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1. 发明申请

US20060160019A1 Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist composition 失效
标题翻译：光敏树脂，具有感光性树脂的光致抗蚀剂组合物和通过使用光致抗蚀剂组合物形成光致抗蚀剂图案的方法
公开(公告)号：US20060160019A1
公开(公告)日：2006-07-20
申请号：US11333934
申请日：2006-01-17
申请人： Youn-Kyung Wang , Kyoung-Mi Kim , Young-Ho Kim , Jae-Hyun Kim
发明人： Youn-Kyung Wang , Kyoung-Mi Kim , Young-Ho Kim , Jae-Hyun Kim
IPC分类号： G03C1/76
CPC分类号： G03F7/0397 , G03F7/0392 , G03F7/0395 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： In a photosensitive resin, a photoresist composition having the photosensitive resin, and a method of forming a photoresist pattern by using the photoresist, the photosensitive resin includes a blocking group substituted for an acid. The photosensitive resin has a weight-average molecular weight of from about 6,000 up to about 8,000. The photosensitive resin has a blocking ratio of from about 5% up to about 40%.
摘要翻译：在感光性树脂中，具有感光性树脂的光致抗蚀剂组合物和通过使用光致抗蚀剂形成光致抗蚀剂图案的方法，感光性树脂包括取代酸的封端基。感光性树脂的重均分子量为约6,000至约8,000。感光性树脂的阻塞率为约5％至约40％。

2. 发明授权

US07258963B2 Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist composition 失效
标题翻译：光敏树脂，具有感光性树脂的光致抗蚀剂组合物和通过使用光致抗蚀剂组合物形成光致抗蚀剂图案的方法
公开(公告)号：US07258963B2
公开(公告)日：2007-08-21
申请号：US11333934
申请日：2006-01-17
申请人： Youn-Kyung Wang , Kyoung-Mi Kim , Young-Ho Kim , Jae-Hyun Kim
发明人： Youn-Kyung Wang , Kyoung-Mi Kim , Young-Ho Kim , Jae-Hyun Kim
IPC分类号： G03F7/039 , G03F7/30
CPC分类号： G03F7/0397 , G03F7/0392 , G03F7/0395 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： In a photosensitive resin, a photoresist composition having the photosensitive resin, and a method of forming a photoresist pattern by using the photoresist, the photosensitive resin includes a blocking group substituted for an acid. The photosensitive resin has a weight-average molecular weight of from about 6,000 up to about 8,000. The photosensitive resin has a blocking ratio of from about 5% up to about 40%.
摘要翻译：在感光性树脂中，具有感光性树脂的光致抗蚀剂组合物和通过使用光致抗蚀剂形成光致抗蚀剂图案的方法，感光性树脂包括取代酸的封端基。感光性树脂的重均分子量为约6,000至约8,000。感光性树脂的阻塞率为约5％至约40％。

3. 发明授权

US07776730B2 Siloxane polymer composition, method of forming a pattern using the same, and method of manufacturing a semiconductor using the same 失效
标题翻译：硅氧烷聚合物组合物，使用其形成图案的方法，以及使用其制造半导体的方法
公开(公告)号：US07776730B2
公开(公告)日：2010-08-17
申请号：US12216682
申请日：2008-07-09
申请人： Kyoung-Mi Kim , Young-Ho Kim , Youn-Kyung Wang , Mi-Ra Park
发明人： Kyoung-Mi Kim , Young-Ho Kim , Youn-Kyung Wang , Mi-Ra Park
IPC分类号： H01L21/20 , H01L21/3205 , H01L21/4763
CPC分类号： C08G77/38 , H01L28/91
摘要： A siloxane polymer composition includes an organic solvent in an amount of about 93 percent by weight to about 98 percent by weight, based on a total weight of the siloxane polymer composition, and a siloxane complex in an amount of about 2 percent by weight to about 7 percent by weight, based on the total weight of the siloxane polymer composition, the siloxane complex including a siloxane polymer with an introduced carboxylic acid and being represented by Formula 1 below, wherein each of R1, R2 R3, and R4 independently represents H, OH, CH3, C2H5, C3H7, C4H9 or C5H11, R′ represents CH2, C2H4, C3H6, C4H8, C5H10 or C6H12, and n represents a positive integer so the siloxane polymer of the siloxane complex has a number average molecular weight of about 4,000 to about 5,000.
摘要翻译：硅氧烷聚合物组合物包含基于硅氧烷聚合物组合物的总重量为约93重量％至约98重量％的量的有机溶剂和约2重量％至约2重量％的硅氧烷配合物 7重量％，基于硅氧烷聚合物组合物的总重量，硅氧烷配合物包括具有引入的羧酸的硅氧烷聚合物并由下式1表示，其中R1，R2 R3和R4各自独立地表示H， OH，CH3，C2H5，C3H7，C4H9或C5H11，R'表示CH2，C2H4，C3H6，C4H8，C5H10或C6H12，n表示正整数，硅氧烷配合物的硅氧烷聚合物的数均分子量为约4,000 至约5,000。

4. 发明授权

US07282319B2 Photoresist composition and method of forming a pattern using same 有权
标题翻译：光刻胶组合物和使用其形成图案的方法
公开(公告)号：US07282319B2
公开(公告)日：2007-10-16
申请号：US11141736
申请日：2005-05-31
申请人： Kyoung-Mi Kim , Yeu-Young Youn , Youn-Kyung Wang , Jae-Ho Kim , Young-Ho Kim , Boo-Deuk Kim
发明人： Kyoung-Mi Kim , Yeu-Young Youn , Youn-Kyung Wang , Jae-Ho Kim , Young-Ho Kim , Boo-Deuk Kim
IPC分类号： G03F7/039 , G03C7/30
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/115 , Y10S430/122
摘要： A photoresist composition for preventing exposing failures and a method of forming a pattern using the same are disclosed. The photoresist composition preferably comprises about 0.1% to about 0.5% by weight of a photo acid generator, and about 2% to about 10% by weight of a polymer resin, the PAG including a monophenyl sulfonium compound, a triphenyl sulfonium compound or a mixture thereof. The footing phenomenon and the top loss of a pattern are sufficiently prevented.
摘要翻译：公开了一种用于防止暴露故障的光致抗蚀剂组合物和使用其形成图案的方法。光致抗蚀剂组合物优选包含约0.1重量％至约0.5重量％的光酸产生剂和约2重量％至约10重量％的聚合物树脂，该PAG包括单苯基锍化合物，三苯基锍化合物或混合物其中。充分防止了基础现象和图案的最大损失。

5. 发明授权

US08450444B2 Siloxane polymer composition 失效
标题翻译：硅氧烷聚合物组合物
公开(公告)号：US08450444B2
公开(公告)日：2013-05-28
申请号：US12856359
申请日：2010-08-13
申请人： Kyoung-Mi Kim , Young-Ho Kim , Youn-Kyung Wang , Mi-Ra Park
发明人： Kyoung-Mi Kim , Young-Ho Kim , Youn-Kyung Wang , Mi-Ra Park
IPC分类号： C08G77/385
CPC分类号： C08G77/38 , H01L28/91
摘要： A siloxane polymer composition includes an organic solvent in an amount of about 93 percent by weight to about 98 percent by weight, based on a total weight of the siloxane polymer composition, and a siloxane complex in an amount of about 2 percent by weight to about 7 percent by weight, based on the total weight of the siloxane polymer composition, the siloxane complex including a siloxane polymer with an introduced carboxylic acid and being represented by Formula 1 below, wherein each of R1, R2 R3, and R4 independently represents H, OH, CH3, C2H5, C3H7, C4H9 or C5H11, R′ represents CH2, C2H4, C3H6, C4H8, C5H10 or C6H12, and n represents a positive integer so the siloxane polymer of the siloxane complex has a number average molecular weight of about 4,000 to about 5,000.
摘要翻译：硅氧烷聚合物组合物包含基于硅氧烷聚合物组合物的总重量为约93重量％至约98重量％的量的有机溶剂和约2重量％至约2重量％的硅氧烷配合物 7重量％，基于硅氧烷聚合物组合物的总重量，硅氧烷配合物包括具有引入的羧酸的硅氧烷聚合物并由下式1表示，其中R1，R2 R3和R4各自独立地表示H， OH，CH3，C2H5，C3H7，C4H9或C5H11，R'表示CH2，C2H4，C3H6，C4H8，C5H10或C6H12，n表示正整数，硅氧烷配合物的硅氧烷聚合物的数均分子量为约4,000 至约5,000。

6. 发明申请

US20050266342A1 Photoresist composition and method of forming a pattern using same 有权
标题翻译：光刻胶组合物和使用其形成图案的方法
公开(公告)号：US20050266342A1
公开(公告)日：2005-12-01
申请号：US11141736
申请日：2005-05-31
申请人： Kyoung-Mi Kim , Yeu-Young Youn , Youn-Kyung Wang , Jae-Ho Kim , Young-Ho Kim , Boo-Deuk Kim
发明人： Kyoung-Mi Kim , Yeu-Young Youn , Youn-Kyung Wang , Jae-Ho Kim , Young-Ho Kim , Boo-Deuk Kim
IPC分类号： G03C1/492 , G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/115 , Y10S430/122
摘要： A photoresist composition for preventing exposing failures and a method of forming a pattern using the same are disclosed. The photoresist composition preferably comprises about 0.1% to about 0.5% by weight of a photo acid generator, and about 2% to about 10% by weight of a polymer resin, the PAG including a monophenyl sulfonium compound, a triphenyl sulfonium compound or a mixture thereof. The footing phenomenon and the top loss of a pattern are sufficiently prevented.
摘要翻译：公开了一种用于防止暴露故障的光致抗蚀剂组合物和使用其形成图案的方法。光致抗蚀剂组合物优选包含约0.1重量％至约0.5重量％的光酸产生剂和约2重量％至约10重量％的聚合物树脂，该PAG包括单苯基锍化合物，三苯基锍化合物或混合物其中。充分防止了基础现象和图案的最大损失。

7. 发明授权

US08071484B2 Method of forming fine pattern employing self-aligned double patterning 失效
标题翻译：使用自对准双重图案形成精细图案的方法
公开(公告)号：US08071484B2
公开(公告)日：2011-12-06
申请号：US12132548
申请日：2008-06-03
申请人： Kyoung-Mi Kim , Jae-Ho Kim , Young-Ho Kim , Myung-Sun Kim , Youn-Kyung Wang , Mi-Ra Park
发明人： Kyoung-Mi Kim , Jae-Ho Kim , Young-Ho Kim , Myung-Sun Kim , Youn-Kyung Wang , Mi-Ra Park
IPC分类号： H01L21/311 , B44C1/22
CPC分类号： H01L21/0337
摘要： There are provided a method of forming a fine pattern employing self-aligned double patterning. The method includes providing a substrate. First mask patterns are formed on the substrate. A reactive layer is formed on the substrate having the first mask patterns. The reactive layer adjacent to the first mask patterns is reacted using a chemical attachment process, thereby forming sacrificial layers along outer walls of the first mask patterns. The reactive layer that is not reacted is removed to expose the sacrificial layers. Second mask patterns are formed between the sacrificial layers adjacent to sidewalls of the first mask patterns facing each other. The sacrificial layers are removed to expose the first and second mask patterns and the substrate exposed between the first and second mask patterns. The substrate is etched using the first and second mask patterns as an etching mask.
摘要翻译：提供了使用自对准双重图案形成精细图案的方法。该方法包括提供基板。在基板上形成第一掩模图案。在具有第一掩模图案的基板上形成反应层。使用化学附着工艺反应与第一掩模图案相邻的反应层，从而沿着第一掩模图案的外壁形成牺牲层。去除未反应的反应层以暴露牺牲层。在与彼此面对的第一掩模图案的侧壁相邻的牺牲层之间形成第二掩模图案。去除牺牲层以暴露在第一和第二掩模图案之间暴露的第一和第二掩模图案和衬底。使用第一和第二掩模图案作为蚀刻掩模蚀刻衬底。

8. 发明申请

US20100305266A1 SILOXANE POLYMER COMPOSITION 失效
标题翻译：硅氧烷聚合物组合物
公开(公告)号：US20100305266A1
公开(公告)日：2010-12-02
申请号：US12856359
申请日：2010-08-13
申请人： Kyoung-Mi KIM , Young-Ho Kim , Youn-Kyung Wang , Mi-Ra Park
发明人： Kyoung-Mi KIM , Young-Ho Kim , Youn-Kyung Wang , Mi-Ra Park
IPC分类号： C08L83/06
CPC分类号： C08G77/38 , H01L28/91
摘要： A siloxane polymer composition includes an organic solvent in an amount of about 93 percent by weight to about 98 percent by weight, based on a total weight of the siloxane polymer composition, and a siloxane complex in an amount of about 2 percent by weight to about 7 percent by weight, based on the total weight of the siloxane polymer composition, the siloxane complex including a siloxane polymer with an introduced carboxylic acid and being represented by Formula 1 below, wherein each of R1, R2 R3, and R4 independently represents H, OH, CH3, C2H5, C3H7, C4H9 or C5H11, R′ represents CH2, C2H4, C3H6, C4H8, C5H10 or C6H12, and n represents a positive integer so the siloxane polymer of the siloxane complex has a number average molecular weight of about 4,000 to about 5,000.
摘要翻译：硅氧烷聚合物组合物包含基于硅氧烷聚合物组合物的总重量为约93重量％至约98重量％的量的有机溶剂和约2重量％至约2重量％的硅氧烷配合物 7重量％，基于硅氧烷聚合物组合物的总重量，硅氧烷配合物包括具有引入的羧酸的硅氧烷聚合物并由下式1表示，其中R1，R2 R3和R4各自独立地表示H， OH，CH3，C2H5，C3H7，C4H9或C5H11，R'表示CH2，C2H4，C3H6，C4H8，C5H10或C6H12，n表示正整数，硅氧烷配合物的硅氧烷聚合物的数均分子量为约4,000 至约5,000。

9. 发明申请

US20090017592A1 Siloxane polymer composition, method of forming a pattern using the same, and method of manufacturing a semiconductor using the same 失效
标题翻译：硅氧烷聚合物组合物，使用其形成图案的方法，以及使用其制造半导体的方法
公开(公告)号：US20090017592A1
公开(公告)日：2009-01-15
申请号：US12216682
申请日：2008-07-09
申请人： Kyoung-Mi Kim , Young-Ho Kim , Youn-Kyung Wang , Mi-Ra Park
发明人： Kyoung-Mi Kim , Young-Ho Kim , Youn-Kyung Wang , Mi-Ra Park
IPC分类号： H01L21/02 , C08G77/14
CPC分类号： C08G77/38 , H01L28/91
摘要： A siloxane polymer composition includes an organic solvent in an amount of about 93 percent by weight to about 98 percent by weight, based on a total weight of the siloxane polymer composition, and a siloxane complex in an amount of about 2 percent by weight to about 7 percent by weight, based on the total weight of the siloxane polymer composition, the siloxane complex including a siloxane polymer with an introduced carboxylic acid and being represented by Formula 1 below, wherein each of R1, R2 R3, and R4 independently represents H, OH, CH3, C2H5, C3H7, C4H9 or C5H11, R′ represents CH2, C2H4, C3H6, C4H8, C5H10 or C6H12, and n represents a positive integer so the siloxane polymer of the siloxane complex has a number average molecular weight of about 4,000 to about 5,000.
摘要翻译：硅氧烷聚合物组合物包含基于硅氧烷聚合物组合物的总重量为约93重量％至约98重量％的量的有机溶剂和约2重量％至约2重量％的硅氧烷配合物 7重量％，基于硅氧烷聚合物组合物的总重量，硅氧烷配合物包括具有引入的羧酸的硅氧烷聚合物并由下式1表示，其中R1，R2 R3和R4各自独立地表示H， OH，CH3，C2H5，C3H7，C4H9或C5H11，R'表示CH2，C2H4，C3H6，C4H8，C5H10或C6H12，n表示正整数，硅氧烷配合物的硅氧烷聚合物的数均分子量为约4,000 至约5,000。

10. 发明申请

US20060166134A1 Photoresist composition and method of forming a pattern using the same 审中-公开
标题翻译：光刻胶组合物和使用其形成图案的方法
公开(公告)号：US20060166134A1
公开(公告)日：2006-07-27
申请号：US11332636
申请日：2006-01-13
申请人： Kyoung-Mi Kim , Youn-Kyung Wang , Young-Ho Kim
发明人： Kyoung-Mi Kim , Youn-Kyung Wang , Young-Ho Kim
IPC分类号： G03C1/76
CPC分类号： G03F7/0392
摘要： A photoresist composition is provided. The photosensitive composition includes a photosensitive resin present in an amount of about 4% by weight to about 10% by weight, a photo-acid generator (PAG) present in an amount of about 0.1% by weight to about 0.5% by weight and a residual amount of a solvent. The photosensitive resin comprises a first resin which includes a first blocking group and a second resin which includes a second blocking group having an activation energy less than the first blocking group.
摘要翻译：提供光致抗蚀剂组合物。感光组合物包含以约4重量％至约10重量％的量存在的感光性树脂，以约0.1重量％至约0.5重量％的量存在的光酸产生剂（PAG）和残留量的溶剂。感光性树脂包括第一树脂，其包含第一封闭基团和第二树脂，其包含具有小于第一封闭基团的活化能的第二封闭基团。

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