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1. 发明授权

US07205557B2 Variable rectangle-type electron beam exposure apparatus and pattern exposure-formation method 失效
标题翻译：可变矩形电子束曝光装置和图案曝光形成方法
公开(公告)号：US07205557B2
公开(公告)日：2007-04-17
申请号：US11319205
申请日：2005-12-28
申请人： Masaaki Miyajima , Yutaka Nakamura , Hiromi Hoshino
发明人： Masaaki Miyajima , Yutaka Nakamura , Hiromi Hoshino
IPC分类号： H01L21/27
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G21K1/08 , H01J2237/31776
摘要： A variable rectangle-type electron beam exposure apparatus for forming rectangular beams of different angles which is capable of highly finely conducting exposure with respect to a predetermined fine line pattern having an arbitrary angle in the pattern region. The apparatus includes a first slit member (10) in which a plurality of rectangular apertures (11, 12) are respectively arranged by different angles; a second slit member (20) in which a plurality of rectangular apertures (21, 22) which are respectively positioned in parallel with the corresponding rectangular apertures of the first slit member, are arranged; and a deflecting unit (40) for deflecting an electron beam, which has been transmitted through a plurality of apertures of the first slit member, so that, when the electron beam transmitted through the first aperture of the first slit member is transmitted through the corresponding first aperture of the second slit member, the electron beam transmitted through the apertures except for the first aperture of the first slit can be intercepted by the second slit member.
摘要翻译：一种用于形成不同角度的矩形光束的可变矩形电子束曝光装置，其能够相对于图案区域中具有任意角度的预定细纹图案进行高度细微的曝光。该装置包括：第一狭缝构件（10），多个矩形孔（11,12）分别以不同的角度布置; 第二狭缝构件（20），其中分别与所述第一狭缝构件的相应矩形孔平行布置的多个矩形孔（21,22）布置; 以及偏转单元（40），用于偏转已经透过第一狭缝部件的多个孔的电子束，使得当透过第一狭缝部件的第一孔的电子束透过相应的第二狭缝部件的第一开口部分，通过第一狭缝的第一开口部分以外的孔径透过的电子束可被第二狭缝部件截取。

2. 发明申请

US20060169925A1 Variable rectangle-type electron beam exposure apparatus and pattern exposure-formation method 失效
标题翻译：可变矩形电子束曝光装置和图案曝光形成方法
公开(公告)号：US20060169925A1
公开(公告)日：2006-08-03
申请号：US11319205
申请日：2005-12-28
申请人： Masaaki Miyajima , Yutaka Nakamura , Hiromi Hoshino
发明人： Masaaki Miyajima , Yutaka Nakamura , Hiromi Hoshino
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G21K1/08 , H01J2237/31776
摘要： A variable rectangle-type electron beam exposure apparatus for forming rectangular beams of different angles which is capable of highly finely conducting exposure with respect to a predetermined fine line pattern having an arbitrary angle in the pattern region. The apparatus includes a first slit member (10) in which a plurality of rectangular apertures (11, 12) are respectively arranged by different angles; a second slit member (20) in which a plurality of rectangular apertures (21, 22) which are respectively positioned in parallel with the corresponding rectangular apertures of the first slit member, are arranged; and a deflecting unit (40) for deflecting an electron beam, which has been transmitted through a plurality of apertures of the first slit member, so that, when the electron beam transmitted through the first aperture of the first slit member is transmitted through the corresponding first aperture of the second slit member, the electron beam transmitted through the apertures except for the first aperture of the first slit can be intercepted by the second slit member.
摘要翻译：一种用于形成不同角度的矩形光束的可变矩形电子束曝光装置，其能够相对于图案区域中具有任意角度的预定细纹图案进行高度细微的曝光。该装置包括：第一狭缝构件（10），多个矩形孔（11,12）分别以不同的角度布置; 第二狭缝构件（20），其中分别与所述第一狭缝构件的相应矩形孔平行布置的多个矩形孔（21,22）布置; 以及偏转单元（40），用于偏转已经透过第一狭缝构件的多个孔的电子束，使得当透过第一狭缝构件的第一孔的电子束透过相应的第二狭缝部件的第一开口部分，通过第一狭缝的第一开口部分以外的孔径透过的电子束可被第二狭缝部件截取。

3. 发明申请

US20060076513A1 Variable rectangle-type electron beam exposure apparatus and pattern exposure-formation method 审中-公开
标题翻译：可变矩形电子束曝光装置和图案曝光形成方法
公开(公告)号：US20060076513A1
公开(公告)日：2006-04-13
申请号：US11055107
申请日：2005-02-11
申请人： Yutaka Nakamura , Masaaki Miyajima , Hiromi Hoshino
发明人： Yutaka Nakamura , Masaaki Miyajima , Hiromi Hoshino
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31776
摘要： A variable rectangle-type electron beam exposure apparatus for forming rectangular beams of different angles is provided which is capable of highly finely conducting exposure with respect to a predetermined fine line pattern having an arbitrary angle in the pattern region. The apparatus comprises: a first slit member (10) in which a plurality of rectangular apertures (11, 12) are respectively arranged by different angles; a second slit member (20) in which a plurality of rectangular apertures (21, 22) which are respectively positioned in parallel with the corresponding rectangular apertures of the first slit member, are arranged; and a deflecting unit (40) for deflecting an electron beam, which has been transmitted through a plurality of apertures of the first slit member, so that, when the electron beam transmitted through the first aperture of the first slit member is transmitted through the corresponding first aperture of the second slit member, the electron beam transmitted through the apertures except for the first aperture of the first slit can be intercepted by the second slit member.
摘要翻译：提供了用于形成不同角度的矩形束的可变矩形电子束曝光装置，其能够相对于图案区域中具有任意角度的预定细纹图案进行高度细微的曝光。该装置包括：第一狭缝构件（10），多个矩形孔（11,12）分别以不同的角度布置; 第二狭缝构件（20），其中分别与所述第一狭缝构件的相应矩形孔平行布置的多个矩形孔（21,22）布置; 以及偏转单元（40），用于偏转已经透过第一狭缝部件的多个孔的电子束，使得当透过第一狭缝部件的第一孔的电子束透过相应的第二狭缝部件的第一开口部分，通过第一狭缝的第一开口部分以外的孔径透过的电子束可被第二狭缝部件截取。

4. 发明授权

US08141009B2 Preparing data for hybrid exposure using both electron beam exposure and reticle exposure in lithographic process 有权
标题翻译：在光刻过程中使用电子束曝光和掩模版曝光准备数据进行混合曝光
公开(公告)号：US08141009B2
公开(公告)日：2012-03-20
申请号：US12398664
申请日：2009-03-05
申请人： Masaaki Miyajima , Hiromi Hoshino , Hiroshi Takita , Kozo Ogino
发明人： Masaaki Miyajima , Hiromi Hoshino , Hiroshi Takita , Kozo Ogino
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/68
摘要： A method for preparing data for exposure includes forming a first plurality of rectangular patterns from a reticle preparing rule; lining an object pattern for performing reticle exposure with the first rectangular patterns, and extracting a second plurality of rectangular patterns, disposed in an N×N matrix, from the first plurality of rectangular patterns in the object pattern; and performing a violation detecting treatment and a correcting treatment of the pattern width and the pattern distance of the reticle exposure pattern on the basis of the distance between the second plurality of rectangular patterns.
摘要翻译：一种用于制备用于曝光的数据的方法包括：从掩模版准备规则形成第一多个矩形图案; 利用所述第一矩形图案衬里进行掩模版曝光的物体图案，并从所述物体图案中的所述第一多个矩形图案提取以N×N矩阵设置的第二多个矩形图案; 并且基于第二多个矩形图案之间的距离执行违反检测处理和对掩模版曝光图案的图案宽度和图案距离的校正处理。

5. 发明申请

US20090239160A1 METHOD FOR PREPARING DATA FOR EXPOSURE AND METHOD FOR MANUFACTURING PHOTO MASK 有权
标题翻译：用于制备曝光数据的方法和制造照相胶片的方法
公开(公告)号：US20090239160A1
公开(公告)日：2009-09-24
申请号：US12398664
申请日：2009-03-05
申请人： Masaaki MIYAJIMA , Hiromi Hoshino , Hiroshi Takita , Kozo Ogino
发明人： Masaaki MIYAJIMA , Hiromi Hoshino , Hiroshi Takita , Kozo Ogino
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： G03F1/36 , G03F1/68
摘要： A method for preparing data for exposure includes forming a first plurality of rectangular patterns from a reticle preparing rule; lining an object pattern for performing reticle exposure with the first rectangular patterns, and extracting a second plurality of rectangular patterns, disposed in an N×N matrix, from the first plurality of rectangular patterns in the object pattern; and performing a violation detecting treatment and a correcting treatment of the pattern width and the pattern distance of the reticle exposure pattern on the basis of the distance between the second plurality of rectangular patterns.
摘要翻译：准备用于曝光的数据的方法包括从掩模版准备规则形成第一多个矩形图案; 利用所述第一矩形图案衬里进行掩模版曝光的物体图案，并从所述物体图案中的所述第一多个矩形图案提取设置在N×N矩阵中的第二多个矩形图案; 并且基于第二多个矩形图案之间的距离执行违反检测处理和对掩模版曝光图案的图案宽度和图案距离的校正处理。

6. 发明授权

US07623176B2 Meta-data display system, meta-data synthesis apparatus, video-signal recording/reproduction apparatus, imaging apparatus and meta-data display method 有权
标题翻译：元数据显示系统，元数据合成装置，视频信号记录/再现装置，成像装置和元数据显示方法
公开(公告)号：US07623176B2
公开(公告)日：2009-11-24
申请号：US10809476
申请日：2004-03-26
申请人： Hiromi Hoshino , Fumio Nakajima
发明人： Hiromi Hoshino , Fumio Nakajima
IPC分类号： H04N5/222
CPC分类号： G11B27/11 , G11B27/3045 , G11B27/3054 , G11B2220/90 , H04N5/222 , H04N5/23293 , H04N5/765 , H04N5/77 , H04N5/772 , H04N5/775 , H04N5/781 , H04N5/85 , H04N5/907 , H04N9/7921 , H04N9/8042 , H04N9/8047 , H04N9/8205
摘要： The present invention provides a meta-data display system capable of displaying meta data related to a shot video material along with the video material synchronously to the material. The meta-data display system includes an imaging apparatus for generating a video signal representing the video material. The meta-data display system also has a meta-data synthesis apparatus for extracting at least a part of meta data from the video signal including the meta data added for every frame and synthesizing the extracted part with the video signal. The meta-data display system also includes display apparatus each used for displaying a video signal including meta data synthesized therewith. In such a configuration, a part of meta data added to a video signal is extracted and converted into video data, which is then multiplexed in the video signal of every frame. Thus, the display apparatus are each capable of displaying not only an image represented by a video signal, but also meta data related to the image synchronously with the image.
摘要翻译：本发明提供一种元数据显示系统，其能够与材料同步地显示与拍摄视频材料相关的元数据以及视频材料。元数据显示系统包括用于产生表示视频材料的视频信号的成像装置。元数据显示系统还具有元数据合成装置，用于从包括为每一帧添加的元数据的视频信号中提取至少一部分元数据，并将提取出的部分与视频信号进行合成。元数据显示系统还包括显示装置，每个显示装置用于显示包括由其合成的元数据的视频信号。在这种配置中，提取添加到视频信号的元数据的一部分并将其转换为视频数据，然后在每帧的视频信号中被复用。因此，显示装置各自能够不仅显示由视频信号表示的图像，而且还可以显示与图像同步的与图像相关的元数据。

7. 发明授权

US07366406B2 Video-recording system, meta-data addition apparatus, imaging apparatus, video-signal recording apparatus, video-recording method, and meta-data format 失效
标题翻译：视频记录系统，元数据添加装置，成像装置，视频信号记录装置，视频记录方法和元数据格式
公开(公告)号：US07366406B2
公开(公告)日：2008-04-29
申请号：US10809499
申请日：2004-03-26
申请人： Hiromi Hoshino , Yasuhiko Mikami
发明人： Hiromi Hoshino , Yasuhiko Mikami
IPC分类号： H04N5/00
CPC分类号： H04N9/8205 , H04N5/222 , H04N5/232 , H04N5/77 , H04N5/775 , H04N5/781 , H04N5/85 , H04N5/907 , H04N9/8042 , H04N9/8047
摘要： In order to present a video-recording system capable of managing a video material and meta data related to the video material in an integrated manner by directly linking the meta data to the video material, the video-recording system is provided with a meta data addition apparatus for adding the meta data to every frame of a video signal generated by an imaging apparatus as a video signal representing the video material and a VTR for recording the video signal including the additional meta data onto a recording medium. In such a configuration, concurrently with a shooting operation carried out by using the imaging apparatus, meta data related to a video signal generated in the shooting operation can be sequentially added to every frame of the video signal and, then, the video signal including the additional meta data can be sequentially recorded onto the recording medium. Thus, the meta data and the video signal can be recorded on the same recording medium by directly linking the meta data to the video signal so that the meta data and the video signal can be managed in an integrated manner.
摘要翻译：为了呈现能够通过将元数据直接链接到视频资料以集成的方式管理视频材料和元数据的视频记录系统，为视频记录系统提供元数据附加将元数据添加到由成像装置生成的视频信号的每个帧作为表示视频资料的视频信号的装置和用于将包括附加元数据的视频信号记录在记录介质上的VTR的装置。在这种结构中，与通过使用成像装置进行的拍摄操作同时，可以将与拍摄操作中生成的视频信号相关的元数据顺序地添加到视频信号的每一帧，然后，包括可以将附加的元数据顺序地记录到记录介质上。因此，通过将元数据直接链接到视频信号，可以将元数据和视频信号记录在相同的记录介质上，从而能够以集成的方式管理元数据和视频信号。

8. 发明授权

US06350992B1 Charged particle beam exposure method and charged particle beam exposure device 有权
标题翻译：带电粒子束曝光方法和带电粒子束曝光装置
公开(公告)号：US06350992B1
公开(公告)日：2002-02-26
申请号：US09520756
申请日：2000-03-07
申请人： Yasuo Manabe , Hiromi Hoshino
发明人： Yasuo Manabe , Hiromi Hoshino
IPC分类号： H01J37302
CPC分类号： H01J37/3026 , H01J2237/31769
摘要： The basis of the present invention is a charged particle beam exposure method comprising the steps of: (a) generating a plurality of areas within the sub-fields; (b) determining the pattern density within each of the areas, and correcting the pattern density in accordance with the pattern density of areas surrounding the area and the distance between areas; (c) generating a supplementary exposure pattern in the area when the corrected pattern density for the area is lower than a prescribed reference exposure density; and (d) exposing the material in accordance with exposure data comprising the supplementary exposure pattern data appended to the pattern data. A first invention comprises a step for further generating a supplementary exposure pattern in areas lying between pattern existing regions where the patterns are located, and having a pattern density higher than the reference exposure density, when the distance between the pattern existing regions is greater than a prescribed reference distance.
摘要翻译：本发明的基础是带电粒子束曝光方法，包括以下步骤：（a）在子场内产生多个区域; （b）确定每个区域内的图案密度，并且根据区域周围的区域的图案密度和区域之间的距离来校正图案密度; （c）当所述区域的校正图案密度低于规定的参考曝光浓度时，在所述区域中产生补充曝光图案; 和（d）根据包括附加到图案数据的补充曝光图案数据的曝光数据曝光该材料。第一发明包括在图案存在区域之间的距离大于图形存在区域时，在图案存在区域之间的区域中进一步产生补充曝光图案并具有高于参考曝光浓度的图案密度的步骤规定参考距离。

9. 发明授权

US07968259B2 Semiconductor device, method for manufacturing semiconductor device, and computer readable medium 有权
标题翻译：半导体装置，半导体装置的制造方法以及计算机可读介质
公开(公告)号：US07968259B2
公开(公告)日：2011-06-28
申请号：US12326154
申请日：2008-12-02
申请人： Hiromi Hoshino , Takashi Maruyama
发明人： Hiromi Hoshino , Takashi Maruyama
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/7045 , Y10S430/143
摘要： In a multi-project-chip semiconductor device, semiconductor elements fabricated on a wafer have a layout that corresponds to an exposure order of a pattern of the semiconductor elements and that is based on information indicating manufacture conditions and the number of shots and are arranged such that the semiconductor elements having the same manufacture condition are adjacent to each other in ascending or descending order of the number of shots.
摘要翻译：在多项目芯片半导体器件中，制造在晶片上的半导体元件具有对应于半导体元件的图案的曝光顺序的布局，并且其基于指示制造条件和拍摄次数的信息，并且布置成具有相同制造条件的半导体元件以照射次数的升序或降序相互相邻。

10. 发明授权

US07732107B2 Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure 有权
标题翻译：掩模图案校正装置，掩模图案的校正方法，曝光修正装置以及曝光校正方法
公开(公告)号：US07732107B2
公开(公告)日：2010-06-08
申请号：US10995215
申请日：2004-11-24
申请人： Teruyoshi Yao , Satoru Asai , Morimi Osawa , Hiromi Hoshino , Kouzou Ogino , Kazumasa Morishita
发明人： Teruyoshi Yao , Satoru Asai , Morimi Osawa , Hiromi Hoshino , Kouzou Ogino , Kazumasa Morishita
IPC分类号： G03C5/00 , G03F1/00 , G06F17/50
CPC分类号： G03F7/70941 , G03F7/70433 , G03F7/705
摘要： In view of realizing a lithographic process which makes it possible to estimate and correct flare with an extremely high accuracy, and causes only an extremely small dimensional variation in width, over the entire portion not only of a single shot region, but also of a single chip region, a mask pattern correction device of the present invention has a numerical aperture calculation unit calculating, for every single shot region, flare energy for a mask pattern corresponding to a transferred pattern, based on an exposure layout of a plurality of shot regions, or more specifically, while considering flare from a plurality of shot regions located around every single shot region.
摘要翻译：鉴于实现能够以极高的精度估计和校正火炬的平版印刷工艺，并且在整个部分上不仅在单一拍摄区域上，而且在单个区域的整个部分上仅产生非常小的尺寸变化芯片区域，本发明的掩模图案校正装置具有数值孔径计算单元，对于每个单个拍摄区域，基于多个拍摄区域的曝光布局来计算对应于被转印图案的掩模图案的闪光能量，或者更具体地，同时考虑来自位于每个单个拍摄区域周围的多个拍摄区域的闪光。

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