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1. 发明授权

US5750951A Power supply system for an electric discharge machine 失效
标题翻译：放电机电源系统
公开(公告)号：US5750951A
公开(公告)日：1998-05-12
申请号：US495627
申请日：1995-08-04
申请人： Yuji Kaneko , Tadao Ueda , Yoshihiro Watanabe , Tatsuo Toyonaga
发明人： Yuji Kaneko , Tadao Ueda , Yoshihiro Watanabe , Tatsuo Toyonaga
IPC分类号： B23H1/02 , B23H7/04
CPC分类号： B23H1/022 , B23H1/02 , B23H2300/22
摘要： A transformer converts high frequency pulses, transmitted through a coaxial cable from a power supply unit positioned at a distance from a gap formed between a tool electrode and a workpiece and having a direct current power supply and switching element, into high frequency alternating current pulses, and is connected to that gap. The transformer includes a ring core, a primary winding connected to the coaxial cable, and a secondary winding connected to the gap. Preferably, these windings will have a minimum number of turns. Further, a bypass means is provided which selectively passes the direct current pulse from the direct current power supply or the alternating current pulse induced in the transformer to the gap. It is preferable to house the bypass means and the transformer in a single case positioned in the vicinity of the gap.
摘要翻译： PCT No.PCT / JP95 / 00232 Sec。 371日期：1995年8月4日 102（e）日期1995年8月4日PCT提交1995年2月17日PCT公布。出版物WO95 / 22426 日期1995年8月24日变压器转换高频脉冲，通过同轴电缆从位于距工具电极和工件之间的间隙一定距离的电源单元传输，并具有直流电源和开关元件，频率交流脉冲，并连接到该间隙。变压器包括环形芯，连接到同轴电缆的初级绕组和连接到间隙的次级绕组。优选地，这些绕组将具有最小匝数。此外，提供了一种旁路装置，其选择性地将来自直流电源的直流脉冲或在变压器中感应的交流电脉冲通过到间隙。优选地将旁路装置和变压器放置在位于间隙附近的单个壳体中。

2. 发明授权

US5770831A Power supply system for an electric discharge machine 失效
标题翻译：放电机电源系统
公开(公告)号：US5770831A
公开(公告)日：1998-06-23
申请号：US564324
申请日：1995-12-19
申请人： Yuji Kaneko , Tadao Ueda
发明人： Yuji Kaneko , Tadao Ueda
IPC分类号： B23H1/02 , B23H7/04
CPC分类号： B23H1/022 , B23H2300/20 , B23H2300/22
摘要： First power supply circuit 8, second power supply circuit 6, and third power supply circuit 9 are connected to form a power supply unit 5. The first power supply circuit 8 includes a direct current power supply 8A and switching element 8B. The power supply circuit 8 does not include any substantial resistance, and has comparatively low inductance and impedance characteristics. The power supply circuit 6 includes a direct current power supply 6A, switching element 6B, and current limiting resistor 6C. The power supply circuits 6, 8, and 9 are connected to the gap using a cable 11 as a common interconnect. A high frequency alternating current circuit is formed by the power supply circuit 8, conductor 11, coupling transformer 13, and the gap. In this event, switches 6F, 6G, 9F, and 9G, associated with power supply circuits 6 and 9, are opened, and the power supply circuits 6 and 9 are completely disconnected from the above high frequency alternating current circuit. It is preferable that the switches 6G, 6F, 9F, and 9 G be butt-type switch devices which will completely disconnect and connect the power supply circuits 6 and 8. Also, when using the high frequency alternating current, it is desirable to use an appropriate detection device 30 having a photocoupler 35 as the means for detecting the gap voltage.
摘要翻译： PCT No.PCT / JP95 / 00826 Sec。 371 1995年12月19日第 102（e）日期1995年12月19日PCT 1995年4月26日PCT PCT。第WO95 / 29031号公报日期1995年11月2日第一电源电路8，第二电源电路6和第三电源电路9被连接以形成电源单元5.第一电源电路8包括直流电源8A和开关元件8B 。电源电路8不包含任何实质的电阻，并且具有较低的电感和阻抗特性。电源电路6包括直流电源6A，开关元件6B和限流电阻器6C。使用电缆11将电源电路6,8和9连接到间隙，作为公共互连。高频交流电路由电源电路8，导体11，耦合变压器13和间隙构成。在这种情况下，与电源电路6和9相关联的开关6F，6G，9F和9G被断开，电源电路6和9与上述高频交流电路完全断开。优选的是，开关6G，6F，9F和9G是将完全断开并连接电源电路6和8的对接型开关装置。而且，当使用高频交流电时，最好使用具有作为用于检测间隙电压的装置的光电耦合器35的合适的检测装置30。

3. 发明授权

US06428638B2 Process for producing sputtering target materials 失效
公开(公告)号：US06428638B2
公开(公告)日：2002-08-06
申请号：US09832448
申请日：2001-04-10
申请人： Lijun Yao , Tadao Ueda
发明人： Lijun Yao , Tadao Ueda
IPC分类号： C22F100
CPC分类号： C22F1/183 , C22F1/04 , C22F1/08 , C23C14/3414
摘要： The invention includes methods of reducing grain sizes of materials, and methods of forming sputtering targets. The invention includes a method for producing a sputtering target material in which a metallic material is subjected to plastic working at a processing percentage of at least 5% and a processing rate of at least 100%/second. In particular applications the metallic material comprises one or more of aluminum, copper and titanium.

4. 发明授权

US5541007A Aluminum alloy wiring layer and aluminum alloy sputtering target 失效
标题翻译：铝合金布线层和铝合金溅射靶
公开(公告)号：US5541007A
公开(公告)日：1996-07-30
申请号：US277073
申请日：1994-07-19
申请人： Tadao Ueda , Kazunari Takemura
发明人： Tadao Ueda , Kazunari Takemura
IPC分类号： C22C21/00 , H01L23/532 , B32B15/20 , C22F1/04
CPC分类号： C22C21/00 , H01L23/53219 , H01L2924/0002 , Y10T428/12528 , Y10T428/12736
摘要： An aluminum alloy wiring layer comprising 0.01 to 1.0 wt. % of scandium, or 0.01 to 1.0 wt. % of scandium and 0.01 to 3.0 wt. % of at least one element selected from the group consisting of silicon, titanium, copper, boron, hafnium and rare-earth elements other than scandium, and the balance aluminum having a purity of not less than 99.99%. A process for producing the same and an aluminum alloy sputtering target used therefor are also disclosed. The aluminum alloy wiring layer of the present invention is suitable as an advanced large-scale integrated circuit.
摘要翻译：一种铝合金布线层，其含有0.01〜1.0重量％％的钪，或0.01〜1.0wt。％的钪和0.01〜3.0wt。选自硅，钛，铜，硼，铪和钪以外的稀土元素中的至少一种元素的％，余量为99.99％的纯度的铝。还公开了一种其制造方法和用于其的铝合金溅射靶。本发明的铝合金布线层适合作为先进的大型集成电路。

5. 发明授权

US06416595B2 Material comprising titanium 失效
标题翻译：钛材料
公开(公告)号：US06416595B2
公开(公告)日：2002-07-09
申请号：US09833504
申请日：2001-04-09
申请人： Lijun Yao , Tadao Ueda
发明人： Lijun Yao , Tadao Ueda
IPC分类号： C22C1400
CPC分类号： C22F1/183 , C22F1/04 , C22F1/08 , C23C14/3414
摘要： A titanium material with titanium grains, wherein the average crystal grain size is less than 4 &mgr;m. The material is at least 99.99% (4N purity) titanium. The alloy is especially useful as a sputtering target. The material is produced by processing the material with plastic working of at least 5% at a rate of at least 100%/second.
摘要翻译：具有钛颗粒的钛材料，其中平均晶粒尺寸小于4μm。该材料至少为99.99％（4N纯度）钛。该合金作为溅射靶特别有用。该材料通过以至少5％的塑性加工方式以至少100％/秒的速率进行加工。

6. 发明授权

US06746553B2 Process for producing sputtering target materials 失效
标题翻译：溅射靶材的制造工艺
公开(公告)号：US06746553B2
公开(公告)日：2004-06-08
申请号：US10165569
申请日：2002-06-07
申请人： Lijun Yao , Tadao Ueda
发明人： Lijun Yao , Tadao Ueda
IPC分类号： C22F100
CPC分类号： C22F1/183 , C22F1/04 , C22F1/08 , C23C14/3414
摘要： The invention includes methods of reducing grain sizes of materials, and methods of forming sputtering targets. The invention includes a method for producing a sputtering target material in which a metallic material is subjected to plastic working at a processing percentage of at least 5% and a processing rate of at least 100%/second. In particular applications the metallic material comprises one or more of aluminum, copper and titanium.
摘要翻译：本发明包括减少材料的晶粒尺寸的方法和形成溅射靶的方法。本发明包括一种制造溅射靶材料的方法，其中金属材料以至少5％的加工百分比和至少100％/秒的加工率进行塑性加工。在具体应用中，金属材料包括铝，铜和钛中的一种或多种。

7. 发明授权

US06423161B1 High purity aluminum materials 失效
标题翻译：高纯度铝材料
公开(公告)号：US06423161B1
公开(公告)日：2002-07-23
申请号：US09627496
申请日：2000-07-28
申请人： Lijun Yao , Tadao Ueda
发明人： Lijun Yao , Tadao Ueda
IPC分类号： C22C2100
CPC分类号： C22F1/183 , C22F1/04 , C22F1/08 , C23C14/3414
摘要： The invention includes a material containing aluminum grains which have an average grain size of less than 20 &mgr;m. The material contains manganese, with a total non-aluminum content of 0.01 to 10.0% by weight. The material is preferably used as a sputtering target. A sputtering target is produced by subjecting the material to plastic working at a processing percentage of at least 5% at a processing rate of at least 100%/second.
摘要翻译：本发明包括平均粒径小于20μm的含有铝颗粒的材料。该材料含有锰，总非铝含量为0.01至10.0重量％。该材料优选用作溅射靶。通过以至少100％/秒的加工速率使材料以至少5％的加工百分比进行塑性加工来制造溅射靶。

8. 发明授权

US4137136A Method for electrolyzing alkali metal halide aqueous solution 失效
标题翻译：电解碱金属卤化物水溶液的方法
公开(公告)号：US4137136A
公开(公告)日：1979-01-30
申请号：US841436
申请日：1977-10-12
申请人： Tadao Ueda , Teruo Nagaya , Koji Kawada
发明人： Tadao Ueda , Teruo Nagaya , Koji Kawada
IPC分类号： C25B9/00 , C25B1/46 , C25B9/08 , C25B9/18 , C25B1/26 , C25B1/34
CPC分类号： C25B9/18 , C25B1/46
摘要： This invention relates to a method for electrolyzing an alkali metal halide aqueous solution in a three-chamber horizontal type electrolytic cell which comprises a top cathode chamber bounded by a cation exchange membrane, a middle chamber, and a bottom anode chamber bounded by a diaphragm. Halogen gas and dilute alkali metal halide solution are taken out of the anode chamber in such a manner as to make the anode chamber work as a gas chamber.
摘要翻译：本发明涉及三室卧式电解池中碱金属卤化物水溶液的电解方法，该方法包括由阳离子交换膜，中间室和由隔膜限定的底部阳极室界定的顶部阴极室。将卤素气体和稀碱金属卤化物溶液以阳极室作为气室的方式从阳极室中取出。

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