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    • 1. 发明授权
    • Flow control valve
    • 流量控制阀
    • US06289922B1
    • 2001-09-18
    • US09593508
    • 2000-06-14
    • Yuji NakanoShigeru HasegawaHiroshi TakeyamaYasuyoshi Yamada
    • Yuji NakanoShigeru HasegawaHiroshi TakeyamaYasuyoshi Yamada
    • F16K5100
    • F16K31/0655F02M3/06Y10T137/7668
    • A flow control valve having a seating surface formed on a valve element to contact a valve seat when the valve is closed has a shape of a part of a hypothetical spherical surface having a spherical center at a center of a supporting member. Therefore, the distance from the center of the supporting member to the seating surface is kept constant, and the valve element can be seated at a periphery of the valve seat without a gap, even if the shaft is inclined. Thus, the valve leakage is reduced. The supporting member supports a shaft connected to the valve element movable in an axial direction of the shaft. The center of the supporting member is aligned with a center of the valve seat. Movement of the supporting member in a radial direction of the supporting member is prohibited. Therefore, the center of the supporting member is not displaced from the center of the valve seat in the radial direction. Accordingly, the displacement of the shaft in the radial direction can be prevented. Therefore, the valve element is certainly seated on the valve seat, and the valve leakage is prevented.
    • 具有形成在阀体上的座面的阀门阀,当阀关闭时与阀座接触的流量控制阀具有在支撑构件的中心具有球面中心的假想球面的一部分的形状。 因此,即使轴倾斜,从支撑构件的中心到座面的距离保持恒定,并且阀元件可以没有间隙而位于阀座的周边。 因此,阀泄漏减少。 支撑构件支撑连接到可在轴的轴向方向上移动的阀元件的轴。 支撑构件的中心与阀座的中心对准。 支撑构件在支撑构件的径向方向上的移动被禁止。 因此,支撑构件的中心在径向上不从阀座的中心偏移。 因此,可以防止轴在径向上的位移。 因此,阀元件确实位于阀座上,并且防止阀泄漏。
    • 2. 发明授权
    • Flow control valve for reducing valve leakage
    • 用于减少阀门泄漏的流量控制阀
    • US6095490A
    • 2000-08-01
    • US119744
    • 1998-07-21
    • Yuji NakanoShigeru HasegawaHiroshi TakeyamaYasuyoshi Yamada
    • Yuji NakanoShigeru HasegawaHiroshi TakeyamaYasuyoshi Yamada
    • F02M3/06F16K31/06F16K25/00F16K31/02
    • F16K31/0655F02M3/06
    • A flow control valve having a seating surface formed on a valve element to contact a valve seat when the valve is closed has a shape of a part of a hypothetical spherical surface having a spherical center at a center of a supporting member. Therefore, the distance from the center of the supporting member to the seating surface is kept constant, and the valve element can be seated at a periphery of the valve seat without a gap, even if the shaft is inclined. Thus, the valve leakage is reduced. The supporting member supports a shaft connected to the valve element movable in an axial direction of the shaft. The center of the supporting member is aligned with a center of the valve seat. Movement of the supporting member in a radial direction of the supporting member is prohibited. Therefore, the center of the supporting member is not displaced from the center of the valve seat in the radial direction. Accordingly, the displacement of the shaft in the radial direction can be prevented. Therefore, the valve element is certainly seated on the valve seat, and the valve leakage is prevented.
    • 具有形成在阀体上的座面的阀门阀,当阀关闭时与阀座接触的流量控制阀具有在支撑构件的中心具有球面中心的假想球面的一部分的形状。 因此,即使轴倾斜,从支撑构件的中心到座面的距离保持恒定,并且阀元件可以没有间隙而位于阀座的周边。 因此,阀泄漏减少。 支撑构件支撑连接到可在轴的轴向方向上移动的阀元件的轴。 支撑构件的中心与阀座的中心对准。 支撑构件在支撑构件的径向方向上的移动被禁止。 因此,支撑构件的中心在径向上不从阀座的中心偏移。 因此,可以防止轴在径向上的位移。 因此,阀元件确实位于阀座上,并且防止阀泄漏。
    • 4. 发明授权
    • Fluid control solenoid valve
    • 流体控制电磁阀
    • US5810030A
    • 1998-09-22
    • US652353
    • 1996-05-23
    • Hidetoshi UchiyamaShinsuke MiyazakiAkira AdachiYasuyoshi Yamada
    • Hidetoshi UchiyamaShinsuke MiyazakiAkira AdachiYasuyoshi Yamada
    • F16K31/06G05D23/02G05D23/08
    • F16K31/0655Y10T137/7737
    • A fluid control solenoid valve includes a fluid passage having a valve seat therein. The solenoid valve further includes a bellows having a valve element and a retractable bellows portion continuous with the valve element. The valve element opens the fluid passage when lifted from the valve seat, and closes the fluid passage when seated onto the valve seat. A first spring urges the valve element in a valve lifting direction away from the valve seat, while a second spring urges the valve element in a valve seating direction toward the valve seat. An electromagnetic actuator is further provided for moving the valve element in the valve lifting direction, when energized. The first spring is interposed between an adjusting screw and the valve element. The adjusting screw is arranged to be extended at a high temperature so as to increase a biasing force of the first spring urging the valve element in the valve lifting direction. This prevents a sealing load, which is applied to the valve element to cause it to be seated onto the valve seat, from increasing. Increase in sealing load would be otherwise caused due to thermal expansion of the bellows portion at the high temperature.
    • 流体控制电磁阀包括其中具有阀座的流体通道。 电磁阀还包括具有阀元件和与阀元件连续的可伸缩波纹管部分的波纹管。 阀元件在从阀座抬起时打开流体通道,并且当坐在阀座上时关闭流体通道。 第一弹簧促使阀元件沿阀提升方向远离阀座,而第二弹簧将阀元件沿阀座方向推向阀座。 进一步提供电磁致动器,用于在通电时沿阀提升方向移动阀元件。 第一弹簧介于调节螺钉和阀元件之间。 调节螺钉被布置成在高温下延伸,以增加第一弹簧沿阀提升方向推动阀元件的偏压力。 这防止了施加到阀元件使得其被安置在阀座上的密封负载增加。 由于波纹管部分在高温下的热膨胀,否则会导致密封负荷的增加。
    • 5. 发明授权
    • Mask aligner having a photo-mask setting device
    • 掩模对准器具有光掩模设定装置
    • US4655599A
    • 1987-04-07
    • US550097
    • 1983-11-09
    • Naoki AyataYasuyoshi Yamada
    • Naoki AyataYasuyoshi Yamada
    • G03F7/20G03F9/00G01B11/00
    • G03F7/70075G03F9/70
    • A mask aligner includes a photo-mask having a plurality of first marks used to align the photo-mask with a wafer and a plurality of second marks used to align the photo-mask with the mask aligner, the number of the second marks being equal to that of the first marks; a wafer having a plurality of third marks associated with the first marks; a mark providing section having a plurality of fourth marks associated with the second marks; and a detector for detecting an error in alignment between the first and third marks and also an error in alignment between the second and fourth marks, the detector including a plurality of sensors for sensing various marks in different positions, a basic form produced when the first and third marks are placed one above another being substantially the same as that produced when the second and fourth marks are placed one above another.
    • 掩模对准器包括具有用于将光掩模与晶片对准的多个第一标记的光掩模和用于将光掩模与掩模对准器对准的多个第二标记,第二标记的数量相等 到第一个标记的; 具有与所述第一标记相关联的多个第三标记的晶片; 标记提供部分,具有与第二标记相关联的多个第四标记; 以及检测器,用于检测第一和第三标记之间的对准误差以及第二和第四标记之间的对准误差,检测器包括用于感测不同位置的各种标记的多个传感器,当第一和第四标记产生的基本形式 并且第三标记被放置在另一个之上,与当第二和第四标记一个放置在另一个上时产生的基本相同。
    • 6. 发明授权
    • Apparatus for processing a signal for alignment
    • 用于处理信号进行对准的装置
    • US4487505A
    • 1984-12-11
    • US419512
    • 1982-09-17
    • Shigeki NakanoYasuyoshi YamadaRyozo Hiraga
    • Shigeki NakanoYasuyoshi YamadaRyozo Hiraga
    • G03F9/00G05D3/12H01L21/027H01L21/30G02B21/06G01B11/00
    • G03F9/70G03F9/00H01L21/30
    • An apparatus for processing a signal for aligning a mask having at least one standard mark thereon with a wafer having at least one reference mark thereon, includes a first sensor for sensing the standard mark, a second sensor for sensing the reference mark through the mask, a threshold value determining circuit for detecting a peak value from a signal stream put out by the first sensor and determining a first threshold value and for detecting a peak value from a signal stream put out by the second sensor and determining a second threshold value, a signal converting circuit for converting a signal of a higher level than the first threshold value from the signal stream put out by the first sensor into a first digital signal and for converting a signal of a higher level than the second threshold value from the signal stream put out by the second sensor into a second digital signal, and a composing circuit for composing the first digital signal and the second digital signal.
    • 一种用于处理用于将具有至少一个标准标记的掩模与其上具有至少一个参考标记的晶片对准的信号的装置,包括用于感测标准标记的第一传感器,用于通过掩模感测参考标记的第二传感器, 阈值确定电路,用于从由第一传感器输出的信号流检测峰值,并确定第一阈值,并从第二传感器输出的信号流中检测峰值,并确定第二阈值; 信号转换电路,用于将来自第一传感器放出的信号流中的高于第一阈值的信号转换为第一数字信号,并从信号流中转换比第二阈值高的信号 由第二传感器输出到第二数字信号中,以及用于组成第一数字信号和第二数字信号的合成电路。
    • 7. 发明授权
    • Mask aligner with a wafer position detecting device
    • 掩模对准器与晶片位置检测装置
    • US4794648A
    • 1988-12-27
    • US42534
    • 1987-04-27
    • Naoki AyataYasuyoshi Yamada
    • Naoki AyataYasuyoshi Yamada
    • G03F9/00G06K9/00
    • G03F9/7069G03F9/7023
    • A mask aligner includes a TV image pick-up device having a wide field angle and picking up the image of a wafer detection pattern on an image pick-up station to generate TV signals at the output, a fine alignment device for detecting a positional deviation of the wafer relative to a mask in an exposure station with the detected result being used to align the wafer with the mask, a transport stage for carrying and transporting the wafer from the image pick-up station to the exposure station, a processing device for determining the positional deviation of the wafer relative to the reference position on the image pick-up stage in accordance with the TV signals, and a drive for moving the transport stage so as to remove the positional deviation of the wafer relative to the reference position of the exposure station.
    • 掩模对准器包括具有宽场角的TV图像拾取装置,并且拾取图像拾取站上的晶片检测图案的图像以在输出端产生TV信号,用于检测位置偏差的精细对准装置 的晶片相对于曝光站中的掩模,其检测结果用于将晶片与掩模对准,用于将晶片从图像拾取站传送并传送到曝光站的传送台,用于 根据TV信号确定晶片相对于图像拾取台上的参考位置的位置偏差;以及用于移动传送台的驱动器,以便消除晶片相对于参考位置的位置偏差 曝光站。
    • 8. 发明授权
    • Position detection signal processing apparatus
    • 位置检测信号处理装置
    • US4599000A
    • 1986-07-08
    • US465103
    • 1983-02-09
    • Yasuyoshi Yamada
    • Yasuyoshi Yamada
    • G01B11/00G01B21/00G03F9/00
    • G03F9/70
    • Disclosed is a position detection signal processing apparatus to be used with a first body having a first pattern for alignment and a second body having a second pattern. The apparatus includes a pattern detecting device for detecting the first and second patterns and producing a detection signal stream, an expectation pulse forming circuit for forming an expectation pulse signal for specifying the portion of the detection signal stream in which the probability with which signals corresponding to the first and second patterns exist is high, and a true signal forming circuit for forming true signal streams corresponding to the first and second patterns from the detection signal stream and the expectation pulse signal.
    • 公开了一种位置检测信号处理装置,其与具有用于对准的第一图案的第一主体和具有第二图案的第二主体一起使用。 该装置包括用于检测第一和第二图案并产生检测信号流的图案检测装置,用于形成用于指定检测信号流的部分的期望脉冲信号的期望脉冲形成电路,其中与 存在第一和第二图案,以及真正的信号形成电路,用于从检测信号流和期望脉冲信号形成对应于第一和第二图案的真实信号流。
    • 9. 发明授权
    • Apparatus for processing a signal for aligning
    • 用于处理用于对准的信号的装置
    • US4515481A
    • 1985-05-07
    • US419511
    • 1982-09-17
    • Yasuyoshi YamadaRyozo Hiraga
    • Yasuyoshi YamadaRyozo Hiraga
    • G03F9/00G05D3/12H01L21/027H01L21/30G01B11/00
    • G03F9/70G03F9/00H01L21/30
    • An apparatus for processing a signal for aligning a first object having at least one standard mark thereon with a second object having at least one reference mark thereon, includes a first sensor for sensing the standard mark, second sensor for sensing the reference mark through the first object, an illumination source for illuminating the standard mark and the reference mark, a first extracting circuit for extracting a signal concerning the standard mark from the signal stream of the first sensor, a second extracting circuit for extracting a signal concerning the reference mark from the signal stream of the second sensor, and a signal composing circuit for composing the signal concerning the standard mark and the signal concerning the reference mark.
    • 一种用于处理信号的装置,用于将具有至少一个标准标记的第一物体与其上具有至少一个参考标记的第二物体对准,包括用于感测标准标记的第一传感器,用于通过第一传感器感测参考标记的第二传感器 物体,用于照亮标准标记和参考标记的照明源,用于从第一传感器的信号流中提取关于标准标记的信号的第一提取电路,用于从第一传感器的信号流中提取关于参考标记的信号的第二提取电路 第二传感器的信号流,以及用于构成关于标准标记的信号和关于参考标记的信号的信号组合电路。
    • 10. 发明授权
    • Exposure unit, exposure system and device manufacturing method
    • 曝光单元,曝光系统和装置制造方法
    • US06185474B2
    • 2001-02-06
    • US09034019
    • 1998-03-02
    • Takashi NakamuraYasuyoshi YamadaSatoshi Kyotoku
    • Takashi NakamuraYasuyoshi YamadaSatoshi Kyotoku
    • G05D100
    • G03F7/70525
    • A network type exposure unit connected via a communication network to other exposure units or to an information processor determines whether or not exposure work information of the instructed kind of exposure work is in the storage thereof. When the instructed exposure work information is determined to be non-existent, the unit inquires of the other exposure units or a host equipment whether or not there is therein the exposure work information, and decides executability of the exposure work requested to be started from the result thereof. The exposure work information can be transferred between arbitrary units, thereby alleviating complexity of maintenance and management of the exposure work information.
    • 经由通信网络连接到其他曝光单元或信息处理器的网络曝光单元确定所指示的曝光工作的曝光作业信息是否在其存储中。 当指定的曝光工作信息被确定为不存在时,单元询问其他曝光单元或主机设备,其中是否存在曝光作业信息,并且从所述曝光单元或主机设备的请求开始的曝光工作的可执行性确定 结果。 曝光工作信息可以在任意单元之间传送,从而减轻了曝光工作信息的维护和管理的复杂性。