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1. 发明授权

US08039202B2 Positive-working photoimageable bottom antireflective coating 有权
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US08039202B2
公开(公告)日：2011-10-18
申请号：US11877891
申请日：2007-10-24
申请人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark O. Neisser , Tomohide Katayama , Shuji S. Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
发明人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark O. Neisser , Tomohide Katayama , Shuji S. Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
IPC分类号： G03F7/26
CPC分类号： G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
摘要翻译：本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂。本发明还涉及使用这种组合物的方法。

2. 发明授权

US07824837B2 Positive-working photoimageable bottom antireflective coating 有权
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US07824837B2
公开(公告)日：2010-11-02
申请号：US11876332
申请日：2007-10-22
申请人： Hengpeng Wu , Mark O. Neisser , Shuji S Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
发明人： Hengpeng Wu , Mark O. Neisser , Shuji S Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
IPC分类号： G03F7/095 , G03F7/039 , G03F7/11
CPC分类号： G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
摘要翻译：本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂。本发明还涉及使用这种组合物的方法。

3. 发明授权

US07264913B2 Antireflective compositions for photoresists 有权
标题翻译：用于光致抗蚀剂的抗反射组合物
公开(公告)号：US07264913B2
公开(公告)日：2007-09-04
申请号：US10301462
申请日：2002-11-21
申请人： Hengpeng Wu , Shuji Ding-Lee , Zhong Xiang , Joseph E. Oberlander , Mark O. Neisser , Eleazar Gonzalez , Jainhui Shan
发明人： Hengpeng Wu , Shuji Ding-Lee , Zhong Xiang , Joseph E. Oberlander , Mark O. Neisser , Eleazar Gonzalez , Jainhui Shan
IPC分类号： G03C1/825 , G03C1/74 , G03F7/20 , G03F7/30 , G03F7/36
CPC分类号： G03F7/091 , G03F7/038 , G03F7/0382 , Y10S430/109 , Y10S430/115 , Y10S430/12 , Y10S430/122
摘要： The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193 nm. The polymer of the present invention contains at least one unit selected from structures 1, 2 and 3, where, Y is a hydrocarbyl linking group of 1 to about 10 carbon atoms, R, R1, R′ and R″ are independently hydrogen, hydrocarbyl group of 1 to about 10 carbon atoms, halogen, —O(CO)Z, —C(CF3)2Z, —C(CF3)2(CO)OZ, —SO2CF3, —(CO)OZ, —SO3Z, —COZ, —OZ, —NZ2, —SZ, —SO2Z, —NHCOZ, —NZCOZ or —SO2NZ2, where Z is H or a hydrocarbyl group of 1 to about 10 carbon atoms, n=1–4, X is O, CO, S, COO, CH2O, CH2COO, SO2, NH, NL, OWO, OW, W, and where L and W are independently hydrocarbyl groups of 1 to about 10 carbon atoms, and m=0–3.
摘要翻译：本发明涉及包含聚合物，交联剂和酸发生剂的新型抗反射涂料组合物。本发明还涉及使用该组合物的方法，特别是在193nm。本发明的聚合物含有至少一种选自结构1,2和3的单元，其中Y是1至约10个碳原子的烃基连接基团，R 1，R 1，R' 和R“独立地为氢，1至约10个碳原子的烃基，卤素，-O（CO）Z，-C（CF 3）2 Z， -C（CF 3）2（CO）OZ，-SO 2 CF 3 - ， - （CO） OZ，-SO 3 Z，-COZ，-OZ，-NZ 2，-SZ，-SO 2 Z，-NHCOZ， - NZCOZ或-SO 2 NZ 2，其中Z为H或1至约10个碳原子的烃基，n = 1-4，X为O，CO， S，COO，CH 2 O，CH 2 COO，SO 2，NH，NL，OWO，OW，W，其中L和 W独立地为1至约10个碳原子的烃基，并且m = 0-3。

4. 发明授权

US08088548B2 Bottom antireflective coating compositions 有权
标题翻译：底部防反射涂料组合物
公开(公告)号：US08088548B2
公开(公告)日：2012-01-03
申请号：US11876793
申请日：2007-10-23
申请人： Francis M. Houlihan , Shinji Miyazaki , Mark O. Neisser , Alberto D. Dioses , Joseph E. Oberlander
发明人： Francis M. Houlihan , Shinji Miyazaki , Mark O. Neisser , Alberto D. Dioses , Joseph E. Oberlander
IPC分类号： G03F7/11 , G03F7/039
CPC分类号： C07C211/05 , C07C55/08 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/091 , G03F7/095
摘要： Developable bottom antireflective coating compositions are provided.
摘要翻译：提供可开发的底部抗反射涂料组合物。

5. 发明授权

US07070914B2 Process for producing an image using a first minimum bottom antireflective coating composition 有权
标题翻译：使用第一最小底部抗反射涂料组合物制造图像的方法
公开(公告)号：US07070914B2
公开(公告)日：2006-07-04
申请号：US10042878
申请日：2002-01-09
申请人： Mark O. Neisser , Joseph E. Oberlander , Medhat A. Toukhy , Raj Sakamuri , Shuji Ding-Lee
发明人： Mark O. Neisser , Joseph E. Oberlander , Medhat A. Toukhy , Raj Sakamuri , Shuji Ding-Lee
IPC分类号： G03F7/00
CPC分类号： G03F7/091 , G03F7/095 , Y10S430/151
摘要： Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of λ 2 ⁢ n wherein λ is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.
摘要翻译：公开了一种在衬底上形成图像的方法，包括以下步骤：（a）在衬底上涂覆第一层辐射敏感的抗反射组合物; （b）将第二层光致抗蚀剂组合物涂覆到抗反射组合物的第一层上; （c）将涂覆的基材从步骤（b）选择性暴露于光化辐射; 和（d）将来自步骤（c）的曝光的涂覆的基底显影以形成图像; 其中在步骤（c）中曝光光致抗蚀剂组合物和抗反射组合物; 在步骤（d）中使用单个显影剂开发两者; 其中步骤（a）的抗反射组合物是具有固体含量高达约8％固体的第一最小底部抗反射涂层（BARC）组合物，并且涂覆的基材的最大涂层厚度为 $λ2n其中λ是步骤（c）的光化辐射的波长，n是BARC的折射率组成。$

6. 发明授权

US06844131B2 Positive-working photoimageable bottom antireflective coating 有权
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US06844131B2
公开(公告)日：2005-01-18
申请号：US10042532
申请日：2002-01-09
申请人： Joseph E. Oberlander , Ralph R. Dammel , Shuji Ding-Lee , Mark O. Neisser , Medhat A. Toukhy
发明人： Joseph E. Oberlander , Ralph R. Dammel , Shuji Ding-Lee , Mark O. Neisser , Medhat A. Toukhy
IPC分类号： G03F7/11 , A61P29/00 , G03F7/004 , G03F7/039 , G03F7/09
CPC分类号： G03F7/09 , G03F7/0392 , G03F7/091 , Y10S430/106
摘要： The present invention relates to a novel absorbing, photoimageable and aqueous developable positive-working antireflective coating composition comprising a photoacid generator and a polymer comprising at least one unit with an acid labile group and at least one unit with an absorbing chromophore. The invention further relates to a process for using such a composition. The present invention also relates to a novel absorbing, photoimageable and aqueous alkali developable positive-working antireflective coating composition comprising a polymer comprising at least one unit with an acid labile group, a dye and a photoacid generator. The invention further relates to a process for using such a composition. The invention also relates to a novel process for forming a positive image with a positive photoresist and a novel photoimageable and aqueous developable positive-working antireflective coating composition, where the antireflective coating comprises a polymer comprising an acid labile group. The invention further relates to such a composition. The invention also relates to a process for imaging a photoimageable antireflective coating composition.
摘要翻译：本发明涉及一种新颖的吸收光可成像和水性显影正性抗反射涂料组合物，其包含光酸产生剂和包含至少一个具有酸不稳定基团的单元和至少一个具有吸收发色团的单元的聚合物。本发明还涉及一种使用这种组合物的方法。本发明还涉及一种新型的吸收，可光成像和水性碱显影正性抗反射涂料组合物，其包含含有至少一个具有酸不稳定基团的单元，染料和光致酸产生剂的聚合物。本发明还涉及使用这种组合物的方法。本发明还涉及一种用正性光致抗蚀剂形成正像的新方法，以及一种新型可光成像和水性可显影正性抗反射涂料组合物，其中抗反射涂层包含含酸不稳定基团的聚合物。本发明还涉及这种组合物。本发明还涉及一种用于对可光成象抗反射涂层组合物进行成像的方法。

7. 发明申请

US20090104559A1 Bottom Antireflective Coating Compositions 有权
标题翻译：底部防反射涂料组合物
公开(公告)号：US20090104559A1
公开(公告)日：2009-04-23
申请号：US11876793
申请日：2007-10-23
申请人： Francis M. Houlihan , Shinjl Miyazaki , Mark O. Neisser , Alberto D. Dioses , Joseph E. Oberlander
发明人： Francis M. Houlihan , Shinjl Miyazaki , Mark O. Neisser , Alberto D. Dioses , Joseph E. Oberlander
IPC分类号： G03C1/73 , C07C55/02 , C07C59/245 , C07C59/305 , G03F7/20 , C07C61/08 , C07C63/14 , C07C63/337
CPC分类号： C07C211/05 , C07C55/08 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/091 , G03F7/095
摘要： Developable bottom antireflective coating compositions are provided.
摘要翻译：提供可开发的底部抗反射涂料组合物。

8. 发明授权

US5225312A Positive photoresist containing dyes 失效
标题翻译：含正光致抗蚀剂的染料
公开(公告)号：US5225312A
公开(公告)日：1993-07-06
申请号：US739646
申请日：1991-08-02
申请人： Sunit S. Dixit , Richard M. Lazarus , Thomas P. Carter , Joseph E. Oberlander , Andreas Goehring , Randall W. Kautz , Grieg Beltramo
发明人： Sunit S. Dixit , Richard M. Lazarus , Thomas P. Carter , Joseph E. Oberlander , Andreas Goehring , Randall W. Kautz , Grieg Beltramo
IPC分类号： G03F7/09
CPC分类号： G03F7/091
摘要： A positive photoresist of the type containing an alkali-soluble novolac resin and a quinone diazide sensitizer contains a dye of the general formula: ##STR1## wherein R' is lower alkyl, R" is H, alkyl or CO.sub.2 -alkyl, alkyl-CO.sub.2 -alkyl or alkyl-CO.sub.2 -(C.sub.1 -C.sub.3 alkyl-O).sub.n -alkyl (n=1-3) and wherein said dye is compatible with the novolac resin/quinone diazide formulation to at least 0.1 phr. The dye reduces reflective notching. Preferably the photoresist also contain a nitro naphthol dye to reduce the effects of I-Line radiation.
摘要翻译：含有碱溶性酚醛清漆树脂和醌二叠氮化物敏化剂的正型光致抗蚀剂含有下列通式的染料：其中R'为低级烷基，R“为H，烷基或CO 2 - 烷基，烷基 - CO 2 - 烷基或烷基-CO 2 - （C 1 -C 3烷基-O）n-烷基（n = 1-3），并且其中所述染料与酚醛清漆树脂/醌二叠氮化合物配方相容至至少0.1phr。染料减少反光缝。优选地，光致抗蚀剂还含有硝基萘酚染料以减少I-Line辐射的影响。

9. 发明授权

US07754414B2 Antireflective coating compositions 失效
标题翻译：防反射涂料组合物
公开(公告)号：US07754414B2
公开(公告)日：2010-07-13
申请号：US11456868
申请日：2006-07-12
申请人： Joseph E. Oberlander
发明人： Joseph E. Oberlander
IPC分类号： G03C1/00 , G03F1/00
CPC分类号： G03F7/091
摘要： Antireflective coating compositions with reduced outgassing are disclosed.
摘要翻译：公开了具有减少的除气的抗反射涂料组合物。

10. 发明授权

US06524775B1 Edge bead remover for thick film photoresists 有权
标题翻译：用于厚膜光刻胶的边缘珠去除器
公开(公告)号：US06524775B1
公开(公告)日：2003-02-25
申请号：US09693215
申请日：2000-10-20
申请人： Joseph E. Oberlander , Craig Traynor , Ernesto S. Sison , Jeff Griffin
发明人： Joseph E. Oberlander , Craig Traynor , Ernesto S. Sison , Jeff Griffin
IPC分类号： G03F716
CPC分类号： G03F7/162
摘要： An edge bead remover for a photoresist composition disposed as a film on a surface, consisting essentially of a solvent mixture comprising from about 50 to about 80 parts by weight, based on the weight of the solvent mixture, of at least one di(C1-C3)alkyl carbonate and from about 20 to about 50 parts by weight, based on the weight of the solvent mixture, of cyclopentanone. A method is also provided for treating a photoresist composition film disposed on a surface which method comprises contacting the photoresist composition with a solvent mixture, in an amount sufficient to produce a substantially uniform film thickness of the photoresist composition across the surface, wherein the solvent mixture comprises from about 50 to about 80 parts by weight, based on the weight of the solvent mixture, of at least one di(C1-C3)alkyl carbonate and from about 20 to about 50 parts by weight, based on the weight of the solvent mixture, of cyclopentanone.
摘要翻译：一种用于光刻胶组合物的边缘珠去除剂，其以表面的薄膜的形式设置，其基本上由溶剂混合物组成，所述溶剂混合物包含基于溶剂混合物的重量约50至约80份重量的至少一种二（C1- C3）烷基碳酸酯和约20至约50重量份的基于溶剂混合物的重量的环戊酮。还提供了一种处理设置在表面上的光致抗蚀剂组合物膜的方法，该方法包括使光致抗蚀剂组合物与溶剂混合物接触，其量足以在整个表面上产生基本上均匀的光致抗蚀剂组合物的膜厚度，其中溶剂混合物基于溶剂混合物的重量，包含约50至约80重量份的至少一种碳酸二（C 1 -C 3）烷基酯和约20至约50重量份，基于溶剂的重量混合物，环戊酮。

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