively allowing or preventing the flow of fluid through selected openings of the plurality of openings.
摘要翻译：一种用于浸没式光刻设备的流体处理装置，所述流体处理装置包括：至少一个具有面向流体空间的表面的主体; 用于在表面中限定的流体流动的多个开口; 至少一个屏障可相对于多个开口移动，用于选择性地允许或防止流体流过多个开口中的选定开口。

9. 发明申请

US20090213343A1 RE-FLOW AND BUFFER SYSTEM FOR IMMERSION LITHOGRAPHY 有权
标题翻译：再流动和缓冲系统
公开(公告)号：US20090213343A1
公开(公告)日：2009-08-27
申请号：US12388900
申请日：2009-02-19
申请人： Harry Sewell , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Louis John Markoya , Diane McCafferty , Ralph Joseph Meijers
发明人： Harry Sewell , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Louis John Markoya , Diane McCafferty , Ralph Joseph Meijers
IPC分类号： G03B27/52 , G01N7/00
CPC分类号： G03B27/52 , G01F1/662 , G01F1/667 , G01N1/2226 , G03F7/70341 , G03F7/70858
摘要： A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further, there is disclosed a system for measuring flow rate and/or vapor concentration of a gas using a transducer to send and/or receive an acoustic signal.
摘要翻译：公开了一种从外部环境中分离浸入式光刻设备的环境室的系统，其中包含液体的浸没流体。此外，公开了一种用于使用换能器测量气体的流速和/或蒸汽浓度以发送和/或接收声信号的系统。

10. 发明申请

US20090185149A1 IMMERSION LITHOGRAPHIC APPARATUS WITH IMMERSION FLUID RE-CIRCULATING SYSTEM 失效
标题翻译：静态流体再循环系统的立式设备
公开(公告)号：US20090185149A1
公开(公告)日：2009-07-23
申请号：US12355039
申请日：2009-01-16
申请人： Harry SEWELL , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Louis John Markoya , Diane McCafferty
发明人： Harry SEWELL , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Louis John Markoya , Diane McCafferty
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70341
摘要： A lithographic apparatus includes a projection system, a fluid handling structure, a metrology device, and a recycling control device. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, the substrate being supported on a substrate table. The fluid handling structure is configured to provide an immersion fluid to a space between the projection system and the substrate and/or substrate table. The metrology device is configured to monitor a parameter of the immersion fluid. The recycling control device regulates a routing of the immersion fluid either to be reused by the fluid handling structure or to be reconditioned based on the quality of immersion fluid indicated by the metrology device.
摘要翻译：光刻设备包括投影系统，流体处理结构，计量装置和再循环控制装置。投影系统被配置为将图案化的辐射束投影到基板的目标部分上，该基板被支撑在基板台上。流体处理结构被配置为向投影系统和衬底和/或衬底台之间的空间提供浸没流体。测量装置被配置为监测浸没流体的参数。回收控制装置调节浸没流体的路线，以便由流体处理结构重新使用，或者基于由计量装置指示的浸入流体的质量进行再修复。

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