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1. 发明授权

US07996193B2 Method for reducing model order exploiting sparsity in electronic design automation and analysis 失效
标题翻译：减少采用电子设计自动化和分析中稀疏性的模型顺序的方法
公开(公告)号：US07996193B2
公开(公告)日：2011-08-09
申请号：US12106948
申请日：2008-04-21
申请人： Zuochang Ye , Zhenhai Zhu , Joel Phillips
发明人： Zuochang Ye , Zhenhai Zhu , Joel Phillips
IPC分类号： G06F7/60
CPC分类号： G06F17/5036
摘要： A method for reducing the order of system models exploiting sparsity is disclosed. According to one embodiment, a computer-implemented method receives a system model having a first system order. The system model contains a plurality of system nodes, a plurality of system matrices. The system nodes are reordered and a reduced order system is constructed by a matrix decomposition (e.g., Cholesky or LU decomposition) on an expansion frequency without calculating a projection matrix. The reduced order system model has a lower system order than the original system model.
摘要翻译：公开了一种降低利用稀疏性的系统模型的顺序的方法。根据一个实施例，计算机实现的方法接收具有第一系统顺序的系统模型。系统模型包含多个系统节点，多个系统矩阵。系统节点被重新排序，并且通过在扩展频率上的矩阵分解（例如，Cholesky或LU分解）来构造缩减顺序系统，而不计算投影矩阵。降序系统模型具有比原始系统模型更低的系统顺序。

2. 发明申请

US20090265150A1 METHOD FOR REDUCING MODEL ORDER EXPLOITING SPARSITY 失效
标题翻译：减少模型命令开发空间的方法
公开(公告)号：US20090265150A1
公开(公告)日：2009-10-22
申请号：US12106948
申请日：2008-04-21
申请人： ZUOCHANG YE , Zhenhai Zhu , Joel Phillips
发明人： ZUOCHANG YE , Zhenhai Zhu , Joel Phillips
IPC分类号： G06F7/60
CPC分类号： G06F17/5036
摘要： A method for reducing the order of system models exploiting sparsity is disclosed. According to one embodiment, a computer-implemented method receives a system model having a first system order. The system model contains a plurality of system nodes, a plurality of system matrices. The system nodes are reordered and a reduced order system is constructed by a matrix decomposition (e.g., Cholesky or LU decomposition) on an expansion frequency without calculating a projection matrix. The reduced order system model has a lower system order than the original system model.
摘要翻译：公开了一种降低利用稀疏性的系统模型的顺序的方法。根据一个实施例，计算机实现的方法接收具有第一系统顺序的系统模型。系统模型包含多个系统节点，多个系统矩阵。系统节点被重新排序，并且通过在扩展频率上的矩阵分解（例如，Cholesky或LU分解）来构造缩减顺序系统，而不计算投影矩阵。降序系统模型具有比原始系统模型更低的系统顺序。

3. 发明授权

US07853910B1 Parasitic effects analysis of circuit structures 有权
标题翻译：电路结构的寄生效应分析
公开(公告)号：US07853910B1
公开(公告)日：2010-12-14
申请号：US11963523
申请日：2007-12-21
申请人： Zhenhai Zhu , Joel Phillips , Zuo-Chang Ye
发明人： Zhenhai Zhu , Joel Phillips , Zuo-Chang Ye
IPC分类号： G06F17/50
CPC分类号： G06F17/5081
摘要： Method, system, and computer program product for analyzing circuit structures for parasitic effects are provided. Data from a previous parasitic effect analysis of a circuit structure is used to perform parasitic effect analysis on another circuit structure even when the circuit structures are not identical, provided the circuit structures are similar.
摘要翻译：提供了用于分析寄生效应电路结构的方法，系统和计算机程序产品。使用电路结构的先前寄生效应分析的数据用于对另一电路结构进行寄生效应分析，即使电路结构不相同，只要电路结构相似即可。

4. 发明申请

US20100169060A1 METHOD, SYSTEM, AND COMPUTER PROGRAM PRODCUT FOR LITHOGRAPHY SIMULATION IN ELECTRONIC DESIGN AUTOMATION 有权
标题翻译：电子设计自动化中的图形仿真的方法，系统和计算机程序
公开(公告)号：US20100169060A1
公开(公告)日：2010-07-01
申请号：US12347926
申请日：2008-12-31
申请人： Zhenhai Zhu
发明人： Zhenhai Zhu
IPC分类号： G06F17/10 , G06F17/50
CPC分类号： G03F7/705
摘要： Disclosed are improved methods, systems, and computer program products for lithographic simulation of an electronic circuit design. Various embodiments of the present invention identifies a mask pattern, performs offline precharacterization for the mask pattern by solving an equation which models a solution for the mask pattern and an interaction between the mask pattern and one or more effects, performs online evaluation based at least upon a parameterized form of the equation, determines a field around the mask pattern based at least upon the act of performing the online evaluation, and stores a result of the act of determining an electromagnetic field around the mask pattern in a tangible computer readable or usable medium
摘要翻译：公开了用于电子电路设计的光刻仿真的改进的方法，系统和计算机程序产品。本发明的各种实施例识别掩模图案，通过求解用于掩模图案的解的模型和掩模图案与一个或多个效果之间的相互作用的等式来对掩模图案执行离线预特性，至少基于方程式的参数化形式至少基于执行在线评估的动作来确定掩模图案周围的场，并且将在屏蔽图案周围确定电磁场的动作的结果存储在有形计算机可读或可用介质中

5. 发明授权

US08209161B2 Method, system, and computer program product for lithography simulation in electronic design automation 有权
标题翻译：电子设计自动化中光刻仿真的方法，系统和计算机程序产品
公开(公告)号：US08209161B2
公开(公告)日：2012-06-26
申请号：US12347926
申请日：2008-12-31
申请人： Zhenhai Zhu
发明人： Zhenhai Zhu
IPC分类号： G06F17/50
CPC分类号： G03F7/705
摘要： Disclosed are improved methods, systems, and computer program products for lithographic simulation of an electronic circuit design. Various embodiments of the present invention identifies a mask pattern, performs offline precharacterization for the mask pattern by solving an equation which models a solution for the mask pattern and an interaction between the mask pattern and one or more effects, performs online evaluation based at least upon a parameterized form of the equation, determines a field around the mask pattern based at least upon the act of performing the online evaluation, and stores a result of the act of determining an electromagnetic field around the mask pattern in a tangible computer readable or usable medium
摘要翻译：公开了用于电子电路设计的光刻仿真的改进的方法，系统和计算机程序产品。本发明的各种实施例识别掩模图案，通过求解用于掩模图案的解的模型和掩模图案与一个或多个效果之间的相互作用的等式来对掩模图案执行离线预特性，至少基于方程式的参数化形式至少基于执行在线评估的动作来确定掩模图案周围的场，并且将在屏蔽图案周围确定电磁场的动作的结果存储在有形计算机可读或可用介质中

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