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1. 发明授权

US09034248B2 Ni-based superalloy, and turbine rotor and stator blades for gas turbine using the same 有权
标题翻译：镍基超级合金，以及使用其的燃气轮机的涡轮转子和定子叶片
公开(公告)号：US09034248B2
公开(公告)日：2015-05-19
申请号：US13335020
申请日：2011-12-22
申请人： Yuting Wang , Akira Yoshinari
发明人： Yuting Wang , Akira Yoshinari
IPC分类号： C22C19/05 , C22C30/00 , F01D5/28 , C22C1/02 , C22F1/10
CPC分类号： F01D5/28 , C22C1/023 , C22C19/056 , C22F1/10 , F05D2300/175
摘要： An object of the present invention is to provide a Ni-based superalloy, especially for a conventional casting, having a good balance among high temperature strength, corrosion resistance and oxidation resistance, as compared to a conventional material. The Ni-based superalloy comprises Cr, Co, Al, Ti, Ta, W, Mo, Nb, C, B, and inevitable impurities, the balance being Ni, the Ni-based superalloy having a superalloy composition comprising, by mass, 13.1 to 16.0% Cr, 11.1 to 20.0% Co, 2.30 to 3.30% Al, 4.55 to 6.00% Ti, 2.50 to 3.50% Ta, 4.00 to 5.50% W, 0.10 to 1.20% Mo, 0.10 to 0.90% Nb, 0.05 to 0.20% C, and 0.005 to 0.02% B.
摘要翻译：本发明的目的是提供一种与常规材料相比具有高温强度，耐腐蚀性和耐氧化性之间良好平衡的常规铸造的Ni基超级合金。所述Ni基超合金包含Cr，Co，Al，Ti，Ta，W，Mo，Nb，C，B和不可避免的杂质，余量为Ni，具有超合金组成的Ni系超合金，至16.0％的Cr，11.1〜20.0％的Co，2.30〜3.30％的Al，4.55〜6.00％的Ti，2.50〜3.50％的Ta，4.00〜5.50％的W，0.10〜1.20的Mo，0.10〜0.90的Nb，0.05〜0.20 ％C，0.005〜0.02％B

2. 发明授权

US08916092B2 Ni-based alloy, and turbine rotor and stator blade for gas turbine 有权
标题翻译：镍基合金，以及用于燃气轮机的涡轮转子和定子叶片
公开(公告)号：US08916092B2
公开(公告)日：2014-12-23
申请号：US13489481
申请日：2012-06-06
申请人： Yuting Wang , Akira Yoshinari
发明人： Yuting Wang , Akira Yoshinari
IPC分类号： C22C19/05 , F01D5/14 , F01D9/02 , F01D9/04 , F01D5/28 , C22F1/10
CPC分类号： F01D9/041 , C22C19/056 , C22F1/10 , F01D5/28
摘要： A Ni-based alloy including chromium, cobalt, aluminum, titanium, tantalum, tungsten, molybdenum, niobium, carbon, and boron, the balance being nickel and incidental impurities, is provided. The alloy has an alloy composition of, on the basis of mass percent, chromium: 13.10% to 16.00%, cobalt: 8.00% to 12.50%, aluminum: 2.30% to 3.50%, titanium: 4.80% to 5.50%, tantalum: 0.40% to less than 1.00%, tungsten: 4.50% to 6.00%, molybdenum: 0.10% to 1.50%, niobium: 0.60% to 1.70%, carbon: 0.01% to 0.20%, boron: 0.005% to 0.02%, and the balance: nickel and incidental impurities.
摘要翻译：提供了包括铬，钴，铝，钛，钽，钨，钼，铌，碳和硼的Ni基合金，其余为镍和附带的杂质。该合金的合金组成为：质量％：13.10％〜16.00％，钴：8.00％〜12.50％，铝：2.30％〜3.50％，钛：4.80％〜5.50％，钽：0.40 ％至小于1.00％，钨：4.50％至6.00％，钼：0.10％至1.50％，铌：0.60％至1.70％，碳：0.01％至0.20％，硼：0.005％至0.02％，余量：镍和杂质。

3. 发明申请

US20120308393A1 NI-BASED ALLOY, AND GAS TURBINE ROTOR BLADE AND STATOR BLADE EACH USING SAME 有权
标题翻译：基于NI的合金和燃气轮机叶片和使用相同的定子叶片
公开(公告)号：US20120308393A1
公开(公告)日：2012-12-06
申请号：US13579642
申请日：2011-03-16
申请人： Yuting Wang , Akira Yoshinari
发明人： Yuting Wang , Akira Yoshinari
IPC分类号： C22C19/05 , F01D5/14
CPC分类号： C22C19/056 , C22F1/10
摘要： This invention provides an Ni-based alloy, which is particularly used for standard casting and is provided with properties such as strength at high temperatures, corrosion resistivity, and oxidation resistivity in a more balanced manner, compared with existing materials. The Ni-based alloy comprises Cr, Co, Al, Ti, Ta, W, Mo, Nb, C, B, and unavoidable impurities, with the balance consisting of Ni. Composition of the alloy is represented by mass: 13.1% to 15.0% Cr, 1.0% to 15.0% Co, 2.3% to 3.3% Al, 4.55% to 6.0% Ti, 3.05% to 4.0% Ta, 4.35% to 4.9% W, 0.1% to 2.0% Mo, 0.05% to 0.5% Nb, less than 0.05% Zr, 0.05% to 0.2% C, and 0.01% to 0.03% B.
摘要翻译：本发明提供了一种Ni基合金，其特别用于标准铸造，并且与现有材料相比，以更均衡的方式提供诸如高温强度，耐腐蚀性和氧化电阻率的性能。 Ni基合金包含Cr，Co，Al，Ti，Ta，W，Mo，Nb，C，B和不可避免的杂质，余量由Ni组成。合金组成以质量计：13.1％至15.0％的Cr，1.0％至15.0％的Co，2.3％至3.3％的Al，4.55％至6.0％的Ti，3.05％至4.0％的Ta，4.35％至4.9％的W ，0.1〜2.0％的Mo，0.05〜0.5％的Nb，小于0.05％的Zr，0.05〜0.2％的C，和0.01〜0.03％的B.

4. 发明授权

US09353427B2 Ni-based alloy, and gas turbine rotor blade and stator blade each using same 有权
标题翻译： Ni基合金，以及各自使用的燃气轮机转子叶片和定子叶片
公开(公告)号：US09353427B2
公开(公告)日：2016-05-31
申请号：US13579642
申请日：2011-03-16
申请人： Yuting Wang , Akira Yoshinari
发明人： Yuting Wang , Akira Yoshinari
IPC分类号： C22C19/05 , C22F1/10
CPC分类号： C22C19/056 , C22F1/10
摘要： This invention provides an Ni-based alloy, which is particularly used for standard casting and is provided with properties such as strength at high temperatures, corrosion resistivity, and oxidation resistivity in a more balanced manner, compared with existing materials. The Ni-based alloy comprises Cr, Co, Al, Ti, Ta, W, Mo, Nb, C, B, and unavoidable impurities, with the balance consisting of Ni. Composition of the alloy is represented by mass: 13.1% to 15.0% Cr, 1.0% to 15.0% Co, 2.3% to 3.3% Al, 4.55% to 6.0% Ti, 3.05% to 4.0% Ta, 4.35% to 4.9% W, 0.1% to 2.0% Mo, 0.05% to 0.5% Nb, less than 0.05% Zr, 0.05% to 0.2% C, and 0.01% to 0.03% B.
摘要翻译：本发明提供了一种Ni基合金，其特别用于标准铸造，并且与现有材料相比，以更均衡的方式提供诸如高温强度，耐腐蚀性和氧化电阻率的性能。 Ni基合金包含Cr，Co，Al，Ti，Ta，W，Mo，Nb，C，B和不可避免的杂质，余量由Ni组成。合金组成以质量计：13.1％至15.0％的Cr，1.0％至15.0％的Co，2.3％至3.3％的Al，4.55％至6.0％的Ti，3.05％至4.0％的Ta，4.35％至4.9％的W ，0.1〜2.0％的Mo，0.05〜0.5％的Nb，小于0.05％的Zr，0.05〜0.2％的C，和0.01〜0.03％的B.

5. 发明申请

US20160027975A1 PHOTON EXTRACTION FROM ULTRAVIOLET LIGHT-EMITTING DEVICES 有权
标题翻译：超紫外线发光装置的光子提取
公开(公告)号：US20160027975A1
公开(公告)日：2016-01-28
申请号：US14806761
申请日：2015-07-23
申请人： Ken Kitamura , Masato Toita , Hironori Ishii , Yuting Wang , Leo J. Schowalter , Jianfeng Chen , James R. Grandusky
发明人： Ken Kitamura , Masato Toita , Hironori Ishii , Yuting Wang , Leo J. Schowalter , Jianfeng Chen , James R. Grandusky
IPC分类号： H01L33/56 , H01L33/58
CPC分类号： H01L33/56 , H01L33/54 , H01L33/58 , H01L2933/005 , H01L2933/0058
摘要： In various embodiments, a layer of organic encapsulant is provided over a surface of an ultraviolet (UV) light-emitting semiconductor die, and at least a portion of the encapsulant is exposed to UV light to convert at least some of said portion of the encapsulant into non-stoichiometric silica material. The non-stoichiometric silica material includes silicon, oxygen, and carbon, and a carbon content of the non-stoichiometric silica material is greater than 1 ppm and less than 40 atomic percent.
摘要翻译：在各种实施例中，在紫外（UV）发光半导体管芯的表面上提供有机密封剂层，并且将至少一部分密封剂暴露于UV光以将至少一部分密封剂成为非化学计量的二氧化硅材料。非化学计量的二氧化硅材料包括硅，氧和碳，非化学计量的二氧化硅材料的碳含量大于1ppm且小于40原子％。

6. 发明申请

US20170087262A1 ULTRAVIOLET LIGHT-EMITTING DEVICES AND METHODS 审中-公开
公开(公告)号：US20170087262A1
公开(公告)日：2017-03-30
申请号：US15373175
申请日：2016-12-08
申请人： Masato Toita , Jianfeng Chen , Yuxin Li , Yuting Wang , Hironori Ishii , Ken Kitamura
发明人： Masato Toita , Jianfeng Chen , Yuxin Li , Yuting Wang , Hironori Ishii , Ken Kitamura
IPC分类号： A61L2/10 , H01L33/54 , H01L33/60 , H01L33/58 , H01L33/56 , H01L33/62 , H01L33/48
CPC分类号： A61L2/10 , H01L33/44 , H01L33/483 , H01L33/486 , H01L33/54 , H01L33/56 , H01L33/58 , H01L33/60 , H01L33/62 , H01L2224/16145 , H01L2224/48091 , H01L2924/1815 , H01L2933/005 , H01L2933/0058 , H01L2933/0066 , H01L2924/00014
摘要： In various embodiments, an illumination device features an ultraviolet (UV) light-emitting device at least partially surrounded by an encapsulant. A barrier layer is disposed between the light-emitting device and the encapsulant and is configured to substantially prevent UV light emitted by the light-emitting device from entering the encapsulant.

7. 发明授权

US11515455B2 Photon extraction from ultraviolet light-emitting devices 有权
公开(公告)号：US11515455B2
公开(公告)日：2022-11-29
申请号：US17083580
申请日：2020-10-29
申请人： Ken Kitamura , Masato Toita , Hironori Ishii , Yuting Wang , Leo J. Schowalter , Jianfeng Chen , James R. Grandusky
发明人： Ken Kitamura , Masato Toita , Hironori Ishii , Yuting Wang , Leo J. Schowalter , Jianfeng Chen , James R. Grandusky
IPC分类号： H01L33/54 , H01L33/56 , H01L33/58
摘要： In various embodiments, a layer of organic encapsulant is provided over a surface of an ultraviolet (UV) light-emitting semiconductor die, and at least a portion of the encapsulant is exposed to UV light to convert at least some of said portion of the encapsulant into non-stoichiometric silica material. The non-stoichiometric silica material includes silicon, oxygen, and carbon, and a carbon content of the non-stoichiometric silica material is greater than 1 ppm and less than 40 atomic percent.

8. 发明授权

US10854797B2 Photon extraction from ultraviolet light-emitting devices 有权
公开(公告)号：US10854797B2
公开(公告)日：2020-12-01
申请号：US16421716
申请日：2019-05-24
申请人： Ken Kitamura , Masato Toita , Hironori Ishii , Yuting Wang , Leo J. Schowalter , Jianfeng Chen , James R. Grandusky
发明人： Ken Kitamura , Masato Toita , Hironori Ishii , Yuting Wang , Leo J. Schowalter , Jianfeng Chen , James R. Grandusky
IPC分类号： H01L33/56 , H01L33/58 , H01L33/54
摘要： In various embodiments, a layer of organic encapsulant is provided over a surface of an ultraviolet (UV) light-emitting semiconductor die, and at least a portion of the encapsulant is exposed to UV light to convert at least some of said portion of the encapsulant into non-stoichiometric silica material. The non-stoichiometric silica material includes silicon, oxygen, and carbon, and a carbon content of the non-stoichiometric silica material is greater than 1 ppm and less than 40 atomic percent.

9. 发明申请

US20160172553A1 ULTRAVOILET LIGHT-EMITTING DEVICES AND METHODS 有权
标题翻译： ULTRAVOILET发光设备和方法
公开(公告)号：US20160172553A1
公开(公告)日：2016-06-16
申请号：US15044577
申请日：2016-02-16
申请人： Masato Toita , Jianfeng Chen , Yuxin Li , Yuting Wang , Hironori Ishii , Ken Kitamura
发明人： Masato Toita , Jianfeng Chen , Yuxin Li , Yuting Wang , Hironori Ishii , Ken Kitamura
IPC分类号： H01L33/56 , H01L33/58
CPC分类号： A61L2/10 , H01L33/44 , H01L33/483 , H01L33/486 , H01L33/54 , H01L33/56 , H01L33/58 , H01L33/60 , H01L33/62 , H01L2224/16145 , H01L2224/48091 , H01L2924/1815 , H01L2933/005 , H01L2933/0058 , H01L2933/0066 , H01L2924/00014
摘要： In various embodiments, an illumination device features an ultraviolet (UV) light-emitting device at least partially surrounded by an encapsulant. A barrier layer is disposed between the light-emitting device and the encapsulant and is configured to substantially prevent UV light emitted by the light-emitting device from entering the encapsulant.
摘要翻译：在各种实施例中，照明装置具有至少部分地被密封剂包围的紫外（UV）发光装置。阻挡层设置在发光器件和密封剂之间，并且被配置为基本上防止由发光器件发射的UV光进入密封剂。

10. 发明授权

US10347805B2 Photon extraction from ultraviolet light-emitting devices 有权
公开(公告)号：US10347805B2
公开(公告)日：2019-07-09
申请号：US15898347
申请日：2018-02-16
申请人： Ken Kitamura , Masato Toita , Hironori Ishii , Yuting Wang , Leo J. Schowalter , Jianfeng Chen , James R. Grandusky
发明人： Ken Kitamura , Masato Toita , Hironori Ishii , Yuting Wang , Leo J. Schowalter , Jianfeng Chen , James R. Grandusky
IPC分类号： H01L33/56 , H01L33/54 , H01L33/58
摘要： In various embodiments, a layer of organic encapsulant is provided over a surface of an ultraviolet (UV) light-emitting semiconductor die, and at least a portion of the encapsulant is exposed to UV light to convert at least some of said portion of the encapsulant into non-stoichiometric silica material. The non-stoichiometric silica material includes silicon, oxygen, and carbon, and a carbon content of the non-stoichiometric silica material is greater than 1 ppm and less than 40 atomic percent.

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