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1. 发明授权

US08377503B2 Method for real-time monitoring thickness chance of coating film 有权
标题翻译：实时监测涂膜厚度变化的方法
公开(公告)号：US08377503B2
公开(公告)日：2013-02-19
申请号：US12662546
申请日：2010-04-22
申请人： Yu-Chia Tsao , Chung-Pei Lee , Ko-Shao Chen , Jia-Huey Tsao , Chun-Chih Lin , Ren-Kun Liang
发明人： Yu-Chia Tsao , Chung-Pei Lee , Ko-Shao Chen , Jia-Huey Tsao , Chun-Chih Lin , Ren-Kun Liang
IPC分类号： C23C14/54
CPC分类号： C23C16/44 , G01N21/553
摘要： A method for real-timely monitoring thickness change of a coating film is disclosed. In the method, a coating module having a chamber and a film thickness-monitoring module containing an SPR optical fiber sensor, a light source, a light-receiving detector, and optical fibers are first provided. The optical fibers are used to connect the SPR optical fiber sensor with the light source and the light-receiving detector. The SPR optical fiber sensor has a sensing area and is arranged in the chamber. The light source provides the SPR optical fiber sensor with light. Then, a substrate is put into the chamber. While coating process is performed on the substrate, a film is also formed on the sensing area of the SPR optical fiber sensor. The light-receiving detector receives signals output from the sensing area of the SPR optical fiber sensor and then outputs signals of light-intensity change.
摘要翻译：公开了一种用于实时监测涂膜厚度变化的方法。在该方法中，首先提供具有室的涂布模块和包含SPR光纤传感器，光源，光接收检测器和光纤的膜厚监测模块。光纤用于将SPR光纤传感器与光源和光接收检测器连接。 SPR光纤传感器具有感测区域，并且布置在腔室中。光源为SPR光纤传感器提供光源。然后，将基板放入室中。虽然在基板上进行涂布处理，但是也在SPR光纤传感器的感测区域上形成膜。光接收检测器接收从SPR光纤传感器的感测区域输出的信号，然后输出光强变化的信号。

2. 发明申请

US20110151107A1 Coating apparatus and method for real-timely monitoring thickness change of coating film 有权
标题翻译：涂膜设备及实时监测涂膜厚度变化的方法
公开(公告)号：US20110151107A1
公开(公告)日：2011-06-23
申请号：US12662546
申请日：2010-04-22
申请人： Yu-Chia Tsao , Chung-Pei Lee , Ko-Shao Chen , Jia-Huey Tsao , Chun-Chih Lin , Ren-Kun Liang
发明人： Yu-Chia Tsao , Chung-Pei Lee , Ko-Shao Chen , Jia-Huey Tsao , Chun-Chih Lin , Ren-Kun Liang
IPC分类号： C23C16/44 , C23C16/00
CPC分类号： C23C16/44 , G01N21/553
摘要： A method for real-timely monitoring thickness change of a coating film is disclosed. In the method, a coating module having a chamber and a film thickness-monitoring module containing an SPR optical fiber sensor, a light source, a light-receiving detector, and optical fibers are first provided. The optical fibers are used to connect the SPR optical fiber sensor with the light source and the light-receiving detector. The SPR optical fiber sensor has a sensing area and is arranged in the chamber. The light source provides the SPR optical fiber sensor with light. Then, a substrate is put into the chamber. While coating process is performed on the substrate, a film is also formed on the sensing area of the SPR optical fiber sensor. The light-receiving detector receives signals output from the sensing area of the SPR optical fiber sensor and then outputs signals of light-intensity change.
摘要翻译：公开了一种用于实时监测涂膜厚度变化的方法。在该方法中，首先提供具有室的涂布模块和包含SPR光纤传感器，光源，光接收检测器和光纤的膜厚监视模块。光纤用于将SPR光纤传感器与光源和光接收检测器连接。 SPR光纤传感器具有感测区域，并且布置在腔室中。光源为SPR光纤传感器提供光源。然后，将基板放入室中。虽然在基板上进行涂布处理，但是也在SPR光纤传感器的感测区域上形成膜。光接收检测器接收从SPR光纤传感器的感测区域输出的信号，然后输出光强变化的信号。

3. 发明申请

US20120279447A1 COATING APPARATUS AND METHOD FOR REAL-TIMELY MONITORING THICKNESS CHANGE OF COATING FILM 审中-公开
标题翻译：涂层装置和方法，用于实时监测涂膜厚度的变化
公开(公告)号：US20120279447A1
公开(公告)日：2012-11-08
申请号：US13552933
申请日：2012-07-19
申请人： Yu-Chia TSAO , Chung-Pei Lee , Ko-Shao Chen , Jia-Huey Tsao , Chun-Chih Lin , Ren-Kun Liang
发明人： Yu-Chia TSAO , Chung-Pei Lee , Ko-Shao Chen , Jia-Huey Tsao , Chun-Chih Lin , Ren-Kun Liang
IPC分类号： B05C11/00
CPC分类号： C23C16/44 , G01N21/553
摘要： A method for real-timely monitoring thickness change of a coating film is disclosed. In the method, a coating module having a chamber and a film thickness-monitoring module containing an SPR optical fiber sensor, a light source, a light-receiving detector, and optical fibers are first provided. The optical fibers are used to connect the SPR optical fiber sensor with the light source and the light-receiving detector. The SPR optical fiber sensor has a sensing area and is arranged in the chamber. The light source provides the SPR optical fiber sensor with light. Then, a substrate is put into the chamber. While coating process is performed on the substrate, a film is also formed on the sensing area of the SPR optical fiber sensor. The light-receiving detector receives signals output from the sensing area of the SPR optical fiber sensor and then outputs signals of light-intensity change.
摘要翻译：公开了一种用于实时监测涂膜厚度变化的方法。在该方法中，首先提供具有室的涂布模块和包含SPR光纤传感器，光源，光接收检测器和光纤的膜厚监视模块。光纤用于将SPR光纤传感器与光源和光接收检测器连接。 SPR光纤传感器具有感测区域，并且布置在腔室中。光源为SPR光纤传感器提供光源。然后，将基板放入室中。虽然在基板上进行涂布处理，但是也在SPR光纤传感器的感测区域上形成膜。光接收检测器接收从SPR光纤传感器的感测区域输出的信号，然后输出光强变化的信号。

4. 发明授权

US06407368B1 System for maintaining a flat zone temperature profile in LP vertical furnace 有权
标题翻译：在LP立式炉中保持平坦区域温度分布的系统
公开(公告)号：US06407368B1
公开(公告)日：2002-06-18
申请号：US09904362
申请日：2001-07-12
申请人： Chun-Keng Hsu , Chun-Chih Lin , Chao-Lin Lee , Sung-Chieh Lin
发明人： Chun-Keng Hsu , Chun-Chih Lin , Chao-Lin Lee , Sung-Chieh Lin
IPC分类号： F27B514
CPC分类号： H01L21/67109 , C30B25/10 , C30B31/12
摘要： A thermal reactor has a processing tube with a multiple-walled inner chamber. The geometry of the multiple-walled inner chamber having flow passageways between the walls, directs the flow of heat to the wafers loaded in the wafer boats for maintaining a flat zone temperature profile. The thermal budget, TB, which is a function of time and temperature, at each vertical zone in the processing tube is substantially equal in all zones.
摘要翻译：热反应器具有具有多壁内室的处理管。具有在壁之间的流动通道的多壁内室的几何形状将热流引导到装载在晶片舟皿中的晶片，以保持平坦的区域温度分布。处理管中每个垂直区域的时间和温度函数的热量预算TB在所有区域中基本相等。

5. 发明申请

US20060027171A1 Wafer boat for reducing wafer warpage 审中-公开
标题翻译：用于减少晶圆翘曲的晶圆船
公开(公告)号：US20060027171A1
公开(公告)日：2006-02-09
申请号：US10913760
申请日：2004-08-06
申请人： Chun-Keng Hsu , Chun-Chih Lin
发明人： Chun-Keng Hsu , Chun-Chih Lin
IPC分类号： C23C16/00
CPC分类号： C23C16/4583 , H01L21/67309
摘要： A wafer boat which is suitable for supporting wafers in a process furnace is disclosed. The wafer boat includes a base plate, multiple support rods carried by the base plate and multiple wafer support pins carried by each of the support rods. Each of the wafer support pins has an upper surface disposed at an acute angle with respect to a longitudinal axis of each of the support rods. This causes contact of the wafer support pins with the wafer at the wafer's center of gravity and minimizes the contact surface area between the wafer support pins and each wafer.
摘要翻译：公开了一种适用于在加工炉中支撑晶片的晶片舟。晶片舟包括基板，由基板承载的多个支撑杆和由每个支撑杆承载的多个晶片支撑销。每个晶片支撑销具有相对于每个支撑杆的纵向轴线成锐角设置的上表面。这导致晶片支撑销与晶片在晶片重心处的接触，并使晶片支撑销和每个晶片之间的接触表面积最小化。

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