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1. 发明授权

US5314782A Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative 失效
标题翻译：深紫外线敏感的抗潜影图像衰减包括硝基苄基衍生物的重氮萘醌磺酸盐
公开(公告)号：US5314782A
公开(公告)日：1994-05-24
申请号：US26934
申请日：1993-03-05
申请人： Richard M. Lazarus , Thomas A. Koes
发明人： Richard M. Lazarus , Thomas A. Koes
IPC分类号： G03F7/004 , G03F7/022 , G03F7/039 , H01L21/027 , H01L21/30 , G03F7/023 , G03F7/30
CPC分类号： G03F7/022 , G03F7/0045
摘要： A positive working deep UV sensitive photoresist which provides improved critical dimension stability during prolonged periods of post exposure delay before baking comprises an acid stable polymer which is insoluble in water but normally soluble in an aqueous alkaline medium, a photo acid generator exemplified by the tri-(2,1,4-diazonaphthoquinonesulfonate) ester of 3,5-dinitro-2,6-dimethylol para cresol, and a mixed carbonate ester of tertiary butyl alcohol and a polyhydric phenol which is an acid labile compound which inhibits the dissolution of the normally soluble polymer in said alkaline medium.
摘要翻译：一种正面工作的深紫外线敏感光刻胶，其在烘烤前后曝光延迟的延长期间提供改进的临界尺寸稳定性包括不溶于水但通常可溶于碱性水溶液的酸稳定聚合物，（2,1,4-二氮杂萘醌）磺酸酯，和3,5-二硝基-2,6-二羟甲基对甲酚的（2,1,4-二氮杂萘醌）酯和叔丁醇与作为酸不稳定化合物的多元酚的混合碳酸酯，在所述碱性介质中的正常可溶性聚合物。

2. 发明授权

US5182184A Novolak resins of lowered hydroxyl content and high contrast high thermal stability positive photoresists prepared therefrom 失效
标题翻译： NOVOLAK树脂的降低羟基含量和高对比度高热稳定性正电子照相机
公开(公告)号：US5182184A
公开(公告)日：1993-01-26
申请号：US475402
申请日：1990-02-05
申请人： Richard M. Lazarus , Randall Kautz , Sunit S. Dixit
发明人： Richard M. Lazarus , Randall Kautz , Sunit S. Dixit
IPC分类号： C08G8/04 , C08G8/28 , G03C1/00 , G03F7/023 , H01L21/027 , H01L21/30
CPC分类号： C08G8/04 , G03F7/0236
摘要： Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and (1) a monohydroxy aromatic aldehyde and wherein at least a portion of the hydroxyl groups thereof are esterified or (2) a mixture of at least one monohydroxy aromatic aldehyde and at least one non-hydroxylic aromatic aldehyde; the novolak resins having a hydroxyl number of from about 120 to about 180 grams of resin per equivalent of hydroxyl. The novolak resins are especially useful in positive photoresist formulations and have enhanced photospeed and film loss characteristics as well as improved thermal stability.

3. 发明授权

US5130409A Mixed aldehyde novolak resins useful as high contrast high thermal stability positive photoresists 失效
标题翻译：混合醛酚醛清漆树脂可用作高对比度高热稳定性阳性光致抗蚀剂
公开(公告)号：US5130409A
公开(公告)日：1992-07-14
申请号：US614636
申请日：1990-11-16
申请人： Richard M. Lazarus , Randall Kautz , Sunit S. Dixit
发明人： Richard M. Lazarus , Randall Kautz , Sunit S. Dixit
IPC分类号： C08G8/04 , G03F7/023
CPC分类号： C08G8/04 , G03F7/0236
摘要： Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and an aromatic aldehyde. When the aromatic aldehyde is a monohydroxy aromatic aldehyde, the novolak resin is especially useful in positive photoresist formulations.
摘要翻译：提供酚醛清漆树脂，其是（a）苯酚，苯酚衍生物或其混合物的缩合产物，和（b）甲醛或甲醛前体和芳族醛的混合物。当芳族醛是单羟基芳族醛时，酚醛清漆树脂在正性光致抗蚀剂制剂中是特别有用的。

4. 发明授权

US4997734A Method of forming a thermally stable mixed aldehyde novolak resin containing resist pattern and that pattern on a substrate 失效
标题翻译：在基材上形成含有抗蚀剂图案和该图案的热稳定的混合醛酚醛清漆树脂的方法
公开(公告)号：US4997734A
公开(公告)日：1991-03-05
申请号：US454409
申请日：1989-12-21
申请人： Richard M. Lazarus , Randall M. Kautz , Sunit S. Dixit
发明人： Richard M. Lazarus , Randall M. Kautz , Sunit S. Dixit
IPC分类号： C08G8/04 , G03F7/023
CPC分类号： C08G8/04 , G03F7/0236
摘要： Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and an aromatic aldehyde. When the aromatic aldehyde is a monohydroxy aromatic aldehyde, the novolak resin is especially useful in positive photoresist formulations.
摘要翻译：提供酚醛清漆树脂，其是（a）苯酚，苯酚衍生物或其混合物的缩合产物，和（b）甲醛或甲醛前体和芳族醛的混合物。当芳族醛是单羟基芳族醛时，酚醛清漆树脂在正性光致抗蚀剂制剂中是特别有用的。

5. 发明授权

US5094934A Method of developing a high contrast, positive photoresist using a developer containing alkanolamine 失效
标题翻译：使用含有链烷醇胺的显影剂开发高对比度正性光致抗蚀剂的方法
公开(公告)号：US5094934A
公开(公告)日：1992-03-10
申请号：US564665
申请日：1990-08-07
申请人： Richard M. Lazarus , Kenneth L. Bell , Carla M. Bauer
发明人： Richard M. Lazarus , Kenneth L. Bell , Carla M. Bauer
IPC分类号： G03F7/32
CPC分类号： G03F7/322
摘要： Compositions and methods for developing quinone diazide positive-working photoresists. The compositions consist essentially of an aqueous solution of a tetraalkylammonium hydroxide and an adjunct having a structure selected from: ##STR1## wherein n is 0 or 1; m is 1 or 2; and each R.sup.1 and R.sup.2 is independently selected from hydrogen, methyl, or ethyl, but in Structure I the two R.sup.2 's are not both ethyl. The methods involve use of this composition to develop the indicated photoresists. The addition of an adjunct of the indicated type prevents the formation of irregular deposits on the edges of unexposed portions of the photoresist lines when the photoresist is developed. Selection of these adjuncts also increases the uniformity of line widths of photoresist lines developed according to the present invention, and increases the process latitude of the developer.
摘要翻译：醌二氮嗪正性光致抗蚀剂的组合物和方法。该组合物基本上由四烷基氢氧化铵的水溶液和具有选自以下结构的辅料组成：其中n为0或1; m为1或2; 并且每个R 1和R 2独立地选自氢，甲基或乙基，但在结构I中，两个R 2不同时为乙基。该方法涉及使用该组合物来开发所指示的光致抗蚀剂。添加指示类型的辅助物防止当光致抗蚀剂显影时在光致抗蚀剂线的未曝光部分的边缘上形成不规则沉积物。这些辅助物的选择也增加了根据本发明开发的光致抗蚀剂线的线宽的均匀性，并且增加了显影剂的工艺范围。

6. 发明授权

US4996122A Method of forming resist pattern and thermally stable and highly resolved resist pattern 失效
标题翻译：形成抗蚀剂图案和热稳定且高度分辨的抗蚀剂图案的方法
公开(公告)号：US4996122A
公开(公告)日：1991-02-26
申请号：US496240
申请日：1990-03-20
申请人： Richard M. Lazarus , Edward J. Reardon , Sunit S. Dixit
发明人： Richard M. Lazarus , Edward J. Reardon , Sunit S. Dixit
IPC分类号： G03F7/023
CPC分类号： G03F7/0236
摘要： Positive photoresist compositions are provided which contain(a) a mixture of mono-, di-, and triesters of 2,3,4-trihydroxybenzophenone and 1,2-naphthoquinone-2-diazo-4-sulfonic acid and(b) a novolak resin selected from resins prepared from a phenolic component having a high p-cresol content or from a mixture of formaldehyde and an aromatic aldehyde.
摘要翻译：提供了正光致抗蚀剂组合物，其含有（a）2,3,4-三羟基二苯甲酮和1,2-萘醌-2-重氮-4-磺酸的一，二和三酯的混合物和（b）酚醛清漆选自由具有高对甲酚含量的酚类组分制备的树脂或由甲醛和芳族醛的混合物制备的树脂。

7. 发明授权

US08501863B2 Paint 有权
标题翻译：涂料
公开(公告)号：US08501863B2
公开(公告)日：2013-08-06
申请号：US12163739
申请日：2008-06-27
申请人： Richard M. Lazarus , Caidian Luo
发明人： Richard M. Lazarus , Caidian Luo
IPC分类号： C08K5/00 , C08G75/02 , C08L27/00 , C08L33/00 , C04B24/26 , C08J3/00
CPC分类号： C09D183/04 , C04B41/009 , C04B41/483 , C04B41/63 , C08L83/04 , C09D133/02 , C08L83/00 , C04B20/0048 , C04B28/02 , C04B41/4549 , C04B41/502 , C04B2103/40 , C04B2103/50 , C04B2103/54
摘要： A paint composition and formulation for building materials, such as materials that are generally cementitious, gypsum, or of another inorganic building material, including those containing cellulose, glass, steel or polymeric fibers. The paint formulation provides improved weatherability, durability, light stability, freeze-thaw resistance and water resistivity.
摘要翻译：用于建筑材料的涂料组合物和制剂，例如通常为水泥质，石膏或另一种无机建筑材料的材料，包括含有纤维素，玻璃，钢或聚合物纤维的材料。涂料配方提供改进的耐候性，耐久性，光稳定性，抗冻融性和耐水性。

8. 发明授权

US5225312A Positive photoresist containing dyes 失效
标题翻译：含正光致抗蚀剂的染料
公开(公告)号：US5225312A
公开(公告)日：1993-07-06
申请号：US739646
申请日：1991-08-02
申请人： Sunit S. Dixit , Richard M. Lazarus , Thomas P. Carter , Joseph E. Oberlander , Andreas Goehring , Randall W. Kautz , Grieg Beltramo
发明人： Sunit S. Dixit , Richard M. Lazarus , Thomas P. Carter , Joseph E. Oberlander , Andreas Goehring , Randall W. Kautz , Grieg Beltramo
IPC分类号： G03F7/09
CPC分类号： G03F7/091
摘要： A positive photoresist of the type containing an alkali-soluble novolac resin and a quinone diazide sensitizer contains a dye of the general formula: ##STR1## wherein R' is lower alkyl, R" is H, alkyl or CO.sub.2 -alkyl, alkyl-CO.sub.2 -alkyl or alkyl-CO.sub.2 -(C.sub.1 -C.sub.3 alkyl-O).sub.n -alkyl (n=1-3) and wherein said dye is compatible with the novolac resin/quinone diazide formulation to at least 0.1 phr. The dye reduces reflective notching. Preferably the photoresist also contain a nitro naphthol dye to reduce the effects of I-Line radiation.
摘要翻译：含有碱溶性酚醛清漆树脂和醌二叠氮化物敏化剂的正型光致抗蚀剂含有下列通式的染料：其中R'为低级烷基，R“为H，烷基或CO 2 - 烷基，烷基 - CO 2 - 烷基或烷基-CO 2 - （C 1 -C 3烷基-O）n-烷基（n = 1-3），并且其中所述染料与酚醛清漆树脂/醌二叠氮化合物配方相容至至少0.1phr。染料减少反光缝。优选地，光致抗蚀剂还含有硝基萘酚染料以减少I-Line辐射的影响。

9. 发明授权

US5208138A High contrast high thermal stability positive photoresists having novolak resins of lowered hydroxyl content 失效
标题翻译：高对比度高热稳定性的阳性光致抗蚀剂具有降低的羟基含量的酚醛清漆树脂
公开(公告)号：US5208138A
公开(公告)日：1993-05-04
申请号：US886976
申请日：1992-05-21
申请人： Richard M. Lazarus , Randall Kautz , Sunit S. Dixit
发明人： Richard M. Lazarus , Randall Kautz , Sunit S. Dixit
IPC分类号： C08G8/04 , G03F7/023
CPC分类号： C08G8/04 , G03F7/0236
摘要： Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and (1) a monohydroxy aromatic aldehyde and wherein at least a portion of the hydroxyl groups thereof are esterified or (2) a mixture of at least one monohydroxy aromatic aldehyde and at least one non-hydroxylic aromatic aldehyde; the novolak resins having a hydroxyl number of from about 120 to about 180 grams of resin per equivalent of hydroxyl. The novolak resins are especially useful in positive photoresist formulations and have enhanced photospeed and film loss characteristics as well as improved thermal stability.
摘要翻译：提供酚醛清漆树脂，其是（a）苯酚，苯酚衍生物或其混合物的缩合产物，和（b）甲醛或甲醛前体的混合物和（1）单羟基芳族醛，其中至少一部分其羟基被酯化或（2）至少一种单羟基芳族醛和至少一种非羟基芳族醛的混合物; 酚醛清漆树脂每当量羟基具有约120至约180克树脂的羟值。酚醛清漆树脂在正性光致抗蚀剂制剂中特别有用，并且具有增强的感光速度和胶片损失特性以及改善的热稳定性。

10. 发明授权

US4920028A High contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinone 失效
标题翻译：高对比度高热稳定性阳离子光刻胶与混合甲酚和羟基苯甲醛制备酚醛清漆和光敏重氮醌
公开(公告)号：US4920028A
公开(公告)日：1990-04-24
申请号：US227404
申请日：1988-08-02
申请人： Richard M. Lazarus , Randall Kautz , Sunit S. Dixit
发明人： Richard M. Lazarus , Randall Kautz , Sunit S. Dixit
IPC分类号： C08G8/04 , G03F7/023
CPC分类号： C08G8/04 , G03F7/0236
摘要： Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and an aromatic aldehyde. When the aromatic aldehyde is a monohydroxy aromatic aldehyde, the novolak resin is especially useful in positive photoresist formulations.
摘要翻译：提供酚醛清漆树脂，其是（a）苯酚，苯酚衍生物或其混合物的缩合产物，和（b）甲醛或甲醛前体和芳族醛的混合物。当芳族醛是单羟基芳族醛时，酚醛清漆树脂在正性光致抗蚀剂制剂中是特别有用的。

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