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    • 4. 发明授权
    • Membrane filter element for chemical-mechanical polishing slurries
    • 用于化学机械抛光浆料的膜过滤元件
    • US06260709B1
    • 2001-07-17
    • US09188647
    • 1998-11-09
    • Derek A. LemanAlfred K. Fritzsche
    • Derek A. LemanAlfred K. Fritzsche
    • B07B120
    • B24B57/02B01D61/14B01D63/067B01D67/0025B01D67/003B01D67/0032B01D69/02B01D2325/02B01D2325/04B01D2325/28B07B1/18B24B37/04
    • A filter media for physically separating particles of an abrasive media having a given mean average particle size from a chemical-mechanical polishing (CMP) slurry. The abrasive media has a particle size distribution including particles larger than the mean average particle size. The filter media is provided as being formed of at least one sheet of a porous membrane having a first and second surface defining a thickness dimension of the membrane therebetween, and having a plurality of generally cylindrical capillary pores formed through the thickness dimension sized effective to capture the particles larger than the mean average particle size. In service, the slurry is supplied to the first side of the filter media, and is passed through the media to the second side thereof such that at least a portion of the particles of the abrasive media larger than the mean average particle size is retained on the first side of the filter media. Such portion may include particles of the abrasive media which are smaller than the pore size of the membrane.
    • 用于从化学机械抛光(CMP)浆料物理分离具有给定平均粒度的研磨介质的颗粒的过滤介质。 研磨介质具有包括大于平均粒度的颗粒的粒度分布。 提供过滤介质由至少一片多孔膜形成,多孔膜具有第一和第二表面,该第一表面和第二表面限定其间的膜的厚度尺寸,并且具有多个通常为圆柱形的毛细孔,所述毛孔通过厚度尺寸有效地捕获, 颗粒大于平均粒径。 在使用中,浆料被供应到过滤介质的第一侧,并且通过介质到达其第二侧,使得磨料介质的至少一部分颗粒大于平均粒度保留在 过滤介质的第一面。 这样的部分可以包括比膜的孔径小的研磨介质的颗粒。