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    • 1. 发明授权
    • Mask aligner with a wafer position detecting device
    • 掩模对准器与晶片位置检测装置
    • US4794648A
    • 1988-12-27
    • US42534
    • 1987-04-27
    • Naoki AyataYasuyoshi Yamada
    • Naoki AyataYasuyoshi Yamada
    • G03F9/00G06K9/00
    • G03F9/7069G03F9/7023
    • A mask aligner includes a TV image pick-up device having a wide field angle and picking up the image of a wafer detection pattern on an image pick-up station to generate TV signals at the output, a fine alignment device for detecting a positional deviation of the wafer relative to a mask in an exposure station with the detected result being used to align the wafer with the mask, a transport stage for carrying and transporting the wafer from the image pick-up station to the exposure station, a processing device for determining the positional deviation of the wafer relative to the reference position on the image pick-up stage in accordance with the TV signals, and a drive for moving the transport stage so as to remove the positional deviation of the wafer relative to the reference position of the exposure station.
    • 掩模对准器包括具有宽场角的TV图像拾取装置,并且拾取图像拾取站上的晶片检测图案的图像以在输出端产生TV信号,用于检测位置偏差的精细对准装置 的晶片相对于曝光站中的掩模,其检测结果用于将晶片与掩模对准,用于将晶片从图像拾取站传送并传送到曝光站的传送台,用于 根据TV信号确定晶片相对于图像拾取台上的参考位置的位置偏差;以及用于移动传送台的驱动器,以便消除晶片相对于参考位置的位置偏差 曝光站。
    • 2. 发明授权
    • Mask aligner having a photo-mask setting device
    • 掩模对准器具有光掩模设定装置
    • US4655599A
    • 1987-04-07
    • US550097
    • 1983-11-09
    • Naoki AyataYasuyoshi Yamada
    • Naoki AyataYasuyoshi Yamada
    • G03F7/20G03F9/00G01B11/00
    • G03F7/70075G03F9/70
    • A mask aligner includes a photo-mask having a plurality of first marks used to align the photo-mask with a wafer and a plurality of second marks used to align the photo-mask with the mask aligner, the number of the second marks being equal to that of the first marks; a wafer having a plurality of third marks associated with the first marks; a mark providing section having a plurality of fourth marks associated with the second marks; and a detector for detecting an error in alignment between the first and third marks and also an error in alignment between the second and fourth marks, the detector including a plurality of sensors for sensing various marks in different positions, a basic form produced when the first and third marks are placed one above another being substantially the same as that produced when the second and fourth marks are placed one above another.
    • 掩模对准器包括具有用于将光掩模与晶片对准的多个第一标记的光掩模和用于将光掩模与掩模对准器对准的多个第二标记,第二标记的数量相等 到第一个标记的; 具有与所述第一标记相关联的多个第三标记的晶片; 标记提供部分,具有与第二标记相关联的多个第四标记; 以及检测器,用于检测第一和第三标记之间的对准误差以及第二和第四标记之间的对准误差,检测器包括用于感测不同位置的各种标记的多个传感器,当第一和第四标记产生的基本形式 并且第三标记被放置在另一个之上,与当第二和第四标记一个放置在另一个上时产生的基本相同。
    • 4. 发明授权
    • Image processing apparatus
    • 图像处理装置
    • US4538182A
    • 1985-08-27
    • US374102
    • 1982-05-03
    • Seiji SaitoNaoki AyataHidetoshi SuzukiKunitaka OzawaNoboru Koumura
    • Seiji SaitoNaoki AyataHidetoshi SuzukiKunitaka OzawaNoboru Koumura
    • H04N1/387H04N1/62H04N1/40
    • H04N1/3872H04N1/62
    • An image processing apparatus has CCDs for reading image data of an original, an edge detector for detecting edges of an area specified on the original with a loop or marks of a specific color, an area detector for detecting the specified area, memories for storing the image data read by the CCDs, and a data selector and a data switching circuit for selecting the image data read by one of the CCDs which is to be supplied to an inkjet head for recording. For preventing contamination of the original, the loop or marks can be drawn on the original through an original cover including a transparent or semitransparent sheet member facing the image of the original. Images inside and outside the area or areas can be selectively reproduced in various combinations of the normal mode, red output modes involving different types of color conversion, and extinguishing mode. Image data from another source which is stored in another memory can be inserted at a desired part of the reproduced copy.
    • 图像处理装置具有用于读取原稿的图像数据的CCD,用于检测具有特定颜色的循环或标记的原稿上指定的区域的边缘的边缘检测器,用于检测指定区域的存储器,用于存储 由CCD读取的图像数据,以及数据选择器和数据切换电路,用于选择要供应到用于记录的喷墨头的CCD之一读取的图像数据。 为了防止原稿的污染,可以通过包括面向原稿的图像的透明或半透明片材的原件盖将原件上的环或标记拉出。 可以以常规模式,涉及不同类型的颜色转换的红色输出模式和熄灭模式的各种组合来选择性地再现区域或区域内外的图像。 存储在另一个存储器中的另一个源的图像数据可以被插入到再现的拷贝的期望部分。
    • 5. 发明授权
    • Solid-state photoelectric transducer
    • 固态光电传感器
    • US4390791A
    • 1983-06-28
    • US247752
    • 1981-03-26
    • Katsunori HatanakaShunichi UzawaYutaka HiraiNaoki Ayata
    • Katsunori HatanakaShunichi UzawaYutaka HiraiNaoki Ayata
    • H01L27/146H01J40/14
    • H01L27/14665
    • A solid-state photoelectric transducer comprises a plurality of output units for photoelectrically converted signals which units are constructed of: a plurality of photoelectric converter elements, a plurality of signal accumulators for accumulating signals output from said photoelectric converter elements corresponding to an amount of light incident on said photoelectric converter elements, each of said signal accumulators being connected with an associated one of said photoelectric converter elements; a plurality of devices for returning the signal accumulators from a signal accumulating state to an initial state, each of said devices being connected with an associated one of the signal accumulators; a plurality of signal amplifiers for outputting amplified signals corresponding to the signals accumulated in the signal accumulators, each signal amplifier being connected with an associated signal accumulator; and a plurality of cross-talk preventors for preventing cross-talk of the signal output from each signal amplifier, each signal amplifier being provided with one of the cross-talk preventors; a plurality of said signal amplifiers being exclusively selected by a unit selecting signal in each of said output units, said output units having a controlling line which transmits a controlling signal for controlling each of the return devices to the initial state in common, and the signal amplifiers of the same level in each output unit having a signal output line in common.
    • 固态光电变换器包括多个用于光电转换信号的输出单元,其单元由以下构成:多个光电转换元件,多个信号累加器,用于累积从所述光电转换元件输出的信号,该信号对应于入射光量 在所述光电转换元件上,每个所述信号存储器与所述光电转换元件中的相关联的一个连接; 用于将信号累加器从信号累积状态返回到初始状态的多个装置,每个所述装置与相关联的一个信号累加器连接; 多个信号放大器,用于输出对应于积累在信号累加器中的信号的放大信号,每个信号放大器与相关联的信号累加器连接; 以及用于防止从每个信号放大器输出的信号的串扰的多个串扰防止器,每个信号放大器设置有串扰防止器之一; 多个所述信号放大器由每个所述输出单元中的单元选择信号专门选择,所述输出单元具有控制线,所述控制线将用于将每个返回装置的每个返回装置共同控制到初始状态,并且所述信号 每个输出单元中具有相同电平的放大器具有共同的信号输出线。
    • 9. 发明授权
    • Method of detecting position of a mark
    • 检测标记位置的方法
    • US4933715A
    • 1990-06-12
    • US301366
    • 1989-01-25
    • Yuichi YamadaNaoki AyataHiroki SuzukawaHideki Nogawa
    • Yuichi YamadaNaoki AyataHiroki SuzukawaHideki Nogawa
    • G01B11/00G03F9/00H01L21/027H01L21/30H01L21/68
    • G03F9/70
    • A mark detecting method and device suitably applicable to the alignment of a reticle in a semiconductor device manufacturing exposure apparatus, called a stepper, is disclosed. A mark is provided by repeated patterns having specific pitches. These patterns are set so that at least one pitch of the patterns differs, on a light-receiving surface of an image sensor which receives an image of the mark, from a multiple, by an integral number, of the sampling pitch (pitch of picture elements) of the image sensor. In one preferred form, the mark is formed by repeated patterns of a number N (.gtoreq.2), wherein at least one pitch Pp of the patterns satisfies, on the light-receiving surface of the image sensor, a relationship Pp=(m+n/N).times.Pix where m is an arbitrary number, n is an integral number which satisfies 1.ltoreq.n.ltoreq.N, and Pix is the sampling pitch of the image sensor. The image of such a mark is photoelectrically converted to thereby determine the position of the mark. With the proposed concept, any error which might be caused upon quantization of the mark image by the picture elements of the image sensor can be canceled or compensated at the time of calculation of the mark center. Therefore, the precision of the mark center detection can be improved.
    • 公开了适用于半导体装置制造用曝光装置(称为步进机)中的掩模版的取向的标记检测方法和装置。 通过具有特定间距的重复图案提供标记。 这些图案被设置为使得图案的至少一个间距在从接收标记的图像的图像传感器的光接收表面上的不同之处,取决于采样间距(图像的间距) 元素)。 在一个优选形式中,标记由数目N(> / = 2)的重复图案形成,其中图案的至少一个间距Pp在图像传感器的光接收表面上满足关系Pp =( m + n / N)xPix其中m是任意数,n是满足1≤n≤N的整数,并且Pix是图像传感器的采样间距。 这样的标记的图像被光电转换,从而确定标记的位置。 利用所提出的概念,可以在计算标记中心时消除或补偿由图像传感器的图像元素对标记图像进行量化时可能引起的任何错误。 因此,可以提高标记中心检测的精度。
    • 10. 发明授权
    • Alignment method usable in a step-and-repeat type exposure apparatus for
either global or dye-by-dye alignment
    • 可用于全球或逐个染料对齐的步进重复型曝光装置中的对准方法
    • US4918320A
    • 1990-04-17
    • US170359
    • 1988-03-18
    • Bunei HamasakiHajime IgarashiAkiya NakaiNaoki Ayata
    • Bunei HamasakiHajime IgarashiAkiya NakaiNaoki Ayata
    • G03F9/00
    • G03F9/7003
    • A method of aligning a semiconductor wafer, usable in a step-and-repeat type exposure apparatus for projecting, in a reduced scale, images of a pattern formed on a reticle upon different shot areas on the semiconductor wafer in a predetermined sequence. According to this alignment method, the wafer is moved stepwise before the initiation of step-and-repeat exposures of the shot areas on the wafer and in accordance with a predetermined layout grid concerning the sites of the shot areas on the wafer. While moving the wafer stepwise in this manner, any positional deviation of each of some of the shot areas with respect to the layout grid is measured by use of a reduction projection lens system and, from the results of measurement, a corrected grid is prepared according to which grid the amount of stepwise movement of the wafer to be made for the step-and-repeat exposures thereof is determined. By this, for the exposures, the wafer can be moved stepwise exactly in accordance with the actual layout of the shot areas. Sample shot areas which are the subject of measurement can be selected under predetermined conditions. Additionally, of the values obtained as a result of the measurement, any extraordinary one or ones may be determined on the basis of the variance and then are excluded at the time of calculations made to determine the corrected grid. Thus, the stepwise movement of the wafer for the step-and-repeat exposures thereof can be controlled with higher precision.
    • 一种可用于步进重复型曝光装置中的半导体晶片的对准方法,用于以预定的顺序,在半导体晶片上的不同照射区域上以缩小的尺度投影形成在掩模版上的图案的图像。 根据这种对准方法,晶片在晶片上的拍摄区域的重复曝光开始之前逐步移动,并且根据关于晶片上的照射区域的位置的预定布局网格。 当以这种方式逐步移动晶片时,通过使用还原投影透镜系统来测量相对于布局格栅的一些照射区域中的每一个的任何位置偏差,并且根据测量结果,根据 确定要进行步进重复曝光的晶圆的逐步移动量。 由此,对于曝光,晶片可以根据拍摄区域的实际布局精确地逐步移动。 作为测量对象的采样拍摄区域可以在预定条件下选择。 此外,作为测量结果获得的值,可以基于方差来确定任何非常一个或一个,然后在进行计算时排除以确定校正的网格。 因此,可以更高精度地控制用于步进重复曝光的晶片的逐步移动。