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1. 发明申请

US20090229382A1 SAMPLING METHOD AND SAMPLER FOR GAS HYDRATES BY HOLE BOTTOM FREEZING 有权
标题翻译：通过孔底冷冻采样方法和采样气体水合物
公开(公告)号：US20090229382A1
公开(公告)日：2009-09-17
申请号：US12402834
申请日：2009-03-12
申请人： Youhong Sun , Wei Guo , V. K. Chistyakov , Chen Chen , Zupei Zhang , Jun Xue
发明人： Youhong Sun , Wei Guo , V. K. Chistyakov , Chen Chen , Zupei Zhang , Jun Xue
IPC分类号： G01N1/22
CPC分类号： G01N1/08 , E21B25/08 , E21B25/18
摘要： The present invention relates to a sampler for gas hydrates by hole bottom freezing, the sampler comprises a fisher, a wire-line coring mechanism and an outer barrel, and it further comprises a refrigeration portion, a low temperature control portion and a frozen insulation sample portion, which constitute an inner barrel assembly located inside the outer barrel together, wherein a refrigerant in the refrigeration portion is injected into the frozen insulation sample portion under a control of the low temperature control portion, so that a cooling medium in the frozen insulation sample portion is always kept under a predetermined temperature, and a core sample of gas hydrates is frozen at the bottom of a drill hole. The invention also relates to a sampling method using the sampler as mentioned above. In the invention, the temperature of the sample can be decreased by using an external cooling source to suppress hydrate decomposition, the critical decomposition pressure of gas hydrates can be reduced by active decreasing the temperature of the sample, and the stability of gas hydrates is maintained by a passive pressure drop. The method of the present invention need not to keep the pressure of the sample, and is simple to obtain a core sample of gas hydrates with higher fidelity.
摘要翻译：本发明涉及一种通过孔底冷冻进行天然气水合物的采样器，该采样器包括渔夫，线路取芯机构和外筒，还包括制冷部分，低温控制部分和冷冻绝热样品部分，其构成位于外筒内部的内筒组件，其中制冷部分中的制冷剂在低温控制部分的控制下被注入到冷冻绝热样品部分中，使得冷冻绝热样品中的冷却介质部分总是保持在预定温度下，并且气孔水合物的芯样品在钻孔的底部被冷冻。本发明还涉及如上所述使用采样器的采样方法。在本发明中，通过使用外部冷却源抑制水合物分解，可以降低样品的温度，通过主动降低样品的温度可以降低气体水合物的临界分解压力，并保持气体水合物的稳定性被动压降。本发明的方法不需要保持样品的压力，并且获得具有更高保真度的气体水合物的核心样品是简单的。

2. 发明授权

US08074739B2 Sampling method and sampler for gas hydrates by hole bottom freezing 有权
标题翻译：通过孔底冷冻进行天然气水合物的取样方法和取样器
公开(公告)号：US08074739B2
公开(公告)日：2011-12-13
申请号：US12402834
申请日：2009-03-12
申请人： Youhong Sun , Wei Guo , Valery Konstantinovich Chistyakov , Chen Chen , Zupei Zhang , Jun Xue
发明人： Youhong Sun , Wei Guo , Valery Konstantinovich Chistyakov , Chen Chen , Zupei Zhang , Jun Xue
IPC分类号： E21B7/00 , G01N1/22 , G01N1/04 , G01N1/14
CPC分类号： G01N1/08 , E21B25/08 , E21B25/18
摘要： The present invention relates to a sampler for gas hydrates by hole bottom freezing, the sampler comprises a fisher, a wire-line coring mechanism and an outer barrel, and it further comprises a refrigeration portion, a low temperature control portion and a frozen insulation sample portion, which constitute an inner barrel assembly located inside the outer barrel together, wherein a refrigerant in the refrigeration portion is injected into the frozen insulation sample portion under a control of the low temperature control portion, so that a cooling medium in the frozen insulation sample portion is always kept under a predetermined temperature, and a core sample of gas hydrates is frozen at the bottom of a drill hole. The invention also relates to a sampling method using the sampler as mentioned above. In the invention, the temperature of the sample can be decreased by using an external cooling source to suppress hydrate decomposition, the critical decomposition pressure of gas hydrates can be reduced by active decreasing the temperature of the sample, and the stability of gas hydrates is maintained by a passive pressure drop. The method of the present invention need not to keep the pressure of the sample, and is simple to obtain a core sample of gas hydrates with higher fidelity.
摘要翻译：本发明涉及一种通过孔底冷冻进行天然气水合物的采样器，该采样器包括渔夫，线路取芯机构和外筒，还包括制冷部分，低温控制部分和冷冻绝热样品部分，其构成位于外筒内部的内筒组件，其中制冷部分中的制冷剂在低温控制部分的控制下被注入到冷冻绝热样品部分中，使得冷冻绝热样品中的冷却介质部分总是保持在预定温度下，并且气孔水合物的芯样品在钻孔的底部被冷冻。本发明还涉及如上所述使用采样器的采样方法。在本发明中，通过使用外部冷却源抑制水合物分解，可以降低样品的温度，通过主动降低样品的温度可以降低气体水合物的临界分解压力，并保持气体水合物的稳定性被动压降。本发明的方法不需要保持样品的压力，并且获得具有更高保真度的气体水合物的核心样品是简单的。

3. 发明申请

US20120297801A1 FORCED COOLING CIRCULATION SYSTEM FOR DRILLING MUD 有权
标题翻译：用于钻孔的强制冷却循环系统
公开(公告)号：US20120297801A1
公开(公告)日：2012-11-29
申请号：US13575941
申请日：2010-04-15
申请人： Youhong Sun , Jiangpeng Zhao , Wei Guo , Huiwen Xu , Qinghua Wang , Chen Chen , Guosheng Li , Rui Jia , Jianguo Zhao , Jun Xue
发明人： Youhong Sun , Jiangpeng Zhao , Wei Guo , Huiwen Xu , Qinghua Wang , Chen Chen , Guosheng Li , Rui Jia , Jianguo Zhao , Jun Xue
IPC分类号： F25B49/00
CPC分类号： E21B36/001 , E21B21/01 , F25D17/02 , F25D29/00
摘要： A forced cooling circulation system for drilling mud, which includes a refrigeration unit (1), a secondary refrigerant tank (4), a coaxial convection heat exchanger (12) for mud and a mud pond (17), is disclosed. The refrigeration unit (1) is in connection with the secondary refrigerant tank (4) and the coaxial convection heat exchanger (12) for mud via a pump (2), and the coaxial convection heat exchanger (12) for mud is in connection with the mud pond (17) via a pump (15) and pipelines. Heat exchange tubes of the coaxial convection heat exchanger (12) for mud are disposed as a double-layer structure or a multi-layer structure, and the inner heat exchange tubes (23) are mounted inside of the outer heat exchange tubes (25). The secondary refrigerant or the mud is circulated in the annular space between the inner heat exchange tubes (23) and the outer heat exchange tubes (25), and the mud or the secondary refrigerant is circulated in the inner tubes (23). The flow of the circulated mud is opposite to that of the circulated secondary refrigerant, and insulation material (24) is painted on the external wall of the outer tubes (25).
摘要翻译：公开了一种用于钻井泥浆的强制冷却循环系统，其包括制冷单元（1），二次制冷剂罐（4），用于泥浆的同轴对流热交换器（12）和泥浆池（17）。制冷单元（1）通过泵（2）与二级制冷剂罐（4）和用于泥浆的同轴对流热交换器（12）连接，用于泥浆的同轴对流热交换器（12）与泥浆池（17）通过泵（15）和管道。用于泥浆的同轴对流换热器（12）的换热管被设置为双层结构或多层结构，并且内部换热管（23）安装在外部换热管（25）的内部，。二次制冷剂或泥浆在内部热交换管23和外部热交换管25之间的环形空间中循环，泥浆或二次制冷剂在内管23中循环。循环泥浆的流动与循环的二次制冷剂的流动相反，绝缘材料（24）涂在外管（25）的外壁上。

4. 发明授权

US09062509B2 Forced cooling circulation system for drilling mud 有权
标题翻译：用于钻井泥浆的强制冷却循环系统
公开(公告)号：US09062509B2
公开(公告)日：2015-06-23
申请号：US13575941
申请日：2010-04-15
申请人： Youhong Sun , Jiangpeng Zhao , Wei Guo , Huiwen Xu , Qinghua Wang , Chen Chen , Guosheng Li , Rui Jia , Jianguo Zhao , Jun Xue
发明人： Youhong Sun , Jiangpeng Zhao , Wei Guo , Huiwen Xu , Qinghua Wang , Chen Chen , Guosheng Li , Rui Jia , Jianguo Zhao , Jun Xue
IPC分类号： E21B36/00 , E21B21/01 , F25D29/00 , F25D17/02
CPC分类号： E21B36/001 , E21B21/01 , F25D17/02 , F25D29/00
摘要： A forced cooling circulation system for drilling mud, which includes a refrigeration unit (1), a secondary refrigerant tank (4), a coaxial convection heat exchanger (12) for mud and a mud pond (17), is disclosed. The refrigeration unit (1) is in connection with the secondary refrigerant tank (4) and the coaxial convection heat exchanger (12) for mud via a pump (2), and the coaxial convection heat exchanger (12) for mud is in connection with the mud pond (17) via a pump (15) and pipelines. Heat exchange tubes of the coaxial convection heat exchanger (12) for mud are disposed as a double-layer structure or a multi-layer structure, and the inner heat exchange tubes (23) are mounted inside of the outer heat exchange tubes (25). The secondary refrigerant or the mud is circulated in the annular space between the inner heat exchange tubes (23) and the outer heat exchange tubes (25), and the mud or the secondary refrigerant is circulated in the inner tubes (23). The flow of the circulated mud is opposite to that of the circulated secondary refrigerant, and insulation material (24) is painted on the external wall of the outer tubes (25).
摘要翻译：公开了一种用于钻井泥浆的强制冷却循环系统，其包括制冷单元（1），二次制冷剂罐（4），用于泥浆的同轴对流热交换器（12）和泥浆池（17）。制冷单元（1）通过泵（2）与二级制冷剂罐（4）和用于泥浆的同轴对流热交换器（12）连接，用于泥浆的同轴对流热交换器（12）与泥浆池（17）通过泵（15）和管道。用于泥浆的同轴对流换热器（12）的换热管被设置为双层结构或多层结构，并且内部换热管（23）安装在外部换热管（25）的内部，。二次制冷剂或泥浆在内部热交换管23和外部热交换管25之间的环形空间中循环，泥浆或二次制冷剂在内管23中循环。循环泥浆的流动与循环的二次制冷剂的流动相反，绝缘材料（24）涂在外管（25）的外壁上。

5. 发明授权

US08278072B1 Method for synthesis of sialylated products using reversible sialylation 失效
标题翻译：使用可逆唾液酸化合成唾液酸化产物的方法
公开(公告)号：US08278072B1
公开(公告)日：2012-10-02
申请号：US12274142
申请日：2008-11-19
申请人： Khushi L. Matta , Edaya V. Chandrasekaran , Sriram Neelamegham , Jun Xue
发明人： Khushi L. Matta , Edaya V. Chandrasekaran , Sriram Neelamegham , Jun Xue
IPC分类号： C12P19/18
CPC分类号： C12P19/18 , C12P7/6436 , C12P19/44 , C12P21/005 , C12Y204/99004
摘要： A method for producing sialylated molecules based on reverse sialylation that catalytically transfers the sialic acid moiety of sialylated donors to nucleotide monophosphates or transfer sialic acid moieties from sialylated donors to acceptor glycoproteins or glycolipids.
摘要翻译：基于反向唾液酸化制备唾液酸化分子的方法，其将唾液酸化供体的唾液酸部分催化转移到核苷酸单磷酸酯或将唾液酸部分从唾液酸化供体转移到受体糖蛋白或糖脂。

6. 发明授权

US09520267B2 Bias voltage frequency controlled angular ion distribution in plasma processing 有权
标题翻译：等离子体处理中的偏压电压频率控制角离子分布
公开(公告)号：US09520267B2
公开(公告)日：2016-12-13
申请号：US14467806
申请日：2014-08-25
申请人： Ludovic Godet , Jun Xue , Prashanth Kothnur , Umesh M. Kelkar , Matthew D. Scotney-Castle
发明人： Ludovic Godet , Jun Xue , Prashanth Kothnur , Umesh M. Kelkar , Matthew D. Scotney-Castle
IPC分类号： H01J37/317 , H01L21/3065 , H01J37/32
CPC分类号： H01J37/3172 , H01J37/32422 , H01J37/32623 , H01J37/32706 , H01L21/3065
摘要： The angular ion distribution in plasma processing is controlled using a bias voltage frequency. In one example, a plasma containing gas ions is generated in a plasma chamber. The plasma sheath is modified using an aperture disposed between the plasma sheath and the workpiece so that the plasma sheath takes a shape above the aperture. An oscillating radio frequency bias voltage is generated and applied to a workpiece holder. The workpiece holder applies the bias voltage to the workpiece to generate a workpiece bias voltage with respect to the plasma to attract ions across the plasma sheath toward the workpiece. The aperture and the frequency of the bias voltage control an angle at which the ions are attracted toward the workpiece.
摘要翻译：使用偏置电压频率来控制等离子体处理中的角度离子分布。在一个实例中，在等离子体室中产生含有气体离子的等离子体。使用设置在等离子体护套和工件之间的孔来改变等离子体护套，使得等离子体护套在孔的上方具有形状。产生振荡射频偏置电压并将其施加到工件保持器。工件保持器将偏置电压施加到工件以产生相对于等离子体的工件偏置电压，以将等离子体护套上的离子吸引到工件。偏压的孔径和频率控制离子被吸引到工件的角度。

7. 发明申请

US20150371827A1 BIAS VOLTAGE FREQUENCY CONTROLLED ANGULAR ION DISTRIBUTION IN PLASMA PROCESSING 有权
标题翻译：等离子体处理中的偏压电压控制角分布
公开(公告)号：US20150371827A1
公开(公告)日：2015-12-24
申请号：US14467806
申请日：2014-08-25
申请人： Ludovic Godet , Jun Xue , Prashanth Kothnur , Umesh M. Kelkar , Matthew D. Scotney-Castle
发明人： Ludovic Godet , Jun Xue , Prashanth Kothnur , Umesh M. Kelkar , Matthew D. Scotney-Castle
IPC分类号： H01J37/32 , H01J37/317
CPC分类号： H01J37/3172 , H01J37/32422 , H01J37/32623 , H01J37/32706 , H01L21/3065
摘要： The angular ion distribution in plasma processing is controlled using a bias voltage frequency. In one example, a plasma containing gas ions is generated in a plasma chamber. The plasma sheath is modified using an aperture disposed between the plasma sheath and the workpiece so that the plasma sheath takes a shape above the aperture. An oscillating radio frequency bias voltage is generated and applied to a workpiece holder. The workpiece holder applies the bias voltage to the workpiece to generate a workpiece bias voltage with respect to the plasma to attract ions across the plasma sheath toward the workpiece. The aperture and the frequency of the bias voltage control an angle at which the ions are attracted toward the workpiece.
摘要翻译：使用偏置电压频率来控制等离子体处理中的角度离子分布。在一个实例中，在等离子体室中产生含有气体离子的等离子体。使用设置在等离子体护套和工件之间的孔来改变等离子体护套，使得等离子体护套在孔的上方具有形状。产生振荡射频偏置电压并将其施加到工件保持器。工件保持器将偏置电压施加到工件以产生相对于等离子体的工件偏置电压，以将等离子体护套上的离子吸引到工件。偏压的孔径和频率控制离子被吸引到工件的角度。

8. 发明申请

US20130115778A1 Dry Etch Processes 审中-公开
标题翻译：干蚀刻工艺
公开(公告)号：US20130115778A1
公开(公告)日：2013-05-09
申请号：US13591915
申请日：2012-08-22
申请人： Jun Xue , Jie Liu , Yongmei Chen , Timothy Michaelson , Paul Deaton , Timothy W. Weidman , Christopher S. Ngai
发明人： Jun Xue , Jie Liu , Yongmei Chen , Timothy Michaelson , Paul Deaton , Timothy W. Weidman , Christopher S. Ngai
IPC分类号： H01L21/311 , H01L21/3065
CPC分类号： H01L21/02181 , H01L21/02189 , H01L21/02274 , H01L21/0228 , H01L21/0337 , H01L21/31122 , H01L21/31144
摘要： Provided methods of etching and/or patterning films. Certain methods comprise exposing at least part of a film on a substrate, the film comprising one or more of HfO2, HfBxOy, ZrO2, ZrBxOy, to a plasma comprising BCl3 and argon to etch away said at least part of the film. Certain other methods relate to patterning substrates using said methods of etching films.
摘要翻译：提供蚀刻和/或图案化薄膜的方法。某些方法包括将包含BCl 3和氩的等离子体中的HfO 2，HfB x O y，ZrO 2，ZrB x O y中的一种或多种的至少部分膜暴露在衬底上，以蚀刻掉所述至少部分膜。某些其它方法涉及使用所述蚀刻膜的方法图案化衬底。

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