专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06504902B2 X-ray optical device and multilayer mirror for small angle scattering system 有权
标题翻译： X射线光学装置和小角度散射系统的多层反射镜
公开(公告)号：US06504902B2
公开(公告)日：2003-01-07
申请号：US09829753
申请日：2001-04-10
申请人： Yoshio Iwasaki , Boris Verman , Licai Jiang
发明人： Yoshio Iwasaki , Boris Verman , Licai Jiang
IPC分类号： G21K106
CPC分类号： B82Y10/00 , G21K1/06 , G21K1/062
摘要： A multilayer mirror 1 that has elliptical reflection faces and provides a divergent angle &dgr; of X-rays, is included. The elliptical reflection faces of the multilayer mirror 1 have two focal points. When an X-ray source 2 is arranged at one focal point A, and X-rays that are diverged from the X-ray source 2 are reflected at the multilayer mirror 1, the reflected X-rays converge on another focal point B. The X-ray source 2 is arranged at one focal point A of the multilayer mirror 1. Additionally, a distance L2 from the center of the reflection faces of the multilayer mirror 1 to another focal point B (in other words, convergent point of reflected X-rays) is set to make a convergent angle &thgr;c of X-rays at the focal point B nearly twice as great as the divergent angle &dgr;. With the above-noted configuration, both small angle resolution and intensity of incident X-rays to a sample may be optimized, and small angle scattering may be performed with high precision.
摘要翻译：包括具有椭圆反射面并提供X射线的发散角δ的多层反射镜1。多层反射镜1的椭圆反射面具有两个焦点。当在一个焦点A处设置X射线源2，并且在多层反射镜1处反射从X射线源2发散的X射线时，反射的X射线会聚在另一焦点B. X射线源2配置在多层反射镜1的一个焦点A.此外，从多层反射镜1的反射面的中心到另一焦点B的距离L2（换句话说，反射X的收敛点射线）被设置为使焦点B处的X射线的收敛角度几乎是发散角度δ的两倍。利用上述构造，可以优化小角度分辨率和入射X射线对样品的强度，并且可以以高精度执行小角度散射。

2. 发明授权

US08249220B2 Multiconfiguration X-ray optical system 有权
标题翻译：多组态X射线光学系统
公开(公告)号：US08249220B2
公开(公告)日：2012-08-21
申请号：US12578667
申请日：2009-10-14
申请人： Boris Verman , Yuriy Platonov , Licai Jiang
发明人： Boris Verman , Yuriy Platonov , Licai Jiang
IPC分类号： G21K1/02
CPC分类号： G21K1/06 , B82Y10/00 , G21K2201/061 , G21K2201/062 , G21K2201/064
摘要： An x-ray optical system includes an x-ray source which emits x-rays, a first optical element which conditions the x-rays to form two beams and at least a second optical element which further conditions at least one of the two beams from the first optical element.
摘要翻译： X射线光学系统包括发射x射线的X射线源，调节X射线以形成两个光束的第一光学元件和至少另外将来自两个光束中的至少一个的条件的第二光学元件第一光学元件。

3. 发明授权

US09336917B2 X-ray apparatus, method of using the same and X-ray irradiation method 有权
标题翻译： X射线装置，使用该方法和X射线照射方法
公开(公告)号：US09336917B2
公开(公告)日：2016-05-10
申请号：US13142787
申请日：2010-06-30
申请人： Tetsuya Ozawa , Ryuji Matsuo , Licai Jiang , Boris Verman , Kazuhiko Omote
发明人： Tetsuya Ozawa , Ryuji Matsuo , Licai Jiang , Boris Verman , Kazuhiko Omote
IPC分类号： G21K1/06 , G01J3/12 , B82Y10/00
CPC分类号： G21K1/06 , B82Y10/00 , G01J3/12 , G21K1/062 , G21K2201/064 , H01J2237/1205 , H01J2237/1516
摘要： An X-ray apparatus that creates a virtual source having a narrow energy bandwidth and enables a high-resolution X-ray diffraction measurement; a method of using the same; and an X-ray irradiation method are provided. An X-ray apparatus 100 includes a monochromator 105 that focuses a divergent X-ray beam while dispersing it and a selection part 107 that is installed in a condensing position of the condensed X-ray beam for selecting an X-ray beam having a wavelength in a specific range, allowing it to pass through, and creating a virtual source. With this arrangement, it is possible to create a virtual source having a narrow energy bandwidth at a focal point 110 and by means of the virtual source a high-resolution X-ray diffraction measurement is available. By using the X-ray apparatus 100, it is possible to sufficiently separate an X-ray beam having such an extremely narrow energy bandwidth as, for example, Kα1 ray from Kα2 ray. In addition, it is also possible to cut out part of continuous X-ray beams to create a virtual source.
摘要翻译：一种X射线装置，其产生具有窄能带宽的虚拟光源，并能进行高分辨率X射线衍射测量; 使用该方法的方法; 并提供X射线照射方法。 X射线装置100包括：单色器105，其分散发散的X射线束;以及选择部107，其安装在聚光的X射线束的聚光位置，用于选择具有波长的X射线在一个特定的范围内，允许它通过，并创建一个虚拟源。利用这种布置，可以在焦点110处创建具有窄能带宽的虚拟源，并且借助于虚拟源，可以获得高分辨率X射线衍射测量。通过使用X射线装置100，能够从Kα2射线充分地分离具有例如Kα1射线的极窄能量带宽的X射线束。此外，还可以切出部分连续X射线束以创建虚拟源。

4. 发明申请

US20110085644A1 Multiconfiguration X-ray Optical System 有权
标题翻译：多组态X射线光学系统
公开(公告)号：US20110085644A1
公开(公告)日：2011-04-14
申请号：US12578667
申请日：2009-10-14
申请人： Boris Verman , Yuriy Platonov , Licai Jiang
发明人： Boris Verman , Yuriy Platonov , Licai Jiang
IPC分类号： G21K1/02
CPC分类号： G21K1/06 , B82Y10/00 , G21K2201/061 , G21K2201/062 , G21K2201/064
摘要： An x-ray optical system includes an x-ray source which emits x-rays, a first optical element which conditions the x-rays to form two beams and at least a second optical element which further conditions at least one of the two beams from the first optical element.
摘要翻译： X射线光学系统包括发射x射线的X射线源，调节X射线以形成两个光束的第一光学元件和至少另外将来自两个光束中的至少一个的条件的第二光学元件第一光学元件。

5. 发明授权

US08767918B2 X-ray scattering measurement device and X-ray scattering measurement method 有权
标题翻译： X射线散射测定装置和X射线散射测定方法
公开(公告)号：US08767918B2
公开(公告)日：2014-07-01
申请号：US13266842
申请日：2010-04-14
申请人： Kazuhiko Omote , Boris Verman , Licai Jiang
发明人： Kazuhiko Omote , Boris Verman , Licai Jiang
IPC分类号： G21K1/06 , G01N23/201
CPC分类号： G21K1/06 , G01N23/201
摘要： A X-ray scattering measurement device and measurement method can measure, with high resolution, the intensity of X-rays which have undergone small-angle scattering and diffraction with reflection geometry and can easily and accurately measure a microstructure on the surface of a sample. The X-ray scattering measurement device is suitable for microstructural measurement on the surface of a sample includes an X-ray source that generates an X-ray; a first mirror and a second mirror that continuously reflect the generated X-ray; a sample stage that supports the sample; and a two-dimensional detector that detects the X-ray scattered on the surface of the sample. The first mirror focuses the generated X-ray onto the two-dimensional detector within a plane parallel to the surface of the sample, and the second mirror focuses the X-ray reflected by the first mirror onto the surface of the sample within a plane perpendicular to the surface of the sample.
摘要翻译： X射线散射测量装置和测量方法可以以高分辨率测量已经经历小角度散射和具有反射几何形状的衍射的X射线的强度，并且可以容易且精确地测量样品表面上的微结构。 X射线散射测量装置适用于样品表面的微结构测量，包括产生X射线的X射线源; 连续地反映所产生的X射线的第一镜和第二镜; 支持样品的样品台; 以及检测在样品表面上散射的X射线的二维检测器。第一个镜子将生成的X射线聚焦到平行于样品表面的平面内的二维检测器上，而第二反射镜将由第一反射镜反射的X射线在垂直的平面内的样品表面上聚焦到样品表面。

6. 发明申请

US20110268252A1 X-RAY APPARATUS, METHOD OF USING THE SAME AND X-RAY IRRADIATION METHOD 有权
标题翻译： X射线装置，其使用方法和X射线辐照方法
公开(公告)号：US20110268252A1
公开(公告)日：2011-11-03
申请号：US13142787
申请日：2010-06-30
申请人： Tetsuya Ozawa , Ryuji Matsuo , Licai Jiang , Boris Verman , Kazuhiko Omote
发明人： Tetsuya Ozawa , Ryuji Matsuo , Licai Jiang , Boris Verman , Kazuhiko Omote
IPC分类号： G01T1/36
CPC分类号： G21K1/06 , B82Y10/00 , G01J3/12 , G21K1/062 , G21K2201/064 , H01J2237/1205 , H01J2237/1516
摘要： An X-ray apparatus that creates a virtual source having a narrow energy bandwidth and enables a high-resolution X-ray diffraction measurement; a method of using the same; and an X-ray irradiation method are provided.An X-ray apparatus 100 includes a spectrometer 105 that focuses a divergent X-ray beam while dispersing it and a selection part 107 that is installed in a condensing position of the condensed X-ray beam for selecting an X-ray beam having a wavelength in a specific range, allowing it to pass through, and creating a virtual source. With this arrangement, it is possible to create a virtual source having a narrow energy bandwidth at a focal point 110 and by means of the virtual source a high-resolution X-ray diffraction measurement is available. By using the X-ray apparatus 100, it is possible to sufficiently separate an X-ray beam having such an extremely narrow energy bandwidth as, for example, Kα1 ray from Kα2 ray. In addition, it is also possible to cut out part of continuous X-ray beams to create a virtual source.
摘要翻译：一种X射线装置，其产生具有窄能带宽的虚拟光源，并能进行高分辨率X射线衍射测量; 使用该方法的方法; 并提供X射线照射方法。 X射线装置100包括分光器105，其分散发散的X射线束;以及选择部107，其安装在聚光X射线束的聚光位置，用于选择具有波长的X射线束在一个特定的范围内，允许它通过，并创建一个虚拟源。利用这种布置，可以在焦点110处创建具有窄能带宽的虚拟源，并且借助于虚拟源，可以获得高分辨率X射线衍射测量。通过使用X射线装置100，能够从Kα2射线充分地分离具有例如Kα1射线的极窄能量带宽的X射线束。此外，还可以切出部分连续X射线束以创建虚拟源。

7. 发明授权

US07933383B2 X-ray generator with polycapillary optic 有权
标题翻译：具有多毛细管光学的X射线发生器
公开(公告)号：US07933383B2
公开(公告)日：2011-04-26
申请号：US12421907
申请日：2009-04-10
申请人： Boris Verman , Licai Jiang
发明人： Boris Verman , Licai Jiang
IPC分类号： G21K1/00
CPC分类号： G21K1/06 , B82Y10/00 , G21K2201/061
摘要： An x-ray generating system includes a source of x-ray radiation, a waveguide bundle optic for collimating the x-ray radiation produced by the source, a focusing optic for focusing the collimated x-ray radiation to a focal point.
摘要翻译： X射线产生系统包括X射线辐射源，用于准直由源产生的x射线辐射的波导束光学器件，用于将准直X射线辐射聚焦到焦点的聚焦光学器件。

8. 发明授权

US06421417B1 Multilayer optics with adjustable working wavelength 有权
标题翻译：具有可调工作波长的多层光学元件
公开(公告)号：US06421417B1
公开(公告)日：2002-07-16
申请号：US09366028
申请日：1999-08-02
申请人： Licai Jiang , Boris Verman
发明人： Licai Jiang , Boris Verman
IPC分类号： G21K106
CPC分类号： B82Y10/00 , G02B5/0891 , G21K1/062 , G21K2201/061 , G21K2201/067
摘要： An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.
摘要翻译：具有多层结构的电磁反射器，其中电磁反射器被配置为反射多个电磁频率。

9. 发明授权

US06041099A Single corner kirkpatrick-baez beam conditioning optic assembly 失效
标题翻译：单角kirkpatrick-baez光束调理光学组件
公开(公告)号：US06041099A
公开(公告)日：2000-03-21
申请号：US26385
申请日：1998-02-19
申请人： George Gutman , Licai Jiang , Boris Verman
发明人： George Gutman , Licai Jiang , Boris Verman
IPC分类号： G02B17/00 , G21K1/06
CPC分类号： B82Y10/00 , G21K1/06 , G21K1/062 , G21K2201/064
摘要： An x-ray reflecting system comprising a Kirkpatrick-Baez side-by-side optic in a single corner configuration having multi-layer Bragg x-ray reflective surfaces.
摘要翻译：包括具有多层布拉格x射线反射表面的单角配置的Kirkpatrick-Baez并排光学器件的x射线反射系统。

10. 发明申请

US20120051518A1 X-RAY SCATTERING MEASUREMENT DEVICE AND X-RAY SCATTERING MEASUREMENT METHOD 有权
标题翻译： X射线散射测量装置和X射线散射测量方法
公开(公告)号：US20120051518A1
公开(公告)日：2012-03-01
申请号：US13266842
申请日：2010-04-14
申请人： Kazuhiko Omote , Boris Verman , Licai Jiang
发明人： Kazuhiko Omote , Boris Verman , Licai Jiang
IPC分类号： G01N23/201
CPC分类号： G21K1/06 , G01N23/201
摘要： A X-ray scattering measurement device and measurement method can measure, with high resolution, the intensity of X-rays which have undergone small-angle scattering and diffraction with reflection geometry and can easily and accurately measure a microstructure on the surface of a sample. The X-ray scattering measurement device is suitable for microstructural measurement on the surface of a sample includes an X-ray source that generates an X-ray; a first mirror and a second mirror that continuously reflect the generated X-ray; a sample stage that supports the sample; and a two-dimensional detector that detects the X-ray scattered on the surface of the sample. The first mirror focuses the generated X-ray onto the two-dimensional detector within a plane parallel to the surface of the sample, and the second mirror focuses the X-ray reflected by the first mirror onto the surface of the sample within a plane perpendicular to the surface of the sample.
摘要翻译： X射线散射测量装置和测量方法可以以高分辨率测量已经经历小角度散射和具有反射几何形状的衍射的X射线的强度，并且可以容易且精确地测量样品表面上的微结构。 X射线散射测量装置适用于样品表面的微结构测量，包括产生X射线的X射线源; 连续地反映所产生的X射线的第一镜和第二镜; 支持样品的样品台; 以及检测在样品表面上散射的X射线的二维检测器。第一个镜子将生成的X射线聚焦到平行于样品表面的平面内的二维检测器上，而第二反射镜将由第一反射镜反射的X射线在垂直的平面内的样品表面上聚焦到样品表面。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式