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    • 5. 发明授权
    • Slicing apparatus
    • 切片机
    • US06223638B1
    • 2001-05-01
    • US09417211
    • 1999-10-13
    • Takeshi Inao
    • Takeshi Inao
    • B26D100
    • B28D5/0064B23Q15/12B26D5/20B28D5/024Y10T83/04Y10T83/148Y10T83/175Y10T83/536
    • A slicing method and slicing apparatus eliminate occurrence of cracking and/or chipping of a to-be-machined object without reducing the processing speed thereof. To this end, the slicing method comprising cutting the to-be-machined object W by supporting the to-be-machined object W on a table 10 and causing this table 10 to travel in an x-axis direction while allowing a slicing blade 20 to rotate at a predetermined position. A sensor 12 detects a variable load F that the to-be-machined object receives during slicing and an actuator 11 operatively responds to receipt of a detection signal of the sensor 12. The actuator 11 forces the to-be-machined object W to deform in a direction which permits reduction of the aforesaid variable load F. The actuator is provided between the sensor 12 and table 10, or alternatively between the to-be-machined object W and sensor 12.
    • 切片方法和切片装置消除了被加工物体的龟裂和/或碎裂的发生,而不会降低其加工速度。 为此,切片方法包括通过将台面10上的待加工对象W支撑在桌子10上并使得台10沿X轴方向行进同时允许切片刀20来切割被加工物体W 以在预定位置旋转。 传感器12检测待切削物体在切片期间接收的可变载荷F,并且致动器11可操作地响应于接收传感器12的检测信号。致动器11迫使被加工物体W变形 在允许减小上述可变载荷F的方向上。致动器设置在传感器12和台10之间,或者备选地在被加工物体W和传感器12之间。
    • 7. 发明授权
    • Polishing apparatus
    • 抛光设备
    • US06887127B2
    • 2005-05-03
    • US10108417
    • 2002-03-29
    • Toru NishikawaTakeshi Inao
    • Toru NishikawaTakeshi Inao
    • B24B37/08B24B49/10B24B49/00
    • B24B37/08B24B49/10
    • A polishing apparatus is provided for accurately detecting the relative displacement between an upper wheel and a lower wheel and thus for reliably polishing workpieces to a desired thickness. The polishing apparatus includes an upper wheel for pressing at least one workpiece, a lower wheel for supporting the workpiece, non-contact-type displacement-detection device for detecting the relative displacement between the upper wheel and the lower wheel, and a reference table for providing a displacement-detection reference position. The non-contact-type displacement-detection device is joined to the upper wheel so as to move therewith. The reference table is disposed at a position opposing the displacement-detection device and also is integrally connected to the lower wheel.
    • 提供了一种用于精确地检测上轮和下轮之间的相对位移并因此可靠地将工件抛光到所需厚度的抛光装置。 抛光装置包括用于按压至少一个工件的上轮,用于支撑工件的下轮,用于检测上轮和下轮之间的相对位移的非接触型位移检测装置,以及用于 提供位移检测基准位置。 非接触型位移检测装置与上轮连接以与其一起移动。 参考台设置在与位移检测装置相对的位置处,并且一体地连接到下轮。
    • 9. 发明申请
    • Methods for measuring strength of film and determining quality of object having the film
    • 用于测量膜的强度并确定具有该膜的物体的质量的方法
    • US20050039534A1
    • 2005-02-24
    • US10891341
    • 2004-07-13
    • Yuichiro TokunagaTakeshi Inao
    • Yuichiro TokunagaTakeshi Inao
    • G01N29/04G01N19/04G01N29/06G01N29/11G01N29/27
    • G01N29/27G01N19/04G01N29/11G01N2291/0237G01N2291/02872G01N2291/0423G01N2291/044
    • A method for measuring a film strength of a film on an object. An incident angle of pressure waves with respect to an object to be measured, the object including a base coated with a film, is set for applying the pressure waves to the object. The incident angle is varied over a range including a critical angle θcr. The object generates surface waves, in response to the pressure waves, at and near the critical angle. In response to the surface waves, the object generates leaky waves, which are pressure waves caused by the surface waves. The intensity of pressure waves including reflected waves and leaky waves from the object are measured. A received intensity V0 at an incident angle where no leaky wave is generated, and the intensity difference VC between V0 and the received intensity at the critical angle θcr when the film strength is high are measured. An intensity difference VR between V0 and the received intensity when the intensity of the leaky waves remains unchanged, regardless of the changes in the incident angle, within the range where the leaky waves are generated, which indicates a low film strength, is also measured. Thus, the film strength is determined based on V0, VC, and VR.
    • 一种用于测量物体上的膜的膜强度的方法。 相对于被测定物体的压力波的入射角被设定为对被涂物施加压力波。 入射角度在包括临界角度的范围内变化。 该物体响应于压力波在临界角处和附近产生表面波。 响应于表面波,物体产生泄漏波,其是由表面波引起的压力波。 测量包括反射波和来自物体的泄漏波的压力波的强度。 测量不产生泄漏波的入射角的接收强度V0,以及膜强度高时V0与临界角的接收强度之间的强度差VC。 另外,也测量了在产生泄漏波的范围内,无论入射角的变化如何,泄漏波的强度保持不变的V0与接收强度之间的强度差VR。 因此,膜强度基于V0,VC和VR确定。