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1. 发明申请

US20110117491A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：耐蚀组合物和形成耐力图案的方法
公开(公告)号：US20110117491A1
公开(公告)日：2011-05-19
申请号：US12861474
申请日：2010-08-23
申请人： Yoshiyuki UTSUMI , Takehiro SESHIMO , Hiroaki SHIMIZU , Naoto MOTOIKE
发明人： Yoshiyuki UTSUMI , Takehiro SESHIMO , Hiroaki SHIMIZU , Naoto MOTOIKE
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： C08F20/18 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition including a base material component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, an acid generator component (B) that generates acid upon exposure, and an nitrogen-containing organic compound (D), wherein the nitrogen-containing organic compound (D) includes a compound represented by general formula (d1) shown below: wherein R20 represents a methylene group, an ethylene group, an oxygen atom or —C(CH3)2—; R21 represents a hydrogen atom or an organic group; and R22 represents an alkoxy group, an alkoxycarbonyloxy group, a hydroxyl group, a halogen atom, —C(═O)—O—R23, —C(═O)—NH—R23 or a carboxyl group, wherein R23 represents a linear or branched alkyl group of 1 to 15 carbon atoms, an unsaturated hydrocarbon group, an aliphatic cyclic group, or an aromatic hydrocarbon group, and a represents an integer of 0 to 2.
摘要翻译：一种抗蚀剂组合物，其包含在酸作用下在碱显影液中溶解度变化的基材成分（A），曝光时产生酸的酸产生剂成分（B）和含氮有机化合物（D），其中所述含氮有机化合物（D）包括由下述通式（d1）表示的化合物：其中R 20表示亚甲基，亚乙基，氧原子或-C（CH 3）2 - ; R 21表示氢原子或有机基团; R 22表示烷氧基，烷氧基羰基氧基，羟基，卤素原子，-C（= O）-O-R 23，-C（= O）-NH-R 23或羧基，其中R 23表示直链状或具有1至15个碳原子的支链烷基，不饱和烃基，脂族环基或芳族烃基，并且表示0至2的整数。

2. 发明申请

US20100297560A1 POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND 有权
标题翻译：正极性组合物，形成耐火模式的方法和聚合物
公开(公告)号：US20100297560A1
公开(公告)日：2010-11-25
申请号：US12781540
申请日：2010-05-17
申请人： Takehiro SESHIMO , Yoshiyuki UTSUMI , Yoshitaka KOMURO , Takeyoshi MIMURA , Daichi TAKAKI
发明人： Takehiro SESHIMO , Yoshiyuki UTSUMI , Yoshitaka KOMURO , Takeyoshi MIMURA , Daichi TAKAKI
IPC分类号： G03F7/004 , G03F7/20 , C08F216/12
CPC分类号： G03F7/0045 , C08F8/34 , C08F12/22 , C08F12/24 , C08F12/30 , C08F220/18 , C08F220/28 , C09D125/18 , G03F7/0392 , G03F7/0397 , C08F212/14 , C08F212/32
摘要： A positive resist composition including a base component (A′) which exhibits increased solubility in an alkali developing solution under action of acid and generates acid upon exposure, the base component (A′) including a polymeric compound (A1′) having a structural unit (a5-1) represented by general formula (a5-1), a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) that generates acid upon exposure, the structural unit (a0-2) containing a group represented by general formula (a0-2′) (wherein represents an anion moiety represented by one of general formulas (1) to (5)).
摘要翻译：一种正性抗蚀剂组合物，其包含在酸性作用下在碱性显影液中显示出增加的溶解性并在曝光时产生酸的基础组分（A'），所述基础组分（A'）包含具有结构单元的聚合物（A1'）由通式（a5-1）表示的（a5-1），由通式（a0-1）表示的结构单元（a0-1）和曝光时产生酸的结构单元（a0-2），结构单元（a0-2'）表示的基团（a0-2）（其中，表示由通式（1）〜（5）中的一个表示的阴离子部分）。

3. 发明申请

US20120135347A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND COMPOUND 有权
标题翻译：耐蚀组合物，形成耐蚀图案的方法，聚合物和化合物
公开(公告)号：US20120135347A1
公开(公告)日：2012-05-31
申请号：US13305545
申请日：2011-11-28
申请人： Yoshiyuki UTSUMI , Takehiro SESHIMO , Tomoyuki HIRANO , Daichi TAKAKI , Junichi TSUCHIYA
发明人： Yoshiyuki UTSUMI , Takehiro SESHIMO , Tomoyuki HIRANO , Daichi TAKAKI , Junichi TSUCHIYA
IPC分类号： G03F7/20 , C08F18/12 , C07D307/00 , G03F7/004
CPC分类号： C07D307/00 , C08F2220/285 , G03F7/0392 , G03F7/0397
摘要： There are provided a resist composition, a method of forming a resist pattern using the resist composition, a novel polymeric compound and a compound useful as a monomer for the polymeric compound, the resist composition including a base component (A) that exhibits changed solubility in a developing solution under action of acid and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) contains a resin component (A0) including a structural unit (a0) represented by general formula (a0) shown below [wherein A represents a divalent linking group; and R1 represents a hydrogen atom or a hydrocarbon group of 1 to 6 carbon atoms which may have a substituent.]
摘要翻译：提供抗蚀剂组合物，使用抗蚀剂组合物形成抗蚀剂图案的方法，新颖的聚合化合物和可用作聚合物的单体的化合物，抗蚀剂组合物包含在在酸和酸产生剂组分（B）的作用下的显影溶液，其在曝光时产生酸，其中所述基础组分（A）含有包含由所示通式（a0）表示的结构单元（a0）的树脂组分（A0） [其中A表示二价连接基团; R 1表示氢原子或可以具有取代基的碳原子数为1〜6的烃基。

4. 发明申请

US20120148956A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：耐蚀组合物和形成耐力图案的方法
公开(公告)号：US20120148956A1
公开(公告)日：2012-06-14
申请号：US13313990
申请日：2011-12-07
申请人： Yoshiyuki UTSUMI , Masaru TAKESHITA , Hiroaki SHIMIZU , Syo ABE , Yoshitaka Komuro
发明人： Yoshiyuki UTSUMI , Masaru TAKESHITA , Hiroaki SHIMIZU , Syo ABE , Yoshitaka Komuro
IPC分类号： G03F7/20 , G03F7/004 , G03F7/027
CPC分类号： G03F7/0397 , G03F7/0045
摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a nitrogen-containing organic compound (C) containing a compound (C1) represented by general formula (c1) shown below and an acid-generator component (B) which generates acid upon exposure (excluding the compound (C1)) (R1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M+ represents an organic cation).
摘要翻译：一种抗蚀剂组合物，其含有在酸作用下在显影液中溶解度变化的碱成分（A），含有下述通式（c1）表示的化合物（C1）的含氮有机化合物（C）和酸发生器组分（B）（不包括化合物（C1））（R1表示可具有取代基的碳原子数为5以上的脂环族基团）; X表示二价连接基团; Y表示直链状，支链状的或环状亚烷基或亚芳基; Rf表示含氟原子的烃基，M +表示有机阳离子。

5. 发明申请

US20100015555A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NOVEL COMPOUND AND ACID GENERATOR 有权
标题翻译：抗菌组合物，形成耐药模式的方法和新型化合物和酸发生器
公开(公告)号：US20100015555A1
公开(公告)日：2010-01-21
申请号：US12501981
申请日：2009-07-13
申请人： Yoshiyuki UTSUMI , Keita ISHIDUKA , Kensuke MATSUZAWA , Akiya KAWAUE , Hiroaki SHIMIZU , Tsuyoshi NAKAMURA
发明人： Yoshiyuki UTSUMI , Keita ISHIDUKA , Kensuke MATSUZAWA , Akiya KAWAUE , Hiroaki SHIMIZU , Tsuyoshi NAKAMURA
IPC分类号： G03F7/004 , G03F7/20 , C07C69/74
CPC分类号： C07C381/12 , C07C309/12 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition including a base component that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator consisting of a compound represented by general formula (b1). In formula (b1), Y1 represents a fluorinated alkylene group of 1 to 4 carbon atoms, X represents an aliphatic cyclic group of 3 to 30 carbon atoms, R11′ to R13′ each represents an aryl group or alkyl group, provided that at least one of R11′ to R13′ is an aryl group having a substituent represented by general formula (b1-0), and two alkyl groups among R11′ to R13′ may be bonded to each other to form a ring with the sulfur atom in the formula. In formula (b1-0), R52 represents a chain-like or cyclic hydrocarbon group, and f and g each represents 0 or 1
摘要翻译：一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中表现出改变的溶解度的碱成分和由通式（b1）表示的化合物组成的酸发生剂。在式（b1）中，Y1表示1〜4个碳原子的氟化亚烷基，X表示3〜30个碳原子的脂肪族环状基团，R 11'〜R 13'表示芳基或烷基， R11'〜R13'中的一个为具有通式（b1-0）所示取代基的芳基，R11'至R13'中的两个烷基可以彼此键合形成环中的硫原子式。在式（b1-0）中，R 52表示链状或环状烃基，f和g各自表示0或1

6. 发明申请

US20120149916A1 NOVEL COMPOUND 有权
标题翻译：新型化合物
公开(公告)号：US20120149916A1
公开(公告)日：2012-06-14
申请号：US13313993
申请日：2011-12-07
申请人： Yoshiyuki UTSUMI , Masaru TAKESHITA , Yoshitaka Komuro
发明人： Yoshiyuki UTSUMI , Masaru TAKESHITA , Yoshitaka Komuro
IPC分类号： C07D333/54 , C07C381/12
CPC分类号： C07C311/09 , C07C381/12 , C07C2601/08 , C07C2603/74 , C07D307/33 , C07D307/93 , G03F7/0045 , G03F7/0397
摘要： A compound represented by general formula (c1) (R1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M+ represents an organic cation or a metal cation).
摘要翻译：由通式（c1）表示的化合物（R1表示可以具有取代基的碳原子数为5以上的脂环式基团; X表示二价连接基团; Y表示直链状，支链状或环状的亚烷基或亚芳基）表示含氟原子的烃基; M +表示有机阳离子或金属阳离子）。

7. 发明申请

US20100266955A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 审中-公开
标题翻译：正电阻组合物和形成电阻图案的方法
公开(公告)号：US20100266955A1
公开(公告)日：2010-10-21
申请号：US12758650
申请日：2010-04-12
申请人： Yoshiyuki UTSUMI , Makiko IRIE
发明人： Yoshiyuki UTSUMI , Makiko IRIE
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/2041
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the component (A) including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-1) (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; R1 represents an acid dissociable, dissolution inhibiting group; and R2 represents a divalent hydrocarbon group), and the acid generator (B) including an acid generator (B1) having an anion moiety represented by general formula (I) (wherein X represents a hydrocarbon group of 3 to 30 carbon atoms; Q1 represents a divalent linking group containing an oxygen atom; and Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group of 1 to 4 carbon atoms).
摘要翻译：一种正型抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解性的碱成分（A）和暴露时产生酸的酸发生剂组分（B），所述组分（A）包含高分子化合物）具有由通式（a0-1）表示的结构单元（a0）（其中R表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的卤代烷基）; R1表示酸离解性溶解抑制基团，R2表示二价烃基），所述酸发生剂（B）含有具有由通式（I）表示的阴离子部分的酸产生剂（B1）（式中，X表示3〜 30个碳原子; Q1表示含有氧原子的二价连接基团，Y1表示碳原子数为1〜4的亚烷基或碳原子数1〜4的氟化亚烷基）。

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