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1. 发明申请

US20080006527A1 Surface treatment apparatus for small object 有权
标题翻译：小物体表面处理装置
公开(公告)号：US20080006527A1
公开(公告)日：2008-01-10
申请号：US11808744
申请日：2007-06-12
申请人： Yutaka Sugiura , Tomoji Okuda , Hideki Nakada
发明人： Yutaka Sugiura , Tomoji Okuda , Hideki Nakada
IPC分类号： C25D17/16
CPC分类号： C25D17/22 , C25D21/10
摘要： A plating process apparatus (1) for small objects, including a treatment cell (2) formed by combining a base plate (23), a bottom plate (24), an electrode ring (21) and a cover (25) using bolts (26), energizes a plating solution within the treatment cell (2) while bringing the small objects (100) into contact with the electrode ring (21) and circulating the plating solution (4) from the inside of the treatment cell (2) to the outside thereof through a flow-out means by rotating the treatment cell (2) with a vertical rotation shaft (3), thereby plating the small objects (100). The apparatus (1) is characterized in that the flow-out means is a gap channel formed between adjacent sheet members (61) by sandwiching the sheet members (61), each having a dimension smaller than a minimum dimension of each small object (100), between the bottom plate (24) and the electrode ring (21) circumferentially at appropriate intervals.
摘要翻译：一种用于小物体的电镀处理装置（1），包括通过使用螺栓（...）组合基板（23），底板（24），电极环（21）和盖（25）而形成的处理电池（2） 26），同时使小物体（100）与电极环（21）接触并使电镀液（4）从处理电池（2）的内部循环到处理电池（2）的内部，从而使处理电池（2）内的电镀液通电，通过利用垂直旋转轴（3）旋转处理电池（2），通过流出装置的外部，从而电镀小物体（100）。所述装置（1）的特征在于，所述流出装置是通过夹着所述薄片构件（61）而形成在相邻薄片构件（61）之间的间隙通道，所述薄板构件（61）的尺寸小于每个小物体（100 ），以适当的间隔周向地位于底板（24）和电极环（21）之间。

2. 发明授权

US07837840B2 Surface treatment apparatus for small object 有权
标题翻译：小物体表面处理装置
公开(公告)号：US07837840B2
公开(公告)日：2010-11-23
申请号：US11808744
申请日：2007-06-12
申请人： Yutaka Sugiura , Tomoji Okuda , Hideki Nakada
发明人： Yutaka Sugiura , Tomoji Okuda , Hideki Nakada
IPC分类号： C25D17/00
CPC分类号： C25D17/22 , C25D21/10
摘要： A plating process apparatus (1) for small objects, including a treatment cell (2) formed by combining a base plate (23), a bottom plate (24), an electrode ring (21) and a cover (25) using bolts (26), energizes a plating solution within the treatment cell (2) while bringing the small objects (100) into contact with the electrode ring (21) and circulating the plating solution (4) from the inside of the treatment cell (2) to the outside thereof through a flow-out means by rotating the treatment cell (2) with a vertical rotation shaft (3), thereby plating the small objects (100). The apparatus (1) is characterized in that the flow-out means is a gap channel formed between adjacent sheet members (61) by sandwiching the sheet members (61), each having a dimension smaller than a minimum dimension of each small object (100), between the bottom plate (24) and the electrode ring (21) circumferentially at appropriate intervals.
摘要翻译：一种用于小物体的电镀处理装置（1），包括通过使用螺栓（...）组合基板（23），底板（24），电极环（21）和盖（25）而形成的处理电池（2） 26），同时使小物体（100）与电极环（21）接触并使电镀液（4）从处理电池（2）的内部循环到处理电池（2）的内部，从而使处理电池（2）内的电镀液通电，通过利用垂直旋转轴（3）旋转处理电池（2），通过流出装置的外部，从而电镀小物体（100）。所述装置（1）的特征在于，所述流出装置是通过夹着所述薄片构件（61）而形成在相邻薄片构件（61）之间的间隙通道，所述薄板构件（61）的尺寸小于每个小物体（100 ），以适当的间隔周向地位于底板（24）和电极环（21）之间。

3. 发明授权

US08877020B2 Electrolytic regeneration unit and electrolytic regeneration apparatus using same 有权
标题翻译：电解再生装置及使用其的电解再生装置
公开(公告)号：US08877020B2
公开(公告)日：2014-11-04
申请号：US13478873
申请日：2012-05-23
申请人： Hisamitsu Yamamoto , Masayuki Utsumi , Yoshikazu Saijo , Tomoji Okuda , Hiroki Omura
发明人： Hisamitsu Yamamoto , Masayuki Utsumi , Yoshikazu Saijo , Tomoji Okuda , Hiroki Omura
IPC分类号： C25B9/00 , C25B1/21 , C25B1/28
CPC分类号： C25B1/21 , C25B1/28 , C25B9/00
摘要： An anode pipe includes a main pipe portion and a secondary pipe portion. The anode pipe has an inner circumferential surface that functions as an anode. The main pipe portion has a first connection end portion and a second connection end portion. The main pipe portion forms a flow channel for a treatment liquid that continues from the first connection end portion to the second connection end portion. The secondary pipe portion extends in a tubular fashion from the intermediate section of the main pipe portion. The interior of the secondary pipe portion communicates with the flow channel inside the main pipe portion. The cathode is disposed at a distance from the inner circumferential surface of the anode pipe. The cathode extends from a cathode attachment end portion toward the main pipe portion inside the secondary pipe portion.
摘要翻译：阳极管包括主管部分和次管部分。阳极管具有用作阳极的内周面。主管部分具有第一连接端部和第二连接端部。主管部形成从第一连接端部向第二连接端部连续的处理液的流路。次管部分以管状方式从主管部分的中间部分延伸。第二管部的内部与主管部内部的流路连通。阴极配置在距离阳极管的内周面一定距离处。阴极从第二管部分的阴极附着端部向主管部延伸。

4. 发明申请

US20070108044A1 Plating tank 审中-公开
标题翻译：电镀槽
公开(公告)号：US20070108044A1
公开(公告)日：2007-05-17
申请号：US11595685
申请日：2006-11-08
申请人： Tomoji Okuda , Junji Mizumoto , Yutaka Kimura , Hiroki Omura
发明人： Tomoji Okuda , Junji Mizumoto , Yutaka Kimura , Hiroki Omura
IPC分类号： C25D17/00
CPC分类号： C25D17/008 , C25D17/06 , H05K3/241
摘要： Provides a plating tank that can transport platy work securely without causing abrasion and attain uniform plating quality and uniform plating film thickness. The shields are comprised of four shielding plates 108, 109, 112, and 113 on upper part and lower part of the thin plate board as follows. The restrict roller 304 is comprised of the roller stand body 120 which reaches until nearly upper end area's height of thin plate board and stood on upper face of the lower shielding plates 108, and the work-end deviation preventing member 122.
摘要翻译：提供电镀槽，可以稳定运输板状工件，不会造成磨损，电镀质量均匀，镀膜厚度均匀。屏蔽件由如下的薄板的上部和下部的四个屏蔽板108,109,112和113组成。限制辊304包括辊架主体120，其直到几乎上端区域的薄板板的高度并且站立在下屏蔽板108的上表面和工件端偏移防止构件122上。

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