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    • 3. 发明申请
    • Novel dental dam and methods of using same
    • 新型牙科大坝及其使用方法
    • US20090053668A1
    • 2009-02-26
    • US11894820
    • 2007-08-22
    • Young K. Kim
    • Young K. Kim
    • A61C5/12
    • A61C5/82
    • The present invention is a system for performing a dental procedure that reduces or eliminates particulates produced during the procedure from being deposited in the mouth of the patient or about the area where the dental procedure is performed. This system comprises, an enclosed dental dam having a semi-rigid upper ring, lower ring and semi-flexible dome. The semi-rigid upper ring has a snap connector along its interior perimeter edge and a first radially outward extending lip along its top side. Then semi-rigid lower ring has a snap connector able to be received by the interior perimeter edge of the semi-rigid upper ring for holding a flexible sheet having an aperture for sealing about a tooth and a second radially outward extending lip. When the upper and lower rings are connected the first and second radially outward extending lips form a snap fit adapter. The semi-flexible dome has an upper surface having at least two apertures and the base having a snap fit adapter along its inner perimeter edge for being received by the groove formed between the radially outward extending lips when the upper and lower rings are connected. One of the at least two apertures is able to receive an air abrasive drill for removing tooth material and the other is able to receive a dental camera for visualizing the tooth during the dental procedure.
    • 本发明是一种用于执行牙科手术的系统,其减少或消除在手术过程中产生的微粒沉积在患者的口中或在牙科手术进行的区域。 该系统包括具有半刚性上环,下环和半柔性圆顶的封闭式牙坝。 半刚性上环具有沿着其内周边缘的卡扣连接器和沿其顶侧的第一径向向外延伸的唇缘。 然后半刚性下环具有能够被半刚性上环的内周边缘接收的卡扣连接器,用于保持具有用于密封齿的孔的柔性片,以及第二径向向外延伸的唇。 当上下环连接时,第一和第二径向向外延伸的唇形成卡扣配合适配器。 半柔性圆顶具有具有至少两个孔的上表面,并且底座具有沿着其内周边缘的卡扣配合适配器,以在上下环连接时由形成在径向向外延伸的唇之间的凹槽接收。 所述至少两个孔中的一个能够接收用于移除牙齿材料的空气磨料钻,并且另一个能够接收用于在牙科手术期间使牙齿可视化的牙科相机。
    • 9. 发明授权
    • Artificial soil composition and a method of growing vegetation on a
sloped surface
    • 人造土壤组成和在斜坡上生长植被的方法
    • US5607494A
    • 1997-03-04
    • US97888
    • 1993-07-28
    • Young K. Kim
    • Young K. Kim
    • C05F11/04C05F11/02C05F11/08
    • C05F11/04Y10S71/903Y10S71/904
    • An artificial soil composition and a method of growing vegetation on a sloped surface, especially a cut rock surface are disclosed. The artificial soil composition includes peat, granular soil, sewage sediment formed by the treatment of urban waste for example and pulp sludge formed by the de-watering of fibrous material and is a byproduct of the manufacture of paper from wood pulp. The artificial soil composition is applied over a meshing which is secured over a sloped cut rock surface. Plants are grown in the layer of artificial soil. Experimentally, the artificial soil is shown to have an increased adhesion to the inclined surface compared to natural soil, promotes plant growth and retains water to a greater extent than natural soil but does not cause an environmental hazard resulting from the leaching of compounds in the run-off water.The preferred concentrations of the constituents by weight are: peat (10-30%) granular soil (10-30%) sewage sediment (40-60%) and pulp sludge (25-44%).
    • 公开了一种人造土壤组合物和在倾斜表面,特别是切割岩石表面上生长植被的方法。 人造土壤组合物包括泥炭,颗粒土壤,通过处理城市废物形成的污水沉淀物和由纤维材料脱水形成的纸浆,并且是由木浆制造纸的副产物。 将人造土壤组合物施加在固定在倾斜的切割岩石表面上的啮合上。 植物生长在人造土壤层。 实验上,与天然土壤相比,人造土壤显示出对倾斜表面的粘附性增加,促进植物生长并且比天然土壤更大程度地保持水分,但不会引起化合物在运行中浸出而引起的环境危害 关闭水。 重量份数组分的优选浓度为:泥炭(10-30%)颗粒土(10-30%)污泥(40-60%)和纸浆污泥(25-44%)。
    • 10. 发明授权
    • Method for fabricating MOS transistor
    • 制造MOS晶体管的方法
    • US5374575A
    • 1994-12-20
    • US156462
    • 1993-11-23
    • Young K. KimKyung S. KimMin H. Park
    • Young K. KimKyung S. KimMin H. Park
    • H01L21/336H01L29/423H01L29/78H01L21/265
    • H01L29/66583H01L29/42368H01L29/66492H01L29/7836H01L29/66537
    • A method for fabricating an LDD MOS transistor having an improved structure capable of simplifying the fabrication and improving characteristics of the transistor. The methods includes the steps of forming a field oxide film for an active region isolation on a silicon substrate, thickly depositing an oxide film and etching the thick oxide film to form a first opening over an active region, forming side wall spacers in the first opening, implanting p type impurity ions in the silicon substrate through the first opening to form a channel region, filling the first opening with a first polysilicon film, removing the spacers to form second openings respectively in both sides of the first polysilicon film, implanting n type impurity ions in the silicon substrate through the second openings to form low concentration source and drain regions respectively disposed adjacent to both lateral ends of the channel region, removing the first polysilicon film to form a third opening, growing an oxide film over the resulting structure to form a gate oxide film, filling the third opening with a second polysilicon film, patterning the gate oxide film, and implanting n type impurity ions in the silicon substrate to form high concentration source and drain regions respectively disposed adjacent to the low concentration source and drain regions.
    • 一种制造具有能够简化晶体管的制造和改善特性的改进结构的LDD MOS晶体管的方法。 所述方法包括以下步骤:在硅衬底上形成用于有源区隔离的场氧化物膜,厚度沉积氧化膜并蚀刻厚氧化物膜以在有源区上形成第一开口,在第一开口中形成侧壁间隔物 通过所述第一开口在所述硅衬底中注入p型杂质离子以形成沟道区,用第一多晶硅膜填充所述第一开口,移除所述间隔物以分别在所述第一多晶硅膜的两侧形成第二开口,将n型 通过第二开口在硅衬底中形成杂质离子,以形成分别邻近通道区两个侧端设置的低浓度源极和漏极区域,去除第一多晶硅膜以形成第三个开口,在所得到的结构上生长氧化膜 形成栅极氧化膜,用第二多晶硅膜填充第三开口,图案化栅极氧化膜并植入 在硅衬底中形成n型杂质离子,以形成分别设置在低浓度源极和漏极区附近的高浓度源极和漏极区域。