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    • 1. 发明授权
    • Production process of cross-linked polyaspartic acid resin
    • 交联聚天冬氨酸树脂的生产工艺
    • US6072024A
    • 2000-06-06
    • US42942
    • 1998-03-17
    • Yoshihiro IrizatoMakoto SukegawaToshio KatohHiroaki TamataniAkinori NagatomoMasaru Wada
    • Yoshihiro IrizatoMakoto SukegawaToshio KatohHiroaki TamataniAkinori NagatomoMasaru Wada
    • C08G73/10C08G69/10
    • C08G73/1092
    • A process is disclosed for producing with good productivity a cross-linked polyaspartic acid resin having biodegradability and high water absorbency. The process features inclusion of one of the following steps: (a) a polysuccinimide, which has been brought into a dispersed state by a dispersant, and a cross-linking agent are reacted to produce the cross-linked polyaspartic acid resin; (b) imide rings of a cross-linked polysuccinimide are subjected to a hydrolysis reaction while controlling a swelling degree of a resulting gel, whereby the cross-linked polyaspartic acid resin is produced; and (c) a gel of a cross-linked polysuccinimide, which has been obtained by reacting a cross-linking agent to a solution of a polysuccinimide in an organic solvent, is disintegrated to subject imide rings of the cross-linked polysuccinimide to a hydrolysis reaction, so that the cross-linked polyaspartic acid resin is produced. The process may also include one or both of the following steps as needed: (d) a gel of the cross-linked polyaspartic acid resin is washed with water and/or a water-miscible organic solvent; and (e) the polysuccinimide is produced using a basic amino acid as a cross-linking agent.
    • 公开了一种具有生物降解性和高吸水性的交联聚天冬氨酸树脂以高生产率生产的方法。 该方法包括以下步骤之一:(a)已经通过分散剂进入分散状态的聚琥珀酰亚胺和交联剂反应生成交联聚天冬氨酸树脂; (b)交联聚琥珀酰亚胺的酰亚胺环进行水解反应同时控制所得凝胶的溶胀度,从而制得交联聚天冬氨酸树脂; 和(c)通过使交联剂与聚琥珀酰亚胺在有机溶剂中的溶液反应而获得的交联聚琥珀酰亚胺的凝胶被分解以使交联的聚琥珀酰亚胺的酰亚胺环进行水解 反应,制成交联聚天冬氨酸树脂。 该方法还可以根据需要包括以下步骤中的一种或两种:(d)用水和/或水混溶性有机溶剂洗涤交联聚天冬氨酸树脂的凝胶; 和(e)使用碱性氨基酸作为交联剂制备聚琥珀酰亚胺。
    • 2. 发明授权
    • Production process of cross-linked polysuccinimide resin
    • 交联聚琥珀酰亚胺树脂的生产工艺
    • US06346569B1
    • 2002-02-12
    • US09514954
    • 2000-02-28
    • Yoshihiro IrizatoMakoto SukegawaToshio KatohHiroaki TamataniAkinori NagatomoMasaru Wada
    • Yoshihiro IrizatoMakoto SukegawaToshio KatohHiroaki TamataniAkinori NagatomoMasaru Wada
    • C08J324
    • C08G73/1092
    • A process is disclosed for producing with good productivity a cross-linked polyaspartic acid resin having biodegradability and high water absorbency. The process features inclusion of one of the following steps: (a) a polysuccinimide, which has been brought into a dispersed state by a dispersant, and a cross-linking agent are reacted to produce the cross-linked polyaspartic acid resin; (b) imide rings of a cross-linked polysuccinimide are subjected to a hydrolysis reaction while controlling a swelling degree of a resulting gel, whereby the cross-linked polyaspartic acid resin is produced; and (c) a gel of a cross-linked polysuccinimide, which has been obtained by reacting a cross-linking agent to a solution of a polysuccinimide in an organic solvent, is disintegrated to subject imide rings of the cross-linked polysuccinimide to a hydrolysis reaction, so that the cross-linked polyaspartic acid resin is produced. The process may also include one or both of the following steps as needed: (d) a gel of the cross-linked polyaspartic acid resin is washed with water and/or a water-miscible organic solvent; and (e) the polysuccinimide is produced using a basic amino acid as a cross-linking agent.
    • 公开了一种具有生物降解性和高吸水性的交联聚天冬氨酸树脂以高生产率生产的方法。 该方法包括以下步骤之一:(a)已经通过分散剂进入分散状态的聚琥珀酰亚胺和交联剂反应生成交联聚天冬氨酸树脂; (b)交联聚琥珀酰亚胺的酰亚胺环进行水解反应同时控制所得凝胶的溶胀度,从而制得交联聚天冬氨酸树脂; 和(c)通过使交联剂与聚琥珀酰亚胺在有机溶剂中的溶液反应而获得的交联聚琥珀酰亚胺的凝胶被分解以使交联的聚琥珀酰亚胺的酰亚胺环进行水解 反应,制成交联聚天冬氨酸树脂。 该方法还可以根据需要包括以下步骤中的一种或两种:(d)用水和/或水混溶性有机溶剂洗涤交联聚天冬氨酸树脂的凝胶; 和(e)使用碱性氨基酸作为交联剂制备聚琥珀酰亚胺。
    • 4. 发明授权
    • Production process of polysuccinimide
    • 聚琥珀酰亚胺的生产工艺
    • US06657041B1
    • 2003-12-02
    • US09868498
    • 2001-06-18
    • Katsuhiko MachidaSusumu FukawaShinji OgawaToshio KatohMakoto SukegawaYoshihiro Irizato
    • Katsuhiko MachidaSusumu FukawaShinji OgawaToshio KatohMakoto SukegawaYoshihiro Irizato
    • C08G6910
    • C08G73/1092C08G69/10
    • A production process of high molecular weight polysuccinimide having a weight average molecular weight of 40,000 or higher is disclosed, which comprises the following steps: 1) mixing and heating aspartic acid and an acidic catalyst to produce a liquid, low molecular weight polymer mixture, 2) separating the acidic catalyst to appropriate extent from the liquid, low molecular weight polymer mixture, thereby directly changing a polymer-containing phase from a liquid phase into a solid phase to produce a solid, low molecular weight polymer mixture, and 3) conducting solid-state polymerization on the thus-obtained solid, low molecular weight polymer mixture. This process can be practiced in a simple apparatus, and is free of problems such as formation of a highly viscous phase, excessive formation of foam, and formation of a reaction mixture into coherent mass.
    • 公开了重均分子量为40,000以上的高分子量聚琥珀酰亚胺的生产方法,其包括以下步骤:1)将天冬氨酸和酸性催化剂混合加热以制备液体低分子量聚合物混合物2 )将酸性催化剂从液态低分子量聚合物混合物中分离出适当的程度,由此直接将含聚合物的相从液相转变为固相以产生固体低分子量聚合物混合物,和3)导电固体 在这样得到的固体低分子量聚合物混合物上进行状态聚合。 该方法可以在简单的装置中实施,并且没有诸如高粘性相的形成,泡沫过度形成以及反应混合物形成连续质量的问题。
    • 8. 发明授权
    • Phase shift photomask
    • 相移光掩模
    • US5387485A
    • 1995-02-07
    • US158210
    • 1993-11-29
    • Makoto SukegawaNaoya Hayashi
    • Makoto SukegawaNaoya Hayashi
    • G03F1/26G03F1/30G03F9/00
    • G03F1/30G03F1/26
    • A phase shift photomask for forming a fine-line pattern with high dimensional accuracy even at different focus positions. The phase shift photomask has a transparent substrate (1) of quartz, for example, and a light-shielding film (2) of chromium, for example, provided on the substrate (1). The light-shielding film (2) is partially removed to form a first opening pattern (4a) and a second opening pattern (4b) with a very small width which is annularly provided in a peripheral region adjacent to the first opening pattern (4a). The light-shielding film (2c) is left in each of the four corners of the second opening pattern (4b). In addition, a phase shifter layer 3 is provided over either of the first or second opening patterns (4a, 4b).
    • 一种相移光掩模,用于即使在不同的焦点位置也可以形成具有高尺寸精度的细线图案。 相移光掩模例如具有石英的透明基板(1)和例如设置在基板(1)上的铬的遮光膜(2)。 遮光膜(2)被部分去除以形成第一开口图案(4a)和具有非常小的宽度的第二开口图案(4b),环形地设置在与第一开口图案(4a)相邻的周边区域中, 。 遮光膜(2c)留在第二开口图案(4b)的四个角中的每一个中。 此外,在第一或第二开口图案(4a,4b)之一上设置移相器层3。