专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5543357A Process of manufacturing a semiconductor device by filling a via hole in an interlayered film of the device with wiring metal 失效
标题翻译：通过用布线金属填充器件的层间膜中的通孔来制造半导体器件的工艺
公开(公告)号：US5543357A
公开(公告)日：1996-08-06
申请号：US351679
申请日：1994-12-08
申请人： Yoshiaki Yamada , Nobukazu Ito , Kuniko Miyakawa , Michiko Yamanaka
发明人： Yoshiaki Yamada , Nobukazu Ito , Kuniko Miyakawa , Michiko Yamanaka
IPC分类号： H01L21/28 , H01L21/3205 , H01L21/768 , H01L23/52
CPC分类号： H01L21/76882 , Y10S438/913
摘要： The present invention discloses a process for manufacturing a semiconductor device in which characteristics of an aluminum alloy film are prevented from deteriorating, when a titanium film is used as an under film and the aluminum alloy film is heated to fill a via hole therewith. Interlayered insulating film is formed on a first aluminum wire, and after the formation of a via hole which reaches the first aluminum wire, a titanium film and an aluminum alloy film are formed in turn by a sputtering process. Next, a silicon substrate is heated up to 450.degree. to 500.degree. C. to melt the aluminum alloy film, thereby filling the via hole therewith. In this case, the thickness of the titanium film is set to 10% or less of the thickness of the aluminum alloy film and at most 25 nm. In particular, in the case of the aluminum alloy film containing no silicon, the thickness of the titanium film is set to 5% or less of the thickness of the aluminum alloy film, whereby the deterioration of characteristics of the aluminum alloy film by titanium can be minimized, and the via hole can be surely filled therewith.
摘要翻译：本发明公开了一种用于制造半导体器件的方法，其中当将钛膜用作底膜并且铝合金膜被加热以填充通孔时，防止铝合金膜的特性劣化。在第一铝线上形成层间绝缘膜，在形成到达第一铝线的通孔后，通过溅射工艺依次形成钛膜和铝合金膜。接着，将硅衬底加热至450℃至500℃以熔化铝合金膜，由此填充通孔。在这种情况下，将钛膜的厚度设定为铝合金膜的厚度的10％以下，至多25nm。特别地，在不含硅的铝合金膜的情况下，钛膜的厚度设定为铝合金膜的厚度的5％以下，由此钛合金膜的特性劣化可以将通孔确定地填满。

2. 发明申请

US20120065017A1 POWER TRANSMITTING MECHANISM FOR HYBRID VEHICLE 失效
标题翻译：混合动力车的发电机构
公开(公告)号：US20120065017A1
公开(公告)日：2012-03-15
申请号：US13320979
申请日：2009-11-18
申请人： Yoshiaki Yamada
发明人： Yoshiaki Yamada
IPC分类号： F16H3/72
CPC分类号： B60K6/387 , B60K6/365 , B60K6/48 , B60K2006/381 , B60K2006/4825 , F16H3/724 , Y02T10/6221 , Y02T10/6252
摘要： A proposition is to provide a power transmitting mechanism for a hybrid vehicle having improved energy utilization efficiency. A power transmitting mechanism for the hybrid vehicle using powers of the engine and the motor/generator in a combined manner, the mechanism includes an engine drive shaft coupled to an engine output shaft via a main clutch; a motor output shaft of a motor/generator rotatably supported separately from the engine drive shaft; a drive shaft brake releasing/fixing the engine drive shaft; a motor-brake releasing/fixing the motor output shaft; and a planetary gear mechanism.
摘要翻译：提出一种具有提高的能量利用效率的混合动力车辆的动力传递机构。一种用于混合动力车辆的动力传递机构，其以组合的方式使用发动机和电动机/发电机的动力，该机构包括经由主离合器联接到发动机输出轴的发动机驱动轴; 与发动机驱动轴分开旋转地支撑的电动机/发电机的电动机输出轴; 驱动轴制动器释放/固定发动机驱动轴; 释放/固定马达输出轴的马达制动器; 和行星齿轮机构。

3. 发明申请

US20110117492A1 PHOTORESIST COATING AND DEVELOPING APPARATUS, SUBSTRATE TRANSFER METHOD AND INTERFACE APPARATUS 有权
标题翻译：光电涂层和开发设备，基板传输方法和接口设备
公开(公告)号：US20110117492A1
公开(公告)日：2011-05-19
申请号：US12940101
申请日：2010-11-05
申请人： Yoshiaki Yamada , Yuichi Yamamoto , Hitoshi Kosugi
发明人： Yoshiaki Yamada , Yuichi Yamamoto , Hitoshi Kosugi
IPC分类号： G03F7/004 , C23C14/00
CPC分类号： H01L21/67109 , H01L21/67196 , H01L21/67201
摘要： A photoresist coating and developing apparatus 1 includes a photoresist film forming unit that forms a photoresist film on a substrate; a heat treatment unit that heats the substrate on which the photoresist film is formed by the photoresist film forming unit; a cooling unit that cools the substrate, on which the photoresist film is formed and which is heated by the heat treatment unit, to normal temperature; a heating unit 61 that heats the substrate, which is cooled to normal temperature by the cooling unit, to a predetermined temperature; a load-lock chamber L1 that unloads the substrate under depressurized atmosphere to expose the photoresist film; and a transfer device 62 that transfers the substrate from the heating unit 61 to the load-lock chamber L1.
摘要翻译：光致抗蚀剂涂层显影装置1包括在基板上形成光致抗蚀剂膜的光致抗蚀剂膜形成单元; 热处理单元，其通过光致抗蚀剂膜形成单元加热其上形成有光致抗蚀剂膜的基板; 冷却单元，其将形成有光致抗蚀剂膜的基板和由热处理单元加热的基板冷却至常温; 加热单元61，其通过冷却单元将被冷却至常温的基板加热到预定温度; 负载锁定室L1，其在减压气氛下卸载基板以露出光致抗蚀剂膜; 以及将基板从加热单元61传递到加载锁定室L1的转移装置62。

4. 发明授权

US07667794B2 Color element-equipped substrate, method for manufacturing color element-equipped substrate, and electronic device 失效
标题翻译：配有色素元件的基板，制造配有色素元件的基板的方法和电子设备
公开(公告)号：US07667794B2
公开(公告)日：2010-02-23
申请号：US11038385
申请日：2005-01-21
申请人： Yoshiaki Yamada
发明人： Yoshiaki Yamada
IPC分类号： G02F1/1335
CPC分类号： G02B5/201
摘要： The color element-equipped substrate of the present invention has a support base, a bank formed on the base that demarcates a pixel region, and a color element formed in the pixel region by depositing droplets of a liquid material in the pixel region. The bank demarcates the pixel region such that the pixel region has a undulated portion. In the color element-equipped substrate, the liquid material can be applied to the entire pixel region.
摘要翻译：本发明的配有色素元件的基板具有支撑基座，形成在基底上的划分像素区域的堤岸和通过在像素区域中沉积液体材料的液滴而形成在像素区域中的色素。银行划分像素区域，使得像素区域具有起伏部分。在配有颜色元件的基板中，可以将液体材料施加到整个像素区域。

5. 发明申请

US20090317752A1 Rinse liquid for lithography and method for forming resist pattern using same 审中-公开
标题翻译：用于光刻的漂洗液和使用其形成抗蚀剂图案的方法
公开(公告)号：US20090317752A1
公开(公告)日：2009-12-24
申请号：US12548698
申请日：2009-08-27
申请人： Masakazu Kobayashi , Hiroyuki Ichikawa , Yoshiaki Yamada , Keiichi Tanaka
发明人： Masakazu Kobayashi , Hiroyuki Ichikawa , Yoshiaki Yamada , Keiichi Tanaka
IPC分类号： G03F7/20
CPC分类号： H01L21/0273 , C11D1/72 , C11D11/0047 , G03F7/322
摘要： The present invention provide with a rinse solution for lithography and a resist pattern forming method using the same, which can prevent an inclination and peeling-off of a resist pattern and form a resist pattern having a high aspect ratio with high reproducibility. The rinse solution for lithography of the present invention comprises water and a nonionic surfactant having an ethyleneoxy group but not having a fluorine atom. The resist forming method of the present invention comprises the step of rinsing the pattern after development treatment with the rinse solution for lithography.
摘要翻译：本发明提供了一种用于光刻的冲洗溶液和使用其的抗蚀剂图案形成方法，其可以防止抗蚀剂图案的倾斜和剥离，并以高重现性形成具有高纵横比的抗蚀剂图案。本发明的光刻用冲洗液包含水和具有乙烯氧基但不具有氟原子的非离子表面活性剂。本发明的抗蚀剂形成方法包括用用于光刻的冲洗溶液对显影处理后的图案进行漂洗的步骤。

6. 发明申请

US20080038671A1 PATTERN FORMING METHOD AND APPARATUS 有权
标题翻译：图案形成方法和装置
公开(公告)号：US20080038671A1
公开(公告)日：2008-02-14
申请号：US11782233
申请日：2007-07-24
申请人： Taro YAMAMOTO , Hitoshi Kosugi , Yoshiaki Yamada , Yasuhito Saiga
发明人： Taro YAMAMOTO , Hitoshi Kosugi , Yoshiaki Yamada , Yasuhito Saiga
IPC分类号： G03B27/42 , G03C5/00
CPC分类号： G03F7/38 , G03F7/2041 , G03F7/70341
摘要： A pattern forming method includes forming a resist film or sequentially forming a resist film and a protection film in this order on a surface of a substrate; then, performing immersion light exposure that includes immersing the resist film or the resist film and the protection film formed on the substrate in a liquid during light exposure, thereby forming a predetermined light exposure pattern on the resist film; and performing a development process of the light exposure pattern by use of a development liquid, thereby forming a predetermined resist pattern. After the immersion light exposure and before the development process, the method further includes performing a hydrophilic process of turning a surface of the resist film or the protection film serving as a substrate surface into a hydrophilic state to allow the substrate surface to be wetted with the development liquid overall.
摘要翻译：图案形成方法包括在基板的表面上依次形成抗蚀剂膜或依次形成抗蚀剂膜和保护膜; 然后，在曝光期间进行浸渍曝光，其中包括将抗蚀剂膜或抗蚀剂膜和形成在基板上的保护膜浸入液体中，从而在抗蚀剂膜上形成预定的曝光图案; 并通过使用显影液进行曝光图案的显影处理，由此形成预定的抗蚀剂图案。在浸没曝光之后和显影处理之前，该方法还包括进行将抗蚀剂膜或用作基板表面的保护膜的表面转动成亲水性的亲水处理，以允许基板表面被开发液体整体。

7. 外观设计

USD557332S1 Ink jet liquid injector 有权
标题翻译：喷墨液注射器
公开(公告)号：USD557332S1
公开(公告)日：2007-12-11
申请号：US29222350
申请日：2005-01-31
申请人： Shinichi Nakamura , Yoshiaki Yamada , Tsuyoshi Kitahara , Satoru Katagami
设计人： Shinichi Nakamura , Yoshiaki Yamada , Tsuyoshi Kitahara , Satoru Katagami

8. 发明申请

US20060250445A1 Ejecting method and ejecting apparatus 审中-公开
公开(公告)号：US20060250445A1
公开(公告)日：2006-11-09
申请号：US11484584
申请日：2006-07-12
申请人： Shinichi Nakamura , Yoshiaki Yamada , Tsuyoshi Kitahara , Satoru Katagami
发明人： Shinichi Nakamura , Yoshiaki Yamada , Tsuyoshi Kitahara , Satoru Katagami
IPC分类号： B05C5/00 , B41J2/16
CPC分类号： H01L51/0005 , B41J2/145 , B41J2202/09 , B41J2202/20
摘要： In an ink jet apparatus for manufacturing a color filter 1, ink jet heads 22 having a plurality of nozzle 27 are disposed in a linear manner. Filter element member is ejected to a motherboard 12 from a plurality of nozzles 27 four times so as to form the filter element 3 in a predetermined thickness. By doing this, it is possible to prevent difference in the thickness in a plurality of the filter elements 3 and to equalize light transparency in planar manner. Thus, in an ejecting apparatus, a color filter can be formed in more common way at low cost and more efficiently. Also, it is possible to provide an ejecting apparatus which can equalize factors such as electrooptical characteristics of the electrooptical members, color displaying characteristics by the liquid crystal apparatuses, and illuminating characteristics by an EL surface.

9. 发明授权

US07116348B2 Member to be recognized for alignment; head unit and electronic device provided therewith; method of manufacturing LCD, organic EL device, electron emission device, PDP device, electrophoretic display device, color filter, and organic EL; method of forming spacer, metallic wire, lens, resist, and light diffusion member, each of said methods using said head unit 有权
标题翻译：会员被认可为对齐; 头单元和电子设备; 制造LCD，有机EL器件，电子发射器件，PDP器件，电泳显示器件，滤色器和有机EL的方法; 形成间隔物，金属线，透镜，抗蚀剂和光漫射构件的方法，每种所述方法使用所述头单元
公开(公告)号：US07116348B2
公开(公告)日：2006-10-03
申请号：US11150104
申请日：2005-06-13
申请人： Shinichi Nakamura , Yoshiaki Yamada
发明人： Shinichi Nakamura , Yoshiaki Yamada
IPC分类号： B41J27/00 , B41J23/00
CPC分类号： H01L23/544 , H01L51/0005 , H01L2223/54473 , H01L2924/0002 , H01L2924/12044 , H01L2924/00
摘要： A method of manufacturing a device includes introducing each color of material into a plurality of liquid droplet ejection heads and scanning the plurality of liquid droplet ejection heads relative to a substrate through a head unit to selectively eject the material, wherein the head unit includes a carriage with two members recognized for alignment, each member being disposed in an object set in position and having formed therein a mark for image-wise recognition, each member comprising a member main body formed substantially in a columnar shape and having a mirror-finished front end surface, wherein the marks are formed into a depressed shape in a substantially central part of the front end surface of each member main body and the marks are disposed at a distance from each other, and the plurality of liquid droplet ejection heads mounted on the carriage.
摘要翻译：一种制造装置的方法包括将每种颜色的材料引入多个液滴喷射头中，并通过头单元相对于基底扫描多个液滴喷射头以选择性地喷射材料，其中头部单元包括滑架其中两个构件被识别用于对准，每个构件被布置在设置在适当位置的物体中并且在其中形成有用于图像识别的标记，每个构件包括构成主体，该构件主体形成为大致圆柱形并具有镜面前端表面，其中标记在每个构件主体的前端表面的大致中心部分中形成为凹陷形状，并且标记彼此间隔设置，并且安装在托架上的多个液滴喷射头。

10. 发明授权

US07087276B2 Thermal transfer recording medium, thermal transfer recording method and recorded article 有权
标题翻译：热转印记录介质，热转印记录方法和记录制品
公开(公告)号：US07087276B2
公开(公告)日：2006-08-08
申请号：US11081670
申请日：2005-03-17
申请人： Takayuki Sasaki , Shigeru Miyajima , Yoshiaki Yamada
发明人： Takayuki Sasaki , Shigeru Miyajima , Yoshiaki Yamada
IPC分类号： B41M5/40 , B41M5/20
CPC分类号： B41M5/395
摘要： A thermal transfer recording medium include a support; and a heat-sensitive transfer layer on the support, and wherein the heat-sensitive transfer layer includes: a resin made from monomer which includes a glycidyl ester of an unsaturated carboxylic acid; and sulfonamide. The present invention also provides a thermal transfer recording method including transferring an image from the thermal transfer recording medium to an image receiving member.
摘要翻译：热转印记录介质包括支撑体; 以及所述载体上的热敏转印层，并且其中所述热敏转印层包括：由单体制成的树脂，其包含不饱和羧酸的缩水甘油酯; 和磺酰胺。本发明还提供一种热转印记录方法，包括将图像从热转印记录介质转印到图像接收部件。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式