专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20090261242A1 APPARATUS FOR AND METHOD OF WITHDRAWING IONS IN EUV LIGHT PRODUCTION APPARATUS 有权
标题翻译：在EUV光生产设备中放置离子的方法和方法
公开(公告)号：US20090261242A1
公开(公告)日：2009-10-22
申请号：US12406388
申请日：2009-03-18
申请人： Yoshifumi UENO , Osamu WAKABAYASHI , Tamotsu ABE , Akira SUMITANI , Hideo HOSHINO , Akira ENDO , Georg SOUMAGNE
发明人： Yoshifumi UENO , Osamu WAKABAYASHI , Tamotsu ABE , Akira SUMITANI , Hideo HOSHINO , Akira ENDO , Georg SOUMAGNE
IPC分类号： B01D59/44 , H01J49/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , G21K1/093 , G21K2201/00 , H05G2/005 , H05G2/008
摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.
摘要翻译：一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子，其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

2. 发明申请

US20120217414A1 APPARATUS FOR AND METHOD OF WITHDRAWING IONS IN EUV LIGHT PRODUCTION APPARATUS 有权
标题翻译：在EUV光生产设备中放置离子的方法和方法
公开(公告)号：US20120217414A1
公开(公告)日：2012-08-30
申请号：US13465108
申请日：2012-05-07
申请人： Yoshifumi UENO , Osamu WAKABAYASHI , Tamotsu ABE , Akira SUMITANI , Hideo HOSHINO , Akira ENDO , Georg SOUMAGNE
发明人： Yoshifumi UENO , Osamu WAKABAYASHI , Tamotsu ABE , Akira SUMITANI , Hideo HOSHINO , Akira ENDO , Georg SOUMAGNE
IPC分类号： H01J1/50
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , G21K1/093 , G21K2201/00 , H05G2/005 , H05G2/008
摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.
摘要翻译：一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子，其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

3. 发明申请

US20110261844A1 LASER SYSTEM 审中-公开
标题翻译：激光系统
公开(公告)号：US20110261844A1
公开(公告)日：2011-10-27
申请号：US13176483
申请日：2011-07-05
申请人： Tamotsu ABE , Hideo Hoshino , Akira Endo , Osamu Wakabayashi , Kouji Kakizaki
发明人： Tamotsu ABE , Hideo Hoshino , Akira Endo , Osamu Wakabayashi , Kouji Kakizaki
IPC分类号： H01S3/10
CPC分类号： H01S3/2316 , H01S3/076 , H01S3/10007 , H01S3/2232
摘要： The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.
摘要翻译：在用于产生大功率短脉冲激光束的激光系统中实现更高的效率和更低的功率消耗。激光系统包括用于通过激光振荡产生脉冲激光束的激光振荡器，用于顺序地输入由激光振荡器产生的脉冲激光束并放大脉冲激光束的多个放大器，以及用于控制激光振荡器进行突发的控制单元在突发振荡周期之间的突发停止时段中振荡并停止多个放大器中的至少一个的放大操作。

4. 发明申请

US20110180734A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光超光源光源装置
公开(公告)号：US20110180734A1
公开(公告)日：2011-07-28
申请号：US13081899
申请日：2011-04-07
申请人： Masato MORIYA , Tamotsu ABE , Takashi SUGANUMA , Hiroshi SOMEYA , Takayuki YABU , Akira SUMITANI , Osamu WAKABAYASHI
发明人： Masato MORIYA , Tamotsu ABE , Takashi SUGANUMA , Hiroshi SOMEYA , Takayuki YABU , Akira SUMITANI , Osamu WAKABAYASHI
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.
摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光产生室内的激光束聚焦光学元件中的光学元件的劣化。该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。

5. 发明申请

US20120228527A1 EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS 审中-公开
标题翻译：极光紫外线光源设备
公开(公告)号：US20120228527A1
公开(公告)日：2012-09-13
申请号：US13477940
申请日：2012-05-22
申请人： Tamotsu ABE , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
发明人： Tamotsu ABE , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
IPC分类号： G21K5/02
CPC分类号： H05G2/001 , G03F7/70033 , G03F7/70916
摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.
摘要翻译：极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

6. 发明申请

US20090103575A1 LASER DEVICE 有权
标题翻译：激光装置
公开(公告)号：US20090103575A1
公开(公告)日：2009-04-23
申请号：US12252704
申请日：2008-10-16
申请人： Tamotsu ABE , Hideo Hoshino
发明人： Tamotsu ABE , Hideo Hoshino
IPC分类号： H01S3/30
CPC分类号： H01S3/03 , G03F7/70033 , G03F7/70975 , H01S3/0346 , H01S3/041 , H01S3/2232 , H01S3/2308
摘要： A laser device, which includes an oscillator unit having a rectangular-solid-shaped housing containing a laser oscillator for generating and outputting a laser light; an amplifier unit having a rectangular-solid-shaped housing containing an amplifier that receives and amplifies the laser light to output; and, a group of optical elements including optical elements provided on a laser light path, wherein the laser device includes one or more amplifier units, and the oscillator and the amplifier units are arranged such that surfaces having a wide area other than a surface having a smallest area of a housing of the oscillator unit and a housing of at least one amplifier unit are next to and face each other, or such that surfaces having a wide area other than a surface having a smallest area of a housing of at least two amplifier units are next to and face each other.
摘要翻译：一种激光装置，其包括具有矩形固体壳体的振荡器单元，所述壳体包含用于产生和输出激光的激光振荡器; 具有矩形固体壳体的放大器单元，其包含放大器，所述放大器接收并放大所述激光以输出; 以及包括设置在激光路径上的光学元件的一组光学元件，其中所述激光装置包括一个或多个放大器单元，并且所述振荡器和所述放大器单元布置成使得具有除了具有所述振荡器单元的壳体的最小面积和至少一个放大器单元的壳体彼此相邻并面对，或者使得具有除表面之外的广泛区域的表面具有至少两个放大器的壳体的最小面积的表面单位相邻并面对面。

7. 发明申请

US20120267553A1 EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 有权
标题翻译：极光紫外线发光装置
公开(公告)号：US20120267553A1
公开(公告)日：2012-10-25
申请号：US13540314
申请日：2012-07-02
申请人： Shinji NAGAI , Tamotsu ABE , Takanobu ISHIHARA , Osamu WAKABAYASHI
发明人： Shinji NAGAI , Tamotsu ABE , Takanobu ISHIHARA , Osamu WAKABAYASHI
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G01J3/10 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.
摘要翻译：一种与激光系统组合使用的极紫外光发生装置，该装置可以包括：设置有至少一个入口的腔室，用于将从激光系统输出的激光束引入腔室; 目标供给单元，其设置在所述室中，用于将所述目标材料供给到所述室内的预定区域，所述目标材料用所述激光束照射; 设置在所述室内的至少一个光学元件; 用于产生围绕预定区域的磁场的磁场产生单元; 离子收集单元，设置在所述磁场的磁力线的方向上，用于收集当所述靶材料被所述激光束照射并沿着所述磁力线流动时产生的离子; 以及用于将蚀刻气体引入到室中的气体引入单元。

8. 发明申请

US20100140512A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光超光源光源装置
公开(公告)号：US20100140512A1
公开(公告)日：2010-06-10
申请号：US12603872
申请日：2009-10-22
申请人： Takashi SUGANUMA , Masato MORIYA , Tamotsu ABE , Kouji KAKIZAKI , Osamu WAKABAYASHI
发明人： Takashi SUGANUMA , Masato MORIYA , Tamotsu ABE , Kouji KAKIZAKI , Osamu WAKABAYASHI
IPC分类号： G21K5/00
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/70141 , G03F7/70175 , G03F7/70191 , G03F7/70575 , G03F7/70591 , G03F7/7085 , H05G2/005
摘要： An extreme ultraviolet (EUV) light source apparatus in which a location or posture shift of an EUV collector mirror can be detected. The apparatus includes: a chamber; a target supply mechanism for supplying a target material into the chamber; a driver laser for irradiating the target material with a laser beam to generate plasma; a collector mirror having a first focal point and a second focal point, for reflecting light, which is generated at the first focal point, toward the second focal point; a splitter optical element provided in an optical path of the light reflected by the collector mirror, for splitting a part of the light reflected by the collector mirror; and an image sensor provided in an optical path of the light split by the splitter optical element, for detecting a profile of the light split by the splitter optical element.
摘要翻译：可以检测EUV收集镜的位置或姿势偏移的极紫外（EUV）光源装置。该装置包括：一个室; 用于将目标材料供应到所述室中的目标供给机构; 用于用激光束照射目标材料以产生等离子体的驱动器激光器; 收集器反射镜，具有第一焦点和第二焦点，用于将在第一焦点处产生的光朝向第二焦点反射; 分离器光学元件，设置在由集光镜反射的光的光路中，用于分离由集光镜反射的一部分光; 以及图像传感器，其设置在由分离光学元件分离的光的光路中，用于检测由分离光学元件分离的光的轮廓。

9. 发明申请

US20110174996A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND NOZZLE PROTECTION DEVICE 有权
标题翻译：极光紫外线光源装置和喷嘴保护装置
公开(公告)号：US20110174996A1
公开(公告)日：2011-07-21
申请号：US13081148
申请日：2011-04-06
申请人： Hiroshi SOMEYA , Tamotsu ABE , Hideo HOSHINO
发明人： Hiroshi SOMEYA , Tamotsu ABE , Hideo HOSHINO
IPC分类号： G21F3/00 , G01J3/10
CPC分类号： H05G2/003 , H05G2/006
摘要： A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.
摘要翻译：一种喷嘴保护装置，其能够保护目标喷嘴免受等离子体的热量的干扰，而不会在LPP型EUV光源装置中形成稳定的目标材料流。该喷嘴保护装置包括冷却单元，该冷却单元形成有用于使目标材料通过的开口，并且其形成有用于使冷却介质在内部循环的流路;以及致动器，其改变冷却单元的位置或形状在从所述目标材料的轨迹排出所述冷却单元的第一状态和通过所述冷却单元阻止从所述等离子体到所述喷嘴的热辐射的第二状态之间，同时确保所述目标材料在所述冷却单元中的路径。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式