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1. 发明申请

US20050139580A1 Method of deciding focal plane and method of crystallization using thereof 有权
标题翻译：决定焦平面的方法及其结晶方法
公开(公告)号：US20050139580A1
公开(公告)日：2005-06-30
申请号：US11017826
申请日：2004-12-22
申请人： Hyun Seo , Yun Jung , Young Kim , JaeSung You
发明人： Hyun Seo , Yun Jung , Young Kim , JaeSung You
IPC分类号： G02F1/13 , B23K26/00 , B23K26/03 , B23K26/04 , B23K26/06 , H01L21/20 , H01L21/268 , H01L21/44 , H01L21/324
CPC分类号： H01L21/0268 , B23K26/04 , B23K26/066 , B23K2101/36 , H01L21/02686 , H01L21/2026 , H01L21/268 , Y10S117/904
摘要： A crystallization method is provided which improves a crystallization process by deciding a best-fit focal plane for a laser beam using a test mask and then applying the decided best-fit focal plane to the crystallization process. The crystallization method includes loading a test mask on a mask stage; deciding a best-fit focal plane by performing a crystallization test using the test mask, checking the test result and deciding conditions of a best-fit focal plane from the test result; moving the mask stage to a position corresponding to the best-fit focal plane; loading a mask for crystallization process onto the moved mask stage; and performing the crystallization process using the mask for crystallization process.
摘要翻译：提供一种结晶方法，其通过使用测试掩模确定用于激光束的最佳拟合焦平面，然后将所确定的最佳拟合焦平面应用于结晶过程来改善结晶过程。结晶方法包括在掩模台上装载测试掩模; 通过使用测试掩模进行结晶测试来确定最佳拟合焦平面，从测试结果检查测试结果并确定最佳拟合焦平面的条件; 将掩模台移动到对应于最佳拟合焦平面的位置; 将用于结晶过程的掩模加载到移动的掩模台上; 并使用该结晶处理用掩模进行结晶处理。

2. 发明申请

US20080011726A1 Method of deciding focal plane and method of crystallization using thereof 有权
标题翻译：决定焦平面的方法及其结晶方法
公开(公告)号：US20080011726A1
公开(公告)日：2008-01-17
申请号：US11826160
申请日：2007-07-12
申请人： Hyun Seo , Yun Jung , Young Kim , JaeSung You
发明人： Hyun Seo , Yun Jung , Young Kim , JaeSung You
IPC分类号： B23K26/02
CPC分类号： H01L21/0268 , B23K26/04 , B23K26/066 , B23K2101/36 , H01L21/02686 , H01L21/2026 , H01L21/268 , Y10S117/904
摘要： A crystallization method and system are provided which improve a crystallization process by deciding a best-fit focal plane for a laser beam using a test mask and then applying the decided best-fit focal plane to the crystallization process. The crystallization method includes loading a test mask on a mask stage; deciding a best-fit focal plane by performing a crystallization test using the test mask, checking the test result and deciding conditions of a best-fit focal plane from the test result; moving the mask stage to a position corresponding to the best-fit focal plane; loading a mask for crystallization process onto the moved mask stage; and performing the crystallization process using the mask for crystallization process.
摘要翻译：提供了一种结晶方法和系统，其通过使用测试掩模确定用于激光束的最佳拟合焦平面，然后将决定的最佳拟合焦平面应用于结晶过程来改善结晶过程。结晶方法包括在掩模台上装载测试掩模; 通过使用测试掩模进行结晶测试来确定最佳拟合焦平面，从测试结果检查测试结果并确定最佳拟合焦平面的条件; 将掩模台移动到对应于最佳拟合焦平面的位置; 将用于结晶过程的掩模加载到移动的掩模台上; 并使用该结晶处理用掩模进行结晶处理。

3. 发明申请

US20050142453A1 Laser mask and crystallization method using the same 有权
标题翻译：激光掩模和结晶法使用相同
公开(公告)号：US20050142453A1
公开(公告)日：2005-06-30
申请号：US11016782
申请日：2004-12-21
申请人： Hyun Seo , Yun Jung , Young Kim , JaeSung You
发明人： Hyun Seo , Yun Jung , Young Kim , JaeSung You
IPC分类号： G02F1/136 , B23K26/06 , G03F1/14 , G03F9/00 , H01L21/00 , H01L21/20 , H01L21/336 , H01L21/77 , H01L21/84 , H01L29/786
CPC分类号： H01L21/0268 , B23K26/066 , H01L21/2026 , H01L27/1285 , H01L29/66757 , H01L29/78675
摘要： A laser mask includes a mask pattern with edges having inverted shapes to alleviate the effects of diffraction of laser beams to reduce overlap regions such that crystallization characteristics are improved. The laser mask includes a mask pattern that includes transmitting regions and a blocking region. The edges of the mask have shapes inverted to the shapes of the edges of a silicon thin film crystallized by the pattern.
摘要翻译：激光掩模包括具有倒置形状的边缘的掩模图案，以减轻激光束的衍射的影响，以减少重叠区域，从而提高结晶特性。激光掩模包括包括透射区域和阻挡区域的掩模图案。掩模的边缘具有与通过图案结晶的硅薄膜的边缘的形状相反的形状。

4. 发明申请

US20050142050A1 Sequential lateral solidification device and method of crystallizing silicon using the same 有权
标题翻译：顺序侧向凝固装置及使用其结晶硅的方法
公开(公告)号：US20050142050A1
公开(公告)日：2005-06-30
申请号：US10951821
申请日：2004-09-29
申请人： Yun Jung , Young Kim
发明人： Yun Jung , Young Kim
IPC分类号： H01L21/324 , B01D9/00 , B23K26/06 , H01L21/20 , H01L21/268 , H01L21/77 , H01L21/84 , H01L21/00
CPC分类号： H01L21/0268 , B01D9/0036 , B01D9/0063 , B23K26/066 , H01L21/2026 , H01L27/1285
摘要： A sequential lateral solidification (SLS) device and a method of crystallizing silicon using the same is disclosed, wherein alignment keys are formed on a substrate with one mask having a plurality of different patterns, and a crystallization process is progressed in parallel to an imaginary line connecting the alignment keys with information for a distance between the mask and the alignment key. The SLS device includes a laser beam generator for irradiating laser beams; a mask having a plurality of areas; a mask stage for moving the mask loaded thereto, to transmit a laser beam through a selective area of the mask; and a substrate stage for moving a substrate loaded thereto, to change portions of the substrate irradiated with the laser beam passing through the mask.
摘要翻译：公开了一种顺序横向固化（SLS）器件和使用其的使硅结晶的方法，其中对准键形成在具有多个不同图案的一个掩模的衬底上，并且结晶过程平行于假想线进行将对准键与掩模和对准键之间的距离的信息连接。 SLS装置包括用于照射激光束的激光束发生器; 具有多个区域的掩模; 用于移动加载到其上的掩模的掩模台，以将激光束透过掩模的选择区域; 以及用于移动装载到其上的基板的基板台，以改变被穿过掩模的激光束照射的基板的部分。

5. 发明申请

US20050142819A1 Silicon crystallization apparatus and silicon crystallization method thereof 有权
标题翻译：硅结晶装置及其硅结晶方法
公开(公告)号：US20050142819A1
公开(公告)日：2005-06-30
申请号：US11019353
申请日：2004-12-23
申请人： Yun Jung , Young Kim
发明人： Yun Jung , Young Kim
IPC分类号： B23K26/00 , B23K26/06 , B23K26/08 , B23K37/04 , C30B11/00 , C30B29/06 , G02F1/35 , H01L21/00 , H01L21/20 , H01L21/324 , H01L21/477 , H01L21/68 , H01L21/84 , C30B1/00 , H01L21/36
CPC分类号： H01L21/0268 , B23K26/0622 , B23K26/0823 , B23K26/0853 , B23K37/0461 , C30B11/005 , C30B29/06 , H01L21/2026 , H01L21/68
摘要： A novel silicon crystallization apparatus and a silicon crystallization method renders it is possible to form alignment key without additional photolithography, and to adjust a substrate to a correct position by sensing a deviation of the substrate when the substrate is loaded. The silicon crystallization apparatus includes a moving stage being moved in a horizontal direction, and a fixing plate provided in the moving stage, to fix a substrate. A rotating frame is provided in the moving stage, to rotate the fixing plate.
摘要翻译：新型硅结晶装置和硅结晶方法使得可以在没有附加光刻的情况下形成对准键，并且通过在衬底被加载时感测衬底的偏差来将衬底调整到正确的位置。硅结晶装置包括沿水平方向移动的移动台和设置在移动台中的固定板以固定基板。旋转框架设置在移动台中，以旋转固定板。

6. 发明申请

US20070063200A1 Sequential lateral solidification device and method of crystallizing silicon using the same 有权
标题翻译：顺序侧向凝固装置及使用其结晶硅的方法
公开(公告)号：US20070063200A1
公开(公告)日：2007-03-22
申请号：US11518202
申请日：2006-09-11
申请人： Yun Jung , Young Kim
发明人： Yun Jung , Young Kim
IPC分类号： H01L27/108 , H01L29/00 , H01L31/036 , H01L31/112
CPC分类号： H01L21/0268 , B01D9/0036 , B01D9/0063 , B23K26/066 , H01L21/2026 , H01L27/1285
摘要： A sequential lateral solidification (SLS) device and a method of crystallizing silicon using the same is disclosed, wherein alignment keys are formed on a substrate with one mask having a plurality of different patterns, and a crystallization process is progressed in parallel to an imaginary line connecting the alignment keys with information for a distance between the mask and the alignment key. The SLS device includes a laser beam generator for irradiating laser beams; a mask having a plurality of areas; a mask stage for moving the mask loaded thereto, to transmit a laser beam through a selective area of the mask; and a substrate stage for moving a substrate loaded thereto, to change portions of the substrate irradiated with the laser beam passing through the mask.
摘要翻译：公开了一种顺序横向固化（SLS）器件和使用其的使硅结晶的方法，其中对准键形成在具有多个不同图案的一个掩模的衬底上，并且结晶过程平行于假想线进行将对准键与掩模和对准键之间的距离的信息连接。 SLS装置包括用于照射激光束的激光束发生器; 具有多个区域的掩模; 用于移动加载到其上的掩模的掩模台，以将激光束透过掩模的选择区域; 以及用于移动装载到其上的基板的基板台，以改变被穿过掩模的激光束照射的基板的部分。

7. 发明申请

US20070052710A1 Virtual mounter system 审中-公开
标题翻译：虚拟贴片机系统
公开(公告)号：US20070052710A1
公开(公告)日：2007-03-08
申请号：US11405406
申请日：2006-04-18
申请人： Young Kim , Yun Jung , Heung Hwang
发明人： Young Kim , Yun Jung , Heung Hwang
IPC分类号： G06T15/70
CPC分类号： G09B19/00 , G09B25/02
摘要： A virtual mounter system is disclosed. The system can implement a mounter through an animation model or a simulation model before users substantially access a real mounter. The system can allow users to learn a necessary technology related to drive and maintenance of a mounter thorough animation or simulation for the mounter. The system can support driving environment of a real mounter to users as examples of setup and motions are displayed. The system can show contents (an assembly structure of a mounter, functions of each assembly, an operation sequence and an operation method) which is described in a user's manual for a mounter, in real time, through an animation model or a simulation model of the mounter.
摘要翻译：公开了虚拟贴片机系统。该系统可以在用户基本上访问真正的安装者之前，通过动画模型或仿真模型实现安装者。该系统可以允许用户学习与安装器的驱动和维护完全动画或模拟的安装器相关的必要技术。系统可以为用户提供真正的安装者的驾驶环境，因为显示了设置和动作的示例。该系统可以通过动画模型或模拟模型来实时显示用于安装者的用户手册中描述的内容（安装器的组装结构，每个组件的功能，操作顺序和操作方法）贴片机

8. 发明申请

US20060253219A1 Virtual preventive inspection system for mounter and method for controlling mounter using the same 审中-公开
标题翻译：用于安装器的虚拟预防检查系统和使用其的安装者的控制方法
公开(公告)号：US20060253219A1
公开(公告)日：2006-11-09
申请号：US11418466
申请日：2006-05-05
申请人： Yun Jung , Young Kim , Heung Hwang
发明人： Yun Jung , Young Kim , Heung Hwang
IPC分类号： G06F19/00
CPC分类号： G05B23/0283 , H05K13/0895
摘要： A virtual preventive inspection system for a mounter and a method for controlling the mounter are disclosed. The system performs animations and simulations for maintenance and repair procedures of assemblies included in a mounter, through virtual models, and for a maintenance procedure for a certain part of the mounter, such that it can protect users from danger and the real mounter from damage when the mounter is maintained. Therefore, the present invention can allow anyone to perform preventive maintenance and repair of the mounter.
摘要翻译：公开了一种用于安装器的虚拟预防性检查系统和用于控制该安装器的方法。该系统通过虚拟模型对安装器中所包括的组件的维护和修复过程进行动画和模拟，以及对于安装器的某一部分的维护程序，使得其可以保护用户免受危险并且真正的安装者不受损害安装者维护。因此，本发明可以允许任何人执行安装机的预防性维护和修理。

9. 发明申请

US20070132670A1 Plasma display apparatus 有权
标题翻译：等离子显示装置
公开(公告)号：US20070132670A1
公开(公告)日：2007-06-14
申请号：US11480420
申请日：2006-07-05
申请人： Yun Jung , Yang An
发明人： Yun Jung , Yang An
IPC分类号： G09G3/28
CPC分类号： G09G3/296 , G09G3/294 , G09G3/2965 , G09G2330/02
摘要： A plasma display apparatus is disclosed. A scan driver of the plasma display apparatus supplies a voltage of a scan signal of a negative polarity direction and a voltage of a sustain signal to a scan electrode using one voltage source. Further, a sustain driver of the plasma display apparatus supplies a voltage of a sustain signal and a sustain bias voltage to a sustain electrode using one voltage source.
摘要翻译：公开了一种等离子体显示装置。等离子体显示装置的扫描驱动器使用一个电压源向扫描电极提供负极性方向的扫描信号和维持信号的电压的电压。此外，等离子体显示装置的维持驱动器使用一个电压源向维持电极提供维持信号和维持偏置电压的电压。

10. 发明申请

US20060125726A1 Plasma display apparatus 审中-公开
标题翻译：等离子显示装置
公开(公告)号：US20060125726A1
公开(公告)日：2006-06-15
申请号：US11295683
申请日：2005-12-07
申请人： Gi Lee , Yun Jung
发明人： Gi Lee , Yun Jung
IPC分类号： G09G3/28
CPC分类号： G09G3/294 , G09G3/2927 , G09G2310/066 , G09G2320/041
摘要： The present invention relates to a plasma display apparatus. A plasma display apparatus according to the present invention comprises a plasma display panel comprising a scan electrode and a sustain electrode, a scan driver for applying a negative voltage to the scan electrode before a reset period when the scan electrode is applied with a positive voltage and a sustain driver for applying a positive voltage to the sustain electrode while the scan electrode is applied with a negative voltage.
摘要翻译：等离子体显示装置技术领域本发明涉及等离子体显示装置。根据本发明的等离子体显示装置包括：等离子体显示面板，包括扫描电极和维持电极;扫描驱动器，用于在扫描电极施加正电压的复位周期之前向扫描电极施加负电压;以及用于在扫描电极施加负电压时向维持电极施加正电压的维持驱动器。

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