会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Chemical vapor deposition reactor and method of producing oxide
superconductive conductor using the same
    • 化学气相沉积反应器及使用其制造氧化物超导导体的方法
    • US5908507A
    • 1999-06-01
    • US889178
    • 1997-07-07
    • Kazunori OnabeNobuyuki SadakataTakashi SaitoOsamu KohnoTaichi YamaguchiYasuhiro IijimaShigeo NagayaNaoki Hirano
    • Kazunori OnabeNobuyuki SadakataTakashi SaitoOsamu KohnoTaichi YamaguchiYasuhiro IijimaShigeo NagayaNaoki Hirano
    • C30B25/08C23C16/40C23C16/44C23C16/455C23C16/54C30B25/14H01B13/00H01L39/24C23C16/00
    • C23C16/45563C23C16/408C23C16/4412C23C16/455C23C16/45561C23C16/545H01L39/2441Y02T50/67
    • A chemical vapor deposition (CVD) reactor for forming a film at the surface of a base material, and a production method for an oxide superconductive conductor using this CVD reactor, are disclosed. The CVD reactor is provided with a processing chamber, a material gas supply mechanism which supplies material gas into the processing chamber, and a gas exhaust mechanism which vents gas from inside the processing chamber. The processing chamber is divided by partitions into a base material introduction section, a reaction chamber, and a base material guide-out section. A base material transit opening is formed in each partition, and a base material conveyance region is formed inside the reaction chamber passing through the base material introduction section, the reaction chamber and the base material guide-out section. The material gas supply mechanism is provided with a material gas supply source and a gas disperser and is connected to the material gas supply source. The gas exhaust mechanism is equipped with gas exhaust holes provided at both sides of the base material conveyance region opposite the side where the gas diffuser is disposed, and with a gas venter connected to the gas exhaust holes. The gas diffuser and the gas exhaust holes oppose each other with the base material conveyance region therebetween. The CVD reactor may be used to produce an oxide superconductive conductor by forming a superconductive layer at the surface of a base material while adjusting the flow of gas around the base material.
    • 公开了一种用于在基材表面形成膜的化学气相沉积(CVD)反应器和使用该CVD反应器的氧化物超导体的制造方法。 CVD反应器设置有处理室,将材料气体供给到处理室中的原料气体供给机构,以及从处理室内部排出气体的排气机构。 处理室由隔板分割成基材导入部,反应室和基材导出部。 在每个隔板中形成有基材输送口,在通过基材导入部,反应室和基材导出部的反应室内部形成有基材输送区域。 原料气体供给机构设有原料气体供给源和气体分散器,与原料气体供给源连接。 排气机构配置有与设置有气体扩散器的一侧相对的基材输送区域的两侧设置有排气孔,并且具有与排气孔连接的气体排气孔。 气体扩散器和排气孔之间的基体输送区域彼此相对。 CVD反应器可用于通过在基材表面形成超导层,同时调节基体材料周围的气体流动来生产氧化物超导导体。
    • 3. 发明授权
    • Apparatus for informing destination apparatus of malfunctions occurring in communication with source apparatus and system incorporating the same therein
    • 用于通知目的地设备与在其中包含其的源设备和系统通信中发生的故障的设备
    • US08452487B2
    • 2013-05-28
    • US12928881
    • 2010-12-21
    • Taichi YamaguchiKatsutoshi Haruna
    • Taichi YamaguchiKatsutoshi Haruna
    • G01M17/00G06F7/00G06F19/00
    • B60C23/0481
    • In a system reporting a malfunction in connection of a first communication line and a desired source apparatus which is due to be connected to the first communication line. In a first memory section, information showing that the source apparatus is due to be present in the system is stored in advance and a malfunction informing apparatus connected to a second communication line. Whether or not the communication is interrupted is checked based on connection information in a second memory section and the information stored in the first memory section. The connection information shows connection history showing that the source apparatus was connected to the first communication line. Through the second communication line, it is informed to a destination apparatus that there is a malfunction in the connection of the source apparatus and the first communication line, when it is checked that the communication is interrupted.
    • 在报告连接到第一通信线路的第一通信线路和期望的源设备的连接故障的系统中。 在第一存储器部分中,预先存储表示源装置存在于系统中的信息,以及连接到第二通信线路的故障通知装置。 基于第二存储器部分中的连接信息和存储在第一存储器部分中的信息来检查通信是否中断。 连接信息示出表示源设备连接到第一通信线路的连接历史。 通过第二通信线路,当检查到通信被中断时,向目的地设备通知源设备和第一通信线路的连接有故障。
    • 5. 发明申请
    • Apparatus for informing destination apparatus of malfunctions occurring in communication with source apparatus and system incorporating the same therein
    • 用于通知目的地设备与在其中包含其的源设备和系统通信中发生的故障的设备
    • US20110160954A1
    • 2011-06-30
    • US12928881
    • 2010-12-21
    • Taichi YamaguchiKatsutoshi Haruna
    • Taichi YamaguchiKatsutoshi Haruna
    • G06F7/00G06F12/00
    • B60C23/0481
    • In a system reporting a malfunction in connection of a first communication line and a desired source apparatus which is due to be connected to the first communication line. In a first memory section, information showing that the source apparatus is due to be present in the system is stored in advance and a malfunction informing apparatus connected to a second communication line. Whether or not the communication is interrupted is checked based on connection information in a second memory section and the information stored in the first memory section. The connection information shows connection history showing that the source apparatus was connected to the first communication line. Through the second communication line, it is informed to a destination apparatus that there is a malfunction in the connection of the source apparatus and the first communication line, when it is checked that the communication is interrupted.
    • 在报告连接到第一通信线路的第一通信线路和期望的源设备的连接故障的系统中。 在第一存储器部分中,预先存储表示源装置存在于系统中的信息,以及连接到第二通信线路的故障通知装置。 基于第二存储器部分中的连接信息和存储在第一存储器部分中的信息来检查通信是否中断。 连接信息示出表示源设备连接到第一通信线路的连接历史。 通过第二通信线路,当检查到通信被中断时,向目的地设备通知源设备和第一通信线路的连接有故障。