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1. 发明申请

US20120154041A1 PREDISTORTION APPARATUSES AND METHODS 失效
标题翻译：预测装置和方法
公开(公告)号：US20120154041A1
公开(公告)日：2012-06-21
申请号：US13331377
申请日：2011-12-20
申请人： Young-Hoon KIM , Gweon Do JO , Jung Hoon OH , Jae Ho JUNG
发明人： Young-Hoon KIM , Gweon Do JO , Jung Hoon OH , Jae Ho JUNG
IPC分类号： H03F1/26
CPC分类号： H03F1/3247 , H03F1/3258 , H03F2201/3209 , H03F2201/3212 , H03F2201/3224
摘要： Provided is a predistortion apparatus which performs predistortion by reflecting a memory effect when linearizing an output of a nonlinear device using a wideband signal. The predistortion apparatus includes a predistortion unit and a coefficient extraction unit. The predistortion unit selects and outputs one of outputs of the sub-predistorters as an output signal according to intensity of an input signal. The coefficient extraction unit selects one of a plurality of coefficient extractors according to intensity of a nonlinear signal which is generated in response to the output signal, extracts a plurality of predistortion coefficients with the nonlinear signal and the output signal, and delivers the extracted predistortion coefficients to the predistortion unit. Accordingly, the memory effect is reflected even when the input signal is a wideband signal.
摘要翻译：提供一种预失真装置，其通过使用宽带信号线性化非线性装置的输出来反映存储器效应来执行预失真。预失真装置包括预失真单元和系数提取单元。预失真单元根据输入信号的强度选择并输出副预失真器的输出之一作为输出信号。系数提取单元根据输出信号产生的非线性信号的强度，选择多个系数提取器中的一个，并用非线性信号和输出信号提取多个预失真系数，并将提取的预失真系数到预失真单位。因此，即使当输入信号是宽带信号时也会反映存储效应。

2. 发明申请

US20130251055A1 APPARATUS AND METHOD FOR CONTROLLING DISTORTION SIGNAL AND SYSTEM BY USING THE SAME 有权
标题翻译：用于通过使用它来控制失真信号和系统的装置和方法
公开(公告)号：US20130251055A1
公开(公告)日：2013-09-26
申请号：US13587296
申请日：2012-08-16
申请人： Chang Wahn YU , Gweon Do JO , Jung Hoon OH , Kwang Chun LEE , Jae Ho JUNG
发明人： Chang Wahn YU , Gweon Do JO , Jung Hoon OH , Kwang Chun LEE , Jae Ho JUNG
IPC分类号： H04L27/28
CPC分类号： H04L5/0007 , H04L27/2614 , H04L27/2627
摘要： Disclosed are a signal distortion component adjusting apparatus and method capable of adjusting error vector magnitude of subcarriers of a predetermined position by adjusting a signal distortion component occurring while decreasing a peak to average power ratio (PAPR) in a communication system of an orthogonal frequency division multiplexing (OFDM) technology or an orthogonal frequency division multiple access (OFDMA) scheme, and a system using the same. The present invention includes a signal distortion component adjusting unit to add an additional signal distortion component Pe((n+N/2) % N) to a signal distortion component e(n) that is obtained by subtracting a threshold Th value, set to decrease peak power, from an absolute value of a time domain signal x(n) of an input signal, and to thereby adjust the signal distortion component. The present invention may transmit a highly reliable signal by adjusting error vector magnitude of subcarrier of a frequency domain.
摘要翻译：公开了一种信号失真分量调整装置和方法，其能够通过调整在正交频分复用的通信系统中降低峰均功率比（PAPR）的同时发生的信号失真分量来调整预定位置的子载波的误差矢量幅度（OFDM）技术或正交频分多址（OFDMA）方案，以及使用它们的系统。本发明包括一个信号失真分量调整单元，用于将附加信号失真分量Pe（（n + N / 2）％N）加到通过将阈值Th值减去得到的信号失真分量e（n）从输入信号的时域信号x（n）的绝对值减小峰值功率，从而调整信号失真分量。本发明可以通过调整频域的子载波的误差矢量幅度来发送高度可靠的信号。

3. 发明申请

US20130147538A1 DIGITAL PRE-DISTORTION DEVICE AND PRE-DISTORTION METHOD THEREOF 审中-公开
标题翻译：数字预失真装置及其预失真方法
公开(公告)号：US20130147538A1
公开(公告)日：2013-06-13
申请号：US13560040
申请日：2012-07-27
申请人： Jung Hoon OH , Joon Hyung KIM , JAE HO JUNG , HYUN KYU CHUNG
发明人： Jung Hoon OH , Joon Hyung KIM , JAE HO JUNG , HYUN KYU CHUNG
IPC分类号： G06F7/48 , G06F7/556
CPC分类号： H03F3/245 , G06F1/0307 , H03F1/3247 , H03F3/19 , H03F2201/3212 , H03F2201/3233 , H04L27/368
摘要： Disclosed is a digital pre-distortion device which includes a pre-compensation lookup table which outputs a first input value and a second input value adjacent to an input signal, a first distortion value corresponding to the first input value, and a second distortion value corresponding to the second input value; and a function generator which generates a pre-distortion function based on the first and second input values and the first and second distortion values and generates a pre-distortion value corresponding to the input signal from the pre-distortion function.
摘要翻译：公开了一种数字预失真装置，其包括预补偿查找表，其输出与输入信号相邻的第一输入值和第二输入值，对应于第一输入值的第一失真值和对应于第一输入值的第二失真值到第二个输入值; 以及函数发生器，其基于第一和第二输入值以及第一和第二失真值产生预失真函数，并且产生与来自预失真函数的输入信号相对应的预失真值。

4. 发明申请

US20120203030A1 PHOTOACID GENERATOR, METHOD FOR PRODUCING THE SAME, AND RESIST COMPOSITION COMPRISING THE SAME 有权
标题翻译：光致发电机及其制造方法以及包含该光电发生器的耐热组合物
公开(公告)号：US20120203030A1
公开(公告)日：2012-08-09
申请号：US13367762
申请日：2012-02-07
申请人： Jung Hoon OH , Dae Kyung Yoon , Yong Hwa Hong , Seung Duk Cho
发明人： Jung Hoon OH , Dae Kyung Yoon , Yong Hwa Hong , Seung Duk Cho
IPC分类号： C07C309/19 , C07C309/10 , C07C303/22 , C07C309/24
CPC分类号： C07C309/10 , C07C381/12 , C07C2601/08 , C07C2601/14 , C07C2602/42 , C07C2603/74 , G03F7/00 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397
摘要： A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y, X, R1, R2, n1, n2 and A+ have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.
摘要翻译：提供由下式（1）表示的光致酸发生剂，光酸产生剂的制造方法和含有光酸产生剂的抗蚀剂组合物。其中，在式（1）中，Y，X，R1，R2，n1，n2和A +具有与本发明的详细说明中所定义的相同的含义。光致酸发生器可以在ArF液浸光刻时保持适当的接触角，可以减少液浸光刻过程中发生的缺陷，并且在抗蚀剂溶剂中具有优异的溶解性和与树脂的相容性优异。此外，光致酸产生剂可以通过使用工业上容易获得的环氧化合物的有效且简单的方法制备。

5. 发明申请

US20100143843A1 PHOTOACID GENERATOR, COPOLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND METHOD OF FORMING PATTERN USING THE CHEMICALLY AMPLIFIED RESIST COMPOSITION 有权
标题翻译：光电发生器，共聚物，化学放大电阻组合物和使用化学放大电阻组合物形成图案的方法
公开(公告)号：US20100143843A1
公开(公告)日：2010-06-10
申请号：US12416988
申请日：2009-04-02
申请人： Jung Hoon OH , Sang Jin KIM , Jin Ho KIM , Dae Hyeon SHIN
发明人： Jung Hoon OH , Sang Jin KIM , Jin Ho KIM , Dae Hyeon SHIN
IPC分类号： G03F7/20 , C07C69/65 , C07C69/52 , C07C69/618 , C07C69/74 , C08F14/18 , G03F7/004
CPC分类号： C07C381/12 , C07C309/12 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C08F220/18 , C08F220/28 , C08F220/32 , C08F232/08 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397
摘要： Disclosed are a photoacid generator, a copolymer, a chemically amplified resist composition, and a method of forming a pattern using the chemically amplified resist composition. The photoacid is connected with a main chain of the copolymer, whereby the photoacid is equally dispersed within a resist layer, and characteristics of line edge roughness of a resist pattern is improved.
摘要翻译：公开了光致酸产生剂，共聚物，化学放大抗蚀剂组合物，以及使用化学放大抗蚀剂组合物形成图案的方法。光致酸与共聚物的主链连接，光致酸等均分散在抗蚀剂层中，抗蚀剂图案的线边缘粗糙度的特性提高。

6. 发明申请

US20120203024A1 PHOTOACID GENERATOR, METHOD FOR PRODUCING THE SAME, AND RESIST COMPOSITION COMPRISING THE SAME 有权
标题翻译：光致发电机及其制造方法以及包含该光电发生器的耐热组合物
公开(公告)号：US20120203024A1
公开(公告)日：2012-08-09
申请号：US13367896
申请日：2012-02-07
申请人： Jung Hoon OH , Jin Bong Shin , Tae Gon Kim , Dong Chul Seo
发明人： Jung Hoon OH , Jin Bong Shin , Tae Gon Kim , Dong Chul Seo
IPC分类号： C07C69/753 , C07C69/78 , C07C69/76 , C07C67/14
CPC分类号： C07C309/10 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D307/33 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y1, Y2, X, R1, R2, n1, n2 and A+ have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.
摘要翻译：提供由下式（1）表示的光致酸发生剂，光酸产生剂的制造方法和含有光酸产生剂的抗蚀剂组合物。其中，在式（1）中，Y1，Y2，X，R1，R2，n1，n2和A +具有与本发明的详细说明中所定义的相同的含义。光致酸发生器可以在ArF液浸光刻时保持适当的接触角，可以减少液浸光刻过程中发生的缺陷，并且在抗蚀剂溶剂中具有优异的溶解性和与树脂的相容性优异。此外，光致酸产生剂可以通过使用工业上容易获得的环氧化合物的有效且简单的方法制备。

7. 发明申请

US20130035503A1 SULFONIUM COMPOUND, PHOTOACID GENERATOR, AND RESIST COMPOSITION 有权
标题翻译：磺化合物，光致发电机和耐腐蚀组合物
公开(公告)号：US20130035503A1
公开(公告)日：2013-02-07
申请号：US13557893
申请日：2012-07-25
申请人： Jung Hoon OH , Dae Kyung Yoon , Seung Duk Cho , So Jeong Park
发明人： Jung Hoon OH , Dae Kyung Yoon , Seung Duk Cho , So Jeong Park
IPC分类号： C07C309/06
CPC分类号： C07C309/06 , C07C309/02 , C07C309/12 , C07C381/12 , C07C2602/42 , C07C2603/74 , C07D307/64 , C07D333/46 , G03F7/00 , G03F7/004 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397
摘要： A sulfonium compound represented by the following formula (1), a photoacid generator containing the sulfonium compound, and a resist composition containing the photoacid generator are provided: wherein X represents an electron donor group; R1 and R2 each independently represent an alkyl group or the like; R4 to R6 each independently represent an alkyl group, or the like; R3 represents a cyclic alkenediyl group or the like; and −A represents an anion. The sulfonium compound has a photon yield that is controllable by introducing different absorbers to the cation region in one molecule, can address the inconvenience of using a mixture of different photoacid generators when the sulfonium compound is applied as a photoacid generator, has excellent miscibility in a resist, and has enhanced resolution and line edge roughness.
摘要翻译：提供由下式（1）表示的锍化合物，含有锍化合物的光酸产生剂和含有光致酸发生剂的抗蚀剂组合物，其中X表示电子给体基团; R1和R2各自独立地表示烷基等; R4至R6各自独立地表示烷基等; R3表示环状亚烯基等; -A表示阴离子。锍化合物具有通过在一个分子中向阳离子区域引入不同吸收剂可控制的光子产率，可以解决当将锍化合物用作光致酸发生剂时使用不同光酸产生剂的混合物的不便之处，在抗蚀，并具有增强的分辨率和线边缘粗糙度。

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