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1. 发明授权

US5629898A Dynamic memory device, a memory module, and a method of refreshing a dynamic memory device 失效
标题翻译：动态存储器件，存储器模块和刷新动态存储器件的方法
公开(公告)号：US5629898A
公开(公告)日：1997-05-13
申请号：US607977
申请日：1996-02-29
申请人： Youji Idei , Katsuhiro Shimohigashi , Masakazu Aoki , Hiromasa Noda , Katsuyuki Sato , Hidetoshi Iwai , Makoto Saeki , Jun Murata , Yoshitaka Tadaki , Toshihiro Sekiguchi , Osamu Tsuchiya
发明人： Youji Idei , Katsuhiro Shimohigashi , Masakazu Aoki , Hiromasa Noda , Katsuyuki Sato , Hidetoshi Iwai , Makoto Saeki , Jun Murata , Yoshitaka Tadaki , Toshihiro Sekiguchi , Osamu Tsuchiya
IPC分类号： G11C11/406 , G11C11/407 , G11C7/00
CPC分类号： G11C11/406 , G11C2211/4016 , G11C2211/4061
摘要： A period pulse corresponding to the shortest information retention time of those of dynamic memory cells is counted to form a refresh address to be assigned to a plurality of word lines. A carry signal outputted from the refresh address counter is divided by a divider. For each of said plurality of word lines assigned with the refresh address, one of a short period corresponding to an output pulse of a timer or a long period corresponding to the divided pulse from the divider is stored in a storage circuit as refresh time setting information. A memory cell refresh operation to be performed by the refresh address is made valid or invalid for each word line according to the refresh time setting information stored in the storage circuit and the refresh time setting information itself is made invalid by the output pulse of the divider.
摘要翻译：对与动态存储单元的最短信息保持时间对应的周期脉冲进行计数，以形成分配给多个字线的刷新地址。从刷新地址计数器输出的进位信号由分频器分频。对于分配有刷新地址的所述多个字线中的每一个，对应于定时器的输出脉冲的短周期中的一个或与来自分频器的分频脉冲相对应的长周期中的一个作为刷新时间设置信息被存储在存储电路中。根据存储在存储电路中的刷新时间设定信息，由刷新地址执行的存储器单元刷新动作对每个字线进行有效或无效，并且刷新时间设定信息本身被分频器的输出脉冲无效。

2. 发明授权

US06281071B1 Method of producing semiconductor integrated circuit device having switching MISFET and capacitor element including wiring therefor and method of producing such wiring 失效
标题翻译：具有开关MISFET和包括其布线的电容器元件的半导体集成电路器件的制造方法以及制造这种布线的方法
公开(公告)号：US06281071B1
公开(公告)日：2001-08-28
申请号：US09317999
申请日：1999-05-25
申请人： Jun Murata , Yoshitaka Tadaki , Isamu Asano , Mitsuaki Horiuchi , Jun Sugiura , Hiroko Kaneko , Shinji Shimizu , Atsushi Hiraiwa , Hidetsugu Ogishi , Masakazu Sagawa , Masami Ozawa , Toshihiro Sekiguchi
发明人： Jun Murata , Yoshitaka Tadaki , Isamu Asano , Mitsuaki Horiuchi , Jun Sugiura , Hiroko Kaneko , Shinji Shimizu , Atsushi Hiraiwa , Hidetsugu Ogishi , Masakazu Sagawa , Masami Ozawa , Toshihiro Sekiguchi
IPC分类号： H01L218242
CPC分类号： H01L27/105 , H01L27/10808
摘要： A semiconductor integrated circuit device having a switching MISFET, and a capacitor element formed over the semiconductor substrate, such as a DRAM, is disclosed. In a first aspect of the present invention, the impurity concentration of the semiconductor region of the switching MISFET to which the capacitor element is connected is less than the impurity concentration of semiconductor regions of MISFETs of peripheral circuitry. In a second aspect, the Y-select signal line overlaps the lower electrode layer of the capacitor element. In a third aspect, a potential barrier layer, provided at least under the semiconductor region of the switching MISFET to which the capacitor element is connected, is formed by diffusion of an impurity for a channel stopper region. In a fourth aspect, the dielectric film of the capacitor element is co-extensive with the capacitor electrode layer over it. In a fifth aspect, the capacitor dielectric film is a silicon nitride film having a silicon oxide layer thereon, the silicon oxide layer being formed by oxidizing a surface layer of the silicon nitride under high pressure. In sixth and seventh aspects, wiring is provided.
摘要翻译：公开了一种具有开关MISFET的半导体集成电路器件和形成在诸如DRAM的半导体衬底之上的电容器元件。在本发明的第一方面中，电容器元件连接的开关MISFET的半导体区域的杂质浓度小于外围电路的MISFET的半导体区域的杂质浓度。在第二方面，Y选择信号线与电容器元件的下电极层重叠。在第三方面中，通过用于沟道阻挡区域的杂质的扩散，形成至少在电容器元件连接的开关MISFET的半导体区域下方的势垒层。在第四方面中，电容器元件的电介质膜与其上的电容器电极层共同扩展。在第五方面中，电容器电介质膜是其上具有氧化硅层的氮化硅膜，通过在高压下氧化氮化硅的表面层而形成氧化硅层。在第六和第七方面中，提供了布线。

3. 发明授权

US5917211A Semiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the same 失效
标题翻译：半导体集成电路及其制造方法及其制造装置
公开(公告)号：US5917211A
公开(公告)日：1999-06-29
申请号：US979543
申请日：1997-11-25
申请人： Jun Murata , Yoshitaka Tadaki , Hiroko Kaneko , Toshihiro Sekiguchi , Hiroyuki Uchiyama , Hisashi Nakamura , Toshio Maeda , Osamu Kasahara , Hiromichi Enami , Atsushi Ogishima , Masaki Nagao , Michimasa Funabashi , Yasuo Kiguchi , Masayuki Kojima , Atsuyoshi Koike , Hiroyuki Miyazawa , Masato Sadaoka , Kazuya Kadota , Tadashi Chikahara , Kazuo Nojiri , Yutaka Kobayashi
发明人： Jun Murata , Yoshitaka Tadaki , Hiroko Kaneko , Toshihiro Sekiguchi , Hiroyuki Uchiyama , Hisashi Nakamura , Toshio Maeda , Osamu Kasahara , Hiromichi Enami , Atsushi Ogishima , Masaki Nagao , Michimasa Funabashi , Yasuo Kiguchi , Masayuki Kojima , Atsuyoshi Koike , Hiroyuki Miyazawa , Masato Sadaoka , Kazuya Kadota , Tadashi Chikahara , Kazuo Nojiri , Yutaka Kobayashi
IPC分类号： H01L21/8234 , H01L27/105 , H01L27/08 , H01L29/76 , H01L29/94
CPC分类号： H01L27/105 , H01L21/823425
摘要： A semiconductor integrated circuit comprising first n-channel MISFETs constituting the memory cells of a storage system, second n-channel MISFETs constituting the peripheral circuits of the storage system, and third n-channel MISFETs constituting the output circuit among the peripheral circuits. The respective threshold voltages of the first n-channel MISFETs, the second n-channel MISFETs and the third n-channel MISFETs are decreased in that order when the respective gate lengths of those MISFETs are substantially the same.
摘要翻译：一种半导体集成电路，包括构成存储系统的存储单元的第一n沟道MISFET，构成存储系统的外围电路的第二n沟道MISFET和构成外围电路中的输出电路的第三n沟道MISFET。当这些MISFET的各个栅极长度基本相同时，第一n沟道MISFET，第二n沟道MISFET和第三n沟道MISFET的阈值电压依次减小。

4. 发明授权

US5753550A Semiconductor integrated circuit device having switching MISFET and capacitor element and method of producing the same, including wiring therefor and method of producing such wiring 失效
标题翻译：具有开关MISFET和电容器元件的半导体集成电路器件及其制造方法，包括其布线及其制造方法
公开(公告)号：US5753550A
公开(公告)日：1998-05-19
申请号：US620867
申请日：1996-03-25
申请人： Jun Murata , Yoshitaka Tadaki , Isamu Asano , Mitsuaki Horiuchi , Jun Sugiura , Hiroko Kaneko , Shinji Shimizu , Atsushi Hiraiwa , Hidetsugu Ogishi , Masakazu Sagawa , Masami Ozawa , Toshihiro Sekiguchi
发明人： Jun Murata , Yoshitaka Tadaki , Isamu Asano , Mitsuaki Horiuchi , Jun Sugiura , Hiroko Kaneko , Shinji Shimizu , Atsushi Hiraiwa , Hidetsugu Ogishi , Masakazu Sagawa , Masami Ozawa , Toshihiro Sekiguchi
IPC分类号： H01L27/10 , H01L21/8242 , H01L27/105 , H01L27/108
CPC分类号： H01L27/105 , H01L27/10808
摘要： A semiconductor integrated circuit device having a switching MISFET, and a capacitor element formed over the semiconductor substrate, is disclosed. In a first aspect, the impurity concentration of the semiconductor region of the switching MISFET to which the capacitor element is connected is less than the impurity concentration of semiconductor regions of MISFETs of peripheral circuitry. In other aspects, a Y-select signal line overlaps the lower electrode layer of the capacitor element; a potential barrier layer, provided at least under the semiconductor region of the switching MISFET to which the capacitor element is connected, is formed by diffusion of an impurity for a channel stopper region; the dielectric film of the capacitor element is co-extensive with the capacitor electrode layer over it, the capacitor dielectric film being a silicon nitride film having a silicon oxide layer thereon, the silicon oxide layer being formed by oxidizing a surface layer of the silicon nitride under high pressure; an aluminum wiring layer and a protective (and/or barrier) layer are formed by sputtering in the same vacuum sputtering chamber without breaking the vacuum between forming the layers; and a refractory metal, or a refractory metal silicide, is used as the protective layer for an aluminum wiring containing an added element (e.g., Cu) to prevent migration.
摘要翻译：公开了一种具有开关MISFET的半导体集成电路器件和形成在半导体衬底上的电容器元件。在第一方面中，电容器元件所连接的开关MISFET的半导体区域的杂质浓度小于外围电路的MISFET的半导体区域的杂质浓度。在其他方面，Y选择信号线与电容器元件的下电极层重叠; 至少在与电容器元件连接的开关MISFET的半导体区域下方设置的势垒层通过用于沟道阻挡区域的杂质的扩散而形成; 电容器元件的电介质膜与其上的电容器电极层共同扩展，电容器电介质膜是其上具有氧化硅层的氮化硅膜，氧化硅层通过氧化氮化硅的表面层而形成在高压下通过溅射在相同的真空溅射室中形成铝布线层和保护（和/或阻挡层），而不破坏形成层之间的真空; 和难熔金属或难熔金属硅化物用作用于包含添加元素（例如Cu）以防止迁移的铝布线的保护层。

5. 发明授权

US5349218A Semiconductor integrated circuit device including memory cells having a structure effective in suppression of leak current 失效
标题翻译：包括具有抑制漏电流的结构的存储单元的半导体集成电路器件
公开(公告)号：US5349218A
公开(公告)日：1994-09-20
申请号：US875653
申请日：1992-04-29
申请人： Yoshitaka Tadaki , Toshihiro Sekiguchi , Hiroyuki Uchiyama , Toru Kaga , Jun Murata , Osaomi Enomoto
发明人： Yoshitaka Tadaki , Toshihiro Sekiguchi , Hiroyuki Uchiyama , Toru Kaga , Jun Murata , Osaomi Enomoto
IPC分类号： H01L27/04 , H01L21/822 , H01L21/8242 , H01L27/10 , H01L27/108 , H01L29/78
CPC分类号： H01L27/10829
摘要： A semiconductor integrated circuit device has a semiconductor memory cell array including word lines, data lines and a plurality of memory cells provided at cross points of the word and data lines. Each memory cell has a cell selection transistor and an information storage capacitor connected in series. The cell selection transistor in one cell includes first and second doped regions formed in a main surface of a semiconductor substrate, a first insulating film formed on the main surface between the first and second doped regions and a control electrode layer formed on the first insulating film between the first and second doped regions. The first doped region is connected with a data line, while the control electrode is connected with a word line. The information storage capacitor includes a second insulating film formed on the wall of one trench formed on the main surface of the substrate, an electrode layer formed on the second insulating film and serving as a first electrode of the capacitor, a dielectric film formed on the electrode layer and a conducting material provided to fill a space defined by the dielectric film in the trench and serving as a second electrode of the capacitor. The second doped region of the transistor terminates at the wall of the trench. A conducting layer is provided to extend both on the second doped region and the conducting material in the cell to electrically interconnect them for the series connection.
摘要翻译：半导体集成电路器件具有半导体存储单元阵列，该半导体存储单元阵列包括在字和数据线的交叉点处设置的字线，数据线和多个存储单元。每个存储单元具有串联连接的单元选择晶体管和信息存储电容器。一个单元中的单元选择晶体管包括形成在半导体衬底的主表面中的第一和第二掺杂区，形成在第一和第二掺杂区之间的主表面上的第一绝缘膜和形成在第一绝缘膜上的控制电极层在第一和第二掺杂区域之间。第一掺杂区域与数据线连接，而控制电极与字线连接。信息存储电容器包括形成在形成在基板的主表面上的一个沟槽的壁上的第二绝缘膜，形成在第二绝缘膜上并用作电容器的第一电极的电极层，形成在第二绝缘膜上的电介质膜电极层和设置成填充由沟槽中的电介质膜限定的空间并用作电容器的第二电极的导电材料。晶体管的第二掺杂区域终止于沟槽的壁。提供导电层以在第二掺杂区域和电池中的导电材料两者上延伸以将它们互连用于串联连接。

6. 发明授权

US6060352A Method of manufacturing semiconductor device with increased focus margin 失效
标题翻译：具有增加焦距的半导体器件的制造方法
公开(公告)号：US6060352A
公开(公告)日：2000-05-09
申请号：US15073
申请日：1998-01-28
申请人： Toshihiro Sekiguchi , Hideo Aoki , Yoshitaka Tadaki , Keizo Kawakita , Jun Murata , Katsuo Yuhara , Michio Nishimura , Kazuhiko Saitoh , Minoru Ohtsuka , Masayuki Yasuda , Toshiyuki Kaeriyama , Songsu Cho
发明人： Toshihiro Sekiguchi , Hideo Aoki , Yoshitaka Tadaki , Keizo Kawakita , Jun Murata , Katsuo Yuhara , Michio Nishimura , Kazuhiko Saitoh , Minoru Ohtsuka , Masayuki Yasuda , Toshiyuki Kaeriyama , Songsu Cho
IPC分类号： H01L21/8242 , H01L27/108
CPC分类号： H01L27/10852 , H01L27/10817
摘要： A method for fabricating DRAMs each having a COB structure, and the semiconductor device formed by this method, are provided. In one embodiment, the word line and/or bit line is covered with an insulating film having a comparatively small etching rate. Contact holes are formed while being defined by those insulating films in self-alignment.
摘要翻译：提供了一种用于制造各自具有COB结构的DRAM的方法，以及通过该方法形成的半导体器件。在一个实施例中，字线和/或位线被具有相对较小蚀刻速率的绝缘膜覆盖。在由这些绝缘膜以自对准的方式限定的同时形成接触孔。

7. 发明授权

US5933724A Method of manufacturing a semiconductor integrated circuit device using a photomask in which transmitted light beam intensities are controlled 失效
标题翻译：使用其中控制透射光束强度的光掩模制造半导体集成电路器件的方法
公开(公告)号：US5933724A
公开(公告)日：1999-08-03
申请号：US703067
申请日：1996-08-26
申请人： Toshihiro Sekiguchi , Yoshitaka Tadaki , Keizo Kawakita , Jun Murata , Katsuo Yuhara , Toshikazu Kumai , Michio Tanaka , Michio Nishimura , Kazuhiko Saitoh , Takatoshi Kakizaki , Takeshi Sakai , Toshiyuki Kaeriyama , Songsu Cho
发明人： Toshihiro Sekiguchi , Yoshitaka Tadaki , Keizo Kawakita , Jun Murata , Katsuo Yuhara , Toshikazu Kumai , Michio Tanaka , Michio Nishimura , Kazuhiko Saitoh , Takatoshi Kakizaki , Takeshi Sakai , Toshiyuki Kaeriyama , Songsu Cho
IPC分类号： G03F1/28 , G03F1/30 , G03F1/36 , G03F1/68 , H01L21/027 , H01L21/302 , H01L21/3065 , H01L21/8242 , H01L27/108
CPC分类号： H01L27/10852
摘要： A phase shifting mask is used for manufacturing a semiconductor integrated circuit device including a conductor pattern in which the line width of patterned conductor strips or the space between patterned conductor strips is not constant. For main transparent areas in the mask corresponding to the conductor pattern, auxiliary pattern segments are provided for compensating changes in the phase distribution of transmitted light caused by changes of the line width or the space. Alternately, the spaces between the conductor strips are adjusted to suppress the changes in the phase distribution of transmitted light. Whether the auxiliary pattern segments should have the phase shifting function is determined depending upon the disposition of the main transparent areas.
摘要翻译：使用相移掩模来制造包括导体图案的半导体集成电路器件，其中图案化导体条的线宽或图案化导体条之间的空间不是恒定的。对于对应于导体图案的掩模中的主要透明区域，提供辅助图案段以补偿由线宽或空间的变化引起的透射光的相位分布的变化。或者，调节导体条之间的空间以抑制透射光的相分布的变化。辅助图案片段是否应该具有相移功能是根据主透明区域的配置来确定的。

8. 发明授权

US5930624A Method of producing semiconductor integrated circuit device having switching MISFET and capacitor element including wiring 失效
标题翻译：具有开关MISFET和包括布线的电容元件的半导体集成电路器件的制造方法
公开(公告)号：US5930624A
公开(公告)日：1999-07-27
申请号：US13605
申请日：1998-01-26
申请人： Jun Murata , Yoshitaka Tadaki , Isamu Asano , Mitsuaki Horiuchi , Jun Sugiura , Hiroko Kaneko , Shinji Shimizu , Atsushi Hiraiwa , Hidetsugu Ogishi , Masakazu Sagawa , Masami Ozawa , Toshihiro Sekiguchi
发明人： Jun Murata , Yoshitaka Tadaki , Isamu Asano , Mitsuaki Horiuchi , Jun Sugiura , Hiroko Kaneko , Shinji Shimizu , Atsushi Hiraiwa , Hidetsugu Ogishi , Masakazu Sagawa , Masami Ozawa , Toshihiro Sekiguchi
IPC分类号： H01L27/10 , H01L21/8242 , H01L27/105 , H01L27/108
CPC分类号： H01L27/105 , H01L27/10808
摘要： A semiconductor integrated circuit device having a switching MISFET, and a capacitor element formed over the semiconductor substrate, is disclosed. In a first aspect, the impurity concentration of the semiconductor region of the switching MISFET to which the capacitor element is connected is less than the impurity concentration of semiconductor regions of MISFETs of peripheral circuitry. In other aspects, a Y-select signal line overlaps the lower electrode layer of the capacitor element; a potential barrier layer, provided at least under the semiconductor region of the switching MISFET to which the capacitor element is connected, is formed by diffusion of an impurity for a channel stopper region; the dielectric film of the capacitor element is co-extensive with the capacitor electrode layer over it, the capacitor dielectric film being a silicon nitride film having a silicon oxide layer thereon, the silicon oxide layer being formed by oxidizing a surface layer of the silicon nitride under high pressure; an aluminum wiring layer and a protective (and/or barrier) layer are formed by sputtering in the same vacuum sputtering chamber without breaking the vacuum between forming the layers; and a refractory metal, or a refractory metal silicide, is used as the protective layer for an aluminum wiring containing an added element (e.g., Cu) to prevent migration.
摘要翻译：公开了一种具有开关MISFET的半导体集成电路器件和形成在半导体衬底上的电容器元件。在第一方面中，电容器元件连接的开关MISFET的半导体区域的杂质浓度小于外围电路的MISFET的半导体区域的杂质浓度。在其他方面，Y选择信号线与电容器元件的下电极层重叠; 至少在与电容器元件连接的开关MISFET的半导体区域下方设置的势垒层通过用于沟道阻挡区域的杂质的扩散而形成; 电容器元件的电介质膜与其上的电容器电极层共同扩展，电容器电介质膜是其上具有氧化硅层的氮化硅膜，氧化硅层通过氧化氮化硅的表面层而形成在高压下通过溅射在相同的真空溅射室中形成铝布线层和保护（和/或阻挡层），而不破坏形成层之间的真空; 和难熔金属或难熔金属硅化物用作用于包含添加元素（例如Cu）以防止迁移的铝布线的保护层。

9. 发明授权

US5264712A Semiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the same 失效
标题翻译：半导体集成电路及其制造方法及其制造装置
公开(公告)号：US5264712A
公开(公告)日：1993-11-23
申请号：US881314
申请日：1992-05-07
申请人： Jun Murata , Yoshitaka Tadaki , Hiroko Kaneko , Toshihiro Sekiguchi , Hiroyuki Uchiyama , Hisashi Nakamura , Toshio Maeda , Osamu Kasahara , Hiromichi Enami , Atsushi Ogishima , Masaki Nagao , Michimasa Funabashi , Yasuo Kiguchi , Masayuki Kojima , Atsuyoshi Koike , Hiroyuki Miyazawa , Masato Sadaoka , Kazuya Kadota , Tadashi Chikahara , Kazuo Nojiri , Yutaka Kobayashi
发明人： Jun Murata , Yoshitaka Tadaki , Hiroko Kaneko , Toshihiro Sekiguchi , Hiroyuki Uchiyama , Hisashi Nakamura , Toshio Maeda , Osamu Kasahara , Hiromichi Enami , Atsushi Ogishima , Masaki Nagao , Michimasa Funabashi , Yasuo Kiguchi , Masayuki Kojima , Atsuyoshi Koike , Hiroyuki Miyazawa , Masato Sadaoka , Kazuya Kadota , Tadashi Chikahara , Kazuo Nojiri , Yutaka Kobayashi
IPC分类号： H01L21/8234 , H01L27/105 , H01L21/308 , H01L29/66
CPC分类号： H01L27/105 , H01L21/823425
摘要： A semiconductor integrated circuit comprising first n-channel MISFETs constituting the memory cells of a storage system, second n-channel MISFETs constituting the peripheral circuits of the storage system, and third n-channel MISFETs constituting the output circuit among the peripheral circuits. The respective threshold voltages of the first n-channel MISFETs, the second n-channel MISFETs and the third n-channel MISFETs are decreased in that order when the respective gate lengths of those MISFETs are substantially the same.
摘要翻译：一种半导体集成电路，包括构成存储系统的存储单元的第一n沟道MISFET，构成存储系统的外围电路的第二n沟道MISFET和构成外围电路中的输出电路的第三n沟道MISFET。当这些MISFET的各个栅极长度基本相同时，第一n沟道MISFET，第二n沟道MISFET和第三n沟道MISFET的阈值电压依次减小。

10. 发明授权

US06737318B2 Semiconductor integrated circuit device having switching misfet and capacitor element and method of producing the same, including wiring therefor and method of producing such wiring 失效
标题翻译：具有开关错位和电容器元件的半导体集成电路器件及其制造方法，包括其布线及其制造方法
公开(公告)号：US06737318B2
公开(公告)日：2004-05-18
申请号：US09998654
申请日：2001-12-03
申请人： Jun Murata , Yoshitaka Tadaki , Isamu Asano , Mitsuaki Horiuchi , Jun Sugiura , Hiroko Kaneko , Shinji Shimizu , Atsushi Hiraiwa , Hidetsugu Ogishi , Masakazu Sagawa , Masami Ozawa , Toshihiro Sekiguchi
发明人： Jun Murata , Yoshitaka Tadaki , Isamu Asano , Mitsuaki Horiuchi , Jun Sugiura , Hiroko Kaneko , Shinji Shimizu , Atsushi Hiraiwa , Hidetsugu Ogishi , Masakazu Sagawa , Masami Ozawa , Toshihiro Sekiguchi
IPC分类号： H01L218242
CPC分类号： H01L27/105 , H01L27/10808
摘要： A method of manufacturing a semiconductor integrated circuit device having a switching MISFET and a capacitor element formed over a semiconductor substrate, such as a DRAM, is disclosed. The dielectric film of the capacitor element is formed to be co-extensive with the capacitor electrode layer over it. The upper electrode of the capacitor element is formed to be larger than the lower electrode.
摘要翻译：公开了一种制造半导体集成电路器件的方法，该半导体集成电路器件具有形成在诸如DRAM之类的半导体衬底上的开关MISFET和电容元件。电容器元件的电介质膜形成为与其上的电容器电极层共同扩展。电容器元件的上电极形成为比下电极大。

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