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1. 发明授权

US07796873B2 Anti-shake apparatus 有权
标题翻译：防抖装置
公开(公告)号：US07796873B2
公开(公告)日：2010-09-14
申请号：US12044102
申请日：2008-03-07
申请人： Yukio Uenaka , Takahiro Ogawa
发明人： Yukio Uenaka , Takahiro Ogawa
IPC分类号： G03B17/00
CPC分类号： H04N5/23248 , H04N5/23287
摘要： An anti-shake apparatus (an image-stabilization apparatus) of a photographing device comprises a movable unit and a controller. The movable unit has an imaging device and is movable and rotatable for an anti-shake operation. The controller controls the movable unit for the anti-shake operation. The controller calculates a hand-shake angle caused by roll. The controller controls whether the anti-shake operation is performed for correcting hand-shake caused by roll, on the basis of the hand-shake angle caused by roll.
摘要翻译：拍摄装置的防抖装置（图像稳定装置）包括可移动单元和控制器。可移动单元具有成像装置，并且可移动并且可旋转以进行防抖操作。控制器控制可动单元进行防抖操作。控制器计算由滚动导致的手抖动角度。控制器根据由滚动导致的手抖动角度来控制是否执行用于校正由滚动导致的手抖动的防抖操作。

2. 发明授权

US07720367B2 Anti-shake apparatus 有权
标题翻译：防抖装置
公开(公告)号：US07720367B2
公开(公告)日：2010-05-18
申请号：US12044085
申请日：2008-03-07
申请人： Yukio Uenaka , Takahiro Ogawa
发明人： Yukio Uenaka , Takahiro Ogawa
IPC分类号： G03B17/00
CPC分类号： G03B17/00
摘要： An anti-shake apparatus (an image-stabilization apparatus) of a photographing device comprises a movable unit and a controller. The movable unit has an imaging device and is movable and rotatable for an anti-shake operation. The controller controls the movable unit for the anti-shake operation. The controller obtains information regarding a resolution at the edge of a lens that is used for an imaging operation of the imaging device. The controller controls a degree of the anti-shake operation that is performed for correcting hand-shake caused by roll on the basis of the resolution at the edge of the lens.
摘要翻译：拍摄装置的防抖装置（图像稳定装置）包括可移动单元和控制器。可移动单元具有成像装置，并且可移动并且可旋转以进行防抖操作。控制器控制可动单元进行防抖操作。控制器获得关于用于成像装置的成像操作的透镜的边缘处的分辨率的信息。控制器控制基于透镜边缘处的分辨率来校正由辊引起的手抖动的防抖操作的程度。

3. 发明授权

US07480457B2 Photographing apparatus 失效
标题翻译：拍摄装置
公开(公告)号：US07480457B2
公开(公告)日：2009-01-20
申请号：US11157806
申请日：2005-06-22
申请人： Yukio Uenaka , Takahiro Ogawa
发明人： Yukio Uenaka , Takahiro Ogawa
IPC分类号： G03B41/00
CPC分类号： H04N5/2259 , G03B37/00 , H04N5/2254 , H04N5/23238 , H04N5/23248 , H04N5/23258 , H04N5/23287
摘要： A photographing apparatus comprises a movable unit, a fixed unit, and a control unit. The movable unit has an imaging device, and can be moved in a first direction. The first direction is perpendicular to an optical axis of a photographing optical system of the photographing apparatus. The fixed unit slidably supports the movable unit in the first direction. The control apparatus controls moving the movable unit to two or more movement-positions in the movable unit's movement range, and obtains a wide-angle image signal which is a combination of the two or more image signals being imaged at two or more movement-positions of the movable unit.
摘要翻译：摄影装置包括可移动单元，固定单元和控制单元。可移动单元具有成像装置，并且可以沿第一方向移动。第一方向垂直于摄影装置的摄影光学系统的光轴。固定单元沿第一方向可滑动地支撑可移动单元。控制装置控制将可移动单元移动到可移动单元的运动范围内的两个或多个运动位置，并获得广角图像信号，该广角图像信号是两个或更多个运动位置成像的两个或多个图像信号的组合的可移动单元。

4. 发明申请

US20050286887A1 Photographing apparatus 失效
标题翻译：拍摄装置
公开(公告)号：US20050286887A1
公开(公告)日：2005-12-29
申请号：US11157806
申请日：2005-06-22
申请人： Yukio Uenaka , Takahiro Ogawa
发明人： Yukio Uenaka , Takahiro Ogawa
IPC分类号： G03B37/00
CPC分类号： H04N5/2259 , G03B37/00 , H04N5/2254 , H04N5/23238 , H04N5/23248 , H04N5/23258 , H04N5/23287
摘要： A photographing apparatus comprises a movable unit, a fixed unit, and a control unit. The movable unit has an imaging device, and can be moved in a first direction. The first direction is perpendicular to an optical axis of a photographing optical system of the photographing apparatus. The fixed unit slidably supports the movable unit in the first direction. The control apparatus controls moving the movable unit to two or more movement-positions in the movable unit's movement range, and obtains a wide-angle image signal which is a combination of the two or more image signals being imaged at two or more movement-positions of the movable unit.
摘要翻译：摄影装置包括可移动单元，固定单元和控制单元。可移动单元具有成像装置，并且可以沿第一方向移动。第一方向垂直于摄影装置的摄影光学系统的光轴。固定单元沿第一方向可滑动地支撑可移动单元。控制装置控制将可移动单元移动到可移动单元的运动范围内的两个或多个运动位置，并获得广角图像信号，该广角图像信号是两个或更多个运动位置成像的两个或多个图像信号的组合的可移动单元。

5. 发明申请

US20050122421A1 Photographing apparatus with lighting function 审中-公开
标题翻译：具有照明功能的摄影装置
公开(公告)号：US20050122421A1
公开(公告)日：2005-06-09
申请号：US11001042
申请日：2004-12-02
申请人： Takahiro Ogawa , Yukio Uenaka , Nobuhito Nakayama , Shuzo Seo
发明人： Takahiro Ogawa , Yukio Uenaka , Nobuhito Nakayama , Shuzo Seo
IPC分类号： H04N5/222 , H04N5/225 , H04N5/235
CPC分类号： H04N5/2256 , H04N5/2354
摘要： A lighting apparatus includes a plurality of light sources, and a light-source controller. The light-source controller controls the plurality of light sources so that at least one light source in the plurality of light sources can emit assisting light to form contrasts of luminance on a photographic subject, and so that the light sources can simultaneously emit illuminating light to illuminate the photographic subject uniformly. And a photographing apparatus includes the lighting apparatus, a line sensor, and a distance measurer. The line sensor forms image signals corresponding to an image of the photographic subject by receiving the reflected light of the assisting light or the illuminating light reflected by the photographic subject. The distance measurer measures a distance to the subject based on the image signals formed by the line sensor. The line sensor and a high-luminance area formed by emission of the assisting light, cross each other on a plane including the light receiving surface of the line sensor.
摘要翻译：照明装置包括多个光源和光源控制器。光源控制器控制多个光源，使得多个光源中的至少一个光源可以发射辅助光，以在被摄体上形成亮度的对比度，并且使得光源可以同时发射照明光均匀地照射摄影对象。并且拍摄装置包括照明装置，线传感器和距离测量器。线传感器通过接收辅助光的反射光或被拍摄对象反射的照明光来形成与被摄体的图像相对应的图像信号。距离测量器基于由线传感器形成的图像信号测量到被摄体的距离。线传感器和通过辅助光的发射形成的高亮度区域在包括线传感器的光接收表面的平面上相互交叉。

6. 发明授权

US08795032B2 Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method 有权
标题翻译：基板处理装置，基板处理方法，基板保持机构和基板保持方法
公开(公告)号：US08795032B2
公开(公告)日：2014-08-05
申请号：US12457175
申请日：2009-06-03
申请人： Mitsuru Miyazaki , Seiji Katsuoka , Naoki Matsuda , Junji Kunisawa , Kenichi Kobayashi , Hiroshi Sotozaki , Hiroyuki Shinozaki , Osamu Nabeya , Shinya Morisawa , Takahiro Ogawa , Natsuki Makino
发明人： Mitsuru Miyazaki , Seiji Katsuoka , Naoki Matsuda , Junji Kunisawa , Kenichi Kobayashi , Hiroshi Sotozaki , Hiroyuki Shinozaki , Osamu Nabeya , Shinya Morisawa , Takahiro Ogawa , Natsuki Makino
IPC分类号： B24B51/00
CPC分类号： B24B37/345 , H01L21/30625 , H01L21/67219 , H01L21/67739 , H01L21/67742 , H01L21/67754 , Y10T137/0318 , Y10T137/8593
摘要： An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates.
摘要翻译：公开了一种用于处理衬底的设备。该装置包括：抛光部，其被配置为对基板进行抛光;移动机构，被配置为传送基板;以及清洁部，其构造成清洁和干燥被研磨的基板。清洗部具有多个用于清洗多个基板的清洗线。多个清洁线具有多个清洁模块和用于传送基板的多个传送机器人。

7. 发明授权

US08777198B2 Substrate holding apparatus, substrate holding method, and substrate processing apparatus 有权
标题翻译：基板保持装置，基板保持方法和基板处理装置
公开(公告)号：US08777198B2
公开(公告)日：2014-07-15
申请号：US13398216
申请日：2012-02-16
申请人： Masahiko Sekimoto , Seiji Katsuoka , Naoki Dai , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Suzuki , Kenichi Kobayashi , Yasuyuki Motoshima , Ryo Kato
发明人： Masahiko Sekimoto , Seiji Katsuoka , Naoki Dai , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Suzuki , Kenichi Kobayashi , Yasuyuki Motoshima , Ryo Kato
IPC分类号： B23Q1/00
CPC分类号： H01L21/67086 , H01L21/67051 , H01L21/687
摘要： A substrate holding apparatus can meet the request for a smaller-sized compact apparatus while ensuring a sufficient immersion depth of a substrate in a processing liquid. The substrate holding apparatus includes: a substrate holder for supporting a substrate (W) by bringing a peripheral portion of a surface of the substrate (W) into contact with a first sealing member; and a substrate pressing section for lowering relative to the substrate holder so as to press the substrate (W) held by the substrate holder downward, thereby bringing a first sealing member into pressure contact with the substrate (W). The substrate pressing section is provided with a second ring-shaped sealing member which makes pressure contact with an upper surface of a ring-shaped holding section of the substrate holder, thereby sealing the peripheral region of the substrate pressing section.
摘要翻译：基板保持装置可以满足对较小尺寸的小型装置的要求，同时确保基板在处理液体中的足够的浸入深度。基板保持装置包括：基板保持件，用于通过使基板（W）的表面的周边部分与第一密封构件接触来支撑基板（W）; 以及基板按压部，其相对于基板保持件下降，以将由基板保持件保持的基板（W）向下压，从而使第一密封部件与基板（W）压力接触。基板按压部设置有与基板保持件的环状保持部的上表面压力接触的第二环状密封部件，从而密封基板按压部的周边区域。

8. 发明授权

US08487284B2 Prohealing endovascular devices 有权
标题翻译：预处理血管内装置
公开(公告)号：US08487284B2
公开(公告)日：2013-07-16
申请号：US13356563
申请日：2012-01-23
申请人： Satoshi Tateshima , Takahiro Ogawa , Fernando Vinuela
发明人： Satoshi Tateshima , Takahiro Ogawa , Fernando Vinuela
IPC分类号： A61F2/82 , A61F2/90
CPC分类号： B29C59/165 , A61L27/04 , A61L27/50 , A61L29/02 , A61L29/14 , A61L31/022 , A61L31/14 , A61L2400/18 , B29C2035/0827 , B29L2031/753 , B29L2031/7534 , B29L2031/7542
摘要： The present invention provides endovascular devices and the methods of making and using the same. The endovascular device is a prohealing endovascular device that comprises a super hydrophilic surface. The super hydrophilic surface is generated by a method comprising a step of irradiating a surface of the endovascular device with a high energy radiation for a period of time to cause the surface to become super hydrophilic.
摘要翻译：本发明提供血管内装置及其制造和使用方法。血管内装置是包括超亲水表面的预热血管内装置。超级亲水性表面通过包括以高能量辐射照射血管内装置的表面一段时间以使表面变得超亲水的步骤的方法产生。

9. 发明申请

US20090067959A1 Substrate processing apparatus, substrate transfer apparatus, substrate clamp apparatus, and chemical liquid treatment apparatus 审中-公开
标题翻译：基板处理装置，基板输送装置，基板夹紧装置和药液处理装置
公开(公告)号：US20090067959A1
公开(公告)日：2009-03-12
申请号：US11665963
申请日：2007-02-21
申请人： Nobuyuki Takahashi , Hiroaki Nishida , Hiroomi Torii , Soichi Isobe , Tadakazu Sone , Ryuichi Kosuge , Hiroyuki Kaneko , Hiroshi Sotozaki , Takao Mitsukura , Takahiro Ogawa , Kenichi Sugita
发明人： Nobuyuki Takahashi , Hiroaki Nishida , Hiroomi Torii , Soichi Isobe , Tadakazu Sone , Ryuichi Kosuge , Hiroyuki Kaneko , Hiroshi Sotozaki , Takao Mitsukura , Takahiro Ogawa , Kenichi Sugita
IPC分类号： H01L21/67
CPC分类号： H01L21/67219 , B24B37/345 , H01L21/6719 , H01L21/67742 , H01L21/67745 , H01L21/67748 , H01L21/67751 , H01L21/67766 , H01L21/68707
摘要： The present invention relates to a substrate processing apparatus which can improve a tact time of substrate processing. A polishing apparatus as the substrate processing apparatus includes plural polishing sections (3a, 3b) each for polishing a semiconductor wafer (W), and a swing transporter (7) for transferring the wafer (W). The swing transporter (7) includes a wafer clamp mechanism (112) adapted to clamp the wafer (W), a vertically moving mechanism (104, 106) for vertically moving the wafer clamp mechanism (112) along a frame (102) of a casing of the polishing section (3a), and a swing mechanism (108, 110) for swinging the wafer clamp mechanism (112) about a shaft adjacent to the frame (102).
摘要翻译：本发明涉及能够提高基板处理的节拍时间的基板处理装置。作为基板处理装置的研磨装置包括：用于研磨半导体晶片（W）的多个研磨部（3a，3b）和用于转印晶片（W）的摆动传送装置（7）。摆动传送器（7）包括适于夹紧晶片（W）的晶片夹紧机构（112），用于沿着晶片夹持机构（102）的框架（102）垂直移动的垂直移动机构（104,106）抛光部分（3a）的外壳和用于使晶片夹紧机构（112）围绕与框架（102）相邻的轴摆动的摆动机构（108,110）。

10. 发明申请

US20090048753A1 TWO-WHEELED MOTOR VEHICLE BRAKE CONTROL METHOD AND SYSTEM 审中-公开
标题翻译：双轮电动车辆制动控制方法与系统
公开(公告)号：US20090048753A1
公开(公告)日：2009-02-19
申请号：US12162223
申请日：2006-01-31
申请人： Takahiro Ogawa , Helge Westerfeld
发明人： Takahiro Ogawa , Helge Westerfeld
IPC分类号： B60T8/1755
CPC分类号： B60T8/1706 , B60T8/1766 , B60T8/261 , B60T8/3225 , B60T2230/03 , B60T2240/06
摘要： To reliably control and prevent rear wheel lifting caused by an abrupt brake operation.An amount of change in vehicle body deceleration is computed on the basis of detection signals of wheel velocity sensors 45 and 46 (S102), it is determined whether or not that computed value exceeds a predetermined value K1 (S104), and when it is determined that the computed value exceeds the predetermined value K1, then it is determined that there is the potential for rear wheel lifting, reduction of a pressure increase gradient of wheel cylinder pressure is performed (S106) until the amount of change in vehicle body deceleration falls below the predetermined value K1, and lifting of the rear wheel is reliably controlled.
摘要翻译：可靠地控制和防止由突然制动操作引起的后轮提升。基于车轮速度传感器45和46的检测信号计算车身减速度的变化量（S102），判定该计算值是否超过规定值K1（S104），并且当确定计算值超过预定值K1，则确定存在后轮提升的可能性，执行轮缸压力的压力增加梯度的减小（S106），直到车体减速度的变化量低于可靠地控制预定值K1和后轮的提升。

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