专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20130004736A1 METHOD OF PROTECTING PATTERNED MAGNETIC MATERIALS OF A STACK 审中-公开
标题翻译：保护堆叠图案的磁性材料的方法
公开(公告)号：US20130004736A1
公开(公告)日：2013-01-03
申请号：US13173564
申请日：2011-06-30
申请人： Zhaohui Fan , Yuan Xu , Justin Jia-Jen Hwu , Koichi Wago , David Shiao-Min Kuo
发明人： Zhaohui Fan , Yuan Xu , Justin Jia-Jen Hwu , Koichi Wago , David Shiao-Min Kuo
IPC分类号： B32B3/00 , C23C16/56 , C23C16/00
CPC分类号： G11B5/8408 , C23C16/45525 , C23C16/513 , G11B5/855 , H01F41/32 , Y10T428/24802
摘要： The embodiments disclose a method of protecting patterned magnetic materials of a stack, including depositing a thin continuous film of an inert material that is inert to the magnetic materials of a patterned stack upon which the thin continuous film is being deposited and forming a thin interim interface layer from the thin continuous film to protect top and sidewall areas of non-etched higher relief magnetic islands and magnetic film etched surfaces of the patterned stack from air exposure damage and damage from contact with backfilled materials.
摘要翻译：这些实施方案公开了一种保护叠层的图案化磁性材料的方法，包括沉积惰性材料的薄连续薄膜，惰性材料对图案化叠层的磁性材料是惰性的，薄膜连续薄膜将沉积在其上并形成薄的临时界面层，以保护未蚀刻的更高的浮雕磁岛的顶部和侧壁区域以及图案化叠层的磁性膜蚀刻表面从空气暴露损坏和与回填材料接触的损坏。

2. 发明申请

US20130070370A1 Planarization Method for Media 有权
标题翻译：媒体平面化方法
公开(公告)号：US20130070370A1
公开(公告)日：2013-03-21
申请号：US13618691
申请日：2012-09-14
申请人： Yuan Xu , Wei Hu , Justin Jia-Jen Hwu , Gene Gauzner , Koichi Wago , David Shiao-Min Kuo
发明人： Yuan Xu , Wei Hu , Justin Jia-Jen Hwu , Gene Gauzner , Koichi Wago , David Shiao-Min Kuo
IPC分类号： G11B5/74
CPC分类号： G11B5/743 , B44D3/18
摘要： A planarization process may planarize a media disk that has data trenches between data features and larger servo trenches between servo features. A filler material layer is deposited on the media disk and provides step coverage of the trenches. The filler material has data recesses over the data trenches and servo recesses over the servo trenches that must be removed to produce a planar media surface. A first planarization process is used to remove the data recesses and a second planarization process is used to remove the servo recesses.
摘要翻译：平坦化处理可以平坦化在伺服特征之间具有数据特征和较大伺服沟槽之间的数据沟槽的介质盘。填充材料层沉积在介质盘上并提供沟槽的台阶覆盖。填充材料在伺服沟槽上的数据沟槽和伺服凹槽上具有必须被移除以产生平面介质表面的数据凹槽。使用第一平面化处理来去除数据凹槽，并且使用第二平面化处理来去除伺服凹部。

3. 发明授权

US08946835B2 Magnetic device with different planarization areas 有权
标题翻译：具有不同平面化区域的磁性装置
公开(公告)号：US08946835B2
公开(公告)日：2015-02-03
申请号：US13618691
申请日：2012-09-14
申请人： Yuan Xu , Wei Hu , Justin Jia-Jen Hwu , Gene Gauzner , Koichi Wago , David Shiao-Min Kuo
发明人： Yuan Xu , Wei Hu , Justin Jia-Jen Hwu , Gene Gauzner , Koichi Wago , David Shiao-Min Kuo
IPC分类号： H01L29/82
CPC分类号： G11B5/743 , B44D3/18
摘要： A planarization process may planarize a media disk that has data trenches between data features and larger servo trenches between servo features. A filler material layer is deposited on the media disk and provides step coverage of the trenches. The filler material has data recesses over the data trenches and servo recesses over the servo trenches that must be removed to produce a planar media surface. A first planarization process is used to remove the data recesses and a second planarization process is used to remove the servo recesses.
摘要翻译：平坦化处理可以平坦化在伺服特征之间具有数据特征和较大伺服沟槽之间的数据沟槽的介质盘。填充材料层沉积在介质盘上并提供沟槽的台阶覆盖。填充材料在伺服沟槽上的数据沟槽和伺服凹槽上具有必须被移除以产生平面介质表面的数据凹槽。使用第一平面化处理来去除数据凹槽，并且使用第二平面化处理来去除伺服凹部。

4. 发明申请

US20120080402A1 PLANARIZATION METHOD FOR MEDIA 有权
标题翻译：媒体平面化方法
公开(公告)号：US20120080402A1
公开(公告)日：2012-04-05
申请号：US12895630
申请日：2010-09-30
申请人： Yuan Xu , Wei Hu , Justin Jia-Jen Hwu , Gene Gauzner , Koichi Wago , David Shiao-Min Kuo
发明人： Yuan Xu , Wei Hu , Justin Jia-Jen Hwu , Gene Gauzner , Koichi Wago , David Shiao-Min Kuo
IPC分类号： B44C1/22
CPC分类号： G11B5/743 , B44D3/18
摘要： A planarization process may planarize a media disk that has data trenches between data features and larger servo trenches between servo features. A filler material layer is deposited on the media disk and provides step coverage of the trenches. The filler material has data recesses over the data trenches and servo recesses over the servo trenches that must be removed to produce a planar media surface. A first planarization process is used to remove the data recesses and a second planarization process is used to remove the servo recesses.
摘要翻译：平坦化处理可以平坦化在伺服特征之间具有数据特征和较大伺服沟槽之间的数据沟槽的介质盘。填充材料层沉积在介质盘上并提供沟槽的台阶覆盖。填充材料在伺服沟槽上的数据沟槽和伺服凹槽上具有必须被移除以产生平面介质表面的数据凹槽。使用第一平面化处理来去除数据凹槽，并且使用第二平面化处理来去除伺服凹部。

5. 发明授权

US08308964B2 Planarization method for media 有权
标题翻译：媒体平面化方法
公开(公告)号：US08308964B2
公开(公告)日：2012-11-13
申请号：US12895630
申请日：2010-09-30
申请人： Yuan Xu , Wei Hu , Justin Jia-Jen Hwu , Gene Gauzner , Koichi Wago , David Shiao-Min Kuo
发明人： Yuan Xu , Wei Hu , Justin Jia-Jen Hwu , Gene Gauzner , Koichi Wago , David Shiao-Min Kuo
IPC分类号： B44C1/22
CPC分类号： G11B5/743 , B44D3/18
摘要： A planarization process may planarize a media disk that has data trenches between data features and larger servo trenches between servo features. A filler material layer is deposited on the media disk and provides step coverage of the trenches. The filler material has data recesses over the data trenches and servo recesses over the servo trenches that must be removed to produce a planar media surface. A first planarization process is used to remove the data recesses and a second planarization process is used to remove the servo recesses.
摘要翻译：平坦化处理可以平坦化在伺服特征之间具有数据特征和较大伺服沟槽之间的数据沟槽的介质盘。填充材料层沉积在介质盘上并提供沟槽的台阶覆盖。填充材料在伺服沟槽上的数据沟槽和伺服凹槽上具有必须被移除以产生平面介质表面的数据凹槽。使用第一平面化处理来去除数据凹槽，并且使用第二平面化处理来去除伺服凹部。

6. 发明申请

US20120196094A1 HYBRID-GUIDED BLOCK COPOLYMER ASSEMBLY 审中-公开
标题翻译：混合型嵌段共聚物组件
公开(公告)号：US20120196094A1
公开(公告)日：2012-08-02
申请号：US13018416
申请日：2011-01-31
申请人： Yuan Xu , Kim Lee , Wei Hu , Koichi Wago , David Shiao-Min Kuo
发明人： Yuan Xu , Kim Lee , Wei Hu , Koichi Wago , David Shiao-Min Kuo
IPC分类号： B32B3/00 , B05D1/36 , B05D3/06 , B05D3/12 , B05D3/00 , B05D3/10
CPC分类号： G11B5/84 , G11B5/746 , G11B5/855 , Y10T428/24479 , Y10T428/24802
摘要： A method for nano-patterning includes imprinting features in a resist with an imprint mold to form one or more topographic surface patterns on the imprinted resist. A a block copolymer (“BCP”) material is deposited on the imprinted resist, wherein a molecular dimension L0 of the BCP material correlates by an integer multiple to a spacing dimension of the one or more topographic surface patterns on the imprinted resist. The deposited BCP is annealed and at least a portion of the annealed BCP is removed, forming a template having discrete domains.
摘要翻译：纳米图案的方法包括在抗蚀剂中用压印模具压印特征以在印刷抗蚀剂上形成一个或多个形貌表面图案。在压印抗蚀剂上沉积嵌段共聚物（“BCP”）材料，其中BCP材料的分子尺寸L0与印迹抗蚀剂上的一个或多个形貌表面图案的间隔尺寸相乘一整数倍。将沉积的BCP退火，并且去除退火的BCP的至少一部分，形成具有离散区域的模板。

7. 发明授权

US06949199B1 Heat-transfer-stamp process for thermal imprint lithography 失效
标题翻译：用于热压印光刻的热转印印刷工艺
公开(公告)号：US06949199B1
公开(公告)日：2005-09-27
申请号：US10087846
申请日：2002-03-05
申请人： Gennady Gauzner , Koichi Wago , David Shiao-Min Kuo
发明人： Gennady Gauzner , Koichi Wago , David Shiao-Min Kuo
IPC分类号： B29C59/00 , B81C1/00 , B82B3/00 , G03F7/00 , G11B5/596 , G11B5/82
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G11B5/59633 , G11B5/743 , G11B5/82 , Y10S977/887
摘要： A method of performing thermal imprint lithography of a surface of a thermoplastic layer-coated workpiece for forming a pattern therein comprises pre-heating the workpiece to a pre-selected high temperature prior to inserting the workpiece in a stamping/imprinting tool maintained at a predetermined lower temperature, whereby the interval for thermal cycling of the stamping/imprinting tool between higher and lower temperatures is eliminated or at least reduced. Applications of the method include forming servo patterns in disk-shaped substrates for hard disk recording media.
摘要翻译：对在其中形成图案的热塑性层涂覆的工件的表面进行热压印光刻的方法包括在将工件插入保持在预定的压印/压印工具之前将工件预加热到预选的高温较低的温度，从而消除或至少减少了冲压/压印工具在较高和较低温度之间的热循环间隔。该方法的应用包括在用于硬盘记录介质的盘形基底中形成伺服图案。

8. 发明授权

US06853514B2 Method for measuring PES noise of servo patterned media 失效
标题翻译：测量伺服图案介质的PES噪声的方法
公开(公告)号：US06853514B2
公开(公告)日：2005-02-08
申请号：US10167561
申请日：2002-06-11
申请人： Xinwei Li , Koichi Wago , David Shiao-Min Kuo
发明人： Xinwei Li , Koichi Wago , David Shiao-Min Kuo
IPC分类号： G11B5/596
CPC分类号： G11B5/59633 , G11B5/59611
摘要： A method for measuring servo pattern irregularity and other servo information of pre-patterned servo media mounted on a spindle with the center of the pre-pattern tracks off center from the axis rotation of the spindle. An actuator is stepped radially while measuring the PES signals from the servo sectors of at least one highly eccentric track to form a cross track profile of the PES signals for each sector. A mathematical algorithm removes step measurement error from the data. A second mathematical algorithm removes non-repeatable random noise from the data. The amount of phase-in that radially aligns the respective cross track profiles is computed. Servo pattern written-in repeatable runout is determined by unwrapping the phase-in values to form a periodic curve.
摘要翻译：一种用于测量安装在主轴上的预先图案化伺服介质的伺服模式不规则性和其他伺服信息的方法，其中预模式轨迹的中心偏离主轴的轴线旋转的中心。在测量来自至少一个高偏心轨道的伺服扇区的PES信号的同时，致动器是径向的，以形成每个扇区的PES信号的交叉轨道轮廓。数学算法从数据中删除步长测量误差。第二个数学算法从数据中去除不可重复的随机噪声。计算径向对准各自的横向轨道轮廓的相位的量。通过展开相位值以形成周期性曲线来确定写入可重复跳动的伺服模式。

9. 发明授权

US06753130B1 Resist removal from patterned recording media 有权
标题翻译：阻挡图案化记录介质的去除
公开(公告)号：US06753130B1
公开(公告)日：2004-06-22
申请号：US10047105
申请日：2002-01-17
申请人： Jianwei Liu , David Shiao-Min Kuo , Li-Ping Wang
发明人： Jianwei Liu , David Shiao-Min Kuo , Li-Ping Wang
IPC分类号： G03F700
CPC分类号： B82Y10/00 , G03F7/427 , G11B5/74 , G11B5/743 , G11B5/82 , G11B5/8404
摘要： A method for patterning a carbon-containing substrate utilizing a patterned layer of a resist material as a mask and then safely removing the mask from the substrate without adversely affecting the substrate, comprising sequential steps of: (a) providing a substrate including a surface comprising carbon; (b) forming a thin metal layer on the substrate surface; (c) forming a layer of a resist material on the thin metal layer; (d) patterning the layer of resist material; (e) patterning the substrate utilizing the patterned layer of resist material as a pattern-defining mask; and (f) removing the mask utilizing the thin metal layer as a wet strippable layer or a plasma etch/ash stop layer.
摘要翻译：一种利用抗蚀剂材料的图案化层作为掩模来图案化含碳衬底的方法，然后从衬底安全地除去掩模而不会不利地影响衬底，包括以下顺序的步骤：（a）提供包括表面的衬底，包括：碳;（b）在所述基板表面上形成薄金属层;（c）在所述薄金属层上形成抗蚀剂材料层;（d）图案化所述抗蚀剂材料层;（e）抗蚀剂材料层作为图案定义掩模; 和（f）使用薄金属层作为湿剥离层或等离子体蚀刻/灰停止层去除掩模。

10. 发明授权

US06665077B1 Method and apparatus for enhanced sensitivity fly height testing and measurement 失效
标题翻译：增强灵敏度飞高测试和测量的方法和装置
公开(公告)号：US06665077B1
公开(公告)日：2003-12-16
申请号：US09884929
申请日：2001-06-21
申请人： Michael Joseph Stirniman , David Shiao-Min Kuo , Thomas Roy Pitchford
发明人： Michael Joseph Stirniman , David Shiao-Min Kuo , Thomas Roy Pitchford
IPC分类号： G01B1102
CPC分类号： G11B5/6005 , G01B11/026 , G11B5/00 , G11B2005/001
摘要： A method and apparatus for performing interferometric measurement/testing of flying heights of read-write head sliders utilizing an improved rotating disk, the disk having a central opening for use with a spindle for rotation about a central axis, the disk comprising: a substrate comprised of a light transmissive material and including a pair of opposed, smooth, major surfaces; and a wear-resistant, protective overcoat layer on one of the major surfaces for improving the tribological properties thereof; wherein the optical properties of the one surface of the disk are optimized for enhancing the sensitivity of the interferometric measurement/testing by increasing the intensity of reflected light received by a detector of the apparatus.
摘要翻译：一种用于利用改进的旋转盘对读写头滑块的飞行高度进行干涉测量/测试的方法和装置，所述盘具有用于与中心轴线一起旋转的心轴的中心开口，所述盘包括：衬底，的透光材料并且包括一对相对的，平滑的主表面; 在其中一个主表面上具有耐磨保护外涂层，用于改善其摩擦学性能;其中盘的一个表面的光学性质被优化，以通过增加反射的强度来提高干涉测量/测试的灵敏度由装置的检测器接收的光。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式