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1. 发明申请

US20070062414A1 Coating solutions for use in forming bismuth-based ferroelectric thin films and a method of forming bismuth-based ferroelectric thin films using the coating solutions 审中-公开
标题翻译：用于形成铋基铁电薄膜的涂布溶液和使用该涂布溶液形成铋基铁电薄膜的方法
公开(公告)号：US20070062414A1
公开(公告)日：2007-03-22
申请号：US11603990
申请日：2006-11-24
申请人： Yoshimi Sato , Atsushi Kawakami , Yoshiyuki Takeuchi
发明人： Yoshimi Sato , Atsushi Kawakami , Yoshiyuki Takeuchi
IPC分类号： C04B28/36 , B05D5/12 , B05D3/02
CPC分类号： H01L21/02197 , C23C18/1216 , H01L21/02282 , H01L21/31691
摘要： Disclosed herein is a coating solution for use in forming Bi-based ferroelectric thin films comprises a specified compound, such as triglyme, dipivaloylmethane, pinacol, pivalic acid or hexyleneglycol, in combination with an organometallic compound containing metallic elements of which a Bi-based ferroelectric thin film to be formed is composed. Disclosed also herein is a method of forming Bi-based ferroelectric thin films using the coating solution.
摘要翻译：本文公开了一种用于形成Bi基铁电薄膜的涂布溶液，其包含特定的化合物，例如三甘醇二甲醚，二新戊酰甲烷，频哪醇，新戊酸或己二醇，以及含有金属元素的有机金属化合物，其中Bi基铁电组成薄膜。此处还公开了使用该涂布溶液形成Bi基铁电薄膜的方法。

2. 发明申请

US20060144293A1 Coating solutions for use in forming bismuth-based ferroelectric thin films and a method of forming bismuth-based ferroelectric thin films using the coating solutions 审中-公开
标题翻译：用于形成铋基铁电薄膜的涂布溶液和使用该涂布溶液形成铋基铁电薄膜的方法
公开(公告)号：US20060144293A1
公开(公告)日：2006-07-06
申请号：US11368482
申请日：2006-03-07
申请人： Yoshimi Sato , Atsushi Kawakami , Yoshiyuki Takeuchi
发明人： Yoshimi Sato , Atsushi Kawakami , Yoshiyuki Takeuchi
IPC分类号： B05D5/12 , C23C16/40 , H01L21/316
CPC分类号： H01L21/02197 , C23C18/1216 , C23C18/1283 , H01L21/02282 , H01L21/31691 , H01L29/40111
摘要： Disclosed herein is a coating solution for use in forming Bi-based ferroelectric thin films comprises a specified compound, such as triglyme, dipivaloylmethane, pinacol, pivalic acid or hexyleneglycol, in combination with an organometallic compound containing metallic elements of which a Bi-based ferroelectric thin film to be formed is composed. Disclosed also herein is a method of forming Bi-based ferroelectric thin films using the coating solution.
摘要翻译：本文公开了一种用于形成Bi基铁电薄膜的涂布溶液，其包含特定的化合物，例如三甘醇二甲醚，二新戊酰甲烷，频哪醇，新戊酸或己二醇，以及含有金属元素的有机金属化合物，其中Bi基铁电组成薄膜。此处还公开了使用该涂布溶液形成Bi基铁电薄膜的方法。

3. 发明申请

US20050158466A1 Coating solutions for use in forming bismuth-based ferroelectric thin films and a method of forming bismuth-based ferroelectric thin films using the coating solutions 审中-公开
标题翻译：用于形成铋基铁电薄膜的涂布溶液和使用该涂布溶液形成铋基铁电薄膜的方法
公开(公告)号：US20050158466A1
公开(公告)日：2005-07-21
申请号：US11042135
申请日：2005-01-26
申请人： Yoshimi Sato , Atsushi Kawakami , Yoshiyuki Takeuchi
发明人： Yoshimi Sato , Atsushi Kawakami , Yoshiyuki Takeuchi
IPC分类号： H01B3/00 , C23C18/12 , H01L21/28 , H01L21/314 , H01L21/316 , C08H1/00 , C07G1/00
CPC分类号： H01L21/02197 , C23C18/1216 , C23C18/1283 , H01L21/02282 , H01L21/31691 , H01L29/40111
摘要： Disclosed herein is a coating solution for use in forming Bi-based ferroelectric thin films comprises a specified compound, such as triglyme, dipivaloylmethane, pinacol, pivalic acid or hexyleneglycol, in combination with an organometallic compound containing metallic elements of which a Bi-based ferroelectric thin film to be formed is composed. Disclosed also herein is a method of forming Bi-based ferroelectric thin films using the coating solution.
摘要翻译：本文公开了一种用于形成Bi基铁电薄膜的涂布溶液，其包含特定的化合物，例如三甘醇二甲醚，二新戊酰甲烷，频哪醇，新戊酸或己二醇，以及含有金属元素的有机金属化合物，其中Bi基铁电组成薄膜。此处还公开了使用该涂布溶液形成Bi基铁电薄膜的方法。

4. 发明授权

US06597027B1 Dielectric element and method for fabricating the same 失效
标题翻译：介电元件及其制造方法
公开(公告)号：US06597027B1
公开(公告)日：2003-07-22
申请号：US09709423
申请日：2000-11-13
申请人： Akira Hashimoto , Yoshimi Sato , Atsushi Kawakami , Hideya Kobari , Tetsuya Nakajima
发明人： Akira Hashimoto , Yoshimi Sato , Atsushi Kawakami , Hideya Kobari , Tetsuya Nakajima
IPC分类号： H01L2100
CPC分类号： H01L28/75 , H01L28/55 , Y10S438/957
摘要： It is disclosed a dielectric element comprising a lower electrode, a dielectric layer, and an upper electrode which are provided on a substrate, in which at least one of the electrodes is a Pt layer, a Ru layer is used as a base layer for the Pt layer. In the fabrication of the dielectric element, the Pt layer is formed by electroplating, a photoresist pattern is used as a plating mask, and an Ru layer is formed as a seed layer. The present invention makes it possible to provide a dielectric element using Pt as an electrode material, that is capable of easily forming a Pt electrode having excellent electrical characteristics without generating voids or seams, that is capable of forming a fine pattern, and that does not occur contamination in a processing chamber, and a method for fabricating a dielectric element of having the characteristics mentioned above.
摘要翻译：公开了一种介电元件，其包括设置在基板上的下电极，电介质层和上电极，其中至少一个电极为Pt层，Ru层用作基极层 Pt层。在电介质元件的制造中，通过电镀形成Pt层，使用光致抗蚀剂图案作为电镀掩模，并且形成Ru层作为籽晶层。本发明使得可以提供使用Pt作为电极材料的电介质元件，其能够容易地形成能够形成精细图案的电气特性优异的Pt电极而不产生空隙或接缝，并且不在处理室中发生污染，以及具有上述特征的制造电介质元件的方法。

5. 发明授权

US06787412B2 Dielectric element and method for fabricating the same 失效
标题翻译：介电元件及其制造方法
公开(公告)号：US06787412B2
公开(公告)日：2004-09-07
申请号：US10458199
申请日：2003-06-11
申请人： Akira Hashimoto , Yoshimi Sato , Atsushi Kawakami , Hideya Kobari , Tetsuya Nakajima
发明人： Akira Hashimoto , Yoshimi Sato , Atsushi Kawakami , Hideya Kobari , Tetsuya Nakajima
IPC分类号： H01L218242
CPC分类号： H01L28/75 , H01L28/55 , Y10S438/957
摘要： It is disclosed a dielectric element comprising a lower electrode, a dielectric layer, and an upper electrode which are provided on a substrate, in which at least one of the electrodes is a Pt layer, a Ru layer is used as a base layer for the Pt layer. In the fabrication of the dielectric element, the Pt layer is formed by electroplating, a photoresist pattern is used as a plating mask, and an Ru layer is formed as a seed layer. The present invention makes it possible to provide a dielectric element using Pt as an electrode material, that is capable of easily forming a Pt electrode having excellent electrical characteristics without generating voids or seams, that is capable of forming a fine pattern, and that does not occur contamination in a processing chamber, and a method for fabricating a dielectric element of having the characteristics mentioned above.
摘要翻译：公开了一种介电元件，其包括设置在基板上的下电极，电介质层和上电极，其中至少一个电极为Pt层，Ru层用作基极层 Pt层。在电介质元件的制造中，通过电镀形成Pt层，使用光致抗蚀剂图案作为电镀掩模，并且形成Ru层作为籽晶层。本发明使得可以提供使用Pt作为电极材料的电介质元件，其能够容易地形成能够形成精细图案的电气特性优异的Pt电极而不产生空隙或接缝，并且不在处理室中发生污染，以及具有上述特征的制造电介质元件的方法。

6. 发明授权

US07452930B2 Curable composition 有权
标题翻译：可固化组合物
公开(公告)号：US07452930B2
公开(公告)日：2008-11-18
申请号：US11256114
申请日：2005-10-24
申请人： Atsushi Kawakami , Katsuhiro Ando
发明人： Atsushi Kawakami , Katsuhiro Ando
IPC分类号： C08L95/00
CPC分类号： C08L95/00 , C08L43/04 , C08L2666/04
摘要： It is the subject of the present invention to provide a solvent-free ambient-temperature curable composition, excellent in water-resistant adhesion, storage stability and curability, and generates neither smoke nor odor when working therewith. The relevant problem is solved by a curable composition including (A) a natural asphalt and/or petroleum asphalt, (B) a polyoxyalkylene polymer having one or more reactive silicon groups capable of cross-linking by forming siloxane bonds through silanol condensation reaction.
摘要翻译：本发明的目的是提供一种无溶剂的环境温度可固化组合物，其耐水粘附性，储存稳定性和固化性优异，并且在加工时既不产生烟雾也不产生气味。相关问题是通过包括（A）天然沥青和/或石油沥青的可固化组合物来解决的，（B）具有一个或多个通过硅烷醇缩合反应形成硅氧烷键能够交联的反应性硅基团的聚氧化烯聚合物。

7. 发明授权

US07333401B2 Timepiece dial and timepiece 有权
标题翻译：钟表表盘和钟表
公开(公告)号：US07333401B2
公开(公告)日：2008-02-19
申请号：US11709127
申请日：2007-02-22
申请人： Atsushi Kawakami
发明人： Atsushi Kawakami
IPC分类号： G04B19/06 , D06N7/04 , B32B27/36 , B32B15/04
CPC分类号： G04B19/12 , C23C28/00 , C23C28/04 , C23C28/42 , G04G17/00 , Y10T428/24421 , Y10T428/31507
摘要： A timepiece dial having a base member made primarily of polycarbonate, a silicon compound layer made primarily of a silicon oxide compound, and a zinc sulfide compound layer made primarily of a zinc sulfide compound and rendered on the opposite side of the silicon compound layer as the side facing the base member.
摘要翻译：具有主要由聚碳酸酯制成的基底构件的钟表，主要由氧化硅化合物制成的硅化合物层和主要由硫化锌化合物制成的硫化锌化合物层，并且形成在硅化合物层的相对侧上面朝向基座部件。

8. 发明申请

US20060089431A1 Curable composition 审中-公开
标题翻译：可固化组合物
公开(公告)号：US20060089431A1
公开(公告)日：2006-04-27
申请号：US11255863
申请日：2005-10-24
申请人： Atsushi Kawakami , Katsuhiro Ando
发明人： Atsushi Kawakami , Katsuhiro Ando
IPC分类号： C08L95/00 , C08L83/00 , B32B11/00
CPC分类号： C08L95/00 , C08L43/04 , C08L2666/04
摘要： A solventless cold-setting curable composition includes a bituminous substance (A) and a vinyl polymer (B) which has a reactive silicon group capable of being crosslinked by forming a siloxane bond by a silanol condensation reaction and whose main chain is produced by living radical polymerization.
摘要翻译：无溶剂的冷固化固化性组合物包括沥青物质（A）和乙烯基聚合物（B），其具有通过硅烷醇缩合反应形成硅氧烷键而能够交联的反应性硅基团，并且其主链由活性基团聚合。

9. 发明申请

US20060089430A1 Curable composition 审中-公开
标题翻译：可固化组合物
公开(公告)号：US20060089430A1
公开(公告)日：2006-04-27
申请号：US11255862
申请日：2005-10-24
申请人： Atsushi Kawakami , Katsuhiro Ando
发明人： Atsushi Kawakami , Katsuhiro Ando
IPC分类号： C08L95/00
CPC分类号： C08L95/00 , C08L43/04 , C08L63/00 , C08L83/00 , C08L2666/02
摘要： A curable composition contains a bituminous substance (A) and a saturated hydrocarbon polymer (B) having a reactive silicon group represented by general formula (1): —Si(R13-a)Xa (1) (wherein R1 is a C1-C20 alkyl group, a C6-C20 aryl group, a C7-C20 aralkyl group, or a triorganosiloxy group represented by (R′O)3Si—; when two R1s are present, they may be the same or different; the three R's each represent a C1-C20 monovalent hydrocarbon group and may be the same or different; X is a hydroxyl group or hydrolyzable group; when two or more Xs are present, they may be the same or different; and a is 1, 2, or 3).
摘要翻译：可固化组合物含有沥青物质（A）和具有由通式（1）表示的反应性硅基团的饱和烃聚合物（B）：<？在线公式描述=“在线配方”末端=“铅 β（Si） - Si（R 1）3-a X 1（1）<β在线公式描述=“In- 线式“end =”tail“？>（其中R 1是C 1 -C 20烷基，C 1 -C 12烷基， C 6 -C 20芳基，C 7 -C 20芳烷基或由（R'）表示的三有机甲硅烷氧基， O）3 Si;当存在两个R 1时，它们可以相同或不同;这三个R各自表示C 1

10. 发明申请

US20050196636A1 Decorative article, method of manufacturing same, and timepiece 审中-公开
标题翻译：装饰品，制造方法和钟表
公开(公告)号：US20050196636A1
公开(公告)日：2005-09-08
申请号：US11048057
申请日：2005-02-02
申请人： Atsushi Kawakami , Yoshiyuki Obi
发明人： Atsushi Kawakami , Yoshiyuki Obi
IPC分类号： G04B37/22 , A44C27/00 , B32B9/00 , B32B15/082 , B32B15/09 , C23C14/02 , C23C14/06 , C23C14/20 , C23C14/58 , C23C28/00 , B32B15/00
CPC分类号： C23C14/024 , C23C14/205 , C23C14/584 , Y10T428/12611 , Y10T428/12618 , Y10T428/12806
摘要： A decorative article 1 includes a substrate 2 formed mainly of plastic material, an oxide coating 3 formed mainly of metal oxide material provided on the substrate 2, and a metal coating 4 formed mainly of metal material provided on a surface of the oxide coating 3 on a side opposite the surface of the oxide coating 3 that is adjacent the substrate 2. It is desirable that the oxide coating 3 is formed of a material including at least one material selected from among TiO2 and CrO. It is further desirable that the metal coating 4 is formed of a material including at least one material selected from among Ag, Cr, Au, Al, Ti, Sn, and In. It is still further desirable that the sum of the average thickness of the oxide coating 3 and the average thickness of the metal coating 4 is 0.02 to 2.5 μm.
摘要翻译：装饰品1包括主要由塑料材料形成的基底2，主要由设置在基底2上的金属氧化物材料形成的氧化物涂层3和主要由金属材料形成的金属涂层4，金属涂层4设置在氧化物涂层3的表面上与氧化物涂层3的与衬底2相邻的表面相对的一侧。希望氧化物涂层3由包括选自TiO 2和CrO中的至少一种材料的材料形成。还希望金属涂层4由包括选自Ag，Cr，Au，Al，Ti，Sn和In中的至少一种的材料形成。还希望氧化物涂层3的平均厚度和金属涂层4的平均厚度之和为0.02-2.5μm。

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