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    • 1. 发明授权
    • Semiconductor device and its manufacture
    • 半导体器件及其制造
    • US06297119B1
    • 2001-10-02
    • US09369267
    • 1999-08-06
    • Yutaka TsutsuiMasaru Wakabayashi
    • Yutaka TsutsuiMasaru Wakabayashi
    • H01L218228
    • H01L21/8249H01L21/82285H01L27/0623
    • The present invention discloses a semiconductor device having a PNP bipolar transistor and an NPN bipolar transistor having excellent transistor characteristics formed on the same semiconductor substrate, and a method of manufacturing the semiconductor device. This semiconductor device is provided with a first n-type well and a second n-type well formed at substantially the same depths in a semiconductor substrate, an NPN bipolar transistor formed within the first n-type well which uses the n-type well as its collector, a p-type well formed within the second n-type well, and a PNP bipolar transistor formed within the p-type well which uses the p-type well as its collector.
    • 本发明公开了一种具有PNP双极型晶体管的半导体器件和在同一半导体衬底上形成的具有优良晶体管特性的NPN双极晶体管,以及制造半导体器件的方法。该半导体器件设置有第一n型阱和 在半导体衬底中基本上相同深度形成的第二n型阱,形成在第一n型阱内的NPN双极型晶体管,其使用n型阱作为其集电极,在第二n型阱内形成p型阱 以及在p型阱中形成的使用p型阱作为其集电极的PNP双极晶体管。