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1. 发明申请

US20060114567A1 Optical film for backlight unit and method for manufacturing the same 审中-公开
标题翻译：背光单元用光学薄膜及其制造方法
公开(公告)号：US20060114567A1
公开(公告)日：2006-06-01
申请号：US11325554
申请日：2006-01-05
申请人： Yong-Shig Shim , Sung-Min Cho , Young-Il Kim , Eun-Mi Lee
发明人： Yong-Shig Shim , Sung-Min Cho , Young-Il Kim , Eun-Mi Lee
IPC分类号： G02B1/10
CPC分类号： G02B6/0053 , G02B5/0231 , G02B5/0242 , G02B5/0278 , G02B5/045 , G02B6/0051 , G02F1/133504 , G02F1/133615 , G02F2001/133607
摘要： The present invention relates to an optical film for a backlight unit and a method for manufacturing the same. The optical film of the present invention comprises a light diffusion layer in which light diffusing particles are distributed, a first refraction layer which has a relatively low index of refraction and is formed integrally on a top surface of the light diffusion layer, and a second refraction layer which has an index of refraction relatively higher than that of the first refraction layer and is formed integrally on a top surface of the first refraction layer and formed with a refraction pattern on a surface thereof. According to the present invention, the loss of light can be prevented, the adsorption of foreign substances in and the resultant scratch generation on the films can be avoided during the assembly process of the backlight unit, the productivity improvement and manufacturing cost reduction can be achieved, and the brightness of the backlight unit can be adjusted.
摘要翻译：本发明涉及背光单元用的光学薄膜及其制造方法。本发明的光学膜包括光散射粒子分布的光漫射层，具有相对低的折射率并且一体地形成在光扩散层的顶表面上的第一折射层和第二折射其折射率相对高于第一折射层的折射率，并且一体地形成在第一折射层的顶表面上，并在其表面上形成折射图案。根据本发明，可以防止在背光单元的组装过程中避免异物的吸附和薄膜上的产生的划痕产生，从而可以实现生产率提高和制造成本降低，并且可以调节背光单元的亮度。

2. 发明申请

US20070097708A1 Prism sheet of back light unit for lcd 有权
标题翻译：液晶显示器背光单元棱镜片
公开(公告)号：US20070097708A1
公开(公告)日：2007-05-03
申请号：US10562263
申请日：2003-10-13
申请人： Young-shig Shim , Sung-Min Cho , Soon-Ryong Park , Eun-Mi Lee
发明人： Young-shig Shim , Sung-Min Cho , Soon-Ryong Park , Eun-Mi Lee
IPC分类号： F21V7/04
CPC分类号： G02B6/0053 , G02B5/045 , G02F1/133606
摘要： Disclosed is a prism sheet structure that can control optical coupling between contact surfaces of two prism sheets in a backlight unit. The prism sheet includes: a structural surface (14) having non-planar peaks (11) with maximum height and minimum height along a length direction thereof; and a curved layer (17) having the same cycle as a cycle of height variation of the peak. The curved layer is formed at a boundary surface (16) between the structural surface 14 and the flat surface to maintain the right-angled isosceles triangular prisms formed due to a difference between the highest point and the lowest point of each of the peaks to have a predetermined size, so that distance between the valleys (12) is uniform along the length direction. Although shapes of prisms are identical, the cycle of the peak height variation allows the moire patterns to be suppressed or removed.
摘要翻译：公开了一种棱镜片结构，其可以控制背光单元中的两个棱镜片的接触表面之间的光耦合。棱镜片包括：具有沿着其长度方向具有最大高度和最小高度的非平面峰（11）的结构表面（14）以及具有与峰值的高度变化的周期相同周期的弯曲层（17）。弯曲层形成在结构表面14和平坦表面之间的边界表面（16）处，以保持由于每个峰的最高点和最低点之间的差异而形成的直角等腰三角棱镜具有使得谷（12）之间的距离沿着长度方向是均匀的。虽然棱镜的形状是相同的，但是峰高变化的周期允许抑制或去除莫尔图案。

3. 发明授权

US07488095B2 Prism sheet of back light unit for LCD 有权
标题翻译： LCD背光单元棱镜片
公开(公告)号：US07488095B2
公开(公告)日：2009-02-10
申请号：US10562263
申请日：2003-10-13
申请人： Young-Shig Shim , Sung-Min Cho , Soon-Ryong Park , Eun-Mi Lee
发明人： Young-Shig Shim , Sung-Min Cho , Soon-Ryong Park , Eun-Mi Lee
IPC分类号： F21V7/04
CPC分类号： G02B6/0053 , G02B5/045 , G02F1/133606
摘要： Disclosed is a prism sheet structure that can control optical coupling between contact surfaces of two prism sheets in a backlight unit. The prism sheet includes: a structural surface (14) having non-planar peaks (11) with maximum height and minimum height along a length direction thereof; and a curved layer (17) having the same cycle as a cycle of height variation of the peak. The curved layer is formed at a boundary surface (16) between the structural surface 14 and the flat surface to maintain the right-angled isosceles triangular prisms formed due to a difference between the highest point and the lowest point of each of the peaks to have a predetermined size, so that distance between the valleys (12) is uniform along the length direction. Although shapes of prisms are identical, the cycle of the peak height variation allows the moiré´ patterns to be suppressed or removed.
摘要翻译：公开了一种棱镜片结构，其可以控制背光单元中的两个棱镜片的接触表面之间的光耦合。棱镜片包括：具有沿着其长度方向具有最大高度和最小高度的非平面峰（11）的结构表面（14）以及具有与峰值的高度变化的周期相同周期的弯曲层（17）。弯曲层形成在结构表面14和平坦表面之间的边界表面（16）处，以保持由于每个峰的最高点和最低点之间的差异而形成的直角等腰三角棱镜具有使得谷（12）之间的距离沿着长度方向是均匀的。虽然棱镜的形状是相同的，但是峰高变化的周期允许抑制或去除莫尔图案。

4. 发明申请

US20070024177A1 Electron emission source, method of preparing the same, and electron emission device employing the electron emission source 失效
标题翻译：电子发射源，其制备方法和使用电子发射源的电子发射装置
公开(公告)号：US20070024177A1
公开(公告)日：2007-02-01
申请号：US11491997
申请日：2006-07-25
申请人： Young-Chul Choi , Jae-Myung Kim , Chang-Wook Kim , Eun-Mi Lee , Joong-Woo Nam , Sung-Hee Cho , Jong-Hwan Park , Ji-Soon Ihm
发明人： Young-Chul Choi , Jae-Myung Kim , Chang-Wook Kim , Eun-Mi Lee , Joong-Woo Nam , Sung-Hee Cho , Jong-Hwan Park , Ji-Soon Ihm
IPC分类号： H01J63/04 , H01J19/06
CPC分类号： H01J9/025 , B82Y10/00 , H01J1/304 , H01J31/127 , H01J2201/30469
摘要： An electron emission source including a carbon-based material coated with metal carbide in the surface coating layer, of which the metal has a negative Gibbs free energy when forming the metal carbide at 1,500 K or lower, a method of preparing electron emission sources, and an electron emission device including the electron emission source. The electron emission source includes a carbon nanotube coated with metal carbide or a carbon nanotube having a metal carbide layer and a metal coating layer, which are sequentially formed thereon. Thus, the electron emission source has long lifespan without deterioration of electron emitting characteristics. The electron emission source can be used to manufacture electron emission devices with improved reliability.
摘要翻译：一种电子发射源，包括在表面被覆层中涂覆有金属碳化物的碳基材料，当在1500K以下的金属碳化物形成时，金属具有负的吉布斯自由能，制备电子发射源的方法以及包括电子发射源的电子发射装置。电子发射源包括涂覆有金属碳化物的碳纳米管或具有顺序地形成在其上的金属碳化物层和金属涂层的碳纳米管。因此，电子发射源具有长寿命而不劣化电子发射特性。电子发射源可用于制造具有可靠性提高的电子发射装置。

5. 发明授权

US07064051B2 Method of forming self-aligned contact pads of non-straight type semiconductor memory device 有权
标题翻译：形成非直型半导体存储器件的自对准接触焊盘的方法
公开(公告)号：US07064051B2
公开(公告)日：2006-06-20
申请号：US10944151
申请日：2004-09-16
申请人： Eun-Mi Lee , Doo-Hoon Goo , Jung-Hyeon Lee , Gi-Sung Yeo
发明人： Eun-Mi Lee , Doo-Hoon Goo , Jung-Hyeon Lee , Gi-Sung Yeo
IPC分类号： H01L21/3205 , H01L21/4763
CPC分类号： H01L21/76897 , H01L23/485 , H01L2924/0002 , H01L2924/00
摘要： Embodiments of the invention provide methods of forming SAC pads in non-straight semiconductor device having non-straight type or separate type active regions. A plurality of gate line structures extending in one direction may be formed on a semiconductor substrate having non-straight active regions. An interlayer insulating layer covering gate line structures may be formed on the gate line structures. Then, a photo-resist layer may be formed on the interlayer insulating layer. A photo-resist pattern may be formed through exposing and developing the photo-resist layer by using a photo-mask having, for example, a bar type, a wave type, or a reverse active type pattern. Then, contact holes exposing source/drain regions may be formed by etching the interlayer insulating layer using the photo-resist pattern as an etching mask. Contact pads may then be formed by filling the contact holes with a conductive material.
摘要翻译：本发明的实施例提供了在具有非直型或分离型有源区的非直线半导体器件中形成SAC焊盘的方法。可以在具有非直线活性区域的半导体衬底上形成沿一个方向延伸的多个栅极线结构。覆盖栅极线结构的层间绝缘层可以形成在栅极线结构上。然后，可以在层间绝缘层上形成光致抗蚀剂层。可以通过使用具有例如条形，波型或反向活性型图案的光掩模，通过曝光和显影光致抗蚀剂层来形成光刻胶图案。然后，可以通过使用光刻胶图案作为蚀刻掩模蚀刻层间绝缘层来形成暴露源极/漏极区的接触孔。然后可以通过用导电材料填充接触孔来形成接触垫。

6. 发明申请

US20070154814A1 Nas battery using liquid electrolyte 审中-公开
标题翻译：使用液体电解质的电池
公开(公告)号：US20070154814A1
公开(公告)日：2007-07-05
申请号：US10586931
申请日：2004-03-03
申请人： Dong-Hyun Ryu , Chul-Wan Park , Hyo-Jun Ahn , Bong-Jun Kim , Eun-Mi Lee , Ho-Suk Ryu , Sang-Won Lee , Ki-Won Kim , Jou-Hyeon Ahn , Jai-Young Lee , Sang-Sik Jeong , Byung-Su Jung , Duck-Jun Lee , Young-Jin Choi , Jin-Kyu Kim
发明人： Dong-Hyun Ryu , Chul-Wan Park , Hyo-Jun Ahn , Bong-Jun Kim , Eun-Mi Lee , Ho-Suk Ryu , Sang-Won Lee , Ki-Won Kim , Jou-Hyeon Ahn , Jai-Young Lee , Sang-Sik Jeong , Byung-Su Jung , Duck-Jun Lee , Young-Jin Choi , Jin-Kyu Kim
IPC分类号： H01M6/18
CPC分类号： H01M10/399
摘要： The present invention relates to a sodium-sulfur battery consisted of solid sodium for the negative electrode (comprising carbon, sodium metal oxide and the like comprising sodium compound, sodium ion); solid sulfur for the positive electrode (comprising sulfur, sulfur compound such as iron sulfide, nickel sulfide); and liquid electrolyte which sodium salt and organic solvent such as grymids or carbonates are soaked in cell guard, thereby improving a drawback of prior art for conventional battery.
摘要翻译：本发明涉及由用于负极的固体钠（包括碳，钠金属氧化物等包含钠化合物，钠离子）组成的钠硫电池; 固体硫为正极（含硫，硫化合物如硫化铁，硫化镍）; 以及钠盐和诸如格里木或碳酸盐的有机溶剂浸泡在电池保护层中的液体电解质，从而改善了传统电池的现有技术的缺点。

7. 发明授权

US07615917B2 Electron emission source, method of preparing the same, and electron emission device employing the electron emission source 失效
标题翻译：电子发射源，其制备方法和使用电子发射源的电子发射装置
公开(公告)号：US07615917B2
公开(公告)日：2009-11-10
申请号：US11491997
申请日：2006-07-25
申请人： Young-Chul Choi , Jae-Myung Kim , Chang-Wook Kim , Eun-Mi Lee , Joong-Woo Nam , Sung-Hee Cho , Jong-Hwan Park , Ji-Soon Ihm
发明人： Young-Chul Choi , Jae-Myung Kim , Chang-Wook Kim , Eun-Mi Lee , Joong-Woo Nam , Sung-Hee Cho , Jong-Hwan Park , Ji-Soon Ihm
IPC分类号： H01J1/62
CPC分类号： H01J9/025 , B82Y10/00 , H01J1/304 , H01J31/127 , H01J2201/30469
摘要： An electron emission source including a carbon-based material coated with metal carbide in the surface coating layer, of which the metal has a negative Gibbs free energy when forming the metal carbide at 1,500 K or lower, a method of preparing electron emission sources, and an electron emission device including the electron emission source. The electron emission source includes a carbon nanotube coated with metal carbide or a carbon nanotube having a metal carbide layer and a metal coating layer, which are sequentially formed thereon. Thus, the electron emission source has long lifespan without deterioration of electron emitting characteristics. The electron emission source can be used to manufacture electron emission devices with improved reliability.
摘要翻译：一种电子发射源，包括在表面被覆层中涂覆有金属碳化物的碳基材料，当在1500K以下的金属碳化物形成时，金属具有负的吉布斯自由能，制备电子发射源的方法以及包括电子发射源的电子发射装置。电子发射源包括涂覆有金属碳化物的碳纳米管或具有顺序地形成在其上的金属碳化物层和金属涂层的碳纳米管。因此，电子发射源具有长寿命而不劣化电子发射特性。电子发射源可用于制造具有可靠性提高的电子发射装置。

8. 发明申请

US20080033630A1 System and method of predicting traffic speed based on speed of neighboring link 审中-公开
标题翻译：基于相邻链路速度预测流量速度的系统和方法
公开(公告)号：US20080033630A1
公开(公告)日：2008-02-07
申请号：US11493088
申请日：2006-07-26
申请人： Eun-Mi Lee , Sung-Hwa Lim , Jae-Hoon Kim , Won-Sik Yoon , Byung-Soo Kim
发明人： Eun-Mi Lee , Sung-Hwa Lim , Jae-Hoon Kim , Won-Sik Yoon , Byung-Soo Kim
IPC分类号： G08G1/00 , G08G1/123
CPC分类号： G08G1/0104
摘要： The present invention relates to a system and a method of predicting traffic speed based on the speeds of neighboring links. A system for predicting traffic speed on a link basis, on a map based on a past traffic patterns, includes a prediction model establishment unit that establishes a neighboring link speed-based prediction model including the correlation between the speed of each link and the speeds of neighboring links based on real-time traffic information accumulated in a real-time traffic information database for a predetermined time, a prediction model database that stores the established neighboring link speed-based prediction model data, and a traffic speed prediction unit that inputs real-time neighboring link speed information for a specific object link to the neighboring link speed-based prediction model and predicts an output value according to the real-time neighboring link speed information as the traffic speed of the object link.
摘要翻译：本发明涉及一种基于相邻链路的速度来预测业务速度的系统和方法。基于过去的业务模式，在地图上基于链路预测业务速度的系统包括建立基于链路速度的相邻预测模型的预测模型建立单元，该预测模型建立单元包括每个链路的速度与每个链路的速度之间的相关性基于在实时交通信息数据库中累积的预定时间的实时交通信息的相邻链路，存储所建立的相邻链路速度预测模型数据的预测模型数据库，并且根据实时邻近链路速度信息将输出值预测为对象链路的传输速度。

9. 发明授权

US08423920B2 Method of forming photomask by collecting verification data based on a layout of contour patterns 有权
标题翻译：通过基于轮廓图案的布局收集验证数据形成光掩模的方法
公开(公告)号：US08423920B2
公开(公告)日：2013-04-16
申请号：US13167949
申请日：2011-06-24
申请人： Eun-Mi Lee , Chun-Suk Suh , Sung-Woo Lee
发明人： Eun-Mi Lee , Chun-Suk Suh , Sung-Woo Lee
IPC分类号： G06F17/50 , G06F9/455
CPC分类号： G06F17/5068 , G03F1/36 , G06F2217/12 , Y02P90/265
摘要： A method of forming a photomask includes providing a layout of design patterns, setting an optical proximity correction (OPC) with respect to the layout of design patterns, and forming a layout of correction patterns with respect to the layout of design patterns by using the set OPC. The method also includes collecting verification data about the layout of correction patterns by using a layout of contour patterns based on the layout of correction patterns, and verifying whether the layout of design patterns and the layout of correction patterns are substantially identical to each other by using the verification data.
摘要翻译：形成光掩模的方法包括提供设计图案的布局，相对于设计图案的布局设置光学邻近校正（OPC），以及通过使用该组合来形成关于设计图案的布局的校正图案的布局 OPC。该方法还包括通过使用基于校正图案的布局的轮廓图案的布局来收集关于校正图案的布局的验证数据，以及通过使用如下方式来验证设计图案的布局和校正图案的布局是否基本相同验证数据。

10. 发明申请

US20050070080A1 Method of forming self-aligned contact pads of non-straight type semiconductor memory device 有权
标题翻译：形成非直型半导体存储器件的自对准接触焊盘的方法
公开(公告)号：US20050070080A1
公开(公告)日：2005-03-31
申请号：US10944151
申请日：2004-09-16
申请人： Eun-Mi Lee , Doo-Hoon Goo , Jung-Hyeon Lee , Gi-Sung Yeo
发明人： Eun-Mi Lee , Doo-Hoon Goo , Jung-Hyeon Lee , Gi-Sung Yeo
IPC分类号： H01L21/28 , H01L21/4763 , H01L21/60 , H01L23/485
CPC分类号： H01L21/76897 , H01L23/485 , H01L2924/0002 , H01L2924/00
摘要： Embodiments of the invention provide methods of forming SAC pads in non-straight semiconductor device having non-straight type or separate type active regions. A plurality of gate line structures extending in one direction may be formed on a semiconductor substrate having non-straight active regions. An interlayer insulating layer covering gate line structures may be formed on the gate line structures. Then, a photo-resist layer may be formed on the interlayer insulating layer. A photo-resist pattern may be formed through exposing and developing the photo-resist layer by using a photo-mask having, for example, a bar type, a wave type, or a reverse active type pattern. Then, contact holes exposing source/drain regions may be formed by etching the interlayer insulating layer using the photo-resist pattern as an etching mask. Contact pads may then be formed by filling the contact holes with a conductive material.
摘要翻译：本发明的实施例提供了在具有非直型或分离型有源区的非直线半导体器件中形成SAC焊盘的方法。可以在具有非直线活性区域的半导体衬底上形成沿一个方向延伸的多个栅极线结构。覆盖栅极线结构的层间绝缘层可以形成在栅极线结构上。然后，可以在层间绝缘层上形成光致抗蚀剂层。可以通过使用具有例如棒型，波型或反向活性型图案的光掩模，通过曝光和显影光致抗蚀剂层来形成光致抗蚀剂图案。然后，可以通过使用光刻胶图案作为蚀刻掩模蚀刻层间绝缘层来形成暴露源极/漏极区的接触孔。然后可以通过用导电材料填充接触孔来形成接触垫。

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