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1. 发明授权

US5686203A Non-aqueous secondary battery 失效
标题翻译：非水二次电池
公开(公告)号：US5686203A
公开(公告)日：1997-11-11
申请号：US562223
申请日：1995-11-28
申请人： Yoshio Idota , Shoichiro Yasunami , Mitsutoshi Tanaka
发明人： Yoshio Idota , Shoichiro Yasunami , Mitsutoshi Tanaka
IPC分类号： H01M4/48 , H01M4/58 , H01M6/50 , H01M6/14
CPC分类号： H01M4/587 , H01G11/56 , H01M4/485 , H01M4/581 , H01M2200/00 , Y02E60/13
摘要： A non-aqueous secondary battery comprises a positive electrode-active material, a negative electrode material and a non-aqueous electrolyte, wherein an electrode mixture for positive electrode containing the positive electrode-active material comprises a compound in which anions can be inserted at a voltage of not less than 3.9 V (with respect to an Li.sup.+ /Li electrode). Moreover, the electrode mixture for positive electrode may further comprise at least one member selected from the group consisting of transition metals, elements of Group IIIB and IVB (except for C) and carbides thereof. The non-aqueous secondary battery can ensure safety against any overcharge and has a high discharge voltage. Moreover, the non-aqueous secondary battery permits increase in the charge capacity and discharge capacity without using any lithium compound in the electrode mixture for positive electrode, the reduction of the amount of the positive electrode-active material to be used and the improvement in the energy density of the resulting battery per unit volume.
摘要翻译：非水二次电池包括正极活性物质，负极材料和非水电解质，其中含有正极活性物质的正极用电极混合物含有阴离子可插入其中的化合物电压不低于3.9V（相对于Li + / Li电极）。此外，正极用电极混合物可以进一步包含选自过渡金属，IIIB族和IVB族元素（C除外）中的至少一种和其碳化物。非水二次电池可以确保安全性，防止任何过充电，并具有高放电电压。此外，非水二次电池可以增加充电容量和放电容量，而不会在正极用电极混合物中使用任何锂化合物，减少所使用的正极活性物质的量和改善每单位体积所得电池的能量密度。

2. 发明授权

US6001139A Nonaqueous secondary battery having multiple-layered negative electrode 失效
标题翻译：具有多层负极的非水二次电池
公开(公告)号：US6001139A
公开(公告)日：1999-12-14
申请号：US860804
申请日：1997-07-10
申请人： Hiroyuki Asanuma , Hiroshi Inoue , Yukio Maekawa , Mitsutoshi Tanaka , Yukio Miyaki , Hiroshi Ishizuka , Shoichiro Yasunami , Kazuo Sugiyama
发明人： Hiroyuki Asanuma , Hiroshi Inoue , Yukio Maekawa , Mitsutoshi Tanaka , Yukio Miyaki , Hiroshi Ishizuka , Shoichiro Yasunami , Kazuo Sugiyama
IPC分类号： H01M10/05 , H01M4/13 , H01M4/131 , H01M4/136 , H01M4/139 , H01M4/36 , H01M4/48 , H01M4/485 , H01M4/52 , H01M4/525 , H01M4/58 , H01M4/62 , H01M6/10 , H01M6/16 , H01M10/0525 , H01M10/0566 , H01M10/058 , H01M10/0587 , H01M10/36 , H01M6/14
CPC分类号： H01M4/13 , H01M10/052 , H01M10/0525 , H01M10/0587 , H01M4/139 , H01M4/366 , H01M4/485 , H01M4/58 , H01M4/62 , H01M2004/027 , H01M2300/004 , H01M4/131 , H01M4/136 , H01M4/1391 , H01M4/405 , H01M4/525 , H01M4/581 , Y10T29/49112
摘要： This invention provides a cylinder type nonaqueous secondary battery which comprises a positive electrode active material comprising a lithium-containing transition metal oxide, a composite oxide or composite chalcogen negative electrode material capable of intercalating and deintercalating lithium and a nonaqueous electrolyte containing a lithium metal salt, wherein high discharging capacity and excellent charge and discharge cycle characteristics are obtained by mounting a metal foil mainly comprising lithium in advance in a coiled group in which a current collector sheet coated with the positive electrode active material (positive electrode sheet), another current collector sheet coated with the negative electrode material (negative electrode sheet) and a separator are coiled in a spiral form.
摘要翻译： PCT No.PCT / JP96 / 00527 Sec。 371日期1997年7月10日 102（e）日期1997年7月10日PCT提交1996年3月5日PCT公布。第WO96 / 27910号公报日期1996年9月12日本发明提供一种圆筒型非水系二次电池，其包含含锂的过渡金属氧化物的正极活性物质，能够嵌入和脱嵌锂的复合氧化物或复合硫族元素负极材料，以及含有通过将预先包含锂的金属箔预先安装在其中涂布有正极活性物质（正极片）的集电体片材的线圈组中，可以获得高放电容量和优异的充放电循环特性的锂金属盐，，涂布有负极材料（负极片）和隔膜的另一个集电体片被螺旋形地卷绕。

3. 发明授权

US08080362B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US08080362B2
公开(公告)日：2011-12-20
申请号：US11926479
申请日：2007-10-29
申请人： Koji Shirakawa , Toru Fujimori , Shoichiro Yasunami
发明人： Koji Shirakawa , Toru Fujimori , Shoichiro Yasunami
IPC分类号： G03C1/00 , G03F7/00 , H01L21/00
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/122
摘要： A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.
摘要翻译：一种正型抗蚀剂组合物，其包含（a）通过酸的作用而分解以增加在碱性显影液中的溶解度的树脂，含有具有本说明书中定义的由式（X）表示的基团的结构单元，其重均分子量分子量不大于5000，并且基于酸分解基团的数量和未被酸保护的碱可溶性基团的总数，含有不大于40％的酸分解基团可分解基团，和（b）在光化射线或辐射照射时产生酸的化合物。

4. 发明授权

US07432034B2 Negative resist composition 有权
标题翻译：负阻抗组成
公开(公告)号：US07432034B2
公开(公告)日：2008-10-07
申请号：US10642291
申请日：2003-08-18
申请人： Shoichiro Yasunami , Koji Shirakawa
发明人： Shoichiro Yasunami , Koji Shirakawa
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0382 , Y10S430/106 , Y10S430/111
摘要： A negative resist composition of the present invention comprises: (A) an alkali-soluble resin; (B-1) a cross-linking agent capable of cross-linking with the alkali-soluble resin (A) by the action of an acid, in which the cross-linking agent is a phenol compound containing: in the molecule one or more benzene rings; and at least two cross-linking groups bonded to any of the benzene rings, the cross-linking group being a group selected from the group consisting of a hydroxymethyl group, an alkoxymethyl group and an acyloxymethyl group; (B-2) a cross-linking agent capable of cross-linking with the alkali-soluble resin (A) by the action of an acid, in which the cross-linking agent contains at least two specific groups; and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.
摘要翻译：本发明的负光刻胶组合物包含：（A）碱溶性树脂; （B-1）能够通过酸的作用与碱溶性树脂（A）交联的交联剂，其中交联剂是酚化合物，其在分子中含有一个或多个苯环; 和至少两个与任何苯环结合的交联基团，所述交联基团是选自羟甲基，烷氧基甲基和酰氧基甲基的基团; （B-2）能够通过酸的作用与碱溶性树脂（A）交联的交联剂，其中交联剂含有至少两个特定基团; 和（C）能够在用光化射线或辐射照射时能产生酸的化合物。

5. 发明授权

US07326513B2 Positive working resist composition 有权
标题翻译：积极的工作抗拒组成
公开(公告)号：US07326513B2
公开(公告)日：2008-02-05
申请号：US10791559
申请日：2004-03-03
申请人： Shoichiro Yasunami , Koji Shirakawa , Kazuyoshi Mizutani
发明人： Shoichiro Yasunami , Koji Shirakawa , Kazuyoshi Mizutani
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0392 , G03F7/0045
摘要： A positive working resist composition comprising (A1) a resin containing a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined in the specification and having a property of being insoluble or sparingly soluble in an alkali developing solution and becoming soluble in an alkali developing solution by the action of an acid, and (B) a compound capable of generating sulfonic acid upon irradiation with active rays or radiations in an amount of from 5 to 20% by weight based on the total solid content of the positive working resist composition.
摘要翻译：一种正性抗蚀剂组合物，其包含（A1）含有本说明书中定义的式（1）表示的重复单元的树脂和由说明书中定义的式（2）表示的重复单元，并且具有不溶或微溶于碱显影液，通过酸的作用变得可溶于碱性显影液，（B）以活性射线或辐射照射时能够产生磺酸的化合物的量为5〜20重量％，基于正性抗蚀剂组合物的总固体含量。

6. 发明授权

US06696219B2 Positive resist laminate 有权
标题翻译：正抗蚀层压板
公开(公告)号：US06696219B2
公开(公告)日：2004-02-24
申请号：US09880030
申请日：2001-06-14
申请人： Shoichiro Yasunami , Kenichiro Sato
发明人： Shoichiro Yasunami , Kenichiro Sato
IPC分类号： G03F711
CPC分类号： G03F7/0758 , G03F7/0045 , G03F7/094
摘要： A positive resist laminate which comprises a substrate, a first resist layer and a second resist layer, wherein the first resist layer is to be a heat-hardening layer and comprises (a-1) a polymer containing an alicyclic skeleton in the side chain thereof, and the second resist layer comprises: (b) a polymer which contains a silicon atom in the side chain thereof and which is insoluble in water and becomes soluble in an aqueous alkali solution by the action of an acid; and (c) a compound which generates an acid upon irradiation with an actinic ray or radiation.
摘要翻译：一种正性抗蚀剂层叠体，其包含基材，第一抗蚀剂层和第二抗蚀剂层，其中所述第一抗蚀剂层为热硬化层，其包含（a-1）侧链中含有脂环族骨架的聚合物第二抗蚀剂层包括：（b）在侧链中含有硅原子并且不溶于水并通过酸的作用而溶于碱性水溶液中的聚合物; 和（c）在用光化射线或辐射照射时产生酸的化合物。

7. 发明授权

US06589705B1 Positive-working photoresist composition 失效
标题翻译：正光刻胶组合物
公开(公告)号：US06589705B1
公开(公告)日：2003-07-08
申请号：US09698190
申请日：2000-10-30
申请人： Kenichiro Sato , Kazuyoshi Mizutani , Shoichiro Yasunami
发明人： Kenichiro Sato , Kazuyoshi Mizutani , Shoichiro Yasunami
IPC分类号： G03C172
CPC分类号： G03F7/0758 , G03F7/0045 , G03F7/0048
摘要： A positive-working photoresist composition comprises (A) a resin comprising the specific repeating structural units which resin increases in its solubility in an alkaline developer when acted upon by an acid, (B′) an onium salt compound which generates an acid when irradiated with active ray or radiation and (C) at least one of fluorine-based and/or silicon-based surface active agent and nonionic surface active agent or a positive-working photoresist composition comprises (A) a resin comprising the specific repeating structural units which resin increases in its solubility in an alkaline developer when acted upon by an acid, (B) a compound which generates an acid when irradiated with active ray or radiation, and (D) a mixed solvent containing at least one propylene glycol monoalkyl ether carboxylate and at least one of solvents selected from the group consisting of propylene glycol monoalkyl ether, alkyl lactate and alkoxyalkyl propionate and solvents selected from the group consisting of &ggr;-butyrolactone, ethylene carbonate and propylene carbonate.
摘要翻译：正性光致抗蚀剂组合物包含（A）包含特定重复结构单元的树脂，当被酸作用时树脂在碱性显影剂中的溶解度增加，（B'）当照射时产生酸的鎓盐化合物活性射线或辐射，和（C）氟基和/或硅基表面活性剂和非离子表面活性剂或正性光致抗蚀剂组合物中的至少一种包含（A）包含特定重复结构单元的树脂，该树脂（B）当用活性射线或辐射照射时产生酸的化合物，和（D）含有至少一种丙二醇单烷基醚羧酸酯的混合溶剂，和选自丙二醇单烷基醚，乳酸烷基酯和丙酸烷氧基烷基酯中的至少一种溶剂和选自以下的溶剂：的γ-丁内酯，碳酸亚乙酯和碳酸亚丙酯。

8. 发明授权

US5707756A Non-aqueous secondary battery 失效
标题翻译：非水二次电池
公开(公告)号：US5707756A
公开(公告)日：1998-01-13
申请号：US814961
申请日：1997-03-10
申请人： Noriyuki Inoue , Yukio Maekawa , Tsutomu Miyasaka , Yoshikatsu Kagawa , Akihiro Matsufuji , Hideki Naito , Kensuke Goda , Osamu Takahashi , Toshiharu Nagamachi , Chuzo Kobayashi , Shoichiro Yasunami
发明人： Noriyuki Inoue , Yukio Maekawa , Tsutomu Miyasaka , Yoshikatsu Kagawa , Akihiro Matsufuji , Hideki Naito , Kensuke Goda , Osamu Takahashi , Toshiharu Nagamachi , Chuzo Kobayashi , Shoichiro Yasunami
IPC分类号： H01M2/12 , H01M2/16 , H01M2/34 , H01M4/02 , H01M4/13 , H01M4/48 , H01M4/485 , H01M4/58 , H01M4/62 , H01M6/50 , H01M10/0525 , H01M10/36
CPC分类号： H01M4/485 , H01M10/0525 , H01M2/1235 , H01M2/16 , H01M2/34 , H01M2/345 , H01M2/348 , H01M4/13 , H01M4/581 , H01M4/622 , H01M2/162 , H01M2/1653 , H01M2004/027 , H01M2200/106 , H01M4/624
摘要： The present invention provides a non-aqueous secondary battery having an improved charge and discharge cycle property and high discharge voltage, high energy density, high capacity and increased stability as well as an excellent high electric current atitude by using a lithium-containing transition metal oxide as a positive electrode material and at least one of the specfified composite oxides as a negative electrode material. Accordingly, the feature of the present invention consists in that the negative electrode material mainly consists of at least one member selected from the group consisting of amorphous chalcogen compounds and amorphous oxides containing at least three atoms selected from the group consisting of Group 13, 14, 15 and 2 atoms of Periodic Table.
摘要翻译：本发明提供一种具有改善的充放电循环性能和高放电电压，高能量密度，高容量和增加的稳定性以及通过使用含锂过渡金属氧化物具有优异的高电流的非水二次电池作为正极材料和作为负极材料的指定复合氧化物中的至少一种。因此，本发明的特征在于，负极材料主要由至少一种选自非晶质硫族化合物和含有至少三个选自由第13,14，周期表15和2个原子。

9. 发明申请

US20060147837A1 Resist composition 审中-公开
标题翻译：抗蚀组成
公开(公告)号：US20060147837A1
公开(公告)日：2006-07-06
申请号：US11359424
申请日：2006-02-23
申请人： Hyou Takahashi , Shoichiro Yasunami , Kazuyoshi Mizutani
发明人： Hyou Takahashi , Shoichiro Yasunami , Kazuyoshi Mizutani
IPC分类号： G03C1/76
CPC分类号： G03F7/0382 , G03F7/0045 , G03F7/0392
摘要： The resist composition of the present invention, ensuring excellent pattern profile and excellent isolation performance for use in the pattern formation by the irradiation of actinic rays or radiation, particularly, electron beam, X ray or EUV light, which comprising (A) a compound having a specific partial structure and a counter ion, the compound generating an acid upon irradiation of actinic rays or radiation.
摘要翻译：本发明的抗蚀剂组合物，通过照射光化射线或辐射，特别是电子束，X射线或EUV光，确保了用于形成图案的优异的图案形状和优异的隔离性能，其包含（A）具有特定的部分结构和抗衡离子，该化合物在光化射线或辐射照射时产生酸。

10. 发明申请

US20050064327A1 Positive resist composition and process for forming pattern using the same 有权
标题翻译：正型抗蚀剂组成和使用其形成图案的工艺
公开(公告)号：US20050064327A1
公开(公告)日：2005-03-24
申请号：US10941925
申请日：2004-09-16
申请人： Shoichiro Yasunami , Koji Shirakawa
发明人： Shoichiro Yasunami , Koji Shirakawa
IPC分类号： C08F212/14 , C08F220/10 , C08F220/42 , G03F7/039 , H01L21/027 , G03C1/76
CPC分类号： G03F7/0397 , Y10S430/111 , Y10S430/122
摘要： A positive resist composition comprising (A) a resin that contains a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined in the specification, and is insoluble or slightly soluble in an alkali developer and becomes soluble in an alkali developer by an action of an acid, and (B) a compound generating a sulfonic acid compound represented by formula (3) defined in the specification upon irradiation of actinic ray or radiation.
摘要翻译：一种正型抗蚀剂组合物，其包含（A）含有本说明书中定义的式（1）表示的重复单元的树脂和由说明书中定义的式（2）表示的重复单元，并且不溶或微溶于碱显影剂并且通过酸的作用变得可溶于碱性显影剂，和（B）在光化射线或辐射照射时产生本说明书中定义的式（3）表示的磺酸化合物的化合物。

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