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1. 发明申请

US20070269723A1 Optically Semitransmissive Film, Photomask Blank and Photomask, and Method for Designing Optically Semitransmissive Film 有权
标题翻译：光学半透射膜，光掩模空白和光掩模，以及设计光学半透射膜的方法
公开(公告)号：US20070269723A1
公开(公告)日：2007-11-22
申请号：US11629210
申请日：2005-06-10
申请人： Yuki Shiota , Osamu Nozawa
发明人： Yuki Shiota , Osamu Nozawa
IPC分类号： G03F9/00 , G02B5/28
CPC分类号： G03F1/26 , G03F1/32 , G03F1/34 , G03F1/54
摘要： The present invention provides an optically semitransmissive film that has a near-zero phase shift, has a desired transmissivity, and is relatively thin; a novel phase-shift mask that uses the optically semitransmissive film; a photomask blank that can manufacture the phase-shift mask; and a method for designing the optically semitransmissive film. The film is formed on a translucent substrate and transmits a portion of light having a desired wavelength λ, wherein the film has at least one phase-difference reduction layer that fulfills the following functions. Specifically, the phase-difference reduction layer is a layer that has a refractive index n and a thickness d that satisfy the expression 0
摘要翻译：本发明提供一种光学半透射膜，其具有接近零的相移，具有期望的透射率，并且相对较薄; 一种使用光学半透射膜的新型相移掩模; 可制造相移掩模的光掩模坯料; 以及用于设计光学半透射膜的方法。该薄膜形成在透光性基板上并透过一部分具有所需波长λ的光，其中该薄膜具有至少一个能够实现以下功能的相差减小层。具体地说，相位差降低层是折射率n和厚度d满足表达式0 单位：度）），其基于层透射光和层参考光之间的光学距离的差异计算。

2. 发明授权

US07011910B2 Halftone-type phase-shift mask blank, and halftone-type phase-shift mask 有权
标题翻译：半色调型相移掩模空白和半色调型相移掩模
公开(公告)号：US07011910B2
公开(公告)日：2006-03-14
申请号：US10421944
申请日：2003-04-24
申请人： Yuki Shiota , Osamu Nozawa , Hideaki Mitsui , Ryo Ohkubo
发明人： Yuki Shiota , Osamu Nozawa , Hideaki Mitsui , Ryo Ohkubo
IPC分类号： G01F9/00
CPC分类号： G03F1/32 , G02B5/3083
摘要： In a halftone-type phase-shift mask blank having a phase shifter film 5, the phase shifter film 5 has a phase adjustment layer 4 for primarily controlling the phase of exposure light, and a transmissivity adjustment layer 3 which is formed between a transparent substrate 2 and the phase adjustment layer 4 and primarily controls the transmissivity of exposure light. The transmissivity adjustment layer 3 has a thickness of 90 angstroms or less.
摘要翻译：在具有移相膜5的半色调型移相掩模坯料中，移相膜5具有用于主要控制曝光光的相位的相位调整层4和形成在透明基板之间的透射率调节层3 2和相位调整层4，并主要控制曝光光的透射率。透射率调整层3的厚度为90埃以下。

3. 发明授权

US06743553B2 Halftone phase shift mask and mask blank 有权
标题翻译：半色调相移掩模和掩模空白
公开(公告)号：US06743553B2
公开(公告)日：2004-06-01
申请号：US10025569
申请日：2001-12-26
申请人： Yuki Shiota , Osamu Nozawa
发明人： Yuki Shiota , Osamu Nozawa
IPC分类号： G03F900
CPC分类号： G03F1/32
摘要： In a phase shift mask blank, a desired transmittance and phase shift amount are given in the vicinity of 157 nm as a wavelength of an F2 excimer laser. The phase shift mask blank has a phase shifter film satisfactory in a resistance to exposure light irradiation, resistance to chemicals, processability, moldability, and shape stability. The halftone phase shift mask blank having the phase shifter on a transparent substrate is used in an exposure light wavelength rage of 140 nm to 200 nm, the phase shifter film is formed of a film containing main constituting elements of silicon, oxygen, and nitrogen, and contains 35 and 45% of silicon, 1 to 60% of oxygen, and 5 to 60% of nitrogen in atomic percentage, and a total amount of the elements occupies at least 90% or more of a whole composition constituting the phase shifter portion.
摘要翻译：在相移掩模空白中，作为F2准分子激光器的波长，在157nm附近给出期望的透射率和相移量。相移掩模空白具有耐曝光光照射，耐化学品，加工性，成型性和形状稳定性令人满意的移相膜。在140nm至200nm的曝光光波长范围内使用在透明基板上具有移相器的半色调相移掩模空白，移相膜由含有硅，氧和氮的主要构成元素的膜形成，并且含有35％和45％的硅，1至60％的氧和5至60％的原子百分比的氮，并且元素的总量占构成移相器部分的整个组合物的至少90％以上。

4. 发明授权

US08486588B2 Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film 有权
标题翻译：光学半透射膜，光掩模坯料和光掩模，以及用于设计光学半透射膜的方法
公开(公告)号：US08486588B2
公开(公告)日：2013-07-16
申请号：US13340228
申请日：2011-12-29
申请人： Yuki Shiota , Osamu Nozawa
发明人： Yuki Shiota , Osamu Nozawa
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： G03F1/26 , G03F1/32 , G03F1/34 , G03F1/54
摘要： A photomask blank includes a transparent substrate and a film containing at least two layers having at least a first layer and a second layer formed on the transparent substrate. The first layer is made of a material containing one or more materials selected from the group Ta, Hf, Si, Cr, Ag, Au, Cu, Al, and Mo. The second layer is made of MoSiN, MoSiO, MoSiON, SiN, SiO, or SiON. A phase difference of the film containing at least two layers is from −30° to +30°.
摘要翻译：光掩模坯料包括透明基板和含有至少两层至少具有形成在透明基板上的第一层和第二层的膜。第一层由含有选自Ta，Hf，Si，Cr，Ag，Au，Cu，Al和Mo中的一种或多种材料的材料制成。第二层由MoSiN，MoSiO，MoSiON，SiN， SiO或SiON。含有至少两层的膜的相位差为-30°〜+ 30°。

5. 发明授权

US07955762B2 Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film 有权
标题翻译：光学半透射膜，光掩模坯料和光掩模，以及用于设计光学半透射膜的方法
公开(公告)号：US07955762B2
公开(公告)日：2011-06-07
申请号：US12632103
申请日：2009-12-07
申请人： Yuki Shiota , Osamu Nozawa
发明人： Yuki Shiota , Osamu Nozawa
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： G03F1/26 , G03F1/32 , G03F1/34 , G03F1/54
摘要： The present invention provides an optically semitransmissive film that has a near-zero phase shift, has a desired transmissivity, and is relatively thin; a novel phase-shift mask that uses the optically semitransmissive film; a photomask blank that can [be used to] manufacture the phase-shift mask; and a method for designing the optically semitransmissive film. The film is formed on a translucent substrate and transmits a portion of light having a desired wavelength λ, wherein the film has at least one phase-difference reduction layer that fulfills the following functions. Specifically, the phase-difference reduction layer is a layer that has a refractive index n and a thickness d that satisfy the expression 0
摘要翻译：本发明提供一种光学半透射膜，其具有接近零的相移，具有期望的透射率，并且相对较薄; 一种使用光学半透射膜的新型相移掩模; 可以[用于]制造相移掩模的光掩模坯料; 以及用于设计光学半透射膜的方法。膜形成在透光性基板上，透过具有期望波长λ的光的一部分，其中，膜具有满足以下功能的至少一个相位差减少层。具体地说，相位差减少层是折射率n和厚度d满足表达式0

6. 发明授权

US08110323B2 Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film 有权
标题翻译：光学半透射膜，光掩模坯料和光掩模，以及用于设计光学半透射膜的方法
公开(公告)号：US08110323B2
公开(公告)日：2012-02-07
申请号：US13098096
申请日：2011-04-29
申请人： Yuki Shiota , Osamu Nozawa
发明人： Yuki Shiota , Osamu Nozawa
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： G03F1/26 , G03F1/32 , G03F1/34 , G03F1/54
摘要： The present invention provides an optically semitransmissive film that has a near-zero phase shift, has a desired transmissivity, and is relatively thin; a novel phase-shift mask that uses the optically semitransmissive film; a photomask blank that can [be used to] manufacture the phase-shift mask; and a method for designing the optically semitransmissive film. The film is formed on a translucent substrate and transmits a portion of light having a desired wavelength λ, wherein the film has at least one phase-difference reduction layer that fulfills the following functions. Specifically, the phase-difference reduction layer is a layer that has a refractive index n and a thickness d that satisfy the expression 0
摘要翻译：本发明提供一种光学半透射膜，其具有接近零的相移，具有期望的透射率，并且相对较薄; 一种使用光学半透射膜的新型相移掩模; 可以[用于]制造相移掩模的光掩模坯料; 以及用于设计光学半透射膜的方法。膜形成在透光性基板上，透过具有期望波长λ的光的一部分，其中，膜具有满足以下功能的至少一个相位差减少层。具体地说，相位差减少层是折射率n和厚度d满足表达式0

7. 发明申请

US20100159368A1 OPTICALLY SEMITRANSMISSIVE FILM, PHOTOMASK BLANK AND PHOTOMASK, AND METHOD FOR DESIGNING OPTICALLY SEMITRANSMISSIVE FILM 有权
标题翻译：光学SEMITRANSMISSIC FILM，PHOTOMASK BLANK和PHOTOMASK，以及设计光学透射电影的方法
公开(公告)号：US20100159368A1
公开(公告)日：2010-06-24
申请号：US12632103
申请日：2009-12-07
申请人： Yuki SHIOTA , Osamu Nozawa
发明人： Yuki SHIOTA , Osamu Nozawa
IPC分类号： G03F1/00
CPC分类号： G03F1/26 , G03F1/32 , G03F1/34 , G03F1/54
摘要： The present invention provides an optically semitransmissive film that has a near-zero phase shift, has a desired transmissivity, and is relatively thin; a novel phase-shift mask that uses the optically semitransmissive film; a photomask blank that can [be used to] manufacture the phase-shift mask; and a method for designing the optically semitransmissive film. The film is formed on a translucent substrate and transmits a portion of light having a desired wavelength λ, wherein the film has at least one phase-difference reduction layer that fulfills the following functions. Specifically, the phase-difference reduction layer is a layer that has a refractive index n and a thickness d that satisfy the expression 0
摘要翻译：本发明提供一种光学半透射膜，其具有接近零的相移，具有期望的透射率，并且相对较薄; 一种使用光学半透射膜的新型相移掩模; 可以[用于]制造相移掩模的光掩模坯料; 以及用于设计光学半透射膜的方法。膜形成在透光性基板上，透过具有期望波长λ的光的一部分，其中，膜具有满足以下功能的至少一个相位差减少层。具体地说，相位差减少层是折射率n和厚度d满足表达式0

8. 发明申请

US20110207032A1 OPTICALLY SEMITRANSMISSIVE FILM, PHOTOMASK BLANK AND PHOTOMASK, AND METHOD FOR DESIGNING OPTICALLY SEMITRANSMISSIVE FILM 有权
标题翻译：光学SEMITRANSMISSIC FILM，PHOTOMASK BLANK和PHOTOMASK，以及设计光学透射电影的方法
公开(公告)号：US20110207032A1
公开(公告)日：2011-08-25
申请号：US13098096
申请日：2011-04-29
申请人： Yuki SHIOTA , Osamu Nozawa
发明人： Yuki SHIOTA , Osamu Nozawa
IPC分类号： G03F1/00
CPC分类号： G03F1/26 , G03F1/32 , G03F1/34 , G03F1/54
摘要： The present invention provides an optically semitransmissive film that has a near-zero phase shift, has a desired transmissivity, and is relatively thin; a novel phase-shift mask that uses the optically semitransmissive film; a photomask blank that can [be used to] manufacture the phase-shift mask; and a method for designing the optically semitransmissive film. The film is formed on a translucent substrate and transmits a portion of light having a desired wavelength λ, wherein the film has at least one phase-difference reduction layer that fulfills the following functions. Specifically, the phase-difference reduction layer is a layer that has a refractive index n and a thickness d that satisfy the expression 0
摘要翻译：本发明提供一种光学半透射膜，其具有接近零的相移，具有期望的透射率，并且相对较薄; 一种使用光学半透射膜的新型相移掩模; 可以[用于]制造相移掩模的光掩模坯料; 以及用于设计光学半透射膜的方法。膜形成在透光性基板上，透过具有期望波长λ的光的一部分，其中，膜具有满足以下功能的至少一个相位差减少层。具体地说，相位差减少层是折射率n和厚度d满足表达式0

9. 发明授权

US07651823B2 Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film 有权
标题翻译：光学半透射膜，光掩模坯料和光掩模，以及用于设计光学半透射膜的方法
公开(公告)号：US07651823B2
公开(公告)日：2010-01-26
申请号：US11629210
申请日：2005-06-10
申请人： Yuki Shiota , Osamu Nozawa
发明人： Yuki Shiota , Osamu Nozawa
IPC分类号： G03F1/00
CPC分类号： G03F1/26 , G03F1/32 , G03F1/34 , G03F1/54
摘要： The present invention provides an optically semitransmissive film that has a near-zero phase shift, has a desired transmissivity, and is relatively thin; a novel phase-shift mask that uses the optically semitransmissive film; a photomask blank that can manufacture the phase-shift mask; and a method for designing the optically semitransmissive film. The film is formed on a translucent substrate and transmits a portion of light having a desired wavelength λ, wherein the film has at least one phase-difference reduction layer that fulfills the following functions. Specifically, the phase-difference reduction layer is a layer that has a refractive index n and a thickness d that satisfy the expression 0
摘要翻译：本发明提供一种光学半透射膜，其具有接近零的相移，具有期望的透射率，并且相对较薄; 一种使用光学半透射膜的新型相移掩模; 可制造相移掩模的光掩模坯料; 以及用于设计光学半透射膜的方法。该薄膜形成在透光性基板上并透过一部分具有所需波长λ的光，其中该薄膜具有至少一个能够实现以下功能的相差减小层。具体地说，相位差降低层是折射率n和厚度d满足表达式0

10. 发明授权

US07060394B2 Halftone phase-shift mask blank and halftone phase-shift mask 失效
标题翻译：半色调相移掩模空白和半色调相移掩模
公开(公告)号：US07060394B2
公开(公告)日：2006-06-13
申请号：US10107825
申请日：2002-03-28
申请人： Yuki Shiota , Osamu Nozawa , Hideaki Mitsui
发明人： Yuki Shiota , Osamu Nozawa , Hideaki Mitsui
IPC分类号： G01F9/00
CPC分类号： G03F1/32 , G03F1/58
摘要： A halftone phase-shift mask blank, in which the phase shifter film is composed of two layers, a low-transmission layer having a principal function of transmittance control, and a high-transmission layer having a principal function of phase shift control, the extinction coefficient K1 of the low-transmission layer and the extinction coefficient K2 of the high-transmission layer satisfy K2
摘要翻译：半色调相移掩模空白，其中移相器膜由两层组成，具有透射控制主要功能的低透射层和具有相移控制的主要功能的高透射层，消光高透射层的低透射层的系数K L1和消光系数K 2 <2>满足K <2 < 在140nm和200nm之间的曝光波长λ1处，低透射层的厚度d 1 <1> 1 <1 <3，满足0.001 <= K 1 < 在曝光波长λ下，λ> 1/1 /λ<= 0.500。

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