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1. 发明授权

US08821642B2 Apparatus for manufacturing flat-panel display 有权
标题翻译：用于制造平板显示器的装置
公开(公告)号：US08821642B2
公开(公告)日：2014-09-02
申请号：US12324202
申请日：2008-11-26
申请人： Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Hyun Hwan Ahn , Suk-Min Son , Sung Il Ahn
发明人： Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Hyun Hwan Ahn , Suk-Min Son , Sung Il Ahn
IPC分类号： C23C16/00 , C23F1/00
CPC分类号： B23Q11/0891 , H01L21/6719
摘要： Disclosed herein is a flat panel display (FPD) manufacturing apparatus for performing a desired process for a substrate positioned in a chamber after establishing a vacuum atmosphere in the chamber. The vacuum chamber is divided into a chamber body and an upper cover to ensure easy opening/closing operations of the upper cover.
摘要翻译：这里公开了一种平板显示器（FPD）制造装置，用于在腔室中建立真空气氛之后，对位于腔室中的基板执行期望的处理。真空室分为室主体和上盖，以确保上盖容易打开/关闭操作。

2. 发明授权

US08758516B2 Apparatus for manufacturing flat-panel display 失效
公开(公告)号：US08758516B2
公开(公告)日：2014-06-24
申请号：US12324297
申请日：2008-11-26
申请人： Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Hyun Hwan Ahn , Suk-Min Son , Sung Il Ahn
发明人： Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Hyun Hwan Ahn , Suk-Min Son , Sung Il Ahn
IPC分类号： C23C16/00 , C23F1/00
CPC分类号： B23Q11/0891 , H01L21/6719
摘要： Disclosed herein is a flat panel display (FPD) manufacturing apparatus for performing a desired process for a substrate positioned in a chamber after establishing a vacuum atmosphere in the chamber. The vacuum chamber is divided into a chamber body and an upper cover to ensure easy opening/closing operations of the upper cover.

3. 发明授权

US07879181B2 Apparatus for manufacturing flat-panel display 有权
标题翻译：用于制造平板显示器的装置
公开(公告)号：US07879181B2
公开(公告)日：2011-02-01
申请号：US12324256
申请日：2008-11-26
申请人： Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Hyun Hwan Ahn , Suk-Min Son , Sung Il Ahn
发明人： Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Hyun Hwan Ahn , Suk-Min Son , Sung Il Ahn
IPC分类号： C23F1/00 , C23C16/00
CPC分类号： B23Q11/0891 , H01L21/6719
摘要： Disclosed herein is a flat panel display (FPD) manufacturing apparatus for performing a desired process for a substrate positioned in a chamber after establishing a vacuum atmosphere in the chamber. The vacuum chamber is divided into a chamber body and an upper cover to ensure easy opening/closing operations of the upper cover.
摘要翻译：这里公开了一种平板显示器（FPD）制造装置，用于在腔室中建立真空气氛之后，对位于腔室中的基板执行期望的处理。真空室分为室主体和上盖，以确保上盖容易打开/关闭操作。

4. 发明申请

US20090084316A1 APPARATUS FOR MANUFACTURING FLAT-PANEL DISPLAY 失效
标题翻译：制造平板显示器的装置
公开(公告)号：US20090084316A1
公开(公告)日：2009-04-02
申请号：US12324297
申请日：2008-11-26
申请人： Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Hyun Hwan Ahn , Suk-Min Son , Sung Il Ahn
发明人： Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Hyun Hwan Ahn , Suk-Min Son , Sung Il Ahn
IPC分类号： C23C16/00
CPC分类号： B23Q11/0891 , H01L21/6719
摘要： Disclosed herein is a flat panel display (FPD) manufacturing apparatus for performing a desired process for a substrate positioned in a chamber after establishing a vacuum atmosphere in the chamber. The vacuum chamber is divided into a chamber body and an upper cover to ensure easy opening/closing operations of the upper cover.
摘要翻译：这里公开了一种平板显示器（FPD）制造装置，用于在腔室中建立真空气氛之后，对位于腔室中的基板执行期望的处理。真空室分为室主体和上盖，以确保上盖容易打开/关闭操作。

5. 发明授权

US08506711B2 Apparatus for manufacturing flat-panel display 失效
标题翻译：用于制造平板显示器的装置
公开(公告)号：US08506711B2
公开(公告)日：2013-08-13
申请号：US12358752
申请日：2009-01-23
申请人： Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Byung-Oh Yoon , Gyeong-Hoon Kim , Hong-Gi Jeong
发明人： Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Byung-Oh Yoon , Gyeong-Hoon Kim , Hong-Gi Jeong
IPC分类号： C23C16/44 , C23F1/00 , H01L21/306 , C23C16/22 , C23C16/06
CPC分类号： H01L21/67126 , H01L21/67196 , H01L21/67201 , H01L21/67236 , H01L51/56
摘要： An flat-panel display (FPD) manufacturing apparatus is provided. The apparatus is flexibly configured so that it is capable of easily processing large-size substrates while also simplifying manufacturing, transporting, operating, and repair processes.
摘要翻译：提供了一种平板显示器（FPD）制造装置。该装置灵活地构造成能够容易地处理大尺寸基板，同时也简化了制造，运输，操作和修理过程。

6. 发明授权

US07886687B2 Plasma processing apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：US07886687B2
公开(公告)日：2011-02-15
申请号：US11313022
申请日：2005-12-20
申请人： Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Young-Joo Hwang , Jong-Cheon Kim
发明人： Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Young-Joo Hwang , Jong-Cheon Kim
IPC分类号： C23C16/50 , C23C16/503 , C23C16/505 , C23C16/509 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： H01L21/67069 , H01J37/3244 , H01J37/32522 , H01J37/32724
摘要： A plasma processing apparatus for generating plasma in a chamber maintained in a vacuum state and processing a substrate using the plasma. The plasma processing apparatus includes a refrigerant channel for circulating a refrigerant formed in a shower head, thereby easily controlling the temperature of the shower head and improving the reproducibility of plasma treatment.
摘要翻译：一种等离子体处理装置，用于在保持真空状态的室中产生等离子体，并使用等离子体处理衬底。等离子体处理装置包括用于使形成在喷淋头中的制冷剂循环的制冷剂通道，从而容易地控制淋浴头的温度并提高等离子体处理的再现性。

7. 发明授权

US07537673B2 Plasma processing apparatus 失效
标题翻译：等离子体处理装置
公开(公告)号：US07537673B2
公开(公告)日：2009-05-26
申请号：US11219956
申请日：2005-09-06
申请人： Young Jong Lee , Jun Young Choi , Hyun Hwan Ahn , Chan-Ho Kang , Hyun-Woo Baek , Young-Joo Hwang
发明人： Young Jong Lee , Jun Young Choi , Hyun Hwan Ahn , Chan-Ho Kang , Hyun-Woo Baek , Young-Joo Hwang
IPC分类号： H01L21/3065 , C23C16/00 , C23C16/458 , C23C16/50
CPC分类号： C23C16/4585
摘要： Disclosed herein is a plasma processing apparatus, which generates plasma within a vacuum chamber to process semiconductor substrates using the plasma. The apparatus comprises a substrate mounting table, an outer lifting bar, and a baffle. The outer lifting bar comprises a driving shaft, and a substrate supporting member coupled perpendicular to an upper end of the driving shaft. The baffle comprises a baffle plate coupled to the upper end of the driving shaft, and a shielding portion coupled to a lower surface of the baffle plate. The substrate supporting member is a foldable substrate supporting member. The baffle and the substrate supporting member are driven up and down at the same time by the driving shaft. As a result, it is possible to protect the substrate supporting member from plasma, and to prevent interference between the baffle and the outer lifting bar during operation of the plasma processing apparatus.
摘要翻译：本文公开了一种等离子体处理装置，其在真空室内产生等离子体以使用等离子体处理半导体衬底。该装置包括基板安装台，外提升杆和挡板。外提升杆包括驱动轴和垂直于驱动轴的上端联接的基板支撑构件。挡板包括耦合到驱动轴的上端的挡板和耦合到挡板的下表面的屏蔽部分。衬底支撑构件是可折叠衬底支撑构件。挡板和基板支撑构件通过驱动轴同时上下驱动。结果，可以在等离子体处理装置的操作期间保护基板支撑构件免受等离子体的影响，并且防止挡板和外部提升杆之间的干扰。

8. 发明授权

US08152926B2 Vacuum processing apparatus 失效
公开(公告)号：US08152926B2
公开(公告)日：2012-04-10
申请号：US12578820
申请日：2009-10-14
申请人： Young Jong Lee , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
发明人： Young Jong Lee , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
IPC分类号： C23C16/00 , H01L21/306 , B66C1/00 , B23P19/04
CPC分类号： H01L21/67126 , H01L21/6719 , Y10T29/53687
摘要： Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.

9. 发明申请

US20100086381A1 VACUUM PROCESSING APPARATUS 失效
标题翻译：真空加工设备
公开(公告)号：US20100086381A1
公开(公告)日：2010-04-08
申请号：US12578820
申请日：2009-10-14
申请人： Young Jong Lee , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
发明人： Young Jong Lee , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
IPC分类号： H01L21/67
CPC分类号： H01L21/67126 , H01L21/6719 , Y10T29/53687
摘要： Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.
摘要翻译：这里公开了一种真空处理装置，用于在其中建立真空气氛之后对基板进行所需的处理。更具体地说，真空处理装置包括真空室，其被分成室主体和上盖。上盖被构造成容易地打开并且关闭到室主体。

10. 发明授权

US08075691B2 Vacuum processing apparatus 有权
标题翻译：真空加工设备
公开(公告)号：US08075691B2
公开(公告)日：2011-12-13
申请号：US12578918
申请日：2009-10-14
申请人： Young Jong Lee , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
发明人： Young Jong Lee , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
IPC分类号： C23C16/00 , H01L21/306 , B66C1/00 , B23P19/04
CPC分类号： H01L21/67126 , H01L21/6719 , Y10T29/53687
摘要： Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.
摘要翻译：这里公开了一种真空处理装置，用于在其中建立真空气氛之后对基板进行所需的处理。更具体地说，真空处理装置包括真空室，其被分成室主体和上盖。上盖被构造成容易地打开并且关闭到室主体。

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