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1. 发明授权

US5998097A Fabrication method employing energy beam source 失效
标题翻译：采用能量束源的制造方法
公开(公告)号：US5998097A
公开(公告)日：1999-12-07
申请号：US300844
申请日：1999-04-28
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Yotaro Hatamura , Masayuki Nakao
IPC分类号： H01J37/305 , H01J37/317 , H05H3/02 , G03C5/00 , G21K5/10
CPC分类号： H05H3/02 , H01J37/3053 , H01J37/3178
摘要： An energy beam source is used in micro-fabrication tasks, such as fabrication of specific patterns, in-situ bonding, repair, connection and disconnection of electrical paths, applicable to semiconductor devices and other micro-sized circuits in integrated circuits. The beam source is made compact so that several sources can be located inside a vacuum vessel and in conjunction with micro-manipulators or micro-movement stages operated under light or an electron microscope. The beam source is provided with at least three electrodes, and by applying a selected voltage, i.e., high frequency voltage, direct current voltage and ground voltage, on each the three electrodes in association with film-forming substance(s), virtually any type of deposit can be formed at any location of a workpiece. Different types of particle beams, such as positive and negative ion beams, a highspeed neutral atomic beam, a radical particle beam, an electron beam can be produced from the beam source by judicious choice of operating-parameters and the film-forming material which may be a process gas or an applied coating. By using the beam source and the method of deposit forming presented, virtually any type of fabrication task can be carried out on any surface and any location of a workpiece in a three-dimensional space.
摘要翻译：能量束源用于微加工任务，例如制造特定图案，原位粘合，修复，连接和断开电路径，适用于集成电路中的半导体器件和其他微型尺寸电路。光束源是紧凑的，使得几个源可以位于真空容器内并且与在微光或电子显微镜下操作的微操纵器或微移动台结合。光束源设置有至少三个电极，并且通过在与成膜物质相关联的三个电极上的每一个上施加选择的电压，即高频电压，直流电压和接地电压，实际上任何类型的沉积物可以形成在工件的任何位置。可以通过明智地选择操作参数和成膜材料，从光束源产生不同类型的粒子束，例如正离子束和负离子束，高速中性原子束，自由基粒子束，电子束，作为工艺气体或涂覆涂层。通过使用光束源和沉积物形成方法，几乎任何类型的制造任务都可以在三维空间中的工件的任何表面和任何位置上进行。

2. 发明授权

US5142424A Floatable information-reading head support configured to prevent forward pitch 失效
标题翻译：浮动信息读取头支持配置为防止前向音调
公开(公告)号：US5142424A
公开(公告)日：1992-08-25
申请号：US540725
申请日：1990-06-20
申请人： Yotaro Hatamura
发明人： Yotaro Hatamura
IPC分类号： G11B11/105 , G11B21/20
CPC分类号： G11B11/1058 , G11B21/20
摘要： An information-reading head having a structure comprising a floatable information-reading head, and a suspension comprising a load arm for supporting the information-reading head via a gimbal. The gimbal having a frame structure in a reversed trapezoidal shape constituted by an upper horizontal portion fixed to the load arm, a lower horizontal portion to which the information-reading head is fixed, and a front portion and a rear portion. At least one of the front and the rear portion being inclined, whereby the information-reading head is substantially prevented from pitching forward when coming into contact with a surface of an information-bearing mechanism. The suspension supports the information reading head such that a center of gravity of the information reading head is positioned between a center of support of the information-reading head by the suspension and a rear of the information-reading head.
摘要翻译：一种信息读取头，其具有包括可浮动信息读取头的结构，以及包括用于经由万向支撑信息读取头的负载臂的悬架。具有由固定到负载臂的上部水平部分，固定有信息读取头的下部水平部分以及前部和后部构成的反向梯形的框架结构的万向架。前部和后部中的至少一个是倾斜的，由此当与信息承载机构的表面接触时，基本上防止信息读取头向前倾斜。悬架支撑信息读取头，使得信息读取头的重心位于信息读取头的悬架中心与信息读取头的后部之间。

3. 发明授权

US4485681A Thrust-torque detector 失效
标题翻译：推力转矩检测器
公开(公告)号：US4485681A
公开(公告)日：1984-12-04
申请号：US433108
申请日：1982-10-06
申请人： Yotaro Hatamura
发明人： Yotaro Hatamura
IPC分类号： B23Q1/34 , G01L1/22 , G01L3/14 , G01L5/12 , G01L5/16
CPC分类号： B23Q1/34 , G01L1/2243 , G01L3/1457 , G01L5/12
摘要： A thrust-torque detector comprising a tubular member. The tubular member has parallel spring-like elastically supported structural portions deformable by a thrust and positioned opposite each other. The tubular member has radially arranged spring-like elastically-supported structural portions deformable by a torque and positioned opposite each other.
摘要翻译：一种推力扭矩检测器，包括管状构件。管状构件具有平行的弹簧状弹性支撑结构部分，其可通过推力变形并且彼此相对定位。管状构件具有径向布置的弹性支撑结构部分，其可通过扭矩变形并且彼此相对定位。

4. 发明授权

US6010831A Ultra-fine microfabrication method using an energy beam 失效
标题翻译：使用能量束的超细微细加工方法
公开(公告)号：US6010831A
公开(公告)日：2000-01-04
申请号：US274341
申请日：1999-03-23
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Yotaro Hatamura
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Yotaro Hatamura
IPC分类号： G03F1/00 , G03F1/20 , G03F7/00 , G03F7/20 , H01J9/02 , H01L21/033 , H01L21/308 , G03C5/00 , H01L21/302
CPC分类号： H01L21/3086 , G03F7/00 , G03F7/001 , G03F7/2065 , G03F7/70358 , H01J9/025 , H01L21/0331 , H01L21/0337 , H01J2209/0223
摘要： An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basis technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. Applications of devices having the fine structures produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.
摘要翻译：使用能量束的超微细微加工方法是基于使用由纳米或微米尺寸的微粒提供的屏蔽来产生通过基本设计的传统光刻技术不可能的各种三维细微结构以产生二维结构。当能量束和屏蔽的辐射的基础技术与使用磁场，电场或激光束的屏蔽定位技术结合使用或不存在由反应性气体粒子束或解决方案提供的附加化学效应时，具有非常高的精细结构纵横比可以精确地生产。通过该方法制造的具有精细结构的器件的应用包括光通信中的波长偏移，量子效应器件和强激光器件。

5. 发明授权

US5852298A Micro-processing apparatus and method therefor 失效
标题翻译：微处理装置及其方法
公开(公告)号：US5852298A
公开(公告)日：1998-12-22
申请号：US621990
申请日：1996-03-26
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Takao Kato , Masaaki Kajiyama , Takashi Tsuzuki , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Takao Kato , Masaaki Kajiyama , Takashi Tsuzuki , Yotaro Hatamura , Masayuki Nakao
IPC分类号： H01J37/20 , H01J37/30 , H01J37/00
CPC分类号： H01J37/3005 , H01J37/20
摘要： A micro-working apparatus performs fabrication and assembly tasks for micron/nanometer sized objects while progress of operations is observed in real-time by at least a pair of optical or electron microscopes to provide simultaneous views from at least two directions. This offers spatial visual information regarding the working space which is particularly critical in micro-working. Micro-working is further facilitated by the use of a micro-pallet device specially designed for use in the apparatus, but also offering other application possibilities. Rotational and parallel translation movements provided by the micro-pallet combined with the micro-working capability of the apparatus are utilized to enable production of micron-sized parts for use in advanced applications of optical and electronic devices.
摘要翻译：微加工设备对微米/纳米尺寸的物体执行制造和组装任务，同时通过至少一对光学或电子显微镜实时观察操作的进展，从而提供来自至少两个方向的同时视图。这提供了关于微型工作特别关键的工作空间的空间视觉信息。通过使用特别设计用于该设备的微型托盘装置，还提供其他应用的可能性，进一步促进了微加工。微型托盘提供的旋转和平行平移运动与该装置的微加工能力相结合，可用于生产用于光学和电子设备的先进应用的微米级部件。

6. 发明授权

US5770123A Method and apparatus for energy beam machining 失效
标题翻译：能量束加工方法和装置
公开(公告)号：US5770123A
公开(公告)日：1998-06-23
申请号：US531698
申请日：1995-09-21
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Masayuki Nakao , Yotaro Hatamura
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Masayuki Nakao , Yotaro Hatamura
IPC分类号： H01J37/305 , B29C59/16
CPC分类号： H01J37/3056 , H01J2237/3114
摘要： An energy beam is irradiated to a workpiece through a beam transmission hole defined in a mask. At that time, a relative position between an energy beam source and the mask or the mask and the workpiece is changed, so that machining depth of the workpiece is varied depending on machining portions of the workpiece, which correspond to amounts of irradiation of the energy beam. With this method, a machined product having locally different depths very easily can be made and further the product can be machined to desired depths with high accuracy by a single machining operation in a short time.
摘要翻译：能量束通过限定在掩模中的光束传播孔照射到工件。此时，能量束源与掩模或掩模和工件之间的相对位置改变，使得工件的加工深度根据工件的加工部分而变化，其对应于能量的照射量光束。通过这种方法，可以非常容易地形成具有局部不同深度的加工产品，并且通过在短时间内的单个加工操作，可以高精度地将产品加工成期望的深度。

7. 发明授权

US4772161A Profile working machine 失效
标题翻译：轮廓加工机
公开(公告)号：US4772161A
公开(公告)日：1988-09-20
申请号：US20123
申请日：1987-02-27
申请人： Takaaki Nagao , Yotaro Hatamura , Kozo Ono
发明人： Takaaki Nagao , Yotaro Hatamura , Kozo Ono
IPC分类号： B24B49/16 , B23Q15/013 , B23Q17/22 , B24B19/20 , G05B19/41 , B23Q15/12
CPC分类号： B23Q17/2233 , B24B19/20 , B24B49/16 , G05B19/41 , G05B2219/49362 , Y10T409/304704 , Y10T409/306888 , Y10T409/30728 , Y10T409/308008
摘要： A profile working machine includes a support portion, a working portion, and a drive and control system. The machine also includes displacement sensors for detecting the present relative displacements between the support portion and working portion, a load sensor for detecting each working reaction force exerted to the working portion, a memory unit for storing values corresponding to a predetermined suitable working reaction force detected by the load sensor, a deviation computing unit for computing the deviation of each working reaction force from the values stored in the memory unit, and a displacement computing unit for computing, based on the deviation determined by the deviation computing unit and the present relative displacement detected by the displacement sensors, corrective relative displacements of the support portion and working portion required to bring the difference to 0, whereby the spatial orientation of the load sensor is maintained constant relative to the direction of the suitable working reaction force.
摘要翻译：轮廓加工机包括支撑部分，工作部分以及驱动和控制系统。该机器还包括用于检测支撑部分和工作部分之间的当前相对位移的位移传感器，用于检测施加到工作部分上的每个工作反作用力的负载传感器，用于存储与检测到的预定合适的工作反作用力对应的值的存储单元通过负载传感器，用于计算每个工作反作用力与存储在存储单元中的值的偏差的偏差计算单元;以及位移计算单元，用于基于由偏差计算单元确定的偏差和当前的相对位移由位移传感器检测到，将差值设定为0所需的支撑部分和工作部分的校正相对位移，由此负载传感器的空间取向相对于合适的工作反作用力的方向保持恒定。

8. 发明授权

US06835317B2 Method of making substrate with micro-protrusions or micro-cavities 失效
标题翻译：制造具有微突起或微孔的基底的方法
公开(公告)号：US06835317B2
公开(公告)日：2004-12-28
申请号：US09941692
申请日：2001-08-30
申请人： Yotaro Hatamura , Masayuki Nakao
发明人： Yotaro Hatamura , Masayuki Nakao
IPC分类号： G11B5127
CPC分类号： G11B5/8404 , G11B5/1871 , G11B11/1058 , G11B11/10584
摘要： A slider prevent the phenomenon of sticking and reduce entrapping of foreign particles between sliding surfaces. A method for making micro-protrusions or micro-cavities on a surface of a substrate comprises placing the substrate in a process chamber, supporting a mask member having a micro shielding surface independent of and in front of the substrate, and irradiating fast atomic beams onto the surface of the substrate through the mask member.
摘要翻译：滑块防止粘附现象，并减少外来颗粒在滑动面之间的截留。一种用于在衬底的表面上制造微突起或微腔的方法，包括将衬底放置在处理室中，支撑具有独立于衬底前面的微屏蔽表面的掩模构件，并将快速原子束照射到通过掩模构件的衬底的表面。

9. 发明授权

US6048671A Ultra-fine microfabrication method using an energy beam 失效
公开(公告)号：US6048671A
公开(公告)日：2000-04-11
申请号：US195255
申请日：1998-11-18
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Yotaro Hatamura
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Yotaro Hatamura
IPC分类号： G03F1/00 , G03F1/20 , G03F7/00 , G03F7/20 , H01J9/02 , H01L21/033 , H01L21/308 , G03C5/58 , B44C1/22
CPC分类号： H01L21/3086 , G03F7/00 , G03F7/001 , G03F7/2065 , G03F7/70358 , H01J9/025 , H01L21/0331 , H01L21/0337 , H01J2209/0223
摘要： An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basis technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. Applications of devices having the fine structures produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.

10. 发明授权

US5989779A Fabrication method employing and energy beam source 失效
标题翻译：采用制造方法和能量束源
公开(公告)号：US5989779A
公开(公告)日：1999-11-23
申请号：US544108
申请日：1995-10-17
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Yotaro Hatamura , Masayuki Nakao
IPC分类号： H01J37/305 , H01J37/317 , H05H3/02 , G03C5/00 , B23K15/00 , G21K5/10
CPC分类号： H05H3/02 , H01J37/3053 , H01J37/3178
摘要： An energy beam source is used in micro-fabrication tasks, such as fabrication of specific patterns, in-situ bonding, repair, connection and disconnection of electrical paths, applicable to semiconductor devices and other micro-sized circuits in integrated circuits. The beam source is made compact so that several sources can be located inside a vacuum vessel and in conjunction with micro-manipulators or micro-movement stages operated under light or an electron microscope. The beam source is provided with at least three electrodes, and by applying a selected voltage, i.e., high frequency voltage, direct current voltage and ground voltage, on each the three electrodes in association with film-forming substance(s), virtually any type of deposit can be formed at any location of a workpiece. Different types of particle beams, such as positive and negative ion beams, a highspeed neutral atomic beam, a radical particle beam, an electron beam can be produced from the beam source by judicious choice of operating-parameters and the film-forming material which may be a process gas or an applied coating. By using the beam source and the method of deposit forming presented, virtually any type of fabrication task can be carried out on any surface and any location of a workpiece in a three-dimensional space.
摘要翻译：能量束源用于微加工任务，例如制造特定图案，原位粘合，修复，连接和断开电路径，适用于集成电路中的半导体器件和其他微型尺寸电路。光束源是紧凑的，使得几个源可以位于真空容器内并且与在微光或电子显微镜下操作的微操纵器或微移动台结合。光束源设置有至少三个电极，并且通过在与成膜物质相关联的三个电极上的每一个上施加选择的电压，即高频电压，直流电压和接地电压，实际上任何类型的沉积物可以形成在工件的任何位置。可以通过明智地选择操作参数和成膜材料，从光束源产生不同类型的粒子束，例如正离子束和负离子束，高速中性原子束，自由基粒子束，电子束，作为工艺气体或涂覆涂层。通过使用光束源和沉积物形成方法，几乎任何类型的制造任务可以在三维空间中的工件的任何表面和任何位置上进行。

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