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    • 2. 发明授权
    • Cad apparatus for designing pattern of electric circuit
    • 用于设计电路图案的CAD设备
    • US5404309A
    • 1995-04-04
    • US830424
    • 1992-01-31
    • Hirohisa YamamotoToshiaki NagakawaTakuji Kurimoto
    • Hirohisa YamamotoToshiaki NagakawaTakuji Kurimoto
    • H05K3/00G06F17/50H01L27/08H05K1/16
    • H01L27/0802G06F17/5068H05K1/16H05K3/0005
    • A CAD apparatus for designing a pattern of an electric circuit, is provided with: a printed resistor shape parameter storing unit for storing values of printed resistor shape parameters including a maximum aspect ratio and a minimum aspect ratio of a printed resistor, which pattern is to be designed; a resistor parameter storing unit for storing values of resistor parameters including a necessary resistance of the printed resistor; a resistor material table storing unit for storing a resistor material table including names of various resistor materials and resistances per unit area of the various resistor materials correspondingly; and an optimum resistor material name storing unit for storing an optimum resistor material name of the printed resistor. The CAD apparatus is also provided with an optimum resistor material selecting unit for calculating aspect ratios of the various resistor materials according to a predetermined rule based on the resistances of the various resistor materials and the necessary resistance, selecting the optimum resistor material according to a predetermined rule based on the values of the calculated aspect ratios and the values of the maximum and minimum aspect ratios, and storing the name of the selected optimum resistor material into the optimum resistor material name storing unit.
    • 一种用于设计电路图案的CAD装置,具有:印刷电阻器形状参数存储单元,用于存储包括印刷电阻器的最大纵横比和最小纵横比的印刷电阻器形状参数的值,该图形为 设计; 电阻器参数存储单元,用于存储包括印刷电阻器的必要电阻的电阻器参数的值; 电阻材料表存储单元,用于相应地存储包含各种电阻材料的各种电阻材料的名称和每单位面积的电阻的电阻器材料表; 以及用于存储印刷电阻器的最佳电阻器材料名称的最佳电阻器材料名称存储单元。 CAD装置还设置有最佳电阻材料选择单元,用于根据各种电阻材料的电阻和所需的电阻,根据预定规则计算各种电阻材料的纵横比,根据预定的方式选择最佳电阻材料 基于计算的宽高比和最大和最小纵横比的值的规则,并将所选择的最佳电阻材料的名称存储到最佳电阻材料名称存储单元中。
    • 3. 发明申请
    • Method of manufacturing a semiconductor device and the semiconductor device
    • 制造半导体器件和半导体器件的方法
    • US20070026632A1
    • 2007-02-01
    • US11492823
    • 2006-07-26
    • Hirohisa Yamamoto
    • Hirohisa Yamamoto
    • H01L21/76
    • H01L21/76235H01L29/785
    • The present invention provides a method of manufacturing a trench with a rounded corner portion and a broadened opening. Anisotropic oxidation is carried out using a halogen oxidation method using dichloroethylene (DCE) to form an anisotropic oxide film such that the film thickness in a shoulder portion of the trench is thick and gradually decreases nearer the bottom, the anisotropic oxide film is removed, and the shoulder portion of the trench is preferentially backed off, thereby rounding the shoulder portion sufficiently to broaden the opening. Then, an insulating member is embedded in the trench. The rounded portion of the shoulder portion of the trench and vicinity thereof is used as a channel of a MOS transistor.
    • 本发明提供一种制造具有圆角部分和开阔开口的沟槽的方法。 使用二氯乙烯(DCE)的卤素氧化法进行各向异性氧化,形成各向异性氧化膜,使得沟槽的肩部的膜厚变厚,逐渐降低到更接近底部,去除各向异性氧化膜, 优选地将沟槽的肩部退回,从而使肩部充分地倒圆以拓宽开口。 然后,绝缘构件嵌入沟槽中。 沟槽及其附近的肩部的圆形部分被用作MOS晶体管的沟道。
    • 4. 发明授权
    • Exchange servicing development support system with a function of automatic replacement of edited contents
    • 交换服务开发支持系统具有自动替换编辑内容的功能
    • US06631376B1
    • 2003-10-07
    • US09471197
    • 1999-12-23
    • Hirohisa YamamotoTakashi Shinoda
    • Hirohisa YamamotoTakashi Shinoda
    • G06F1730
    • G06F8/10Y10S707/99933Y10S707/99945
    • An exchange servicing development support system automatically replaces definition contents and creates generation codes to new specifications, even if interfacing is changed, by reading servicing definition result files stored in accordance with old specifications. By providing a unit for re-constructing service tree structure data in a format in accordance with information about compatibility description in a menu describing file, the service tree structure data is automatically created. Since information about compatibility is allocated to the menu describing a file stored in the storage device, each unit in the data processing device is adapted to be used for a general purpose. The description of replacement of various patterns can be made by descriptions of information about compatibility in the menu describing file.
    • 交换服务开发支持系统通过读取根据旧规范存储的服务定义结果文件,自动替换定义内容并将生成代码创建为新规范,即使接口更改。 通过提供用于根据关于菜单描述文件中的兼容性描述的信息的格式重新构建服务树结构数据的单元,自动创建服务树结构数据。 由于关于兼容性的信息被分配给描述存储在存储设备中的文件的菜单,所以数据处理设备中的每个单元适于用于通用目的。 可以通过描述关于菜单描述文件中的兼容性的信息来进行各种模式的替换的描述。
    • 7. 发明授权
    • Method of manufacturing a semiconductor device and the semiconductor device
    • 制造半导体器件和半导体器件的方法
    • US07745303B2
    • 2010-06-29
    • US11492823
    • 2006-07-26
    • Hirohisa Yamamoto
    • Hirohisa Yamamoto
    • H01L21/76
    • H01L21/76235H01L29/785
    • The present invention provides a method of manufacturing a trench with a rounded corner portion and a broadened opening. Anisotropic oxidation is carried out using a halogen oxidation method using dichloroethylene (DCE) to form an anisotropic oxide film such that the film thickness in a shoulder portion of the trench is thick and gradually decreases nearer the bottom, the anisotropic oxide film is removed, and the shoulder portion of the trench is preferentially backed off, thereby rounding the shoulder portion sufficiently to broaden the opening. Then, an insulating member is embedded in the trench. The rounded portion of the shoulder portion of the trench and vicinity thereof is used as a channel of a MOS transistor.
    • 本发明提供一种制造具有圆角部分和开阔开口的沟槽的方法。 使用二氯乙烯(DCE)的卤素氧化法进行各向异性氧化,形成各向异性氧化膜,使得沟槽的肩部的膜厚变厚,逐渐降低到更接近底部,去除各向异性氧化膜, 优选地将沟槽的肩部退回,从而使肩部充分地倒圆以使开口变宽。 然后,绝缘构件嵌入沟槽中。 沟槽及其附近的肩部的圆形部分被用作MOS晶体管的沟道。