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    • 7. 发明授权
    • Exposure system for image recording apparatus
    • 图像记录装置曝光系统
    • US4908653A
    • 1990-03-13
    • US204239
    • 1988-06-09
    • Akira SagoMasashi UedaOsamu TakagiYumio MatsumotoKiyoharu Hayakawa
    • Akira SagoMasashi UedaOsamu TakagiYumio MatsumotoKiyoharu Hayakawa
    • G03B27/32G03F7/00G03B17/00
    • G03F7/0022G03B27/32G03B2227/325
    • An exposure system for use in an image recording apparatus includes a photosensitive and pressure-sensitive recording sheet which is sensitive to light in a certain wavelength range. The exposure system also includes a light source disposed on one side of the photosensitive and pressure-sensitive recording medium for applying the light in the predetermined wavelength range to the photosensive and pressure-sensitive recording medium through a first original, and a space region disposed on said one side for accommodating therein an optional exposure unit for optionally exposing the photosensitive and pressure-sensitive recording medium through a second original. The light source is movable while applying the light to the photosensitive and pressure-sensitive recording medium through the first original. The exposure system also includes a rest area for resting the light source out of a light path along which the optional exposure unit exposes the photosensitive and pressure-sensitive recording medium through the second original.
    • 用于图像记录装置的曝光系统包括对特定波长范围的光敏感的感光和压敏记录片材。 曝光系统还包括设置在感光和压敏记录介质的一侧的光源,用于通过第一原稿将预定波长范围的光施加到光敏和压敏记录介质上,并且设置在 所述一侧用于容纳可选的曝光单元,用于可选地通过第二原稿曝光感光和压敏记录介质。 光源可移动,同时通过第一原稿将光施加到感光和压敏记录介质上。 曝光系统还包括用于将光源从光路中静止的休息区域,沿着该路径可选的曝光单元通过第二原稿曝光感光和压敏记录介质。